120198 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating Acoustic wave CVD
Crystalline semiconductor film, plate-like body and semiconductor device
#2MIST COATING FORMING APPARATUS AND MIST COATING FORMING METHOD
#3ENHANCING GAS-PHASE REACTION IN A PLASMA USING HIGH INTENSITY AND HIGH POWER ULTRASONIC ACOUSTIC WAVES
#4Surface mechanical attrition treatment (SMAT) methods and systems for modifying nanostructures
#5Crystalline semiconductor film, plate-like body and semiconductor device
#6Surface mechanical attrition treatment (SMAT) methods and systems for modifying nanostructures
#7Systems and methods for enhancing mobility of atomic or molecular species on a substrate at reduced bulk temperature using acoustic waves, and structures formed using same
#8Systems and methods for enhancing mobility of atomic or molecular species on a substrate at reduced bulk temperature using acoustic waves, and structures formed using same
#9SUBSTRATE TREATING APPARATUS
#10ENHANCING GAS-PHASE REACTION IN A PLASMA USING HIGH INTENSITY AND HIGH POWER ULTRASONIC ACOUSTIC WAVES
#11Enhancing plasma surface modification using high intensity and high power ultrasonic acoustic waves
#12Method of fabrication of fibers, textiles and composite materials