ClassID:

120148

C23C16/20 - CPC Classification

Classification description:

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of metallic material from metallo-organic compounds Deposition of aluminium only

Recent Application in this class:
#1
20260098050
2026-04-09

AREA SELECTIVE DEPOSITION OF ALUMINUM BASED FILMS USING ALKYL ALUMINUM AMIDINATE PRECURSORS

#2
20260028712
2026-01-29

SIMULTANEOUS SELECTIVE DEPOSITION OF TWO DIFFERENT MATERIALS ON TWO DIFFERENT SURFACES

#3
20250270409
2025-08-28

ALUMINUM-CONTAINING INHIBITOR COMPOUNDS FOR SELECTIVE DEPOSITION

#4
20250263834
2025-08-21

AREA SELECTIVE DEPOSITION OF ALUMINUM BASED FILMS USING ALKYL ALUMINUM AMIDINATE PRECURSORS

#5
20230203644
2023-06-29

SIMULTANEOUS SELECTIVE DEPOSITION OF TWO DIFFERENT MATERIALS ON TWO DIFFERENT SURFACES

#6
20230132011
2023-04-27

Area selective nanoscale-thin layer deposition via precise functional group lithography

#7
20220220131
2022-07-14

Process for the generation of metal-containing films

#8
20220197142
2022-06-23

PHOTORESIST UNDERLAYER COMPOSITIONS AND PATTERNING METHODS

#9
20220197141
2022-06-23

PHOTORESIST UNDERLAYER COMPOSITIONS AND PATTERNING METHODS

#10
20220074051
2022-03-10

Method and apparatus for fabricating fibers and microstructures from disparate molar mass precursors

#11
20220049348
2022-02-17

Method of manufacturing oxide crystal thin film

#12
20220033963
2022-02-03

Area selective nanoscale-thin layer deposition via precise functional group lithography

#13
20210301391
2021-09-30

Simultaneous selective deposition of two different materials on two different surfaces

#14
20210288086
2021-09-16

Methods for reflector film growth

#15
20210079520
2021-03-18

Process for the generation of metal-containing films

#16
20210079025
2021-03-18

Process for the generation of metal-containing films

#17
20200354833
2020-11-12

Method for forming a protective coating film for halide plasma resistance

#18
20200332417
2020-10-22

Method and apparatus for fabricating fibers and microstructures from disparate molar mass precursors

#19
20200291155
2020-09-17

Pattern forming material, composition for pattern formation, pattern forming method and method of manufacturing semiconductor device

#20
20200207790
2020-07-02

Aluminum compound and method for manufacturing semiconductor device using the same

#21
20200090924
2020-03-19

Selective aluminum oxide film deposition

#22
20190305250
2019-10-03

Encapsulation structure, electronic device and encapsulation method

#23
20190304770
2019-10-03

Method of fabricating semiconductor device

#24
20190112703
2019-04-18

METHOD OF MANUFACTURING OXIDE CRYSTAL THIN FILM

#25
20190074405
2019-03-07

Production method for group III nitride semiconductor

#26
20170327944
2017-11-16

ALUMINUM PRECURSORS FOR THIN-FILM DEPOSITION, PREPARATION METHOD AND USE THEREOF

#27
20160369400
2016-12-22

Method and apparatus for fabricating fibers and microstructures from disparate molar mass precursors

#28
20150257990
2015-09-17

GLITTER AND METHOD FOR PRODUCING SAME

#29
20150225843
2015-08-13

Method of manufacturing oxide crystal thin film

#30
20140295084
2014-10-02

Tris(dialkylamide)aluminum compound, and method for producing aluminum-containing thin film using same

#31
20140050848
2014-02-20

Aluminum precursor composition

#32
20120189868
2012-07-26

Process for the preparation of a coated substrate, coated substrate, and use thereof

#33
20120103135
2012-05-03

Nanomatrix powder metal composite

#34
20110143471
2011-06-16

Surface passivation techniques for chamber-split processing

#35
20110137093
2011-06-09

Enhancing catalytic activity of nanoporous materials

#36
20100330390
2010-12-30

Structural member to be used in apparatus for manufacturing semiconductor or flat display, and method for producing the same

#37
20100099257
2010-04-22

Method for thin film vapor deposition of a dialkyl amido dihydroaluminum compound

#38
20090233349
2009-09-17

Metal nanowires with an oxide sheath and production method for same

#39
20090104353
2009-04-23

Apparatus For Treating A Gas Stream

#40
20090035516
2009-02-05

Organometallic precursor, thin film having the same, metal wiring including the thin film, method of forming a thin film and method of manufacturing a metal wiring using the same

#41
20080233742
2008-09-25

METHOD OF DEPOSITING ALUMINUM LAYER AND METHOD OF FORMING CONTACT OF SEMICONDUCTOR DEVICE USING THE SAME

#42
20080014348
2008-01-17

Method of coating gas turbine components

#43
20070071893
2007-03-29

Organic aluminum precursor and method of manufacturing a metal wiring using the same

#44
20070069401
2007-03-29

Semiconductor device, manufacturing method thereof, liquid crystal display device, RFID tag, light emitting device, and electronic device

#45
20060222846
2006-10-05

Reflective and resistant coatings and methods for applying to composite structures

#46
20060210723
2006-09-21

Plasma enhanced atomic layer deposition system and method

#47
20060024517
2006-02-02

Coating for aluminum component

#48
20050064211
2005-03-24

Metallization of substrate(s) by a liquid/vapor deposition process

#49
20050061245
2005-03-24

Chemical vapor deposition apparatus

#50
20050053467
2005-03-10

Aluminide or chromide coating of turbine engine rotor component

#51
20050008780
2005-01-13

Aluminide coating of turbine engine component