120186 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material; Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides Silicides
METHOD AND APPARATUS FOR FORMING METAL SILICIDE LAYER ON SUBSTRATE
#2METHOD FOR PREPARING METALLIC COBALT THIN FILM AND METHOD FOR PREPARING COBALT SILICIDE THIN FILM
#3FILM FORMING METHOD AND FILM FORMING APPARATUS
#4CHAMBER ARRANGEMENTS WITH OFFSET UPPER REFLECTORS, SEMICONDUCTOR PROCESSING SYSTEMS, AND RELATED METHODS OF MAKING CHAMBER ARRANGEMENTS AND DEPOSITING MATERIAL LAYERS ONTO SUBSTRATES
#5CYCLIC PLASMA AND THERMAL PROCESS TO IMPROVE PECVD TI SILICIDE DEPOSITION SELECTIVITY
#6ATOMIC LAYER DEPOSITION OF MOLYBDENUM SILICIDE THIN FILMS
#7METAL SILICIDE CONTACT FORMATION
#8METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, RECORDING MEDIUM, AND SUBSTRATE PROCESSING APPARATUS
#9METHOD FOR MANUFACTURING PELLICLE FOR FORMING METAL SILICIDE CAPPING LAYER AND PELLICLE MANUFACTURED THEREFROM
#10SEMICONDUCTOR DEVICES AND METHODS OF MANUFACTURING
#11DIFFUSION BARRIER INCLUDING METAL SILICIDE AND TITANIUM SILICON NITRIDE
#12SURFACE TREATMENT ENABLING SUPER-CONFORMAL METAL CAP PROFILE ON MIDDLE OF-LINE (MOL) SILICIDES
#13MULTI-REGION DIFFUSION BARRIER CONTAINING TITANIUM, SILICON AND NITROGEN
#14METHOD OF DEPOSITING EPITAXIAL MATERIAL, STRUCTURE FORMED USING THE METHOD, AND SYSTEM FOR PERFORMING THE METHOD
#15SELECTIVE METAL CAPPING PROCESSES FOR A JUNCTION SILICIDE
#16LOW TEMPERATURE MOLYBDENUM DEPOSITION ASSISTED BY SILICON-CONTAINING REACTANTS
#17METHOD OF SIMULTANEOUS SILICIDATION ON SOURCE AND DRAIN OF NMOS AND PMOS TRANSISTORS
#18SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#19METHODS OF FORMING STRUCTURES INCLUDING SILICON GERMANIUM AND SILICON LAYERS, DEVICES FORMED USING THE METHODS, AND SYSTEMS FOR PERFORMING THE METHODS
#20Fluorinated Aluminum Coated Component for a Substrate Processing Apparatus and Method of Producing
#21METHOD OF FORMING MOLYBDENUM SILICIDE
#22LOW TEMPERATURE DEPOSITION OF IRIDIUM CONTAINING FILMS
#23Method of Selective Metal Deposition Using Separated Reactant Activation and Plasma Discharging Zone
#24METHODS FOR SELECTIVE DEPOSITION OF PRECURSOR MATERIALS AND RELATED DEVICES
#25METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
#26Electrode structure comprising potential sheath for secondary battery and fabrication method therefor
#27Low temperature deposition of iridium containing films
#28INTERMEDIATE COATING FOR HIGH TEMPERATURE ENVIRONMENTS
#29Arene molybdenum (0) precursors for deposition of molybdenum films
#30CYCLOHEPTATRIENE MOLYBDENUM (0) PRECURSORS FOR DEPOSITION OF MOLYBDENUM FILMS
#31Processing apparatus and cleaning processing method
#32FILM FORMING METHOD, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND FILM FORMING APPARATUS
#33Homoleptic lanthanide deposition precursors
#34Methods and apparatus for processing a substrate
#35Cyclic plasma processing
#36Semiconductor devices and methods of manufacturing
#37Enhancing gapfill performance of dram word line
#38METHODS AND APPARATUS FOR ENHANCING SELECTIVITY OF TITANIUM AND TITANIUM SILICIDES DURING CHEMICAL VAPOR DEPOSITION
#39SILICON COMPOUNDS AND METHODS FOR DEPOSITING FILMS USING SAME
#40Cycloheptatriene molybdenum (0) precursors for deposition of molybdenum films
#41Arene molybdenum (0) precursors for deposition of molybdenum films
#42Method of simultaneous silicidation on source and drain of NMOS and PMOS transistors
#43Methods of forming nucleation layers with halogenated silanes
#44Silicide film nucleation
#45SELECTIVE DEPOSITION ON METAL OR METALLIC SURFACES RELATIVE TO DIELECTRIC SURFACES
#46Methods of forming structures including silicon germanium and silicon layers, devices formed using the methods, and systems for performing the methods
#47Method of depositing epitaxial material, structure formed using the method, and system for performing the method
#48METHOD AND APPARATUS FOR REDUCING IMPURITY IN A FILM
#49Methods for depositing fluorine/carbon-free conformal tungsten
#50Electrode structure comprising potential sheath for secondary battery and fabrication method therefor
#51CYCLIC GERMANIUM SILYLAMIDO PRECURSORS FOR GE-CONTAINING FILM DEPOSITIONS AND METHODS OF USING THE SAME
#52Deposition of metal silicide layers on substrates and chamber components
#53Volumetric expansion of metal-containing films by silicidation
#54Homoleptic lanthanide deposition precursors
#55Methods and apparatus for enhancing selectivity of titanium and titanium silicides during chemical vapor deposition
#56SiC composite substrate and method for manufacturing same
#57SiC epitaxial wafer, manufacturing apparatus of SiC epitaxial wafer, fabrication method of SiC epitaxial wafer, and semiconductor device
#58SiC epitaxial wafer and method for producing same
#59Method of processing substrate and substrate processing apparatus
#60Semiconductor wafer
#61SiC epitaxial wafer, manufacturing apparatus of SiC epitaxial wafer, fabrication method of SiC epitaxial wafer, and semiconductor device
#62Silicon carbide epitaxial substrate and method for manufacturing a silicon carbide semiconductor device
#63Silicon carbide epitaxial substrate and method for manufacturing silicon carbide semiconductor device
#64LAMINATE FILM, ELECTRONIC DEVICE MEMBER, AND ELECTRONIC DEVICE
#65SEMICONDUCTOR DEVICE
#66Method for processing workpiece
#67Methods for forming a metal silicide interconnection nanowire structure
#68Method of producing a silicon compound material and apparatus for producing a silicon compound material
#69Selective deposition of metal silicides
#70Low temperature deposition of iridium containing films
#71Methods for depositing semiconductor films
#72Multi-region diffusion barrier containing titanium, silicon and nitrogen
#73Deposition on two sides of a web
#74Deposition of metal silicide layers on substrates and chamber components
#75Method for manufacturing a part coated with a protective coating
#76Epitaxial growth method for silicon carbide
#77Polymer substrate with hardcoat layer, and manufacturing method for same
#78SiC composite substrate and method for manufacturing same
#79Manufacturing method of SiC composite substrate
#80Wear resistant vapor deposited coating, method of coating deposition and applications therefor
#81Method for manufacturing a semiconductor device where a plurality of layers including a semiconductor layer made of an oxide semiconductor are stacked to form a thin film transistor
#82Method of manufacturing silicon carbide epitaxial wafer
#83SiC epitaxial wafer, manufacturing apparatus of SiC epitaxial wafer, fabrication method of SiC epitaxial wafer, and semiconductor device
#84ALKYLAMINO-SUBSTITUTED HALOCARBOSILANE PRECURSORS
#85Silicide alloy film for semiconductor device electrode, and production method for silicide alloy film
#86COBALT COMPOUNDS, METHOD OF MAKING AND METHOD OF USE THEREOF
#87DISUBSTITUTED ALKYNE DICOBALT HEXACARBONYL COMPOUNDS, METHOD OF MAKING AND METHOD OF USE THEREOF
#88Method for forming amorphous thin film
#89MULTI-COMPOSITION FIBER WITH REFRACTORY ADDITIVE(S) AND METHOD OF MAKING
#90Methods for depositing tungsten on halosilane based metal silicide nucleation layers
#91PRODUCTION METHOD OF NUCLEAR REACTOR STRUCTURE
#92Method for manufacturing SiC epitaxial wafer by simultaneously utilizing an N-based gas and a CI-based gas, and SiC epitaxial growth apparatus
#93Method for manufacturing a part coated with a protective coating
#94STATIC THERMAL CHEMICAL VAPOR DEPOSITION WITH LIQUID PRECURSOR
#95CASTING SYSTEM FOR INVESTMENT CASTING PROCESS
#96COATING STRUCTURE, HEAT EXCHANGER, AND METHOD FOR MANUFACTURING HEAT EXCHANGER
#97Deposition of metal borides and silicides
#98COMPONENT OF A MOLYBDENUM ALLOY AND METHOD FOR FORMING AN OXIDATION PROTECTION LAYER THEREFOR
#99Methods for depositing fluorine/carbon-free conformal tungsten
#100Gas barrier multilayer film
#101Organometallic complex, light-emitting element, light-emitting device, electronic device, and lighting device
#102LAMINATE FILM, ORGANIC ELECTROLUMINESCENT DEVICE, PHOTOELECTRIC CONVERSION DEVICE, AND LIQUID CRYSTAL DISPLAY
#103Vanadium-containing film forming compositions and vapor deposition of vanadium-containing films
#104TANTALUM-CONTAINING FILM FORMING COMPOSITIONS AND VAPOR DEPOSITION OF TANTALUM-CONTAINING FILMS
#105Chemical vapor deposition process for depositing a silica coating on a glass substrate
#106Method for producing nickel thin film on a Si substrate by chemical vapor deposition method, and method for producing Ni silicide thin film on Si substrate
#107Metal silicide formation through an intermediate metal halogen compound
#108Laminate film, organic electroluminescence device, photoelectric conversion device, and liquid crystal display
#109Manganese-containing film forming compositions, their synthesis, and use in film deposition
#110Methods for forming a metal silicide interconnection nanowire structure
#111Cobalt-containing film forming compositions, their synthesis, and use in film deposition
#112Wear resistant vapor deposited coating, method of coating deposition and applications therefor
#113Cobalt-containing compounds, their synthesis, and use in cobalt-containing film deposition
#114Silicon carbide semiconductor device manufacturing method and silicon carbide semiconductor device
#115GAS CLUSTER REACTOR FOR ANISOTROPIC FILM GROWTH
#116Cobalt-containing compounds, their synthesis, and use in cobalt-containing film deposition
#117Method of manufacturing semiconductor device, using hydrocarbon and halogen-based precursors, substrate processing apparatus for processing same, and recording medium comprising hydrocarbon and halogen-based precursors
#118Low Emissivity Glass Incorporating Phosphorescent Rare Earth Compounds
#119Electropositive metal containing layers for semiconductor applications
#120Chemical vapor deposition process for depositing a silica coating on a glass substrate
#121METHOD FOR FORMING MANGANESE-CONTAINING FILM
#122PECVD microcrystalline silicon germanium (SiGe)
#123Deposition on two sides of a web
#124Low temperature migration enhanced Si-Ge epitaxy with plasma assisted surface activation
#125Composite coatings and methods therefor
#126Methods for depositing films comprising cobalt and cobalt nitrides
#127Nickel bis diazabutadiene precursors, their synthesis, and their use for nickel containing films depositions
#128Structure including thin primer film and method of producing said structure
#129Alkoxysilylamine compounds and applications thereof
#130NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors
#131Advanced high temperature and fatigue resistant environmental barrier coating bond coat systems for SiC/SiC ceramic matrix composites
#132Electropositive metal containing layers for semiconductor applications
#133Methods for depositing an epitaxial silicon germanium layer having a germanium to silicon ratio greater than 1:1 using silylgermane and a diluent
#134Charged particle beam apparatus, thin film forming method, defect correction method and device forming method
#135Method of forming conformal metal silicide films
#136Low temperature migration enhanced Si-Ge epitaxy with plasma assisted surface activation
#137Heteroleptic pyrrolecarbaldimine precursors
#138Heteroleptic pyrrolecarbaldimine precursors
#139Process for forming cobalt-containing materials
#140ATOMIC LAYER DEPOSITION OF SUPER-CONDUCTING NIOBIUM SILICIDE
#141Process for forming cobalt and cobalt silicide materials in tungsten contact applications
#142METAL SILICIDE FILM FORMING METHOD
#143Wear resistant vapor deposited coating, method of coating deposition and applications therefor
#144NMOS metal gate materials, manufacturing methods, and equipment using CVD and ALD processes with metal based precursors
#145Apparatus for Deposition on Two Sides of the Web
#146PROCESS FOR FORMING COBALT-CONTAINING MATERIALS
#147ARTICLE FOR HIGH TEMPERATURE SERVICE
#148Process for forming cobalt and cobalt silicide materials in tungsten contact applications
#149Thin film of metal-silicon compound and process for producing the thin film of the metal-silicon compound
#150NICKEL-CONTAINING FILM-FORMING MATERIAL AND PROCESS FOR PRODUCING NICKEL-CONTAINING FILM
#151METHOD FOR FORMING W-BASED FILM, METHOD FOR FORMING GATE ELECTRODE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#152Apparatus for crystal growth
#153FILM FORMING METHOD AND FILM FORMING APPARATUS
#154Semiconductor device including an ohmic layer
#155Plasma-enhanced cyclic layer deposition process for barrier layers
#156SEQUENTIAL FLOW DEPOSITION OF A TUNGSTEN SILICIDE GATE ELECTRODE FILM
#157Semiconductor device
#158Process for producing silicon compound
#159Vapor deposition of tungsten materials
#160Cobalt deposition on barrier surfaces
#161Methods and apparatuses promoting adhesion of dielectric barrier film to copper
#162PROCESS FOR FORMING COBALT AND COBALT SILICIDE MATERIALS IN TUNGSTEN CONTACT APPLICATIONS
#163PROCESS FOR FORMING COBALT AND COBALT SILICIDE MATERIALS IN COPPER CONTACT APPLICATIONS
#164Organometallic compounds and their use as precursors for forming films and powders of metal or metal derivatives
#165GeSiSn-based compounds, templates, and semiconductor structures
#166Systems and methods of forming tantalum silicide layers
#167Wear resistant vapor deposited coating, method of coating deposition and applications therefor
#168Process for forming cobalt-containing materials
#169Method of forming tungsten silicide layer and method of fabricating semiconductor element using same
#170Plasma-enhanced cyclic layer deposition process for barrier layers
#171Method of forming a semiconductor device including an ohmic layer
#172Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers
#173Plasma enhanced chemical vapor deposition method of forming titanium silicide comprising layers
#174In-situ thin-film deposition method
#175Apparatus and method for plasma assisted deposition
#176Film forming method
#177Film forming method
#178Film forming method
#179Film forming method
#180Systems and methods of forming tantalum silicide layers
#181Film forming method
#182Semiconductor substrate
#183Method of making iron silicide and method of making photoelectric transducer
#184Integration of titanium and titanium nitride layers
#185Method for depositing thin film and thin film deposition system having separate jet orifices for spraying purge gas
#186Atomic layer deposition of hafnium-based high-k dielectric
#187Methods and apparatuses promoting adhesion of dielectric barrier film to copper
#188Film formation method and apparatus for semiconductor process
#189Method of fabricating an epitaxial silicon-germanium layer and an integrated semiconductor device comprising an epitaxial arsenic in-situ doped silicon-germanium layer
#190Methods of forming conductive metal silicides by reaction of metal with silicon
#191Plasma enhanced chemical vapor deposition method of forming a titanium silicide comprising layer
#192Film forming material, film forming method, and silicide film
#193Chemistry for chemical vapor deposition of titanium containing films