ClassID:

108112

C11D7/22 - CPC Classification

Classification description:

Compositions of detergents based essentially on non-surface-active compounds Organic compounds

Sub-classes:
Recent Application in this class:
#1
20210163858
2021-06-03

PURGE COMPOSITION AND METHOD OF CLEANING

#2
20200282606
2020-09-10

Cleaning agent for molding-machine cleaning and cleaning method

#3
20190309178
2019-10-10

Cleaning solution

#4
20190263614
2019-08-29

Material and hardware to automatically clean flexible electronic web rolls

#5
20190263613
2019-08-29

Material and hardware to automatically clean flexible electronic web rolls

#6
20190262872
2019-08-29

Material and hardware to automatically clean flexible electronic web rolls

#7
20190262871
2019-08-29

Material and hardware to automatically clean flexible electronic web rolls

#8
20190203027
2019-07-04

Composition for surface treatment

#9
20190169544
2019-06-06

Detergents and cleaning agents having improved performance

#10
20180265826
2018-09-20

Methods for making encapsulate-containing product compositions

#11
20180265824
2018-09-20

Methods for making encapsulate-containing product compositions

#12
20180230405
2018-08-16

Cleaning formulations

#13
20170200619
2017-07-13

Anti-reflective coating cleaning and post-etch residue removal composition having metal, dielectric and nitride compatibility

#14
20170175053
2017-06-22

Polishing composition

#15
20160024436
2016-01-28

Fabric treatment composition comprising an aminosiloxane polymer nanoemulsion

#16
20140099789
2014-04-10

Method of making an interconnect device

#17
20140083450
2014-03-27

Chamber cleaning with infrared absorption gas

#18
20130041083
2013-02-14

Composition for easy to clean surfaces

#19
20120277141
2012-11-01

Calcium sequestering composition

#20
20120010119
2012-01-12

AZEOTROPIC AND NEAR-AZEOTROPIC MIXTURES OF HEXAMETHYLDISILOXANE AND DIMETHYL CARBONATE AND METHODS OF USE

#21
20090163396
2009-06-25

Nanoelectronic and microelectronic cleaning compositions

#22
20090120458
2009-05-14

High negative zeta potential polyhedral silsesquioxane composition and method for damage free semiconductor wet clean

#23
20090072190
2009-03-19

CLEANING SOLUTION FORMULATIONS FOR SUBSTRATES

#24
20080280804
2008-11-13

Surfactant-free detergent composition comprising an anti-soil redeposition agent

#25
20070287277
2007-12-13

Semiconductor system with surface modification

#26
20060247143
2006-11-02

Windshield washer fluid composition, additive concentrate for use therein, and methods of using the same

#27
20060030509
2006-02-09

Cleaning compound for and method of cleaning valves and actuators of metered dose dispensers containing pharmaceutical compositions