Patents-Review.com
ClassID:

120000 ⎘

C23C14/0063 - CPC Classification

Classification description:

Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material; Reactive sputtering or evaporation; Reactive sputtering characterised by means for introducing or removing gases

Recent Application in this class:
#1
20250129464
2025-04-24

SURFACE TREATMENT APPARATUS AND SURFACE TREATMENT METHOD

 #2
20250079126
2025-03-06

SURFACE TREATMENT APPARATUS

 #3
20240321563
2024-09-26

FILM FORMING APPARATUS

 #4
20240207882
2024-06-27

FILM FORMING APPARATUS AND METHOD FOR MANUFACTURING PART HAVING FILM CONTAINING SILICON

 #5
20240183025
2024-06-06

FILM FORMING APPARATUS AND METHOD FOR REDUCING ARCING

 #6
20240084438
2024-03-14

METHOD FOR FORMING AN LICOO2 FILM AND DEVICE FOR CARRYING OUT SAME

 #7
20240043988
2024-02-08

GAS MIXTURE AS CO-GAS FOR ION IMPLANT

 #8
20230399734
2023-12-14

OXIDE FILM PREPARATION METHOD

 #9
20230220533
2023-07-13

SPUTTERING APPARATUS AND CVD MASK COATING METHOD USING THE SAME

 #10
20230203636
2023-06-29

REACTIVE SPUTTER DEPOSITION OF DIELECTRIC FILMS

 #11
20230183855
2023-06-15

Film forming apparatus and method for reducing arcing

 #12
20230005725
2023-01-05

METHOD OF SPUTTER-COATING SUBSTRATES OR OF MANUFACTURING SPUTTER COATED SUBSTRATES AND APPARATUS

 #13
20220411915
2022-12-29

Strain gauge

 #14
20220396864
2022-12-15

VACUUM PROCESS TREATMENT CHAMBER AND METHOD OF TREATING A SUBSTRATE BY MEANS OF A VACUUM TREATMENT PROCESS

 #15
20220380886
2022-12-01

Film forming apparatus and method for reducing arcing

 #16
20220223367
2022-07-14

REDUCED SUBSTRATE PROCESS CHAMBER CAVITY VOLUME

 #17
20220199370
2022-06-23

Reactive particles supply system

 #18
20220098724
2022-03-31

Vacuum system and method to deposit a compound layer

 #19
20220062943
2022-03-03

Film forming apparatus and method for manufacturing part having film containing silicon

 #20
20210217586
2021-07-15

Sputtering apparatus including gas distribution system

 #21
20210156019
2021-05-27

Reactive sputter deposition of dielectric films

 #22
20210047724
2021-02-18

FILM FORMING APPARATUS AND FILM FORMING METHOD

 #23
20200325571
2020-10-15

Strain gauge

 #24
20200219704
2020-07-09

Deposition system with integrated cooling on a rotating drum

 #25
20200208257
2020-07-02

COATING WITH DIAMOND-LIKE CARBON BY MEANS OF A PECVD MAGNETRON METHOD

 #26
20200040440
2020-02-06

Reactive sputtering apparatus and film formation method for composite metal compound film or mixture film using the same

 #27
20200000509
2020-01-02

Energy source apparatus

 #28
20190214234
2019-07-11

DEPOSITION SYSTEM WITH INTEGRATED COOLING ON A ROTATING DRUM

 #29
20190080883
2019-03-14

Sputtering apparatus including gas distribution system

 #30
20180282855
2018-10-04

Reactive sputter deposition of dielectric films

 #31
20180245197
2018-08-30

CERAMIC METALLIC COATINGS

 #32
20180211823
2018-07-26

APPARATUS FOR VACUUM SPUTTER DEPOSITION AND METHOD THEREFOR

 #33
20180155817
2018-06-07

Film forming apparatus

 #34
20180037981
2018-02-08

TEMPERATURE-CONTROLLED CHALCOGEN VAPOR DISTRIBUTION APPARATUS AND METHOD FOR UNIFORM CIGS DEPOSITION

 #35
20180033595
2018-02-01

SPUTTERING APPARATUS INCLUDING GAS DISTRIBUTION SYSTEM

 #36
20170330796
2017-11-16

Filling a cavity in a substrate using sputtering and deposition

 #37
20170221600
2017-08-03

Electrode substrate film and method of manufacturing the same

 #38
20170117119
2017-04-27

Deposition system with integrated cooling on a rotating drum

 #39
20170032946
2017-02-02

INTEGRATED ANODE AND ACTIVATED REACTIVE GAS SOURCE FOR USE IN A MAGNETRON SPUTTERING DEVICE

 #40
20160268104
2016-09-15

Plasma source device and methods

 #41
20160251746
2016-09-01

Deposition device and deposition method

 #42
20160233056
2016-08-11

Sputtering apparatus including gas distribution system

 #43
20160083832
2016-03-24

Thin film forming method

 #44
20160032446
2016-02-04

Film forming apparatus and film forming method

 #45
20150368783
2015-12-24

DEPOSITION APPARATUS WITH GAS SUPPLY AND METHOD FOR DEPOSITING MATERIAL

 #46
20150337430
2015-11-26

Film formation method and film formation apparatus

 #47
20150284838
2015-10-08

Deposition systems and methods

 #48
20150206714
2015-07-23

Reactive sputtering apparatus

 #49
20150056373
2015-02-26

DEPOSITION METHOD AND DEPOSITION APPARATUS

 #50
20140261177
2014-09-18

Apparatus for gas injection in a physical vapor deposition chamber

 #51
20140076714
2014-03-20

Sputtering device

 #52
20140023796
2014-01-23

PLASMA CVD APPARATUS, PLASMA CVD METHOD, REACTIVE SPUTTERING APPARATUS, AND REACTIVE SPUTTERING METHOD

 #53
20130292244
2013-11-07

Reactive sputter deposition of silicon films

 #54
20120234672
2012-09-20

Sputtering method and sputtering apparatus

 #55
20120152736
2012-06-21

Reactive sputtering apparatus

 #56
20120031748
2012-02-09

Film forming apparatus and film forming method

 #57
20120024693
2012-02-02

Reactive sputtering chamber with gas distribution tubes

 #58
20120012459
2012-01-19

Integrated anode and activated reactive gas source for use in magnetron sputtering device

 #59
20120000773
2012-01-05

REACTIVE SPUTTERING ZINC OXIDE TRANSPARENT CONDUCTIVE OXIDES ONTO LARGE AREA SUBSTRATES

 #60
20110278164
2011-11-17

SPUTTERING DEVICE

 #61
20110266147
2011-11-03

SPUTTERING DEVICE WITH ROTATABLE TARGETS

 #62
20110095198
2011-04-28

System and method for fabricating macroscopic objects, and nano-assembled objects obtained therewith

 #63
20100326818
2010-12-30

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SPUTTERING APPARATUS

 #64
20100288625
2010-11-18

FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD

 #65
20100270144
2010-10-28

High Power Pulse Magnetron Sputtering For High Aspect-Ratio Features, Vias, and Trenches

 #66
20100078313
2010-04-01

SPUTTERING APPARATUS AND METHOD OF THIN FILM FORMATION

 #67
20090233424
2009-09-17

Thin film metal oxynitride semiconductors

 #68
20090134012
2009-05-28

SPUTTERING APPARATUS AND SPUTTERING METHOD

 #69
20080308411
2008-12-18

METHOD AND PROCESS FOR DEPOSITION OF TEXTURED ZINC OXIDE THIN FILMS

 #70
20080217170
2008-09-11

SPUTTERING SYSTEM

 #71
20070278090
2007-12-06

Hard laminated film, method of manufacturing the same and film-forming device

 #72
20070261951
2007-11-15

REACTIVE SPUTTERING ZINC OXIDE TRANSPARENT CONDUCTIVE OXIDES ONTO LARGE AREA SUBSTRATES

 #73
20070235320
2007-10-11

Reactive sputtering chamber with gas distribution tubes

 #74
20070163872
2007-07-19

Heat treatable low-E coated articles and methods of making same by sputtering Ag in oxygen inclusive atmosphere

 #75
20070158186
2007-07-12

Cathode sputtering gas distribution apparatus

 #76
20070158181
2007-07-12

Method & apparatus for cathode sputtering with uniform process gas distribution

 #77
20060188749
2006-08-24

Compound film with a nonlinear third order susceptibility, and method for fabricating the same

 #78
20050241932
2005-11-03

Manufacturing apparatus of semiconductor device

 #79
20050211544
2005-09-29

Electrical biasing of gas introduction means of plasma apparatus

 #80
20050170162
2005-08-04

Hard laminated film, method of manufacturing the same and film-forming device

 #81
20050103620
2005-05-19

PLASMA SOURCE WITH SEGMENTED MAGNETRON CATHODE

 #82
20050072664
2005-04-07

Gas injection for uniform composition reactively sputter-deposited thin films

 #83
20050011756
2005-01-20

Sputtering system