Patents-Review.com
ClassID:

120005 ⎘

C23C14/0089 - CPC Classification

Classification description:

Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material; Reactive sputtering or evaporation; Reactive sputtering in metallic mode

Recent Application in this class:
#1
20260152790
2026-06-04

USE OF TITANIUM NITRIDE AS AN ELECTRODE IN NON-FARADAIC ELECTROCHEMICAL CELL

 #2
20220185726
2022-06-16

System for forming nano-laminate optical coating

 #3
20210381046
2021-12-09

USE OF TITANIUM NITRIDE AS AN ELECTRODE IN NON-FARADAIC ELECTROCHEMICAL CELL

 #4
20200249561
2020-08-06

Halftone phase shift photomask blank, making method, and halftone phase shift photomask

 #5
20200040440
2020-02-06

Reactive sputtering apparatus and film formation method for composite metal compound film or mixture film using the same

 #6
20190284685
2019-09-19

THIN FILM FORMATION APPARATUS, SPUTTERING CATHODE, AND METHOD OF FORMING THIN FILM

 #7
20190161795
2019-05-30

Use of titanium nitride as an electrode in non-faradaic electrochemical cell

 #8
20190025469
2019-01-24

System for forming nano-laminate optical coating

 #9
20180334741
2018-11-22

Coatings for surgical instruments

 #10
20180088456
2018-03-29

Halftone phase shift photomask blank, making method, and halftone phase shift photomask

 #11
20170226624
2017-08-10

Laminate film and electrode substrate film, and method of manufacturing the same

 #12
20170037467
2017-02-09

Use of titanium nitride as an electrode in non-faradaic electrochemical cell

 #13
20160186307
2016-06-30

COATINGS FOR SURGICAL INSTRUMENTS

 #14
20130126347
2013-05-23

Arc deposition source having a defined electric field

 #15
20130015054
2013-01-17

METHOD OF CONTROLLING LITHIUM UNIFORMITY

 #16
20120255855
2012-10-11

METHOD OF CONTROLLING LITHIUM UNIFORMITY

 #17
20120251714
2012-10-04

Methods of rejuvenating sputtering targets

 #18
20120181167
2012-07-19

Electrochromic tungsten oxide film deposition

 #19
20120045588
2012-02-23

Deposition system with a rotating drum

 #20
20110220491
2011-09-15

Electron-assisted deposition

 #21
20090139862
2009-06-04

Rotatable sputter target

 #22
20090087585
2009-04-02

Deposition processes for titanium nitride barrier and aluminum

 #23
20080271779
2008-11-06

Methods of forming sputtering targets

 #24
20080158680
2008-07-03

Optical element, optical device, and method of producing optical element

 #25
20070196695
2007-08-23

Durable sputtered metal oxide coating

 #26
20070039545
2007-02-22

System and method for film formation

 #27
20060275613
2006-12-07

Coated article with IR reflecting layer and method of making same

 #28
20060042929
2006-03-02

Method for reactive sputter deposition of an ultra-thin metal oxide film