ClassID:

120204

C23C16/4482 - CPC Classification

Classification description:

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material

Recent Application in this class:
#1
20260130155
2026-05-07

FLUID CONTROL DEVICE AND SUBSTRATE PROCESSING APPARATUS

#2
20250105001
2025-03-27

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM

#3
20250105000
2025-03-27

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM

#4
20250011933
2025-01-09

LAMINATE MANUFACTURING APPARATUS AND SELF-ASSEMBLED MONOLAYER FORMATION METHOD

#5
20240360555
2024-10-31

PRECURSOR CONTAINER APPARATUS

#6
20240328522
2024-10-03

FLUID CONTROL DEVICE AND SUBSTRATE PROCESSING APPARATUS

#7
20240279803
2024-08-22

CHEMICAL SUPPLY DEVICE AND CHEMICAL SUPPLY SYSTEM INCLUDING THE SAME

#8
20240274435
2024-08-15

METHOD AND APPARATUS FOR MANUFACTURING A SEMICONDUCTOR LAYER AND SUBSTRATE PROVIDED THEREWITH

#9
20240209495
2024-06-27

DEPOSITION SYSTEM AND PROCESSING SYSTEM

#10
20240207838
2024-06-27

AMPOULE FOR A SEMICONDUCTOR MANUFACTURING PRECURSOR

#11
20240199433
2024-06-20

NON-METALLIC HIGH-ENTROPY COMPOUND, AND PREPARATION METHOD AND USE THEREOF

#12
20240071750
2024-02-29

Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium

#13
20230411484
2023-12-21

SEMICONDUCTOR ELECTRONIC DEVICES INCLUDING SIDEWALL BARRIER LAYERS AND METHODS OF FABRICATING THE SAME

#14
20230290963
2023-09-14

MANUFACTURING METHOD OF ELECTRODE FOR ELECTROCHEMICAL REACTION, ELECTRODE FOR ELECTROCHEMICAL REACTION MANUFACTURED THEREFROM AND REVERSE ELECTRODIALYSIS ELECTRIC GENERATING DEVICE

#15
20230257878
2023-08-17

Concentration control using a bubbler

#16
20230243030
2023-08-03

METHOD OF GROWING MONOLAYER TRANSITION METAL DICHALCOGENIDES VIA SULFURIZATION AND SUBSEQUENT SUBLIMATION

#17
20230242453
2023-08-03

Method for depositing a coating on a yarn in a microwave field

#18
20230212787
2023-07-06

METALORGANIC CHEMICAL VAPOR PHASE EPITAXY OR VAPOR PHASE DEPOSITION APPARATUS

#19
20230141275
2023-05-11

Moisture governed growth method of atomic layer ribbons and nanoribbons of transition metal dichalcogenides

#20
20220415653
2022-12-29

METHOD FOR MANUFACTURING A COMPOSITE STRUCTURE COMPRISING A THIN LAYER OF MONOCRYSTALLINE SIC ON AN SIC CARRIER SUBSTRATE

#21
20220403512
2022-12-22

Bottom fed sublimation bed for high saturation efficiency in semiconductor applications

#22
20220049348
2022-02-17

Method of manufacturing oxide crystal thin film

#23
20220033962
2022-02-03

DEPOSITION SYSTEM AND PROCESSING SYSTEM

#24
20210381104
2021-12-09

Apparatus and methods for controlling concentration of precursors to processing chamber

#25
20210346851
2021-11-11

LIQUID PRECURSOR BUBBLER

#26
20210324515
2021-10-21

Moisture governed growth method of atomic layer ribbons and nanoribbons of transition metal dichalcogenides

#27
20210249256
2021-08-12

Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium

#28
20210072731
2021-03-11

Device and method for obtaining information about layers deposited in a CVD method

#29
20210066070
2021-03-04

Method and apparatus for manufacturing a semiconductor layer and substrate provided therewith

#30
20200294820
2020-09-17

Concentration control apparatus, source consumption quantity estimation method, and program recording medium on which a program for a concentration control apparatus is recorded

#31
20200294788
2020-09-17

Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium

#32
20190211449
2019-07-11

Substrate processing apparatus, liquid precursor replenishment system, and method of manufacturing semiconductor device

#33
20190161400
2019-05-30

Process for depositing a layer

#34
20190112703
2019-04-18

METHOD OF MANUFACTURING OXIDE CRYSTAL THIN FILM

#35
20180371419
2018-12-27

Method of fabricating substrate for culturing stem cell

#36
20180347038
2018-12-06

Elimination of H2S in immersion tin plating solution

#37
20180334744
2018-11-22

EVAPORATION VESSEL APPARATUS AND METHOD

#38
20180258530
2018-09-13

Gas control system, deposition apparatus including gas control system, and program and gas control method used for gas control system

#39
20180163307
2018-06-14

Temperature control system and process for gaseous precursor delivery

#40
20180023195
2018-01-25

Method to improve precursor utilization in pulsed atomic layer processes

#41
20170327945
2017-11-16

Delivery container with flow distributor

#42
20170327944
2017-11-16

ALUMINUM PRECURSORS FOR THIN-FILM DEPOSITION, PREPARATION METHOD AND USE THEREOF

#43
20170306485
2017-10-26

Solid precursor delivery method using liquid solvent for thin film deposition

#44
20170298510
2017-10-19

Organodisilane precursors for ALD/CVD silicon-containing film applications

#45
20170263439
2017-09-14

Method of manufacturing semiconductor device, substrate processing apparatus and recording medium

#46
20170168036
2017-06-15

System and method for determining a concentration of a constituent gas in a gas stream using pressure measurements

#47
20170167027
2017-06-15

Material delivery system and method

#48
20170145564
2017-05-25

VAPOR DELIVERY SYSTEM

#49
20170125675
2017-05-04

Method for vapor-phase growth of phase-change thin film, and device for vapor-phase growth of phase-change thin film

#50
20170121814
2017-05-04

Apparatus and Method for Delivering a Gaseous Precursor to a Reaction Chamber

#51
20170101715
2017-04-13

Gas control system and program for gas control system

#52
20170069489
2017-03-09

Process of preparing low dielectric constant thin film layer used in integrated circuit

#53
20170058400
2017-03-02

Method and device for continuously supplying a precursor

#54
20160305019
2016-10-20

Vessel and method for delivery of precursor materials

#55
20160293409
2016-10-06

Preparation of lanthanide-containing precursors and deposition of lanthanide-containing films

#56
20160265113
2016-09-15

Evaporation vessel apparatus and method

#57
20160230933
2016-08-11

Refillable ampoule with purge capability

#58
20160130727
2016-05-12

Continuous distillation trichlorosilane vaporization supply apparatus

#59
20160097121
2016-04-07

Methods of vapor deposition with multiple vapor sources

#60
20160090651
2016-03-31

SUBSTRATE PROCESSING APPARATUS

#61
20160052772
2016-02-25

Methods and apparatus for liquid chemical delivery

#62
20160017489
2016-01-21

Method for supplying a process with an enriched carrier gas

#63
20150322567
2015-11-12

Raw material vaporization and supply apparatus

#64
20150279659
2015-10-01

VAPOR PHASE GROWTH APPARATUS AND VAPOR PHASE GROWTH METHOD

#65
20150276264
2015-10-01

Systems and methods for bulk vaporization of precursor

#66
20150246329
2015-09-03

Processing gas generating apparatus, processing gas generating method, substrate processing method, and storage medium

#67
20150225843
2015-08-13

Method of manufacturing oxide crystal thin film

#68
20150211126
2015-07-30

DIRECT LIQUID INJECTION OF SOLUTION BASED PRECURSORS FOR ATOMIC LAYER DEPOSITION

#69
20150203962
2015-07-23

Delivery device, methods of manufacture thereof and articles comprising the same

#70
20140299206
2014-10-09

Raw material vaporizing and supplying apparatus equipped with raw material concentration

#71
20140295084
2014-10-02

Tris(dialkylamide)aluminum compound, and method for producing aluminum-containing thin film using same

#72
20140193578
2014-07-10

Splashguard and Inlet Diffuser for High Vacuum, High Flow Bubbler Vessel

#73
20140191423
2014-07-10

Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel

#74
20140083512
2014-03-27

Refillable ampoule with purge capability

#75
20140041590
2014-02-13

Canister

#76
20130319015
2013-12-05

Compact ampoule thermal management system

#77
20130319013
2013-12-05

Compact ampoule thermal management system

#78
20130298834
2013-11-14

Liquid vaporizer

#79
20130203267
2013-08-08

Multiple vapor sources for vapor deposition

#80
20130152857
2013-06-20

Substrate Processing Fluid Delivery System and Method

#81
20130145988
2013-06-13

Substrate Processing Bubbler Assembly

#82
20130089934
2013-04-11

Material Delivery System and Method

#83
20120304935
2012-12-06

BUBBLER ASSEMBLY AND METHOD FOR VAPOR FLOW CONTROL

#84
20120288625
2012-11-15

GAS SUPPLY APPARATUS, THERMAL TREATMENT APPARATUS, GAS SUPPLY METHOD, AND THERMAL TREATMENT METHOD

#85
20120216712
2012-08-30

COMPOSITION AND METHOD FOR LOW TEMPERATURE DEPOSITION OF RUTHENIUM

#86
20120156373
2012-06-21

PREPARATION OF CERIUM-CONTAINING PRECURSORS AND DEPOSITION OF CERIUM-CONTAINING FILMS

#87
20120121807
2012-05-17

FILM DEPOSITION SYSTEM AND METHOD AND GAS SUPPLYING APPARATUS BEING USED THEREIN

#88
20120018037
2012-01-26

Device for supplying the liquid material inside a filling container and method of controlling the liquid level inside the filling container for said liquid material supply device

#89
20110268887
2011-11-03

PROCESS FOR REMOVING RESIDUAL WATER MOLECULES IN METALLIC-THIN-FILM PRODUCTION METHOD AND PURGE SOLVENT

#90
20110217466
2011-09-08

Apparatus and methods for chemical vapor deposition

#91
20110210142
2011-09-01

Diptube apparatus and delivery method

#92
20110197812
2011-08-18

APPARATUS AND METHOD FOR FABRICATING A PHASE-CHANGE MATERIAL LAYER

#93
20110171383
2011-07-14

Method for constant concentration evaporation and a device using the same

#94
20110104876
2011-05-05

Atmospheric pressure chemical vapor deposition method for producing an-N-semiconductive metal sulfide thin layer

#95
20110000554
2011-01-06

Raw material supply device

#96
20100285206
2010-11-11

Method and apparatus

#97
20100230834
2010-09-16

Bubbling supply system for stable precursor supply

#98
20100215853
2010-08-26

METHOD FOR CONTROLLING PROCESS GAS CONCENTRATION

#99
20100140120
2010-06-10

Container for precursors used in deposition processes

#100
20100117246
2010-05-13

Reagent dispensing apparatuses and delivery methods

#101
20100112215
2010-05-06

Chemical precursor ampoule for vapor deposition processes

#102
20100108153
2010-05-06

Material gas concentration control system

#103
20100063753
2010-03-11

Integrated vapor delivery systems for chemical vapor deposition precursors

#104
20100058954
2010-03-11

Novel Carbon-Modified Photocatalyst Films and Method for Producing Same

#105
20090305057
2009-12-10

Deposition process

#106
20090263257
2009-10-22

SYSTEM AND METHOD FOR DELIVERY OF PRECURSOR MATERIAL

#107
20090258143
2009-10-15

REAGENT DISPENSING APPARATUS AND DELIVERY METHOD

#108
20090255466
2009-10-15

REAGENT DISPENSING APPARATUS AND DELIVERY METHOD

#109
20090223441
2009-09-10

HIGH VOLUME DELIVERY SYSTEM FOR GALLIUM TRICHLORIDE

#110
20090214858
2009-08-27

Magnesium oxide coated glass article and a method for depositing magnesium oxide coatings on flat glass

#111
20090191338
2009-07-30

Film-Deposition Apparatus and Film-Deposition Method

#112
20090186481
2009-07-23

Method for integrating selective low-temperature ruthenium deposition into copper metallization of a semiconductor device

#113
20090162551
2009-06-25

Hafnium oxide ALD process

#114
20090151633
2009-06-18

Method and apparatus for generating a precursor for a semiconductor processing system

#115
20090133632
2009-05-28

Safe liquid source containers

#116
20090114157
2009-05-07

Ampoule splash guard apparatus

#117
20090011129
2009-01-08

Method and apparatus for providing precursor gas to a processing chamber

#118
20090000740
2009-01-01

Vaporizer and processor

#119
20080216743
2008-09-11

Chemical precursor ampoule for vapor deposition processes

#120
20080213476
2008-09-04

Reagent dispensing apparatus and delivery method

#121
20080182425
2008-07-31

Bubbler apparatus and method for delivering vapor phase reagent to a deposition chamber

#122
20080182023
2008-07-31

Diptube apparatus and delivery method

#123
20080182010
2008-07-31

Bubbler apparatus and delivery method

#124
20080179767
2008-07-31

Apparatus and method for delivering vapor phase reagent to a deposition chamber

#125
20080178809
2008-07-31

Diptube apparatus and method for delivering vapor phase reagent to a deposition chamber

#126
20080149031
2008-06-26

Ampoule with a thermally conductive coating

#127
20080143002
2008-06-19

Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel

#128
20080050510
2008-02-28

Method for measuring precursor amounts in bubbler sources

#129
20080018004
2008-01-24

High Flow GaCl3 Delivery

#130
20080014350
2008-01-17

Apparatus and methods for chemical vapor deposition

#131
20070292612
2007-12-20

Metal-organic vaporizing and feeding apparatus, metal-organic chemical vapor deposition apparatus, metal-organic chemical vapor deposition method, gas flow rate regulator, semiconductor manufacturing apparatus, and semiconductor manufacturing method

#132
20070254100
2007-11-01

MOCVD reactor without metalorganic-source temperature control

#133
20070254093
2007-11-01

MOCVD reactor with concentration-monitor feedback

#134
20070221127
2007-09-27

Bubbler for constant vapor delivery of a solid chemical

#135
20070170604
2007-07-26

Safe liquid source containers

#136
20070166980
2007-07-19

Chemical vapor deposition chamber for depositing titanium silicon nitride films for forming phase change memory devices

#137
20070120275
2007-05-31

High stability and high capacity precursor vapor generation for thin film deposition

#138
20070119480
2007-05-31

Apparatus and method of supplying chemical solution

#139
20070110898
2007-05-17

Method and apparatus for providing precursor gas to a processing chamber

#140
20070089817
2007-04-26

Method for providing gas to a processing chamber

#141
20070079759
2007-04-12

Ampoule splash guard apparatus

#142
20070071908
2007-03-29

Staggered in-situ deposition and etching of a dielectric layer for HDP-CVD

#143
20070054472
2007-03-08

Apparatus for preparing oxide thin film and method for preparing the same

#144
20070054049
2007-03-08

Method of growing a thin film onto a substrate

#145
20070022953
2007-02-01

Source gas-supplying unit and chemical vapor deposition apparatus having the same

#146
20060257295
2006-11-16

Apparatus and method for generating a chemical precursor

#147
20060237861
2006-10-26

Bubbler for substrate processing

#148
20060213446
2006-09-28

Temperature control unit for bubblers

#149
20060188646
2006-08-24

System and method for detecting remaining amount of precursor in vessel during CVD process

#150
20060096541
2006-05-11

Apparatus and method of forming a layer on a semiconductor substrate

#151
20050189072
2005-09-01

Method and apparatus of generating PDMAT precursor

#152
20050183771
2005-08-25

Apparatus and process for refilling a bubbler

#153
20050156338
2005-07-21

Method for maintaining a constant level of fluid in a liquid vapor delivery system

#154
20050066893
2005-03-31

Safe liquid source containers

#155
20050061245
2005-03-24

Chemical vapor deposition apparatus

#156
20050032382
2005-02-10

Staggered in-situ deposition and etching of a dielectric layer for HDP CVD

#157
20050014366
2005-01-20

MOCVD apparatus and method