120163 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material; Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
Sub-classes:METHOD AND DEVICE FOR DEPOSITING A LAYER CONTAINING A GROUP FIVE ELEMENT IN A PROCESS CHAMBER AND SUBSEQUENT CLEANING OF THE PROCESS CHAMBER
#2METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE AND SEMICONDUCTOR GROWTH DEVICE
#3GAS-INLET ELEMENT FOR A CVD REACTOR
#4SEED SUBSTRATE FOR EPITAXIAL GROWTH USE AND METHOD FOR MANUFACTURING SAME, AND SEMICONDUCTOR SUBSTRATE AND METHOD FOR MANUFACTURING SAME
#5GROUP III-V SEMICONDUCTOR DEVICE AND METHOD OF FABRICATION OF SAME INCLUDING IN-SITU SURFACE PASSIVATION
#6SYSTEMS AND METHODS FOR LARGE SCALE GAS GENERATION
#7Cutting tool including substrate and coating layer
#8Vapor phase epitaxy method
#9VAPOR PHASE EPITAXY METHOD
#10Vapor jet printing
#11HYDRIDE ENHANCED GROWTH RATES IN HYDRIDE VAPOR PHASE EPITAXY
#12Concentric flow reactor
#13Display device having integrated metamaterial lens
#14METHOD FOR PRODUCING AN OPTOELECTRONIC SEMICONDUCTOR CHIP, AND OPTOELECTRONIC SEMICONDUCTOR CHIP
#15Concentric flow reactor
#16Display device having integrated metamaterial lens
#17Vapor jet printing
#18Hydride enhanced growth rates in hydride vapor phase epitaxy
#19Method of utilizing a degassing chamber to reduce arsenic outgassing following deposition of arsenic-containing material on a substrate
#20MWIR/LWIR transparent, conductive coatings
#21EVAPORATION VESSEL APPARATUS AND METHOD
#22Vapor phase growth rate measuring apparatus, vapor phase growth apparatus, and growth rate detection method
#23Display device having integrated metamaterial lens
#24DEGASSING CHAMBER FOR ARSENIC RELATED PROCESSES
#25Use of at least one binary group 15 element compound, a 13/15 semiconductor layer and binary group 15 element compounds
#26Concentric flower reactor
#27Gallium arsenide based materials used in thin film transistor applications
#28Evaporation vessel apparatus and method
#29Substrate treatment device
#30Nano deposition and ablation for the repair and fabrication of integrated circuits
#31Method for preparing bismuth iodide article and method for manufacturing radiation detecting element
#32Optimized method for fabricating patterns of III-V semiconductor material on a semiconductor substrate
#33Gas inlet member of a CVD reactor
#34Process for preparing trialkyl compounds of metals of group IIIA
#35Process for preparing trialkylgallium compounds
#36Method for manufacturing nitride semiconductor layer and method for manufacturing semiconductor light emitting device
#37CARBON DOPING OF GALLIUM ARSENIDE VIA HYDRIDE VAPOR PHASE EPITAXY
#38DEPOSITION SYSTEMS HAVING REACTION CHAMBERS CONFIGURED FOR IN-SITU METROLOGY AND RELATED METHODS
#39DEPOSITION SYSTEMS INCLUDING A PRECURSOR GAS FURNACE WITHIN A REACTION CHAMBER, AND RELATED METHODS
#40Method for producing a group III nitride semiconductor light-emitting device
#41Method for manufacturing epitaxial crystal substrate, epitaxial crystal substrate and semiconductor device
#42APPARATUS FOR DEPOSITION OF MATERIALS ON A SUBSTRATE
#43VAPOR DEPOSITION DEVICE, VAPOR DEPOSITION METHOD, AND SEMICONDUCTOR ELEMENT MANUFACTURING METHOD
#44SUBSTRATE PRETREATMENT FOR SUBSEQUENT HIGH TEMPERATURE GROUP III DEPOSITIONS
#45Systems for forming semiconductor materials by atomic layer deposition
#46Systems and methods for forming semiconductor materials by atomic layer deposition
#47Thermalizing gas injectors for generating increased precursor gas, material deposition systems including such injectors, and related methods
#48GALLIUM ARSENIDE BASED MATERIALS USED IN THIN FILM TRANSISTOR APPLICATIONS
#49High efficiency thin film transistor device with gallium arsenide layer
#50Semiconductor light-emitting device, surface-emission laser diode, and production apparatus thereof, production method, optical module and optical telecommunication system
#51Chemical vapor deposition with elevated temperature gas injection
#52Reactor clean
#53FORMING A COMPOUND-NITRIDE STRUCTURE THAT INCLUDES A NUCLEATION LAYER
#54FORMING A COMPOUND-NITRIDE STRUCTURE THAT INCLUDES A NUCLEATION LAYER
#55Enhancement of LED light extraction with in-situ surface roughening
#56UV absorption based monitor and control of chloride gas stream
#57Substrate processing apparatus and method of manufacturing semiconductor device
#58REACTOR, CHEMICAL VAPOR DEPOSITION REACTOR, AND METALORGANIC CHEMICAL VAPOR DEPOSITION REACTOR
#59MULTICHAMBER SPLIT PROCESSES FOR LED MANUFACTURING
#60VAPOR PHASE EPITAXY APPARATUS OF GROUP III NITRIDE SEMICONDUCTOR
#61Method and apparatus
#62Substrate pretreatment for subsequent high temperature group III depositions
#63Chemical vapor deposition with elevated temperature gas injection
#64PLASMA SILANIZATION SUPPORT METHOD AND SYSTEM
#65Concentric showerhead for vapor deposition
#66Plural Gas Distribution System
#67Semiconductor light-emitting device, surface-emission laser diode, and production apparatus thereof, production method, optical module and optical telecommunication system
#68Method for producing group 3-5 nitride semiconductor and method for producing light-emitting device
#69Layer depositing device and method for operating it
#70GeSiSn-based compounds, templates, and semiconductor structures
#71Vapor-Phase Growth System and Vapor-Phase Growth Method
#72IN-SITU DETECTION OF GAS-PHASE PARTICLE FORMATION IN NITRIDE FILM DEPOSITION
#73Controlled growth of gallium nitride nanostructures
#74PRODUCTION APPARATUS FOR PRODUCING GALLIUM NITRIDE FILM SEMICONDUCTOR AND CLEANING APPARATUS FOR EXHAUST GAS
#75Methods of fabricating nanoclusters and dielectric layer having the same
#76Method for depositing compounds on a substrate by means of metalorganic chemical vapor deposition
#77Method of making nitride-based compound semiconductor crystal and substrate
#78Organometallic compounds
#79Method for making organometallic compounds
#80Methods, complexes, and system for forming metal-containing films
#81Controlled growth of gallium nitride nanostructures
#82Production apparatus for producing gallium nitride semiconductor film and cleaning apparatus for exhaust gas
#83Inverted metamorphic multijunction solar cell with lightweight laminate substrate