120208 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by using a condenser
METHODS AND SYSTEM FOR PRECURSOR RECYCLING
#2SEMICONDUCTOR MANUFACTURING APPARATUS AND A METHOD FOR MANUFACTURING OF A SEMICONDUCTOR
#3LIQUID PRECURSOR RECOVERY MODULE
#4Chemical delivery system and method of operating the chemical delivery system
#5Chemical delivery system and method of operating the chemical delivery system
#6Apparatus and method for generating a vapor for a CVD or PVD device
#7Method and apparatus for generating a precursor for a semiconductor processing system
#8Method and apparatus for providing precursor gas to a processing chamber
#9Chemical precursor ampoule for vapor deposition processes
#10Method and apparatus for providing precursor gas to a processing chamber
#11Method for providing gas to a processing chamber
#12Apparatus and method for generating a chemical precursor
#13Method and apparatus of generating PDMAT precursor