C11D7/105 - CPC Classification Index

ClassID:

108107 ⎘

C11D7/105 - CPC Classification

Classification description:

Compositions of detergents based essentially on non-surface-active compounds; Inorganic compounds; Water-soluble compounds; Salts Nitrates; Nitrites

Recent Application in this class:

20240288785

2024-08-29

CLEANING COMPOSITION AND METHOD OF CLEANING MASK BY USING THE SAME

20230159864

2023-05-25

Treatment liquid and method for treating object to be treated

20220333044

2022-10-20

Photoresist Remover

20210130751

2021-05-06

Composition for surface treatment, method for producing the same, and surface treatment method using the same

20210002591

2021-01-07

Composition having suppressed alumina damage and production method for semiconductor substrate using same

20200199758

2020-06-25

Method for nickel-free phosphating metal surfaces

20200017978

2020-01-16

COMPOSITION FOR CLEANING MASK AND METHOD FOR CLEANING MASK USING THE SAME

20180355289

2018-12-13

TARGETED PERFORMANCE OF HYPOHALITE METHODS THEREOF

20180245026

2018-08-30

SYSTEM FOR DISPENSING A SOLUTION OF NITRIC OXIDE IN DEIONIZED AND/OR DEOXYGENATED WATER FROM A VESSEL

#10

20170335248

2017-11-23

Alkaline earth metal-containing cleaning solution for cleaning semiconductor element, and method for cleaning semiconductor element using same

#11

20170240850

2017-08-24

Semiconductor element cleaning solution that suppresses damage to cobalt, and method for cleaning semiconductor element using same

#12

20170233687

2017-08-17

Semiconductor element cleaning solution that suppresses damage to tantalum-containing materials, and cleaning method using same

#13

20170044470

2017-02-16

Wet clean process for removing CHFetch residue

#14

20170022453

2017-01-26

Targeted performance of hypohalite methods thereof

#15

20170015955

2017-01-19

Semiconductor element cleaning liquid and cleaning method

#16

20160376527

2016-12-29

Pyrophoric iron sulfide treatment using sodium nitrite

#17

20150361525

2015-12-17

Method of mercury decontamination

#18

20150197710

2015-07-16

Targeted performance of hypohalite methods thereof

#19

20150166940

2015-06-18

UNIVERSAL SURFACE DECONTAMINATION FORMULATION

#20

20150118839

2015-04-30

Wet clean process for removing CHFetch residue

#21

20140024651

2014-01-23

UNIVERSAL SURFACE DECONTAMINATION FORMULATION

#22

20130217610

2013-08-22

Targeted performance of hypohalite methods thereof

#23

20130216293

2013-08-22

Targeted performance of hypohalite systems thereof

#24

20120244050

2012-09-27

CLEANING AGENT FOR SILVER-CONTAINING COMPOSITION, METHOD FOR REMOVING SILVER-CONTAINING COMPOSITION, AND METHOD FOR RECOVERING SILVER

#25

20120108485

2012-05-03

Multi-agent type cleaning kit for semiconductor substrates, cleaning method using the same and method of producing semiconductor element

#26

20120028871

2012-02-02

Stripping compositions for cleaning ion implanted photoresist from semiconductor device wafers

#27

20090305932

2009-12-10

Composition for removing engine deposits from turbine components

#28

20080066779

2008-03-20

Removing solution, cleaning method for semiconductor substrate, and process for production of semiconductor device

#29

20060137724

2006-06-29

Method for removing engine deposits from turbine components and composition for use in same

#30

20060091182

2006-05-04

Repair of braze joint and article repaired

#31

20050143279

2005-06-30

Cleaning agent and method for cleaning heater tubes