108009 ⎘
Other compounding ingredients of detergent compositions covered in group; Organic compounds containing sulfur containing thiol, mercapto or sulfide groups, e.g. thioethers or mercaptales
INJECTIVITY IMPROVEMENT WITH THIOALCOHOLS
#2TEXTILE ARTICLES FOR TUMBLE-DRYING
#3FLUX CLEANING COMPOSITION
#4PRECURSORS FOR THE CONTROLLED RELEASE OF A,B-UNSATURATED ALDEHYDES OR KETONES AND OTHER HIGH IMPACT FRAGRANCE SUBSTANCES
#5IMPROVED PERFUME COMPOSITIONS COMPRISING SULFUR-CONTAINING PRO-FRAGRANCE COMPOUNDS
#6INJECTIVITY IMPROVEMENT WITH THIOALCOHOLS
#7CONSUMER PRODUCTS CONTAINING PRO-FRAGRANCES
#8CLEANING SOLUTION AND CLEANING METHOD
#9Hydrofluorothioethers and methods of using same
#10PROCESS SOLUTION FOR POLYMER PROCESSING
#11WATER-SOLUBLE POLYMER FILMS OF ETHYLENE OXIDE HOMO- OR COPOLYMERS, CALENDERING PROCESS FOR THE PRODUCTION THEREOF AND THE USE THEREOF
#12ADVANCED NOVEL ECO-FRIENDLY COMPOSITIONS
#13Chemical compositions and method for degassing of processing equipment
#14Stripping compositions for removing photoresists from semiconductor substrates
#15Cleaning compositions for removing residues on semiconductor substrates
#16Chemical compositions and method for degassing of processing equipment
#17Stripping compositions for removing photoresists from semiconductor substrates
#18Sulfur-containing compounds as solvents
#19Solvent for cleaning turbine components
#20Liquid chemical for forming water repellent protecting film, and process for cleaning wafers using the same
#21Apparatus, method, and solvent for cleaning turbine components
#22Post chemical-mechanical-polishing (post-CMP) cleaning composition comprising a specific sulfur-containing compound and a sugar alcohol or a polycarboxylic acid
#23Oilfield cleaner and corrosion inhibitor comprising a polyamine sulfonic acid salt
#24Personal care compositions containing zinc pyrithione and a metal-phosphonate complex
#25Acidic compositions including reducing agents for scale and decolorization of metal stains
#26Liquid chemical for forming water repellent protecting film, and process for cleaning wafers using the same
#27FORMULA FOR REMOVING COLOR COATS AND VARIOUS SOIL LAYERS FROM SURFACES, METHOD FOR PRODUCING THE AGENT, AND METHOD FOR CLEANING
#28Liquid compostion for cleaning a nozzle surface, method of cleaning a nozzle surface using the liquid composition, and inkjet recording apparatus including the liquid composition
#29Compositions And Methods For Removing Scale And Inhibiting Formation Thereof
#30Formulations for cleaning ion-implanted photoresist layers from microelectronic devices
#31Methods of corrosion prevention and cleaning of copper structures
#32IMPROVED ACIDIC CHEMISTRY FOR POST-CMP CLEANING
#33Semiconductor process residue removal composition and process
#34Ophthalmic Compositions Comprising A Branched, Glycerol Compound
#35Ophthalmic compositions comprising a branched, glycerol monoalkyl compound and a fatty acid monoester
#36Cleaning compositions and methods of use thereof
#37Subterranean well and oil or gas stream treatment with bis(3-alkoxyalkan-2-ol) sulfides, sulfones, and sulfoxides: new surface active agents
#38Acidic chemistry for Post-CMP cleaning using a composition comprising mercaptopropionic acid
#39Bis(3-alkoxyalkan-2-ol) sulfides, sulfones, and sulfoxides: new surface active agents
#40Alkylglycidol carbonates as cosurfactants
#41Acidic chemistry for post-CMP cleaning
#42Alkaline chemistry for post-CMP cleaning
#43Cleaning composition and method of cleaning a semiconductor device using the same
#44Aqueous cleaning solution for integrated circuit device and method of cleaning using the cleaning solution
#45Compositions and methods for removal of incidental soils from fabric articles via soil modification