ClassID:

120006

C23C14/0094 - CPC Classification

Classification description:

Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material; Reactive sputtering or evaporation; Reactive sputtering in transition mode

Recent Application in this class:
#1
20240043985
2024-02-08

Al-RICH AlTiN-BASED FILMS

#2
20220316049
2022-10-06

Optical film, sputtering target, and method of producing optical film

#3
20210118703
2021-04-22

Rare-earth oxide based coatings based on ion assisted deposition

#4
20210108306
2021-04-15

Al-rich AlTin-based films

#5
20200388474
2020-12-10

Reactive sputtering with HIPIMS

#6
20200249561
2020-08-06

Halftone phase shift photomask blank, making method, and halftone phase shift photomask

#7
20190153582
2019-05-23

SPUTTERING APPARATUS AND METHOD FOR MANUFACTURING FILM

#8
20180100228
2018-04-12

Rare-earth oxide based coatings based on ion assisted deposition

#9
20180088456
2018-03-29

Halftone phase shift photomask blank, making method, and halftone phase shift photomask

#10
20180066356
2018-03-08

Method for depositing a layer using a magnetron sputtering device

#11
20170130319
2017-05-11

Ion assisted deposition for rare-earth oxide based coatings

#12
20160369390
2016-12-22

Method for depositing a piezoelectric film containing AIN, and a piezoelectric film containing AIN

#13
20160254127
2016-09-01

Method and device for producing uniform films on moving substrates and films produced in this way

#14
20160158418
2016-06-09

Bonded alumina coating for stainless steel

#15
20160083832
2016-03-24

Thin film forming method

#16
20150354052
2015-12-10

High-rate reactive sputtering of dielectric stoichiometric films

#17
20150337431
2015-11-26

Bonded alumina coating for stainless steel

#18
20150162173
2015-06-11

Method for producing a multilayer coating and device for carrying out said method

#19
20150152542
2015-06-04

Closed loop control

#20
20140311892
2014-10-23

Reactive sputtering process

#21
20120031749
2012-02-09

REACTIVE SPUTTERING WITH MULTIPLE SPUTTER SOURCES

#22
20110312178
2011-12-22

Method for manufacturing semiconductor memory element and sputtering apparatus

#23
20110177649
2011-07-21

Process for the deposition of an anti-reflection film on a substrate

#24
20090173622
2009-07-09

Reactive sputtering with HIPIMs

#25
20070212893
2007-09-13

System and method for sputtering a tensile silicon nitride film

#26
20060151312
2006-07-13

Method for producing a multilayer coating and device for carrying out said method

#27
20060032739
2006-02-16

Method for producing silicon oxide film and method for producing optical multilayer film

#28
20050205413
2005-09-22

Reactive sputtering method and device