120146 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metal carbonyl compounds
DEPOSITION OF METAL-CONTAINING FILMS
#2AREA SELECTIVE DEPOSITION USING METAL CARBONYL PRECURSORS
#3SYNTHESIS AND USE OF PRECURSORS FOR ALD OF MOLYBDENUM OR TUNGSTEN CONTAINING THIN FILMS
#4COMPOSITION FOR DEPOSITING A MOLYBDENUM-CONTAINING THIN FILM, METHOD FOR MANUFACTURING A MOLYBDENUM-CONTAINING THIN FILM, AND MOLYBDENUM-CONTAINING THIN FILM MANUFACTURED THEREBY
#5AREA SELECTIVE DEPOSITION OF METALS FOR ELECTRONIC DEVICES
#6METAL CARBONYL COMPLEXES WITH PHOSPHORUS-BASED LIGANDS FOR CVD AND ALD APPLICATIONS
#7METHOD AND APPARATUS FOR EMBEDDING RUTHENIUM IN RECESS FORMED ON SUBSTRATE SURFACE
#8METHOD FOR MAKING METAL TRIMETHYLENEMETHANE-CARBONYL COMPLEXES
#9SELECTIVE COBALT DEPOSITION ON COPPER SURFACES
#10PLASMA-ENHANCED MOLYBDENUM DEPOSITION
#11SHOWER HEAD ASSEMBLY AND FILM FORMING APPARATUS
#12EMBEDDING METHOD AND PROCESSING SYSTEM
#13TRANSITION METAL DEPOSITION PROCESSES AND A DEPOSITION ASSEMBLY
#14Haloalkynyl dicobalt hexacarbonyl precursors for chemical vapor deposition of cobalt
#15SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
#16Enhanced deposition rate by thermal isolation cover for GIS manipulator
#17DEPOSITION METHOD AND DEPOSITION APPARATUS
#18METHOD AND APPARATUS FOR FORMING RUTHENIUM SILICIDE FILM ON SURFACE OF SUBSTRATE
#19SYNTHESIS AND USE OF PRECURSORS FOR ALD OF MOLYBDENUM OR TUNGSTEN CONTAINING THIN FILMS
#20Ruthenium film forming method and substrate processing system
#21Method for forming ruthenium thin film
#22SOURCE GAS SUPPLY METHOD, SOURCE GAS SUPPLY MECHANISM, AND FILM FORMING SYSTEM
#23Methods of preparing molybdenum-containing films
#24SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING SYSTEM
#25FILM-FORMING METHOD AND FILM-FORMING SYSTEM
#26Temperature-controlled surface with a cryo-nanomanipulator for improved deposition rate
#27PRESSURE BATCH COMPENSATION TO STABILIZE CD VARIATION FOR TRIM AND DEPOSITION PROCESSES
#28Selective cobalt deposition on copper surfaces
#29PROTECTION OF SEED LAYERS DURING ELECTRODEPOSITION OF METALS IN SEMICONDUCTOR DEVICE MANUFACTURING
#30Process for thin film deposition through controlled formation of vapor phase transient species
#31Manufacturing method for gate electrode and thin film transistor and display panel
#32FILM FORMING APPARATUS AND FILM FORMING METHOD
#33Contact structure
#34Process for thin film deposition through controlled formation of vapor phase transient species
#35Haloalkynyl dicobalt hexacarbonyl precursors for chemical vapor deposition of cobalt
#36Process for pulsed thin film deposition
#37Ge-containing Co-film forming material, Ge-containing Co film and film forming method thereof
#38Metal fill process for three-dimensional vertical NAND wordline
#39Method of Forming RuSi Film and Film and Film-Forming Apparatus
#40METHODS FOR SELECTIVE DEPOSITION USING MOLYBDENUM HEXACARBONYL
#41Contact structure
#42WIRING CORRECTING DEVICE AND WIRING CORRECTING METHOD
#43Film forming apparatus, source supply apparatus, and film forming method
#44Chemical deposition raw material including iridium complex and chemical deposition method using the chemical deposition raw material
#45Method and device for permanently repairing defects of absent material of a photolithographic mask
#46Contact structure
#47Method and apparatus for depositing cobalt in a feature
#48Methods and System for the Integrated Synthesis, Delivery, and Processing of Source Chemicals for Thin Film Manufacturing
#49Ruthenium metal feature fill for interconnects
#50PROCESS OF FILLING THE HIGH ASPECT RATIO TRENCHES BY CO-FLOWING LIGANDS DURING THERMAL CVD
#51Tantalum compound
#52Stabilized metal monolayer structure
#53Deposition of molybdenum thin films using a molybdenum carbonyl precursor
#54Method of manufacturing ruthenium wiring
#55Liner and barrier applications for subtractive metal integration
#56Chemical vapor deposition raw material including dinuclear ruthenium complex and chemical deposition method using chemical vapor deposition raw material
#57Haloalkynyl dicobalt hexacarbonyl precursors for chemical vapor deposition of cobalt
#58APPARATUS FOR DEPOSITING A COBALT LAYER USING A CAROUSEL BATCH DEPOSITION REACTOR
#59Disubstituted alkyne dicobalt hexacarbonyl compounds, method of making and method of use thereof
#60Alloys of Co to reduce stress
#61High-purity tungsten hexacarbonyl for solid source delivery
#62High resolution additive manufacturing method with real materials
#63Selective cobalt deposition on copper surfaces
#64Method and device for permanently repairing defects of absent material of a photolithographic mask
#65RUTHENIUM METAL DEPOSITION METHOD FOR ELECTRICAL CONNECTIONS
#66Tantalum compound and methods of forming thin film and fabricating integrated circuit device by using the same
#67Method and apparatus for depositing cobalt in a feature
#68Solid precursor-based delivery of fluid utilizing controlled solids morphology
#69Cobalt precursors
#70Metal nanodot formation method, metal nanodot formation apparatus and semiconductor device manufacturing method
#71Process of filling the high aspect ratio trenches by co-flowing ligands during thermal CVD
#72Ultrathin multilayer metal alloy liner for nano Cu interconnects
#73Ruthenium compound, material for thin film formation, and process for thin film formation
#74Ultrathin multilayer metal alloy liner for nano Cu interconnects
#75Machine and Process for building 3-Dimensional Metal and Composite Structures by Using Carbonyl and Other Gases
#76Device for producing and method for producing dodecacarbonyl triruthenium
#77Ruthenium film forming method, film forming apparatus, and semiconductor device manufacturing method
#78Method to deposit CVD ruthenium
#79Method For Optimizing A Deposition Process, Method For Setting A Deposition System and Deposition System
#80Methods and apparatus for depositing a cobalt layer using a carousel batch deposition reactor
#81Liner and barrier applications for subtractive metal integration
#82Method for producing a tribologically distressed laminate, a laminate and use of an organometallic compound for producing a functional layer of the laminate
#83Film forming method, film forming apparatus and recording medium
#84MAGNETIC MATERIAL AND METHOD THEREFOR
#85Fluorine free tungsten ALD/CVD process
#86Methods for forming a cobalt-ruthenium liner layer for interconnect structures
#87Silicon- and Zirconium-containing compositions for vapor deposition of Zirconium-containing films
#88Trap assembly in film forming apparatus
#89Method of forming a metal from a cobalt metal precursor
#90Container containing a cobalt carbonyl complex and cobalt carbonyl complex composition
#91Film forming method using reversible decomposition reaction
#92Method for manufacturing semiconductor device
#93Metallurgically bonded stainless steel
#94Organoruthenium compound for chemical vapor deposition raw material and production method for the organoruthenium compound
#95Metallurgically bonded stainless steel
#96Metallurgically bonded stainless steel
#97Gate valve unit, substrate processing device and substrate processing method thereof
#98Metallurgically bonded stainless steel
#99Mo—Si—B—based coatings for ceramic base substrates
#100Deposition device
#101APPARATUS FOR THERMAL AND PLASMA ENHANCED VAPOR DEPOSITION AND METHOD OF OPERATING
#102METHOD FOR MODIFYING METAL CAP LAYERS IN SEMICONDUCTOR DEVICES
#103Precursors and methods for the atomic layer deposition of manganese
#104Film forming method and storage medium
#105METHOD FOR FORMING METAL THIN FILM, SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
#106METHODS OF CONTROLLING TUNGSTEN FILM PROPERTIES
#107Methods of forming copper wiring and copper film, and film forming system
#108Method of forming copper wiring and method and system for forming copper film
#109FILM FORMING APPARATUS, FILM FORMING METHOD AND STORAGE MEDIUM
#110SYSTEM AND METHOD FOR GENERATING A BEAM OF PARTICLES
#111ELECTRODE IN SEMICONDUCTOR DEVICE, CAPACITOR AND METHOD OF FABRICATING THE SAME
#112Method for forming barrier film on wiring line
#113Nanomatrix powder metal composite
#114METHOD FOR FORMING CVD-RU FILM AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICES
#115Method for film formation, apparatus for film formation, and computer-readable recording medium
#116PLACING TABLE STRUCTURE
#117Ruthenium-containing precursors for CVD and ALD
#118Self-aligned barrier layers for interconnects
#119CONTAINER CONTAINING A COBALT CARBONYL COMPLEX AND COBALT CARBONYL COMPLEX COMPOSITION
#120FILM FORMING APPARATUS
#121Metal recovery method, metal recovery apparatus, gas exhaust system and film forming device using same
#122Raw material recovery method and trapping mechanism for recovering raw material
#123Chemical vapor deposition of high conductivity, adherent thin films of ruthenium
#124Method for electron beam induced deposition of conductive material
#125METHODS OF FORMING RUTHENIUM-CONTAINING FILMS BY ATOMIC LAYER DEPOSITION
#126Method for film formation, apparatus for film formation, and computer-readable recording medium
#127Organometallic compounds
#128Structures of and methods and tools for forming in-situ metallic/dielectric caps for interconnects
#129Multi-Step Method to Selectively Deposit Ruthenium Layers of Arbitrary Thickness on Copper
#130Methods of forming thin metal-containing films by chemical phase deposition
#131Organometallic precursors for use in chemical phase deposition processes
#132Metal plating using seed film
#133Solid precursor-based delivery of fluid utilizing controlled solids morphology
#134METHOD FOR FORMING W-BASED FILM, METHOD FOR FORMING GATE ELECTRODE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#135Radiation-assisted selective deposition of metal-containing cap layers
#136METHOD FOR FORMING RUTHENIUM METAL CAP LAYERS
#137Film formation method and film formation apparatus
#138Method of fabricating capacitor
#139METHOD FOR FORMING METAL FILM USING CARBONYL MATERIAL, METHOD FOR FORMING MULTI-LAYER WIRING STRUCTURE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#140Method for forming a ruthenium metal cap layer
#141METAL FILM DECARBONIZING METHOD, FILM FORMING METHOD AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
#142Methods of forming a material layer and methods of fabricating a memory device
#143FILM FORMING METHOD AND APPARATUS
#144Method of Manufacturing Particle Wire
#145SELECTIVE COBALT DEPOSITION ON COPPER SURFACES
#146Self-aligned barrier layers for interconnects
#147Light-induced directed self-assembly of periodic sub-wavelength nanostructures
#148Method for integrating selective low-temperature ruthenium deposition into copper metallization of a semiconductor device
#149METHODS OF DEPOSITING A RUTHENIUM FILM
#150METHOD FOR TREATING SUBSTRATE AND RECORDING MEDIUM
#151Method of manufacturing particle wire
#152Cobalt deposition on barrier surfaces
#153METHOD OF FORMING METAL FILM
#154Method for improving the selectivity of a CVD process
#155CV method using metal carbonyl gas
#156Metal Precursor Solutions For Chemical Vapor Deposition
#157DEPOSITION PRECURSORS FOR SEMICONDUCTOR APPLICATIONS
#158System and method for simulated dosimetry using a real time locating system
#159Method for pre-conditioning a precursor vaporization system for a vapor deposition process
#160Method for performing a vapor deposition process
#161Method and apparatus for reducing substrate temperature variability
#162Method for heating a substrate prior to a vapor deposition process
#163Divided solid composition composed of grains provided with continuous metal deposition, method for the production and use thereof in the form of a catalyst
#164Continuous ultra-thin copper film formed using a low thermal budget
#165Method of coating graphite particles with metallic catalyst layer
#166METHOD AND SYSTEM FOR CONTROLLING A VAPOR DELIVERY SYSTEM
#167Atomic layer deposition process for iridium barrier layers
#168Deposition system for increasing deposition rates of metal layers from metal-carbonyl precursors
#169Method for increasing deposition rates of metal layers from metal-carbonyl precursors
#170METHOD FOR PRODUCING COMPONENTS FOR ROCKET CONSTRUCTION
#171Method for integrating a conformal ruthenium layer into copper metallization of high aspect ratio features
#172METHOD AND SYSTEM FOR INITIATING A DEPOSITION PROCESS UTILIZING A METAL CARBONYL PRECURSOR
#173System for introducing a precursor gas to a vapor deposition system
#174METHOD AND APPARATUS FOR REDUCING CARBON MONOXIDE POISONING AT THE PERIPHERAL EDGE OF A SUBSTRATE IN A THIN FILM DEPOSITION SYSTEM
#175Method for reducing carbon monoxide poisoning in a thin film deposition system
#176METHOD FOR INTRODUCING A PRECURSOR GAS TO A VAPOR DEPOSITION SYSTEM
#177Method and integrated system for purifying and delivering a metal carbonyl precursor
#178Chemical vapor deposition of high conductivity, adherent thin films of ruthenium
#179Method and apparatus for reducing particle formation in a vapor distribution system
#180Method and apparatus for reducing particle contamination in a deposition system
#181Methods and apparatus for forming rhodium-containing layers
#182ALD film forming method
#183Apparatus for thermal and plasma enhanced vapor deposition and method of operating
#184METHOD AND SYSTEM FOR DEPOSITING MATERIAL ON A SUBSTRATE USING A SOLID PRECURSOR
#185Process for improving the color of gemstones and gemstone minerals obtained thereby
#186Metal plating using seed film
#187Method for controlling the step coverage of a ruthenium layer on a patterned substrate
#188Method for purifying a metal carbonyl precursor
#189Semiconductor device containing a ruthenium diffusion barrier and method of forming
#190Metal plating using seed film
#191Method of forming a tantalum-containing layer from a metalorganic precursor
#192Method of forming a tantalum-containing layer from a metalorganic precursor
#193Method for thin film deposition using multi-tray film precursor evaporation system
#194Technique for forming nickel silicide by depositing nickel from a gaseous precursor
#195Focused ion beam deposition
#196Method for forming a barrier/seed layer for copper metallization
#197Method for saturating a carrier gas with precursor vapor
#198Low-temperature chemical vapor deposition of low-resistivity ruthenium layers
#199Method and system for depositing material on a substrate using a solid precursor
#200Solid precursor vaporization system for use in chemical vapor deposition
#201Method and system for forming a variable thickness seed layer
#202Method and system for improved delivery of a precursor vapor to a processing zone
#203Rhodium film and method of formation
#204Apparatus for active dispersion of precursors
#205Method for preparing solid precursor tray for use in solid precursor evaporation system
#206Method and system for performing in-situ cleaning of a deposition system
#207Method and system for measuring a flow rate in a solid precursor delivery system
#208Replaceable precursor tray for use in a multi-tray solid precursor delivery system
#209Multi-tray film precursor evaporation system and thin film deposition system incorporating same
#210Method and deposition system for increasing deposition rates of metal layers from metal-carbonyl precursors
#211Method for increasing deposition rates of metal layers from metal-carbonyl precursors
#212Processing gas supply mechanism, film forming apparatus and method, and computer storage medium storing program for controlling same
#213Low-pressure deposition of ruthenium and rhenium metal layers from metal carbonyl precursors
#214Deposition of ruthenium metal layers in a thermal chemical vapor deposition process
#215Method for forming a passivated metal layer
#216Apparatus and a method for forming an alloy layer over a substrate
#217Focused ion beam deposition
#218Methods for depositing tungsten layers employing atomic layer deposition techniques
#219Methods and apparatus for forming rhodium-containing layers
#220Apparatus and a method for forming an alloy layer over a substrate
#221Film formation method
#222Method for processing a substrate
#223Method of forming a metal layer
#224CVD method for forming metal film by using metal carbonyl gas
#225Chemical vapor deposition of high conductivity, adherent thin films of ruthenium
#226Metal plating using seed film
#227Metal plating using seed film
#228Film forming apparatus
#229Method to locally protect extreme ultraviolet multilayer blanks used for lithography
#230Method for preventing and cleaning ruthenium-containing deposits in a CVD apparatus
#231Method of depositing metal layers from metal-carbonyl precursors
#232Low-pressure deposition of metal layers from metal-carbonyl precursors
#233Method for depositing metal layers using sequential flow deposition
#234Method of forming a metal layer using an intermittent precursor gas flow process
#235Aluminide or chromide coating of turbine engine rotor component
#236Hollow nickel shapes by vapor deposition
#237Methods of forming cobalt layers for semiconductor devices
#238NiPd nano-alloy film as a electrocatalyst and methods of preparation thereof
#239Additive manufacturing using metals from the gaseous state