ClassID:

120082

C23C14/351 - CPC Classification

Classification description:

Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating; Sputtering by application of a magnetic field, e.g. magnetron sputtering using a magnetic field in close vicinity to the substrate

Recent Application in this class:
#1
20260146315
2026-05-28

SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF DEPOSITING A MATERIAL ON A SUBSTRATE

#2
20260135070
2026-05-14

PHYSICAL VAPOR DEPOSITION APPARATUS

#3
20250340976
2025-11-06

CATHODIC ARC SOURCE

#4
20250313944
2025-10-09

DEPOSITION APPARATUS

#5
20250183020
2025-06-05

SPUTTERING APPARATUS

#6
20250087536
2025-03-13

DEPOSITION SYSTEM AND METHOD

#7
20240337009
2024-10-10

SPUTTERING MACHINES, SUBSTRATE HOLDERS, AND SPUTTERING PROCESSES WITH MAGNETIC BIASING

#8
20240301546
2024-09-12

SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF DEPOSITING A MATERIAL ON A SUBSTRATE

#9
20240279792
2024-08-22

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

#10
20240014018
2024-01-11

Apparatus and a Method of Controlling Thickness Variation in a Material Layer Formed Using Physical Vapour Deposition

#11
20230402271
2023-12-14

Methods and apparatus for controlling ion fraction in physical vapor deposition processes

#12
20230352350
2023-11-02

Deposition system and method

#13
20230340659
2023-10-26

DEPOSITION DEVICE HAVING CONTACT STRUCTURE AND DEPOSITION SYSTEM HAVING SAME

#14
20230313364
2023-10-05

Electromagnet pulsing effect on PVD step coverage

#15
20230307218
2023-09-28

Physical vapor deposition apparatus and method thereof

#16
20230282466
2023-09-07

SPUTTER MAGNETRON FOR OPERATING WITH OTHER PLASMA SOURCES

#17
20230253190
2023-08-10

Deposition apparatus and deposition method using the same

#18
20230175113
2023-06-08

PHYSICAL VAPOR DEPOSITION APPARATUS

#19
20230175112
2023-06-08

FILM FORMING METHOD AND FILM FORMING APPARATUS

#20
20230133160
2023-05-04

Sputtering system with a plurality of cathode assemblies

#21
20230130947
2023-04-27

Tilted PVD source with rotating pedestal

#22
20230094699
2023-03-30

Method and apparatus for controlling stress variation in a material layer formed via pulsed DC physical vapor deposition

#23
20230067917
2023-03-02

Device and method for producing layers with improved uniformity in coating systems with horizontally rotating substrate and additional plasma sources

#24
20230032638
2023-02-02

Physical vapor deposition of piezoelectric films

#25
20220399195
2022-12-15

SPUTTER DEPOSITION

#26
20220396865
2022-12-15

SPUTTER DEPOSITION APPARATUS AND METHOD

#27
20220384165
2022-12-01

Methods and apparatus for processing a substrate

#28
20220384158
2022-12-01

Apparatus for generating magnetic fields during semiconductor processing

#29
20220380888
2022-12-01

Methods for shaping magnetic fields during semiconductor processing

#30
20220367161
2022-11-17

Physical vapor deposition apparatus and method thereof

#31
20220359174
2022-11-10

Apparatus and method for physical vapor deposition

#32
20220319819
2022-10-06

SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD

#33
20220319740
2022-10-06

METHOD OF FABRICATING SUPERCONDUCTING WIRE

#34
20220307125
2022-09-29

CATHODIC ARC SOURCE

#35
20220267893
2022-08-25

Sputtering device with microwave heating mechanism

#36
20220228253
2022-07-21

BIAS MAGNETIC FIELD CONTROL METHOD, MAGNETIC THIN FILM DEPOSITION METHOD,CHAMBER, AND APPARATUS

#37
20220170147
2022-06-02

Substrate treating apparatus and substrate treating method

#38
20220112593
2022-04-14

Sputtering system with a plurality of cathode assemblies

#39
20220106679
2022-04-07

Deposition system with a multi-cathode

#40
20220068619
2022-03-03

SYSTEMS AND METHODS FOR A MAGNETRON WITH A SEGMENTED TARGET CONFIGURATION

#41
20220051952
2022-02-17

Deposition system and method

#42
20220033956
2022-02-03

Methods and apparatus for extended chamber for through silicon via deposition

#43
20220020577
2022-01-20

Methods and apparatus for controlling ion fraction in physical vapor deposition processes

#44
20210375603
2021-12-02

Magnetron sputtering source and coating system arrangement

#45
20210375595
2021-12-02

Deposition apparatus and deposition method using the same

#46
20210327691
2021-10-21

HIGH DENSITY PLASMA PROCESSING APPARATUS

#47
20210327690
2021-10-21

METHOD FOR GENERATING AND PROCESSING A UNIFORM HIGH DENSITY PLASMA SHEET

#48
20210317565
2021-10-14

Deposition method of a metallic layer on a substrate of a resonator device

#49
20210285092
2021-09-16

Sputtering apparatus

#50
20210285090
2021-09-16

Convertible magnetics for rotary cathode

#51
20210249241
2021-08-12

Magnet unit for magnetron sputtering apparatus

#52
20210246542
2021-08-12

COATING APPARATUS AND METHOD FOR USE THEREOF

#53
20210207261
2021-07-08

Film forming apparatus and method

#54
20210143319
2021-05-13

Physical vapor deposition of piezoelectric films

#55
20210123130
2021-04-29

Method and apparatus for depositing a material

#56
20210071294
2021-03-11

METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPOR DEPOSITION PROCESSES

#57
20210057186
2021-02-25

Methods and apparatus for depositing aluminum by physical vapor deposition (PVD)

#58
20200263298
2020-08-20

Apparatus and method for processing, coating or curing a substrate

#59
20200199742
2020-06-25

Double-Sided Vacuum Coating Device For Continuously Coating A Film Back And Forth

#60
20200183054
2020-06-11

ANTI-REFLECTION COMPOSITE LAYER AND THE MANUFACTURING METHOD THEREOF

#61
20200105511
2020-04-02

Physical vapor deposition apparatus and method thereof

#62
20200090914
2020-03-19

METHODS AND APPARATUS FOR UNIFORMITY CONTROL IN SELECTIVE PLASMA VAPOR DEPOSITION

#63
20200090913
2020-03-19

Apparatus and a method of controlling thickness variation in a material layer formed using physical vapour deposition

#64
20200024729
2020-01-23

Grain Size Tuning for Radiation Resistance

#65
20190382881
2019-12-19

Deposition system with a multi-cathode

#66
20190352769
2019-11-21

HOUSING OF ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING HOUSING

#67
20190309410
2019-10-10

Hard mask films with graded vertical concentration formed using reactive sputtering in a radio frequency deposition chamber

#68
20190308239
2019-10-10

Nanowires and process for their production

#69
20190244754
2019-08-08

Magnetic thin film deposition chamber and thin film deposition apparatus

#70
20190194798
2019-06-27

Cathode unit for sputtering apparatus

#71
20190194795
2019-06-27

SLIDING ELEMENT WITH MAX PHASE COATING

#72
20190096638
2019-03-28

Substrate processing chamber having improved process volume sealing

#73
20190078196
2019-03-14

FILM-FORMING METHOD AND SPUTTERING APPARATUS

#74
20190043701
2019-02-07

INVERTED MAGNETRON FOR PROCESSING OF THIN FILM MATERIALS

#75
20190006216
2019-01-03

Apparatus for transportation of a substrate carrier in a vacuum chamber, system for vacuum processing of a substrate, and method for transportation of a substrate carrier in a vacuum chamber

#76
20180374732
2018-12-27

APPARATUS FOR TRANSPORTATION OF A SUBSTRATE, APPARATUS FOR VACUUM PROCESSING OF A SUBSTRATE, AND METHOD FOR MAINTENANCE OF A MAGNETIC LEVITATION SYSTEM

#77
20180355474
2018-12-13

Film-forming apparatus and film-forming method

#78
20180308670
2018-10-25

Method and apparatus for controlling stress variation in a material layer formed via pulsed DC physical vapor deposition

#79
20180174605
2018-06-21

Magnetic recording medium, with carbide segregant, method for manufacturing same and magnetic recording and reproducing apparatus

#80
20180102420
2018-04-12

Semiconductor device and manufacturing method of the same

#81
20180005806
2018-01-04

APPARATUS FOR PHYSICAL VAPOR DEPOSITION REACTIVE PROCESSING OF THIN FILM MATERIALS

#82
20170369985
2017-12-28

Laterally adjustable return path magnet assembly and methods

#83
20170253959
2017-09-07

Methods and apparatus for controlling ion fraction in physical vapor deposition processes

#84
20170204511
2017-07-20

Method of sputtering and sputter system

#85
20170200526
2017-07-13

Ultra-thin doped noble metal films for optoelectronics and photonics applications

#86
20170051393
2017-02-23

Apparatus and method for coating inner wall of metal tube

#87
20170047205
2017-02-16

Apparatus and a method for deposition of material to form a coating

#88
20170025258
2017-01-26

DEPOSITION OF THICK MAGNETIZABLE FILMS FOR MAGNETIC DEVICES

#89
20170002456
2017-01-05

Grain Size Tuning for Radiation Resistance

#90
20160336433
2016-11-17

Semiconductor device and manufacturing method of the same

#91
20160289815
2016-10-06

Method and apparatus for depositing a material

#92
20160189940
2016-06-30

RADIO-FREQUENCY SPUTTERING SYSTEM WITH ROTARY TARGET FOR FABRICATING SOLAR CELLS

#93
20160177438
2016-06-23

METHOD FOR SPUTTERING SYSTEM AND USING COUNTERWEIGHT

#94
20160163521
2016-06-09

Interchangeable magnet pack

#95
20160118254
2016-04-28

Oxide and method for forming the same

#96
20160053362
2016-02-25

FILM FORMATION APPARATUS AND FILM FORMATION METHOD

#97
20160042951
2016-02-11

Optically tuned hardmask for multi-patterning applications

#98
20150368792
2015-12-24

Method of HIPIMS sputtering and HIPIMS sputter system

#99
20150329956
2015-11-19

Method for continuously forming noble metal film and method for continuously manufacturing electronic component

#100
20150325259
2015-11-12

Method of manufacturing a magnetic film having high coercivity for use as a hot seed in a magnetic write head

#101
20150307985
2015-10-29

Rotation plus vibration magnet for magnetron sputtering apparatus

#102
20150184283
2015-07-02

Ternary metal nitride formation by annealing constituent layers

#103
20150176117
2015-06-25

Interchangeable sputter gun head

#104
20150147041
2015-05-28

Optical fiber and optical fiber manufacturing method

#105
20150108475
2015-04-23

Semiconductor device and manufacturing method of the same

#106
20150075982
2015-03-19

Source magnet for improved resputtering uniformity in direct current (DC) physical vapor deposition (PVD) processes

#107
20150053331
2015-02-26

Method for manufacturing patterned layer and method for manufacturing electrochromic device

#108
20140377472
2014-12-25

Thin-film formation method, thin-film formation device, object to be processed having coating film formed thereof, die and tool

#109
20140339545
2014-11-20

Semiconductor device, method for manufacturing the same, and apparatus for manufacturing semiconductor device

#110
20140246313
2014-09-04

In-situ sputtering apparatus

#111
20140238843
2014-08-28

Variable radius dual magnetron

#112
20140216923
2014-08-07

PVD RF DC open/closed loop selectable magnetron

#113
20140174921
2014-06-26

Multi-Piece Target and Magnetron to Prevent Sputtering of Target Backing Materials

#114
20140154487
2014-06-05

Bilayer chromium nitride coated articles and related methods

#115
20140124359
2014-05-08

New Magnet Design Which Improves Erosion Profile for PVD Systems

#116
20140106182
2014-04-17

High coercivity magnetic film for use as a hot seed in a magnetic write head and method to grow it

#117
20140008213
2014-01-09

Magnet module having epicyclic gearing system and method of use

#118
20130319855
2013-12-05

MAGNETRON SPUTTERING SYSTEM

#119
20130299349
2013-11-14

Magnetic-field-generating apparatus for magnetron sputtering

#120
20130220547
2013-08-29

Substrate processing apparatus

#121
20130213798
2013-08-22

MAGNETRON SPUTTERING DEVICE, METHOD FOR CONTROLLING MAGNETRON SPUTTERING DEVICE, AND FILM FORMING METHOD

#122
20130213797
2013-08-22

Rotation plus vibration magnet for magnetron sputtering apparatus

#123
20130199926
2013-08-08

Multi coil target design

#124
20130199925
2013-08-08

High density TiN RF/DC PVD deposition with stress tuning

#125
20130192980
2013-08-01

Crystalline orientation and overhang control in collision based RF plasmas

#126
20130186744
2013-07-25

Method of switching magnetic flux distribution

#127
20130180851
2013-07-18

Magnetic field generator, magnetron cathode and spattering apparatus

#128
20130168231
2013-07-04

Method For Sputter Deposition And RF Plasma Sputter Etch Combinatorial Processing

#129
20130156936
2013-06-20

Sputter gun having variable magnetic strength

#130
20130153413
2013-06-20

SPUTTER GUN SHUTTER

#131
20130149868
2013-06-13

Masking method and apparatus

#132
20130146451
2013-06-13

Magnetic Confinement and Directionally Driven Ionized Sputtered Films For Combinatorial Processing

#133
20130126333
2013-05-23

Magnetic Field Configuration For Energetic Plasma Surface Treatment and Energetic Deposition Conditions

#134
20130101749
2013-04-25

Method and Apparatus for Enhanced Film Uniformity

#135
20130062198
2013-03-14

Apparatus for processing work piece by pulsed electric discharges in solid-gas plasma

#136
20120193227
2012-08-02

MAGNET ARRAY FOR A PHYSICAL VAPOR DEPOSITION SYSTEM

#137
20120118732
2012-05-17

FILM FORMATION APPARATUS

#138
20120118725
2012-05-17

FILM FORMING METHOD AND FILM FORMING APPARATUS

#139
20120103801
2012-05-03

Film formation apparatus

#140
20120097528
2012-04-26

Deposition of Material to Form a Coating

#141
20120097527
2012-04-26

FILM FORMATION APPARATUS AND FILM FORMING METHOD

#142
20120070589
2012-03-22

CREATION OF MAGNETIC FIELD (VECTOR POTENTIAL) WELL FOR IMPROVED PLASMA DEPOSITION AND RESPUTTERING UNIFORMITY

#143
20120043198
2012-02-23

FILM FORMATION APPARATUS AND FILM FORMATION METHOD

#144
20120000775
2012-01-05

Apparatus for Forming Electronic Material Layer

#145
20110303529
2011-12-15

Processes and device for the deposition of films on substrates

#146
20110303527
2011-12-15

Substrate processing apparatus and apparatus and method of manufacturing magnetic device

#147
20110247928
2011-10-13

Sputtering apparatus and sputtering method

#148
20110233058
2011-09-29

Magnetron Plasma Sputtering Apparatus

#149
20110233050
2011-09-29

Magnetic lensing to improve deposition uniformity in a physical vapor deposition (PVD) process

#150
20110203734
2011-08-25

Plasma processing apparatus, magnetoresistive device manufacturing apparatus, magnetic thin film forming method, and film formation control program

#151
20110100799
2011-05-05

SPUTTER DEPOSITION SYSTEM AND METHOD

#152
20110062015
2011-03-17

COATING APPARATUS AND COATING METHOD

#153
20110048934
2011-03-03

System and apparatus to facilitate physical vapor deposition to modify non-metal films on semiconductor substrates

#154
20100291320
2010-11-18

Method for manufacturing a treated surface and vacuum plasma sources

#155
20100270143
2010-10-28

SUBSTRATE STAGE, SPUTTERING APPARATUS PROVIDED WITH SAME, AND FILM FORMING METHOD

#156
20100258432
2010-10-14

Sputtering apparatus, sputter deposition method, and analysis apparatus

#157
20100258430
2010-10-14

SPUTTERING APPARATUS AND FILM FORMING METHOD

#158
20100178436
2010-07-15

Methods and apparatus for forming diamond-like coatings

#159
20090321248
2009-12-31

LOW DAMAGE SPUTTERING SYSTEM AND METHOD

#160
20090239378
2009-09-24

Methods for forming a titanium nitride layer

#161
20090223812
2009-09-10

Processes and device for the deposition of films on substrates

#162
20090159429
2009-06-25

Reactive sputtering method

#163
20090107834
2009-04-30

CHALCOGENIDE TARGET AND METHOD

#164
20090101497
2009-04-23

SPUTTERING SYSTEM CARRIER

#165
20090065348
2009-03-12

Method of arc ion plating and target for use therein

#166
20080099326
2008-05-01

Sputtering of thermally resistive materials including metal chalcogenides

#167
20070256927
2007-11-08

Coating Apparatus for the Coating of a Substrate and also Method for Coating

#168
20070231939
2007-10-04

Manufacturing method of a transparent conductive film, a manufacturing method of a transparent electrode of an organic electroluminescence device, an organic electroluminescence device and the manufacturing method

#169
20070209927
2007-09-13

Magnetron Sputtering Device In which Two Modes Of Magnetic Flux Distribution (Balanced Mode/Unbalanced Mode) Can Be Switched From One To The Other And Vice Versa, A Film Formation Method For Forming A Film From An Inorganic Film Formation Material Using The Device, And A Dual Mode Magnetron Sputtering Device And Film Formation Method For Forming A Film From An Inorganic Film Formation Material At A Low Temperature Using The Device

#170
20070205096
2007-09-06

Magnetron based wafer processing

#171
20060278518
2006-12-14

Work piece processing by pulsed electric discharges in solid-gas plasma

#172
20060278163
2006-12-14

High throughput deposition apparatus with magnetic support

#173
20060073700
2006-04-06

Method for forming a barrier layer in an integrated circuit in a plasma with source and bias power frequencies applied through the workpiece

#174
20050205411
2005-09-22

[PHYSICAL VAPOR DEPOSITION PROCESS AND APPARATUS THEREFOR]

#175
20050150758
2005-07-14

Processes and device for the deposition of films on substrates

#176
20050115822
2005-06-02

Sputtering cathode and device and method for coating a substrate with several layers