ClassID:

120072

C23C14/3435 - CPC Classification

Classification description:

Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating; Sputtering Applying energy to the substrate during sputtering

Sub-classes:
Recent Application in this class:
#1
20260002252
2026-01-01

SPUTTERING APPARATUS AND DEPOSITION METHOD OF TUNGSTEN FILM

#2
20250084526
2025-03-13

METHOD FOR SURFACE COATING ACCORDING TO THE SPUTTERING PRINCIPLE

#3
20240410047
2024-12-12

P-type gallium oxide film, and preparation method and application thereof

#4
20240355626
2024-10-24

METHOD FOR CONTROLLING RESISTIVITY AND CRYSTALLINITY OF LOW-RESISTANCE MATERIAL THROUGH PVD

#5
20240093355
2024-03-21

Glassy Carbon Shutter Disk For Physical Vapor Deposition (PVD) Chamber

#6
20230007786
2023-01-05

Systems for printing conformal materials on component edges at high resolution

#7
20220205922
2022-06-30

Apparatus and method for preparing glow discharge sputtering samples for material microscopic characterization

#8
20220162756
2022-05-26

Supplemental energy for low temperature processes

#9
20220076932
2022-03-10

PLASMA FILM FORMING APPARATUS AND PLASMA FILM FORMING METHOD

#10
20210385951
2021-12-09

Methods for printing conformal materials on component edges at high resolution

#11
20210222288
2021-07-22

DEPOSITION APPARATUS FOR COATING A FLEXIBLE SUBSTRATE, METHOD OF COATING A FLEXIBLE SUBSTRATE AND FLEXIBLE SUBSTRATE HAVING A COATING

#12
20210189545
2021-06-24

Methods and apparatus for depositing aluminum by physical vapor deposition (PVD) with controlled cooling

#13
20200392003
2020-12-17

SYSTEMS AND TECHNIQUES FOR MODIFYING ELECTRONIC PROPERTIES OF MATTER

#14
20200350159
2020-11-05

Methods and apparatus for filling a feature disposed in a substrate

#15
20200277698
2020-09-03

Physical vapor deposition system and processes

#16
20200277697
2020-09-03

Physical vapor deposition system and processes

#17
20200277696
2020-09-03

Physical vapor deposition system and processes

#18
20200071815
2020-03-05

Film-forming device

#19
20180105927
2018-04-19

METHOD FOR PREPARING HIGH-HARDNESS ANTI-BACTERIAL PVD FILM

#20
20180087155
2018-03-29

Sputtering showerhead

#21
20170241009
2017-08-24

COATED ARTICLE INCLUDING METAL ISLAND LAYER(S) FORMED USING STOICHIOMETRY CONTROL, AND/OR METHOD OF MAKING THE SAME

#22
20170200593
2017-07-13

Target and process for producing a target

#23
20170145588
2017-05-25

Film formation method, vacuum processing apparatus, method of manufacturing semiconductor light emitting element, semiconductor light emitting element, method of manufacturing semiconductor electronic element, semiconductor electronic element, and illuminating apparatus

#24
20170051392
2017-02-23

APPARTUS AND METHOD FOR PRODUCING SPUTTER-DEPOSITED COATINGS ON FLUIDIZED PARTICLE BEDS

#25
20160372653
2016-12-22

Aluminum nitride piezoelectric thin film, piezoelectric material, piezoelectric component, and method for manufacturing aluminum nitride piezoelectric thin film

#26
20160032445
2016-02-04

Plasma processing apparatus and plasma processing method

#27
20150345010
2015-12-03

METHODS OF MAGNETICALLY ENHANCED PHYSICAL VAPOR DEPOSITION

#28
20150053553
2015-02-26

PLASMA PROCESSING APPARATUS

#29
20130270107
2013-10-17

Off-angled heating of the underside of a substrate using a lamp assembly

#30
20130196514
2013-08-01

Off-angled heating of the underside of a substrate using a lamp assembly

#31
20130029033
2013-01-31

Method for manufacturing acoustic wave device

#32
20130009193
2013-01-10

METHOD OF FABRICATING LIGHT RECEIVING ELEMENT AND APPARATUS FOR FABRICATING LIGHT RECEIVING ELEMENT

#33
20120231633
2012-09-13

Off-angled heating of the underside of a substrate using a lamp assembly

#34
20120103802
2012-05-03

THIN FILM DEPOSITING APPARATUS

#35
20120103259
2012-05-03

THIN FILM DEPOSITING APPARATUS

#36
20110194106
2011-08-11

Method and apparatus to prepare a substrate for molecular detection

#37
20100227133
2010-09-09

Pulsed laser micro-deposition pattern formation

#38
20090110848
2009-04-30

METHOD AND APPARATUS FOR HIGH-PRESSURE ATOMIC-BEAM LASER INDUCED DEPOSITION/ETCHING

#39
20080102560
2008-05-01

Method of forming phase change memory devices in a pulsed DC deposition chamber