120082 ⎘
Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating; Sputtering by application of a magnetic field, e.g. magnetron sputtering using a magnetic field in close vicinity to the substrate
SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF DEPOSITING A MATERIAL ON A SUBSTRATE
#2PHYSICAL VAPOR DEPOSITION APPARATUS
#3CATHODIC ARC SOURCE
#4DEPOSITION APPARATUS
#5SPUTTERING APPARATUS
#6DEPOSITION SYSTEM AND METHOD
#7SPUTTERING MACHINES, SUBSTRATE HOLDERS, AND SPUTTERING PROCESSES WITH MAGNETIC BIASING
#8SPUTTER DEPOSITION SOURCE, MAGNETRON SPUTTER CATHODE, AND METHOD OF DEPOSITING A MATERIAL ON A SUBSTRATE
#9SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
#10Apparatus and a Method of Controlling Thickness Variation in a Material Layer Formed Using Physical Vapour Deposition
#11Methods and apparatus for controlling ion fraction in physical vapor deposition processes
#12Deposition system and method
#13DEPOSITION DEVICE HAVING CONTACT STRUCTURE AND DEPOSITION SYSTEM HAVING SAME
#14Electromagnet pulsing effect on PVD step coverage
#15Physical vapor deposition apparatus and method thereof
#16SPUTTER MAGNETRON FOR OPERATING WITH OTHER PLASMA SOURCES
#17Deposition apparatus and deposition method using the same
#18PHYSICAL VAPOR DEPOSITION APPARATUS
#19FILM FORMING METHOD AND FILM FORMING APPARATUS
#20Sputtering system with a plurality of cathode assemblies
#21Tilted PVD source with rotating pedestal
#22Method and apparatus for controlling stress variation in a material layer formed via pulsed DC physical vapor deposition
#23Device and method for producing layers with improved uniformity in coating systems with horizontally rotating substrate and additional plasma sources
#24Physical vapor deposition of piezoelectric films
#25SPUTTER DEPOSITION
#26SPUTTER DEPOSITION APPARATUS AND METHOD
#27Methods and apparatus for processing a substrate
#28Apparatus for generating magnetic fields during semiconductor processing
#29Methods for shaping magnetic fields during semiconductor processing
#30Physical vapor deposition apparatus and method thereof
#31Apparatus and method for physical vapor deposition
#32SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD
#33METHOD OF FABRICATING SUPERCONDUCTING WIRE
#34CATHODIC ARC SOURCE
#35Sputtering device with microwave heating mechanism
#36BIAS MAGNETIC FIELD CONTROL METHOD, MAGNETIC THIN FILM DEPOSITION METHOD,CHAMBER, AND APPARATUS
#37Substrate treating apparatus and substrate treating method
#38Sputtering system with a plurality of cathode assemblies
#39Deposition system with a multi-cathode
#40SYSTEMS AND METHODS FOR A MAGNETRON WITH A SEGMENTED TARGET CONFIGURATION
#41Deposition system and method
#42Methods and apparatus for extended chamber for through silicon via deposition
#43Methods and apparatus for controlling ion fraction in physical vapor deposition processes
#44Magnetron sputtering source and coating system arrangement
#45Deposition apparatus and deposition method using the same
#46HIGH DENSITY PLASMA PROCESSING APPARATUS
#47METHOD FOR GENERATING AND PROCESSING A UNIFORM HIGH DENSITY PLASMA SHEET
#48Deposition method of a metallic layer on a substrate of a resonator device
#49Sputtering apparatus
#50Convertible magnetics for rotary cathode
#51Magnet unit for magnetron sputtering apparatus
#52COATING APPARATUS AND METHOD FOR USE THEREOF
#53Film forming apparatus and method
#54Physical vapor deposition of piezoelectric films
#55Method and apparatus for depositing a material
#56METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPOR DEPOSITION PROCESSES
#57Methods and apparatus for depositing aluminum by physical vapor deposition (PVD)
#58Apparatus and method for processing, coating or curing a substrate
#59Double-Sided Vacuum Coating Device For Continuously Coating A Film Back And Forth
#60ANTI-REFLECTION COMPOSITE LAYER AND THE MANUFACTURING METHOD THEREOF
#61Physical vapor deposition apparatus and method thereof
#62METHODS AND APPARATUS FOR UNIFORMITY CONTROL IN SELECTIVE PLASMA VAPOR DEPOSITION
#63Apparatus and a method of controlling thickness variation in a material layer formed using physical vapour deposition
#64Grain Size Tuning for Radiation Resistance
#65Deposition system with a multi-cathode
#66HOUSING OF ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING HOUSING
#67Hard mask films with graded vertical concentration formed using reactive sputtering in a radio frequency deposition chamber
#68Nanowires and process for their production
#69Magnetic thin film deposition chamber and thin film deposition apparatus
#70Cathode unit for sputtering apparatus
#71SLIDING ELEMENT WITH MAX PHASE COATING
#72Substrate processing chamber having improved process volume sealing
#73FILM-FORMING METHOD AND SPUTTERING APPARATUS
#74INVERTED MAGNETRON FOR PROCESSING OF THIN FILM MATERIALS
#75Apparatus for transportation of a substrate carrier in a vacuum chamber, system for vacuum processing of a substrate, and method for transportation of a substrate carrier in a vacuum chamber
#76APPARATUS FOR TRANSPORTATION OF A SUBSTRATE, APPARATUS FOR VACUUM PROCESSING OF A SUBSTRATE, AND METHOD FOR MAINTENANCE OF A MAGNETIC LEVITATION SYSTEM
#77Film-forming apparatus and film-forming method
#78Method and apparatus for controlling stress variation in a material layer formed via pulsed DC physical vapor deposition
#79Magnetic recording medium, with carbide segregant, method for manufacturing same and magnetic recording and reproducing apparatus
#80Semiconductor device and manufacturing method of the same
#81APPARATUS FOR PHYSICAL VAPOR DEPOSITION REACTIVE PROCESSING OF THIN FILM MATERIALS
#82Laterally adjustable return path magnet assembly and methods
#83Methods and apparatus for controlling ion fraction in physical vapor deposition processes
#84Method of sputtering and sputter system
#85Ultra-thin doped noble metal films for optoelectronics and photonics applications
#86Apparatus and method for coating inner wall of metal tube
#87Apparatus and a method for deposition of material to form a coating
#88DEPOSITION OF THICK MAGNETIZABLE FILMS FOR MAGNETIC DEVICES
#89Grain Size Tuning for Radiation Resistance
#90Semiconductor device and manufacturing method of the same
#91Method and apparatus for depositing a material
#92RADIO-FREQUENCY SPUTTERING SYSTEM WITH ROTARY TARGET FOR FABRICATING SOLAR CELLS
#93METHOD FOR SPUTTERING SYSTEM AND USING COUNTERWEIGHT
#94Interchangeable magnet pack
#95Oxide and method for forming the same
#96FILM FORMATION APPARATUS AND FILM FORMATION METHOD
#97Optically tuned hardmask for multi-patterning applications
#98Method of HIPIMS sputtering and HIPIMS sputter system
#99Method for continuously forming noble metal film and method for continuously manufacturing electronic component
#100Method of manufacturing a magnetic film having high coercivity for use as a hot seed in a magnetic write head
#101Rotation plus vibration magnet for magnetron sputtering apparatus
#102Ternary metal nitride formation by annealing constituent layers
#103Interchangeable sputter gun head
#104Optical fiber and optical fiber manufacturing method
#105Semiconductor device and manufacturing method of the same
#106Source magnet for improved resputtering uniformity in direct current (DC) physical vapor deposition (PVD) processes
#107Method for manufacturing patterned layer and method for manufacturing electrochromic device
#108Thin-film formation method, thin-film formation device, object to be processed having coating film formed thereof, die and tool
#109Semiconductor device, method for manufacturing the same, and apparatus for manufacturing semiconductor device
#110In-situ sputtering apparatus
#111Variable radius dual magnetron
#112PVD RF DC open/closed loop selectable magnetron
#113Multi-Piece Target and Magnetron to Prevent Sputtering of Target Backing Materials
#114Bilayer chromium nitride coated articles and related methods
#115New Magnet Design Which Improves Erosion Profile for PVD Systems
#116High coercivity magnetic film for use as a hot seed in a magnetic write head and method to grow it
#117Magnet module having epicyclic gearing system and method of use
#118MAGNETRON SPUTTERING SYSTEM
#119Magnetic-field-generating apparatus for magnetron sputtering
#120Substrate processing apparatus
#121MAGNETRON SPUTTERING DEVICE, METHOD FOR CONTROLLING MAGNETRON SPUTTERING DEVICE, AND FILM FORMING METHOD
#122Rotation plus vibration magnet for magnetron sputtering apparatus
#123Multi coil target design
#124High density TiN RF/DC PVD deposition with stress tuning
#125Crystalline orientation and overhang control in collision based RF plasmas
#126Method of switching magnetic flux distribution
#127Magnetic field generator, magnetron cathode and spattering apparatus
#128Method For Sputter Deposition And RF Plasma Sputter Etch Combinatorial Processing
#129Sputter gun having variable magnetic strength
#130SPUTTER GUN SHUTTER
#131Masking method and apparatus
#132Magnetic Confinement and Directionally Driven Ionized Sputtered Films For Combinatorial Processing
#133Magnetic Field Configuration For Energetic Plasma Surface Treatment and Energetic Deposition Conditions
#134Method and Apparatus for Enhanced Film Uniformity
#135Apparatus for processing work piece by pulsed electric discharges in solid-gas plasma
#136MAGNET ARRAY FOR A PHYSICAL VAPOR DEPOSITION SYSTEM
#137FILM FORMATION APPARATUS
#138FILM FORMING METHOD AND FILM FORMING APPARATUS
#139Film formation apparatus
#140Deposition of Material to Form a Coating
#141FILM FORMATION APPARATUS AND FILM FORMING METHOD
#142CREATION OF MAGNETIC FIELD (VECTOR POTENTIAL) WELL FOR IMPROVED PLASMA DEPOSITION AND RESPUTTERING UNIFORMITY
#143FILM FORMATION APPARATUS AND FILM FORMATION METHOD
#144Apparatus for Forming Electronic Material Layer
#145Processes and device for the deposition of films on substrates
#146Substrate processing apparatus and apparatus and method of manufacturing magnetic device
#147Sputtering apparatus and sputtering method
#148Magnetron Plasma Sputtering Apparatus
#149Magnetic lensing to improve deposition uniformity in a physical vapor deposition (PVD) process
#150Plasma processing apparatus, magnetoresistive device manufacturing apparatus, magnetic thin film forming method, and film formation control program
#151SPUTTER DEPOSITION SYSTEM AND METHOD
#152COATING APPARATUS AND COATING METHOD
#153System and apparatus to facilitate physical vapor deposition to modify non-metal films on semiconductor substrates
#154Method for manufacturing a treated surface and vacuum plasma sources
#155SUBSTRATE STAGE, SPUTTERING APPARATUS PROVIDED WITH SAME, AND FILM FORMING METHOD
#156Sputtering apparatus, sputter deposition method, and analysis apparatus
#157SPUTTERING APPARATUS AND FILM FORMING METHOD
#158Methods and apparatus for forming diamond-like coatings
#159LOW DAMAGE SPUTTERING SYSTEM AND METHOD
#160Methods for forming a titanium nitride layer
#161Processes and device for the deposition of films on substrates
#162Reactive sputtering method
#163CHALCOGENIDE TARGET AND METHOD
#164SPUTTERING SYSTEM CARRIER
#165Method of arc ion plating and target for use therein
#166Sputtering of thermally resistive materials including metal chalcogenides
#167Coating Apparatus for the Coating of a Substrate and also Method for Coating
#168Manufacturing method of a transparent conductive film, a manufacturing method of a transparent electrode of an organic electroluminescence device, an organic electroluminescence device and the manufacturing method
#169Magnetron Sputtering Device In which Two Modes Of Magnetic Flux Distribution (Balanced Mode/Unbalanced Mode) Can Be Switched From One To The Other And Vice Versa, A Film Formation Method For Forming A Film From An Inorganic Film Formation Material Using The Device, And A Dual Mode Magnetron Sputtering Device And Film Formation Method For Forming A Film From An Inorganic Film Formation Material At A Low Temperature Using The Device
#170Magnetron based wafer processing
#171Work piece processing by pulsed electric discharges in solid-gas plasma
#172High throughput deposition apparatus with magnetic support
#173Method for forming a barrier layer in an integrated circuit in a plasma with source and bias power frequencies applied through the workpiece
#174[PHYSICAL VAPOR DEPOSITION PROCESS AND APPARATUS THEREFOR]
#175Processes and device for the deposition of films on substrates
#176Sputtering cathode and device and method for coating a substrate with several layers