Patents-Review.com
ClassID:

120001 ⎘

C23C14/0068 - CPC Classification

Classification description:

Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material; Reactive sputtering or evaporation; Reactive sputtering characterised by means for confinement of gases or sputtered material, e.g. screens, baffles

Recent Application in this class:
#1
20260146315
2026-05-28

SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF DEPOSITING A MATERIAL ON A SUBSTRATE

 #2
20250336646
2025-10-30

SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

 #3
20240301546
2024-09-12

SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF DEPOSITING A MATERIAL ON A SUBSTRATE

 #4
20240096597
2024-03-21

Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device

 #5
20220098717
2022-03-31

FILM FORMING APPARATUS AND FILM FORMING METHOD

 #6
20210130948
2021-05-06

Lattice coat surface enhancement for chamber components

 #7
20200402774
2020-12-24

Substrate processing apparatus and method of manufacturing semiconductor device

 #8
20200279724
2020-09-03

FILM FORMATION DEVICE

 #9
20190352222
2019-11-21

High-refractive-index hydrogenated silicon film and methods for preparing the same

 #10
20180351075
2018-12-06

Piezoelectric element

 #11
20180334741
2018-11-22

Coatings for surgical instruments

 #12
20180112304
2018-04-26

METAL STRIP, BIPOLAR PLATE AND ASSOCIATED MANUFACTURING METHOD

 #13
20170330796
2017-11-16

Filling a cavity in a substrate using sputtering and deposition

 #14
20160322206
2016-11-03

Process chamber and semiconductor processing apparatus

 #15
20160186307
2016-06-30

COATINGS FOR SURGICAL INSTRUMENTS

 #16
20150376774
2015-12-31

Sputtering apparatus and method thereof

 #17
20150364301
2015-12-17

Electronic device manufacturing method and sputtering method

 #18
20150206714
2015-07-23

Reactive sputtering apparatus

 #19
20140020629
2014-01-23

Two piece shutter disk assembly for a substrate process chamber

 #20
20130302596
2013-11-14

Coating method for depositing a layer system on a substrate and substrate having a layer system

 #21
20130048489
2013-02-28

Electronic device manufacturing method and sputtering method

 #22
20130015057
2013-01-17

CATHODE SPUTTER DEPOSITION OF A Cu(In,Ga)X2 THIN FILM

 #23
20120199919
2012-08-09

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

 #24
20120152736
2012-06-21

Reactive sputtering apparatus

 #25
20120128948
2012-05-24

COATED ARTICLE AND METHOD FOR MANUFACTURING SAME

 #26
20120045588
2012-02-23

Deposition system with a rotating drum

 #27
20120031748
2012-02-09

Film forming apparatus and film forming method

 #28
20110266147
2011-11-03

SPUTTERING DEVICE WITH ROTATABLE TARGETS

 #29
20110220491
2011-09-15

Electron-assisted deposition

 #30
20110135898
2011-06-09

Multilayered coated cutting tool

 #31
20100326818
2010-12-30

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SPUTTERING APPARATUS

 #32
20090200159
2009-08-13

REACTIVE SPUTTERING METHOD

 #33
20090057133
2009-03-05

Method and Apparatus for Reactive Solid-Gas Plasma Deposition

 #34
20080210546
2008-09-04

Sputtering apparatus, method for producing a transparent electroconductive film

 #35
20080073203
2008-03-27

Method of making first surface mirror with oxide graded reflecting layer structure

 #36
20070131536
2007-06-14

Reactive sputter deposition processes and equipment

 #37
20060275548
2006-12-07

Method and apparatus for depositing a coating on a tape carrier

 #38
20050118503
2005-06-02

Energy device and method for producing the same

 #39
20050072669
2005-04-07

Deposition apparatus, deposition method, optical element, and optical system

 #40
20050029091
2005-02-10

Apparatus and method for reactive sputtering deposition

 #41
20050023130
2005-02-03

Reactive sputtering method

 #42
19009396
2025-09-09

Optimizing cadmium (CD) alloy solar cells with sputtered copper-dopped zinc telluride (ZNTE:CU) back contacts in the presence of hydrogen