ClassID:

108150

C11D7/5013 - CPC Classification

Classification description:

Compositions of detergents based essentially on non-surface-active compounds; Solvents; Organic solvents containing nitrogen

Recent Application in this class:
#1
20260092239
2026-04-02

CLEANING COMPOSITION

#2
20260071152
2026-03-12

CLEANING METHOD

#3
20260062568
2026-03-05

COMPOSITIONS AND METHODS FOR CLEANING AND STRIPPING

#4
20260035639
2026-02-05

RATIONAL SOLVENT FORMULATION FOR CURED PHOTORESIST REMOVAL

#5
20250379042
2025-12-11

METHOD OF CLEANING CHAMBER COMPONENTS WITH METAL ETCH RESIDUES

#6
20250376645
2025-12-11

METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE

#7
20250354092
2025-11-20

CLEANING COMPOSITION AND METHOD FOR REMOVING POLYMER FILM BONDING MATERIALS USING THE SAME

#8
20250297195
2025-09-25

ETCHING CLEANING COMPOSITION AND ETCHING CLEANING METHOD USING THE SAME

#9
20250092337
2025-03-20

MASK CLEANING COMPOSITION, MASK CLEANING METHOD, AND METHOD OF MANUFACTURING DISPLAY APPARATUS

#10
20250043217
2025-02-06

STRIPPER COMPOSITION AND METHOD FOR STRIPPING PHOTORESIST

#11
20250043216
2025-02-06

METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR MANUFACTURING PROCESSED SEMICONDUCTOR SUBSTRATE, AND RELEASING AND DISSOLVING COMPOSITION

#12
20240417664
2024-12-19

METHOD FOR CLEANING A MICROFLUIDIC DEVICE USING AN IONIC LIQUID

#13
20240368504
2024-11-07

ADDITIVE FOR CLEANING SCR SYSTEMS

#14
20240304428
2024-09-12

METHOD OF CLEANING CHAMBER COMPONENTS WITH METAL ETCH RESIDUES

#15
20240254415
2024-08-01

Surface Treatment Compositions and Methods

#16
20240150682
2024-05-09

POLYSTYRENE AND/OR STYRENE COPOLYMERS SOLUBILIZING COMPOSITION

#17
20240117280
2024-04-11

METAL RESIDUE REMOVING LIQUID, METAL RESIDUE REMOVING METHOD, AND METAL WIRING MANUFACTURING METHOD

#18
20230348822
2023-11-02

Anti-limescale composition

#19
20230203408
2023-06-29

CLEANING LIQUID AND METHOD FOR CLEANING SUBSTRATE

#20
20230151308
2023-05-18

SEMICONDUCTOR SUBSTRATE CLEANING METHOD, PROCESSED SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD, AND COMPOSITION FOR PEELING

#21
20230129238
2023-04-27

CLEANING AGENT COMPOSITION AND METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE

#22
20230125907
2023-04-27

METHOD FOR CLEANING SEMICONDUCTOR SUBSTRATE, METHOD FOR PRODUCING PROCESSED SEMICONDUCTOR SUBSTRATE, AND STRIPPING COMPOSITION

#23
20230095013
2023-03-30

CLEANING AGENT AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

#24
20230039366
2023-02-09

COMPOSITION, AND METHOD FOR CLEANING ADHESIVE POLYMER

#25
20220290078
2022-09-15

Composition, and method for cleaning adhesive polymer

#26
20220195352
2022-06-23

Cleaning solution for temporary adhesive for substrates, substrate cleaning method, and cleaning method for support or substrate

#27
20220135914
2022-05-05

CLEANING AGENT COMPOSITION AND CLEANING METHOD

#28
20220135913
2022-05-05

CLEANING AGENT COMPOSITION AND CLEANING METHOD

#29
20220119739
2022-04-21

Decomposing/cleaning composition, method for cleaning adhesive polymer, and method for producing device wafer

#30
20220098526
2022-03-31

Nitrile solvents

#31
20220010242
2022-01-13

CLEANING AGENT COMPOSITION AND CLEANING METHOD

#32
20210317390
2021-10-14

Composition, method for cleaning adhesive polymer, method for producing device wafer, and method for regenerating support wafer

#33
20210129192
2021-05-06

METHOD FOR TREATING A SEMICONDUCTOR DEVICE

#34
20210047525
2021-02-18

COMPOSITIONS AND METHODS FOR CLEANING AND STRIPPING

#35
20210040421
2021-02-11

Compositions and methods for cleaning urethane molds

#36
20200165547
2020-05-28

Treatment liquid, kit, and method for washing substrate

#37
20200088677
2020-03-19

Method for treating a semiconductor device

#38
20200055097
2020-02-20

Method for treating a semiconductor device

#39
20200002652
2020-01-02

Cleaning agent composition for semiconductor device substrate, method of cleaning semiconductor device substrate, method of manufacturing semiconductor device substrate, and semiconductor device substrate

#40
20190256805
2019-08-22

Cleaning solution and method for cleaning substrate

#41
20190219925
2019-07-18

Solvents for use in the electronics industry

#42
20190211286
2019-07-11

Sulfoxide/glycol ether based solvents for use in the electronics industry

#43
20190136159
2019-05-09

BUTYLPYRROLIDONE BASED CLEANING AGENT FOR REMOVAL OF CONTAMINATES FROM ELECTRONIC AND SEMICONDUCTOR DEVICES

#44
20190118018
2019-04-25

Composition and method for decontaminating opioids on surfaces

#45
20190080952
2019-03-14

Adhesive for temporary bonding, adhesive layer, wafer work piece and method for manufacturing semiconductor device using same, rework solvent, polyimide copolymer, polyimide mixed resin, and resin compostion

#46
20190070640
2019-03-07

Method for treating a semiconductor device

#47
20190048294
2019-02-14

Cleaning composition and cleaning method

#48
20190016998
2019-01-17

Cleaning composition for liquid crystal alignment layer and manufacturing method of liquid crystal alignment layer using the same

#49
20180328883
2018-11-15

Method for treating a semiconductor device

#50
20180298310
2018-10-18

Cleaning Agent for Removal of Soldering Flux

#51
20180265819
2018-09-20

Composition for removing silicone resins and method of thinning substrate by using the same

#52
20180187133
2018-07-05

Cleaning liquid and method for manufacturing the same

#53
20180003672
2018-01-04

Method for treating a semiconductor device

#54
20180002645
2018-01-04

Composition for cleaning gasoline engine fuel delivery systems, air intake systems, and combustion chambers

#55
20170327703
2017-11-16

Synergistic mixed solvents-based compositions with improved efficiency of performance and environmental safety for removal of paint, varnish and stain

#56
20170321168
2017-11-09

Polyimide-based resin film cleaning liquid, method for cleaning polyimide-based resin film, method for producing polyimide coating, method for producing filter, filter medium, or filter device, and method for producing chemical solution for lithography

#57
20170221746
2017-08-03

Adhesive for temporary bonding, adhesive layer, wafer work piece and method for manufacturing semiconductor device using same, rework solvent, polyimide copolymer, polyimide mixed resin, and resin composition

#58
20170130045
2017-05-11

POLYVINYLIDENE FLUORIDE SOLUTIONS IN N-FORMYL- OR N-ACETYLMORPHOLINE

#59
20170095841
2017-04-06

Method for treating a semiconductor device

#60
20170076939
2017-03-16

TiN pull-back and cleaning composition

#61
20170037344
2017-02-09

Photoresist cleaning composition used in photolithography and a method for treating substrate therewith

#62
20170015955
2017-01-19

Semiconductor element cleaning liquid and cleaning method

#63
20160339704
2016-11-24

Method for manufacturing liquid ejection head

#64
20160312160
2016-10-27

Solvent composition and process for removal of asphalt and other contaminant materials

#65
20160279677
2016-09-29

Method for treating a semiconductor device

#66
20160244700
2016-08-25

Removing resin coatings from wellbore surfaces

#67
20160222326
2016-08-04

Low VOC composition to remove food, beverage, pet and protein stains

#68
20160186106
2016-06-30

Stripping compositions for removing photoresists from semiconductor substrates

#69
20160152930
2016-06-02

Stripping and Cleaning Compositions for Removal of Thick Film Resist

#70
20160061773
2016-03-03

METHOD FOR TREATING A SEMICONDUCTOR DEVICE

#71
20160056049
2016-02-25

Wafer treatment solution for edge-bead removal, edge film hump reduction and resist surface smooth, its apparatus and edge-bead removal method by using the same

#72
20150299628
2015-10-22

Composition for removing and preventing formation of oxide on the surface of metal wire

#73
20150291920
2015-10-15

Cleaning industrial plant components to remove metal halides

#74
20150252311
2015-09-10

Cleaning composition, cleaning process, and process for producing semiconductor device

#75
20150057375
2015-02-26

USE OF IMPROVED N-ALKYL PYRROLIDONE SOLVENT

#76
20150044839
2015-02-12

Photoresist stripping and cleaning composition, method of its preparation and its use

#77
20140357052
2014-12-04

SUBSTRATE DETERGENT COMPOSITION

#78
20140352740
2014-12-04

Label removal solution for low temperature and low alkaline conditions

#79
20140261555
2014-09-18

De-carbonizing process for combustion component cleaning

#80
20140256609
2014-09-11

Compositions for degreasing hard surfaces

#81
20140238444
2014-08-28

Method for cleaning microfluidic device and cleaning liquid

#82
20140221211
2014-08-07

Use of esteramides as solvents, novel esteramides and process for preparing esteramides

#83
20140109931
2014-04-24

Cleaning formulations

#84
20130217234
2013-08-22

Cleaning solution and damascene process using the same

#85
20130167867
2013-07-04

Composition and method for removing photoresist and bottom anti-reflective coating for a semiconductor substrate

#86
20130161840
2013-06-27

STRIPPER SOLUTIONS EFFECTIVE FOR BACK-END-OF-LINE OPERATIONS

#87
20130096044
2013-04-18

Liquid concentrate for cleaning composition, cleaning composition and cleaning method

#88
20130037749
2013-02-14

Solvent compositions

#89
20120315831
2012-12-13

CMP Polishing Method, CMP Polishing Apparatus, and Process for Producing Semiconductor Device

#90
20120273010
2012-11-01

Composition and method to remove excess material during manufacturing of semiconductor devices

#91
20120264673
2012-10-18

Environmentally friendly, multi-purpose refluxing cleaner

#92
20120214294
2012-08-23

Method for manufacturing compound semiconductor device and detergent

#93
20120157367
2012-06-21

Composition and method for removing photoresist and bottom anti-reflective coating for a semiconductor substrate

#94
20120046209
2012-02-23

Cleaning solvent and cleaning method for metallic compound

#95
20120029092
2012-02-02

PRODUCT CONTAINING DIAMIDES, METHOD FOR MAKING SAME AND USES THEREOF

#96
20110319309
2011-12-29

Compositions and methods for the removal of chewing gum residues from substrates

#97
20110256483
2011-10-20

Residue removing liquid composition and method for cleaning semiconductor element using same

#98
20110214689
2011-09-08

Cleaning solvent and cleaning method for metallic compound

#99
20110212865
2011-09-01

Gluconic acid containing photoresist cleaning composition for multi-metal device processing

#100
20110192421
2011-08-11

COMPOSITIONS FOR DEGREASING HARD SURFACES

#101
20110166025
2011-07-07

Esteramide solvents/coalescing agents in phytosanitary, cleaning, degreasing, stripping, lubricating, coating, and pigment/ink compositions

#102
20110076852
2011-03-31

Cleaning composition, cleaning process, and process for producing semiconductor device

#103
20100081602
2010-04-01

Compositions for lipophilic fluid systems comprising a siloxane-based/non-ionic surfactant mixture

#104
20100009885
2010-01-14

Composition for removing a photoresist, method of preparing the composition, method of removing a photoresist and method of manufacturing a semiconductor device using the composition

#105
20090099051
2009-04-16

Aqueous fluoride compositions for cleaning semiconductor devices

#106
20090047785
2009-02-19

CMP polishing method, CMP polishing apparatus, and process for producing semiconductor device

#107
20090011967
2009-01-08

Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials

#108
20090005285
2009-01-01

Composition comprising an organosilicone/diol lipophilic fluid for treating or cleaning fabrics

#109
20080287337
2008-11-20

Solvent composition for cleaning

#110
20080242583
2008-10-02

Composition and Method

#111
20080210266
2008-09-04

Purge solution

#112
20080200360
2008-08-21

Aqueous Solution and Method for Removing Ionic Contaminants from the Surface of a Workpiece

#113
20080171682
2008-07-17

Compositions for cleaning ion implanted photoresist in front end of line applications

#114
20080051308
2008-02-28

Cleaning compositions for microelectronic substrates

#115
20080004193
2008-01-03

Semiconductor process residue removal composition and process

#116
20080000505
2008-01-03

Processing of semiconductor components with dense processing fluids

#117
20070261720
2007-11-15

Voc Free Coatings Strippers

#118
20070232513
2007-10-04

Microelectronic cleaning compositions containing ammonia-free fluoride salts for selective photoresist stripping and plasma ash residue cleaning

#119
20070207938
2007-09-06

Cleaning compositions and methods of use thereof

#120
20070185005
2007-08-09

Composition and method

#121
20070135326
2007-06-14

Compositions comprising 1,1,1,3,3-pentafluorobutane and use of these compositions

#122
20070078074
2007-04-05

Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials

#123
20070000519
2007-01-04

Removal of residues for low-k dielectric materials in wafer processing

#124
20060287207
2006-12-21

Composition for removing a photoresist, method of preparing the composition, method of removing a photoresist and method of manufacturing a semiconductor device using the composition

#125
20060247147
2006-11-02

Compositions for lipophilic fluid systems

#126
20060234891
2006-10-19

Fabric article treatment appliance

#127
20060211591
2006-09-21

Solvent composition for cleaning

#128
20060128589
2006-06-15

Low VOC air intake system cleaner

#129
20060122085
2006-06-08

Compositions and methods for high-efficiency cleaning of semiconductor wafers

#130
20060122084
2006-06-08

Composition for removing photoresist, method of removing photoresist and method of manufacturing a semiconductor device using the same

#131
20060003909
2006-01-05

Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials

#132
20050272621
2005-12-08

Composition and method for removing copper-compatible resist

#133
20050256015
2005-11-17

Composition comprising a silicone/perfluoro surfactant mixture for treating or cleaning fabrics

#134
20050227889
2005-10-13

Paint removing composition

#135
20050187125
2005-08-25

Compositions for lipophilic fluid systems comprising 1,2-hexanediol

#136
20050183631
2005-08-25

Purge solution

#137
20050119143
2005-06-02

Compositions for the removal of organic and inorganic residues

#138
20050081306
2005-04-21

Domestic fabric article refreshment in integrated cleaning and treatment processes

#139
20050081305
2005-04-21

Domestic fabric article refreshment in integrated cleaning and treatment processes

#140
20050075264
2005-04-07

Solvent composition for washing

#141
20050059569
2005-03-17

Solvent composition for dissolving plastic

#142
20050059565
2005-03-17

Cleaning composition

#143
20050050644
2005-03-10

Washing apparatus

#144
20050044637
2005-03-03

Domestic fabric article refreshment in integrated cleaning and treatment processes

#145
20050032657
2005-02-10

Stripping and cleaning compositions for microelectronics

#146
20050014667
2005-01-20

Aqueous fluoride compositions for cleaning semiconductor devices

#147
20050003977
2005-01-06

Composition for cleaning