Patents-Review.com
ClassID:

120205 ⎘

C23C16/4483 - CPC Classification

Classification description:

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material using a porous body

Recent Application in this class:
#1
20250034703
2025-01-30

PRECURSOR DELIVERY VESSEL, PRECURSOR DELIVERY SYSTEM, AND PRECURSOR DEPOSITION APPARATUS

 #2
20250027199
2025-01-23

SEMICONDUCTOR CHEMICAL PRECURSOR WITH GAS PASSAGES

 #3
20230220553
2023-07-13

DEVICE AND METHOD FOR EVAPORATING AN ORGANIC POWDER

 #4
20230128048
2023-04-27

CANISTER OF SEMICONDUCTOR PRODUCT DEVICE

 #5
20220064786
2022-03-03

Solid vaporization/supply system of metal halide for thin film deposition

 #6
20210292900
2021-09-23

Precursor supply unit, substrate processing system, and method of fabricating semiconductor device using the same

 #7
20210207266
2021-07-08

Vaporizer

 #8
20210054504
2021-02-25

Film-forming material mixed-gas forming device and film forming device

 #9
20190161358
2019-05-30

Titanium-containing film forming compositions for vapor deposition of titanium-containing films

 #10
20190055649
2019-02-21

Precursor supply unit, substrate processing system, and method of fabricating semiconductor device using the same

 #11
20190032206
2019-01-31

Modular tray ampoule

 #12
20180148836
2018-05-31

Apparatus and method for generating a vapor for a CVD or PVD device

 #13
20170342557
2017-11-30

Solid vaporizer

 #14
20170029946
2017-02-02

Method and apparatus to help promote contact of gas with vaporized material

 #15
20160007410
2016-01-07

Device for generating vapor from solid or liquid starting material for CVD or PVD apparatus

 #16
20150337436
2015-11-26

Method and apparatus to help promote contact of gas with vaporized material

 #17
20150240355
2015-08-27

Vaporizer unit with open cell core and method of operating

 #18
20150218696
2015-08-06

METHOD AND APPARATUS TO HELP PROMOTE CONTACT OF GAS WITH VAPORIZED MATERIAL

 #19
20130105483
2013-05-02

APPARATUS FOR SUBLIMATING SOLID STATE PRECURSORS

 #20
20130084059
2013-04-04

Vaporizer

 #21
20120266967
2012-10-25

Solid precursor delivery assemblies and related methods

 #22
20120153048
2012-06-21

Method and apparatus to help promote contact of gas with vaporized material

 #23
20120148743
2012-06-14

Method and apparatus for depositing LED organic film

 #24
20120034378
2012-02-09

Delivery device and method of use thereof

 #25
20110262624
2011-10-27

Method and apparatus for depositing LED organic film

 #26
20110076402
2011-03-31

System for controlling the sublimation of reactants

 #27
20110052482
2011-03-03

Method and apparatus to help promote contact of gas with vaporized material

 #28
20100107978
2010-05-06

Deposition from liquid sources

 #29
20090136668
2009-05-28

Method and apparatus to help promote contact of gas with vaporized material

 #30
20080274276
2008-11-06

Method for controlling the sublimation of reactants

 #31
20080121182
2008-05-29

APPARATUS OF SUPPLYING ORGANOMETALLIC COMPOUND

 #32
20070166966
2007-07-19

Deposition from liquid sources

 #33
20060216419
2006-09-28

Sublimation bed employing carrier gas guidance structures

 #34
20060160370
2006-07-20

Solid material gasification method

 #35
20060115585
2006-06-01

Method and apparatus for depositing LED organic film

 #36
20060051940
2006-03-09

Deposition from liquid sources

 #37
20060024439
2006-02-02

System for controlling the sublimation of reactants

 #38
20050072357
2005-04-07

Sublimation bed employing carrier gas guidance structures

 #39
15704151
2018-12-04

Turbulent flow spiral multi-zone precursor vaporizer