120204 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material by bubbling of carrier gas through liquid source material
FLUID CONTROL DEVICE AND SUBSTRATE PROCESSING APPARATUS
#2METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
#3METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
#4LAMINATE MANUFACTURING APPARATUS AND SELF-ASSEMBLED MONOLAYER FORMATION METHOD
#5PRECURSOR CONTAINER APPARATUS
#6FLUID CONTROL DEVICE AND SUBSTRATE PROCESSING APPARATUS
#7CHEMICAL SUPPLY DEVICE AND CHEMICAL SUPPLY SYSTEM INCLUDING THE SAME
#8METHOD AND APPARATUS FOR MANUFACTURING A SEMICONDUCTOR LAYER AND SUBSTRATE PROVIDED THEREWITH
#9DEPOSITION SYSTEM AND PROCESSING SYSTEM
#10AMPOULE FOR A SEMICONDUCTOR MANUFACTURING PRECURSOR
#11NON-METALLIC HIGH-ENTROPY COMPOUND, AND PREPARATION METHOD AND USE THEREOF
#12Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium
#13SEMICONDUCTOR ELECTRONIC DEVICES INCLUDING SIDEWALL BARRIER LAYERS AND METHODS OF FABRICATING THE SAME
#14MANUFACTURING METHOD OF ELECTRODE FOR ELECTROCHEMICAL REACTION, ELECTRODE FOR ELECTROCHEMICAL REACTION MANUFACTURED THEREFROM AND REVERSE ELECTRODIALYSIS ELECTRIC GENERATING DEVICE
#15Concentration control using a bubbler
#16METHOD OF GROWING MONOLAYER TRANSITION METAL DICHALCOGENIDES VIA SULFURIZATION AND SUBSEQUENT SUBLIMATION
#17Method for depositing a coating on a yarn in a microwave field
#18METALORGANIC CHEMICAL VAPOR PHASE EPITAXY OR VAPOR PHASE DEPOSITION APPARATUS
#19Moisture governed growth method of atomic layer ribbons and nanoribbons of transition metal dichalcogenides
#20METHOD FOR MANUFACTURING A COMPOSITE STRUCTURE COMPRISING A THIN LAYER OF MONOCRYSTALLINE SIC ON AN SIC CARRIER SUBSTRATE
#21Bottom fed sublimation bed for high saturation efficiency in semiconductor applications
#22Method of manufacturing oxide crystal thin film
#23DEPOSITION SYSTEM AND PROCESSING SYSTEM
#24Apparatus and methods for controlling concentration of precursors to processing chamber
#25LIQUID PRECURSOR BUBBLER
#26Moisture governed growth method of atomic layer ribbons and nanoribbons of transition metal dichalcogenides
#27Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium
#28Device and method for obtaining information about layers deposited in a CVD method
#29Method and apparatus for manufacturing a semiconductor layer and substrate provided therewith
#30Concentration control apparatus, source consumption quantity estimation method, and program recording medium on which a program for a concentration control apparatus is recorded
#31Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium
#32Substrate processing apparatus, liquid precursor replenishment system, and method of manufacturing semiconductor device
#33Process for depositing a layer
#34METHOD OF MANUFACTURING OXIDE CRYSTAL THIN FILM
#35Method of fabricating substrate for culturing stem cell
#36Elimination of H2S in immersion tin plating solution
#37EVAPORATION VESSEL APPARATUS AND METHOD
#38Gas control system, deposition apparatus including gas control system, and program and gas control method used for gas control system
#39Temperature control system and process for gaseous precursor delivery
#40Method to improve precursor utilization in pulsed atomic layer processes
#41Delivery container with flow distributor
#42ALUMINUM PRECURSORS FOR THIN-FILM DEPOSITION, PREPARATION METHOD AND USE THEREOF
#43Solid precursor delivery method using liquid solvent for thin film deposition
#44Organodisilane precursors for ALD/CVD silicon-containing film applications
#45Method of manufacturing semiconductor device, substrate processing apparatus and recording medium
#46System and method for determining a concentration of a constituent gas in a gas stream using pressure measurements
#47Material delivery system and method
#48VAPOR DELIVERY SYSTEM
#49Method for vapor-phase growth of phase-change thin film, and device for vapor-phase growth of phase-change thin film
#50Apparatus and Method for Delivering a Gaseous Precursor to a Reaction Chamber
#51Gas control system and program for gas control system
#52Process of preparing low dielectric constant thin film layer used in integrated circuit
#53Method and device for continuously supplying a precursor
#54Vessel and method for delivery of precursor materials
#55Preparation of lanthanide-containing precursors and deposition of lanthanide-containing films
#56Evaporation vessel apparatus and method
#57Refillable ampoule with purge capability
#58Continuous distillation trichlorosilane vaporization supply apparatus
#59Methods of vapor deposition with multiple vapor sources
#60SUBSTRATE PROCESSING APPARATUS
#61Methods and apparatus for liquid chemical delivery
#62Method for supplying a process with an enriched carrier gas
#63Raw material vaporization and supply apparatus
#64VAPOR PHASE GROWTH APPARATUS AND VAPOR PHASE GROWTH METHOD
#65Systems and methods for bulk vaporization of precursor
#66Processing gas generating apparatus, processing gas generating method, substrate processing method, and storage medium
#67Method of manufacturing oxide crystal thin film
#68DIRECT LIQUID INJECTION OF SOLUTION BASED PRECURSORS FOR ATOMIC LAYER DEPOSITION
#69Delivery device, methods of manufacture thereof and articles comprising the same
#70Raw material vaporizing and supplying apparatus equipped with raw material concentration
#71Tris(dialkylamide)aluminum compound, and method for producing aluminum-containing thin film using same
#72Splashguard and Inlet Diffuser for High Vacuum, High Flow Bubbler Vessel
#73Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel
#74Refillable ampoule with purge capability
#75Canister
#76Compact ampoule thermal management system
#77Compact ampoule thermal management system
#78Liquid vaporizer
#79Multiple vapor sources for vapor deposition
#80Substrate Processing Fluid Delivery System and Method
#81Substrate Processing Bubbler Assembly
#82Material Delivery System and Method
#83BUBBLER ASSEMBLY AND METHOD FOR VAPOR FLOW CONTROL
#84GAS SUPPLY APPARATUS, THERMAL TREATMENT APPARATUS, GAS SUPPLY METHOD, AND THERMAL TREATMENT METHOD
#85COMPOSITION AND METHOD FOR LOW TEMPERATURE DEPOSITION OF RUTHENIUM
#86PREPARATION OF CERIUM-CONTAINING PRECURSORS AND DEPOSITION OF CERIUM-CONTAINING FILMS
#87FILM DEPOSITION SYSTEM AND METHOD AND GAS SUPPLYING APPARATUS BEING USED THEREIN
#88Device for supplying the liquid material inside a filling container and method of controlling the liquid level inside the filling container for said liquid material supply device
#89PROCESS FOR REMOVING RESIDUAL WATER MOLECULES IN METALLIC-THIN-FILM PRODUCTION METHOD AND PURGE SOLVENT
#90Apparatus and methods for chemical vapor deposition
#91Diptube apparatus and delivery method
#92APPARATUS AND METHOD FOR FABRICATING A PHASE-CHANGE MATERIAL LAYER
#93Method for constant concentration evaporation and a device using the same
#94Atmospheric pressure chemical vapor deposition method for producing an-N-semiconductive metal sulfide thin layer
#95Raw material supply device
#96Method and apparatus
#97Bubbling supply system for stable precursor supply
#98METHOD FOR CONTROLLING PROCESS GAS CONCENTRATION
#99Container for precursors used in deposition processes
#100Reagent dispensing apparatuses and delivery methods
#101Chemical precursor ampoule for vapor deposition processes
#102Material gas concentration control system
#103Integrated vapor delivery systems for chemical vapor deposition precursors
#104Novel Carbon-Modified Photocatalyst Films and Method for Producing Same
#105Deposition process
#106SYSTEM AND METHOD FOR DELIVERY OF PRECURSOR MATERIAL
#107REAGENT DISPENSING APPARATUS AND DELIVERY METHOD
#108REAGENT DISPENSING APPARATUS AND DELIVERY METHOD
#109HIGH VOLUME DELIVERY SYSTEM FOR GALLIUM TRICHLORIDE
#110Magnesium oxide coated glass article and a method for depositing magnesium oxide coatings on flat glass
#111Film-Deposition Apparatus and Film-Deposition Method
#112Method for integrating selective low-temperature ruthenium deposition into copper metallization of a semiconductor device
#113Hafnium oxide ALD process
#114Method and apparatus for generating a precursor for a semiconductor processing system
#115Safe liquid source containers
#116Ampoule splash guard apparatus
#117Method and apparatus for providing precursor gas to a processing chamber
#118Vaporizer and processor
#119Chemical precursor ampoule for vapor deposition processes
#120Reagent dispensing apparatus and delivery method
#121Bubbler apparatus and method for delivering vapor phase reagent to a deposition chamber
#122Diptube apparatus and delivery method
#123Bubbler apparatus and delivery method
#124Apparatus and method for delivering vapor phase reagent to a deposition chamber
#125Diptube apparatus and method for delivering vapor phase reagent to a deposition chamber
#126Ampoule with a thermally conductive coating
#127Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel
#128Method for measuring precursor amounts in bubbler sources
#129High Flow GaCl3 Delivery
#130Apparatus and methods for chemical vapor deposition
#131Metal-organic vaporizing and feeding apparatus, metal-organic chemical vapor deposition apparatus, metal-organic chemical vapor deposition method, gas flow rate regulator, semiconductor manufacturing apparatus, and semiconductor manufacturing method
#132MOCVD reactor without metalorganic-source temperature control
#133MOCVD reactor with concentration-monitor feedback
#134Bubbler for constant vapor delivery of a solid chemical
#135Safe liquid source containers
#136Chemical vapor deposition chamber for depositing titanium silicon nitride films for forming phase change memory devices
#137High stability and high capacity precursor vapor generation for thin film deposition
#138Apparatus and method of supplying chemical solution
#139Method and apparatus for providing precursor gas to a processing chamber
#140Method for providing gas to a processing chamber
#141Ampoule splash guard apparatus
#142Staggered in-situ deposition and etching of a dielectric layer for HDP-CVD
#143Apparatus for preparing oxide thin film and method for preparing the same
#144Method of growing a thin film onto a substrate
#145Source gas-supplying unit and chemical vapor deposition apparatus having the same
#146Apparatus and method for generating a chemical precursor
#147Bubbler for substrate processing
#148Temperature control unit for bubblers
#149System and method for detecting remaining amount of precursor in vessel during CVD process
#150Apparatus and method of forming a layer on a semiconductor substrate
#151Method and apparatus of generating PDMAT precursor
#152Apparatus and process for refilling a bubbler
#153Method for maintaining a constant level of fluid in a liquid vapor delivery system
#154Safe liquid source containers
#155Chemical vapor deposition apparatus
#156Staggered in-situ deposition and etching of a dielectric layer for HDP CVD
#157MOCVD apparatus and method