Patents-Review.com
ClassID:

120075 ⎘

C23C14/3457 - CPC Classification

Classification description:

Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating; Sputtering using other particles than noble gas ions

Recent Application in this class:
#1
20250389880
2025-12-25

NEAR INFRARED OPTICAL INTERFERENCE FILTERS WITH IMPROVED TRANSMISSION

 #2
20250146125
2025-05-08

FILM FORMATION APPARATUS

 #3
20240387155
2024-11-21

Method for Improving Deposition Process

 #4
20220299688
2022-09-22

NEAR INFRARED OPTICAL INTERFERENCE FILTERS WITH IMPROVED TRANSMISSION

 #5
20210062320
2021-03-04

Method of forming a thin film of tantalum with low resistivity

 #6
20200141008
2020-05-07

Coated metallic substrate and fabrication method

 #7
20200096675
2020-03-26

OPTICAL FILTER INCLUDING A HIGH REFRACTIVE INDEX MATERIAL

 #8
20200075299
2020-03-05

Method for improving deposition process

 #9
20190301004
2019-10-03

AMORPHOUS TUNGSTEN NITRIDE COMPOSITIONS, METHODS OF MANUFACTURE, AND DEVICES INCORPORATING THE SAME

 #10
20190212484
2019-07-11

Near infrared optical interference filters with improved transmission

 #11
20190211444
2019-07-11

SEMICONDUCTOR PROCESS KIT WITH 3D PROFILING

 #12
20180327893
2018-11-15

SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESPUTTERING

 #13
20180030602
2018-02-01

FABRICATION METHOD OF STRONTIUM NIOBIUM OXYNITRIDE FILM HAVING SMALL CARRIER DENSITY AND ITS USE

 #14
20180023189
2018-01-25

Magnetic-field-generating apparatus for magnetron sputtering

 #15
20170357033
2017-12-14

PROTECTED ITEM INCLUDING A PROTECTIVE COATING

 #16
20170352540
2017-12-07

Sputtering apparatus, sputtering target, and method for forming semiconductor film with the sputtering apparatus

 #17
20170268099
2017-09-21

Window film and preparation method thereof

 #18
20170268098
2017-09-21

Film formation apparatus and film formation method

 #19
20170250077
2017-08-31

Method for manufacturing oxide

 #20
20170190858
2017-07-06

Gas barrier film

 #21
20170175249
2017-06-22

THIN METAL FILM SUBSTRATE AND METHOD FOR PREPARING THE SAME

 #22
20170159169
2017-06-08

PROCESS FOR MANUFACTURING NICKEL OXIDE FILMS WITH HIGH CONDUCTIVITY

 #23
20170153372
2017-06-01

WIRE GRID POLARIZER PLATE AND METHOD FOR MANUFACTURING THE SAME

 #24
20160369387
2016-12-22

METHOD OF GROWING ALUMINUM OXIDE ONTO SUBSTRATES BY USE OF AN ALUMINUM SOURCE IN AN ENVIRONMENT CONTAINING PARTIAL PRESSURE OF OXYGEN TO CREATE TRANSPARENT, SCRATCH-RESISTANT WINDOWS

 #25
20160343552
2016-11-24

DEPOSITION OF SOLID STATE ELECTROLYTE ON ELECTRODE LAYERS IN ELECTROCHEMICAL DEVICES

 #26
20160293827
2016-10-06

Electronic device, method for producing electronic device, electronic apparatus, and moving object

 #27
20160260834
2016-09-08

Thin film transistor and manufacturing method thereof, display substrate and display device

 #28
20160238759
2016-08-18

NEAR INFRARED OPTICAL INTERFERENCE FILTERS WITH IMPROVED TRANSMISSION

 #29
20160215381
2016-07-28

METHOD OF GROWING ALUMINUM OXIDE ONTO SUBSTRATES BY USE OF AN ALUMINUM SOURCE IN AN ENVIRONMENT CONTAINING PARTIAL PRESSURE OF OXYGEN TO CREATE TRANSPARENT, SCRATCH-RESISTANT WINDOWS

 #30
20160114581
2016-04-28

Printhead protective coating

 #31
20160076139
2016-03-17

Sustained self-sputtering of lithium for lithium physical vapor deposition

 #32
20150083580
2015-03-26

Plasma processing method

 #33
20140346500
2014-11-27

Oxide semiconductor film and formation method thereof

 #34
20140308521
2014-10-16

Apparatus and method for sputter-deposited coatings on fluidized particle beds

 #35
20140305802
2014-10-16

Self-ionized and inductively-coupled plasma for sputtering and resputtering

 #36
20120141784
2012-06-07

Coated article and method for making same

 #37
20110212605
2011-09-01

Method for manufacturing semiconductor element and deposition apparatus

 #38
20110062019
2011-03-17

Sputtering apparatus

 #39
20100068412
2010-03-18

Process for coating a substrate, plant for implementing the process and feeder for feeding such a plant with metal

 #40
20090233438
2009-09-17

SELF-IONIZED AND INDUCTIVELY-COUPLED PLASMA FOR SPUTTERING AND RESPUTTERING

 #41
20090188785
2009-07-30

Sputtering Targets and Methods for Depositing Film Containing Tin and Niobium

 #42
20090054230
2009-02-26

Catalyst production process

 #43
20090020417
2009-01-22

Methods of sputtering a protective coating on a semiconductor substrate

 #44
20080110747
2008-05-15

Self-ionized and inductively-coupled plasma for sputtering and resputtering

 #45
20080035471
2008-02-14

Silicon object forming method and apparatus

 #46
20070158178
2007-07-12

Method and apparatus for deposition of low-k dielectric materials

 #47
20070134500
2007-06-14

Sputtering targets and methods for depositing film containing tin and niobium

 #48
20070110920
2007-05-17

Method of forming vertical inorganic alignment layer and liquid crystal display apparatus having the same

 #49
20070056846
2007-03-15

Silicon dot forming method and silicon dot forming apparatus

 #50
20050255691
2005-11-17

Self-ionized and inductively-coupled plasma for sputtering and resputtering

 #51
20050199491
2005-09-15

Shields usable with an inductively coupled plasma reactor

 #52
20050006222
2005-01-13

Self-ionized and inductively-coupled plasma for sputtering and resputtering