120209 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by generation of reactive gas by chemical or electrochemical reaction
METHOD FOR TUNGSTEN-BASED THIN FILM DEPOSITION VIA FABRICATION AND DECOMPOSITION OF PRECURSOR METASTABLE COMPLEXES (MOLECULAR SPECIES)
#2BINARY-OXIDE VAPOR SOURCE AND METHOD AND SYSTEM FOR USING SAME
#3MICROWAVE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION DEVICE
#4METHOD OF FORMING A LAYER OF A COMPOUND
#5HALIDOSILANE COMPOUNDS AND COMPOSITIONS AND PROCESSES FOR DEPOSITING SILICON-CONTAINING FILMS USING SAME
#6ALKOXYSILACYCLIC OR ACYLOXYSILACYCLIC COMPOUNDS AND METHODS FOR DEPOSITING FILMS USING SAME
#7Methods and Apparatuses for Fabricating Polymeric Conformal Coatings, Parts Coated With Polymeric Conformal Coatings, and Optical Apparatus Including Said Parts
#8METHOD FOR COATING A COMPONENT
#9Method of forming coating layer of which composition can be controlled
#10Apparatus and method for manufacturing hexagonal silicon crystal
#11DEPOSITION PROCESS USING ADDITIONAL CHLORIDE-BASED PRECURSORS
#12Method for producing N-doped carbon nanomesh
#13Processes for depositing silicon-containing films using halidosilane compounds and compositions
#14Process for thin film deposition through controlled formation of vapor phase transient species
#15Fluorine-free tungsten deposition process employing in-situ oxidation and apparatuses for effecting the same
#16Method for growing beta-GaO-based single crystal film, and crystalline layered structure
#17HOT FILAMENT CVD DEVICE
#18Increased deposition efficiency via dual reactor system
#19HOT FILAMENT CVD DEVICE
#20METHODS AND SYSTEMS FOR PRODUCING STRUCTURED CARBON MATERIALS IN A MICROGRAVITY ENVIRONMENT
#21Method for producing GaN crystal
#22Process for thin film deposition through controlled formation of vapor phase transient species
#23CRACKING DEVICE AND DEPOSITION APPARATUS INCLUDING THE SAME
#24Method for forming RuSi film and substrate processing system
#25Alkoxysilacyclic or acyloxysilacyclic compounds and methods for depositing films using same
#26Method and system for preparing polycrystalline group III metal nitride
#27Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber
#28Method for applying a carbon layer to a substrate comprising introducing a process gas into a deposition chamber via a gas inlet and gas activation element
#29Vapor-liquid reaction device, reaction tube, film forming apparatus
#30Processes for depositing silicon-containing films using halidosilane compounds
#31Deposition apparatus and deposition method
#32Forming iron nitride hard magnetic materials using chemical vapor deposition or liquid phase epitaxy
#33LOW TEMPERATURE IN-SITU CLEANING METHOD FOR EPI-CHAMBERS
#34Apparatus for depositing chalcogenide thin films
#35Method and system for preparing polycrystalline group III metal nitride
#36Multilayer structure incorporating a mat of carbon nanotubes as diffusion layer in a PEMFC
#37Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber
#38Method for producing GaN crystal
#39METHOD AND SYSTEM FOR PREPARING POLYCRYSTALLINE GROUP III METAL NITRIDE
#40Chain component and chain
#41Forming iron nitride hard magnetic materials using chemical vapor deposition or liquid phase epitaxy
#42HYDROCHLORINATION REACTOR
#43Heat-resistant composite material production method and production device
#44Method and apparatus for forming thin oxide film
#45Method for producing group III nitride crystal, group III nitride crystal, semiconductor device and apparatus for producing group III nitride crystal
#46Method for preparing a molybdenum disulfide film used in a field emission device
#47Deposition method and method of manufacturing a catalyst wire for a catalytic chemical vapor deposition apparatus
#48Magnetic material including α″-Fe(NZ)or a mixture of α″-FeZand α″-FeN, where Z includes at least one of C, B, or O
#49CARBON NANO-TUBE PRODUCTION FROM CARBON DIOXIDE
#50TEMPERATURE MANAGEMENT IN CHLORINATION PROCESSES AND SYSTEMS RELATED THERETO
#51Divided electrochemical cell and low cost high purity hydride gas production process
#52Solid gasification apparatus
#53ZnO film production system and production method using ZnO film production system having heating units and control device
#54METHOD AND SYSTEM OF PROVIDING DOPANT CONCENTRATION CONTROL IN DIFFERENT LAYERS OF A SEMICONDUCTOR DEVICE
#55Radical reactor with inverted orientation
#56PLASMA PROCESSING APPARATUS AND METHOD OF PERFORMING PLASMA PROCESS
#57Filament temperature derivation in hotwire semiconductor process
#58Method of depositing material
#59Localized atmospheric laser chemical vapor deposition
#60Apparatus for forming thin film
#61Plasma generation for thin film deposition on flexible substrates
#62METHOD AND DEVICE FOR DEPOSITING SILICON ON A SUBSTRATE
#63Hot-wire method for depositing semiconductor material on a substrate and device for performing the method
#64Method of manufacturing semiconductor device, substrate processing method and substrate processing apparatus
#65EVAPORATION APPARATUS
#66Method for fabricating two dimensional nanostructured tungsten carbide
#67Method for producing gallium trichloride gas and method for producing nitride semiconductor crystal
#68APPARATUS FOR SUBLIMATING SOLID STATE PRECURSORS
#69Multiple complementary gas distribution assemblies
#70Method of forming organic film
#71APPARATUS AND METHOD FOR HVPE PROCESSING USING A PLASMA
#72Semiconductor transistor
#73PLASMA ASSISTED HVPE CHAMBER DESIGN
#74MOCVD FABRICATION OF GROUP III-NITRIDE MATERIALS USING IN-SITU GENERATED HYDRAZINE OR FRAGMENTS THERE FROM
#75Process for the vapor phase aluminization of a turbomachine metal part and donor liner and turbomachine vane comprising such a liner
#76Film forming method and storage medium
#77Process for depositing ceramic or organoceramic material on a substrate
#78Method and apparatus for achieving maximum yield in the electrolytic preparation of group IV and V hydrides
#79Method of depositing material
#80CATALYTIC CVD EQUIPMENT, METHOD FOR FORMATION OF FILM, AND PROCESS FOR PRODUCTION OF SOLAR CELL
#81Thermoelectric module and method of sealing the same
#82Systems for forming semiconductor materials by atomic layer deposition
#83Methods for enhancing tantalum filament life in hot wire chemical vapor deposition processes
#84Systems and methods for forming semiconductor materials by atomic layer deposition
#85Thermalizing gas injectors for generating increased precursor gas, material deposition systems including such injectors, and related methods
#86Processing apparatus
#87METHOD AND APPARATUS FOR SILICON REFINEMENT
#88Apparatus and Method for Coating Internal Surfaces of a Turbine Engine Component
#89Film-forming method and film-forming apparatus
#90Catalytic Chemical Vapor Deposition Apparatus
#91Film forming apparatus and film-forming method
#92Chemical vapor deposition reactor for depositing layers made of a reaction gas mixture onto workpieces
#93Metal halide reactor deposition method
#94POINT-OF-USE SILYLAMINE GENERATION
#95Mixed source growth apparatus and method of fabricating III-nitride ultraviolet emitters
#96Fabrication method and fabrication apparatus of group III nitride crystal substance
#97Method of Manufacturing Solar Cell Device and Solar Cell Device
#98Method for growth of nitrogen face (N-face) polarity compound nitride semiconductor device with integrated processing system
#99Indium surfactant assisted HVPE of high quality gallium nitride and gallium nitride alloy films
#100Film forming method and film forming apparatus
#101METHOD OF FORMING IN-SITU PRE-GaN DEPOSITION LAYER IN HVPE
#102METHOD FOR PREPARING A DEPOSITION FROM A VAPOUR
#103HVPE SHOWERHEAD DESIGN
#104In situ generation of RuO4 for ALD of Ru and Ru related materials
#105Monomolecular carbon-based film for forming lubricious surface on aircraft parts
#106Monomolecular carbon-based film for enhancing electrical power transmission
#107ALD APPARATUS AND METHOD
#108Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
#109COATING FOR GAS TURBINE COMPONENTS, AND METHOD AND DEVICE FOR PROVIDING A COATING
#110Etching method, method for producing dielectric film of low dielectric constant, method for producing porous member, etching system and thin film forming equipment
#111METAL FILM PRODUCTION APPARATUS AND METAL FILM PRODUCTION METHOD
#112BARRIER METAL FILM PRODUCTION APPARATUS, BARRIER METAL FILM PRODUCTION METHOD, METAL FILM PRODUCTION METHOD, AND METAL FILM PRODUCTION APPARATUS
#113METHOD AND APPARATUS FOR PRODUCTION OF METAL FILM OR THE LIKE
#114METHOD AND DEVICES FOR THE APPLICATION OF TRANSPARENT SILICON DIOXIDE LAYERS FROM THE GAS PHASE
#115Fabrication method and fabrication apparatus of group III nitride crystal substance
#116Method for manufacturing nitride semiconductor self-supporting substrate and nitride semiconductor self-supporting substrate
#117METAL FILM PRODUCTION APPARATUS
#118METHOD AND APPARATUS FOR PRODUCTION OF METAL FILM OR THE LIKE
#119Crystallographically orientated tantalum pentoxide and methods of making same
#120Film producing method using atmospheric pressure hydrogen plasma, and method and apparatus for producing refined film
#121CATALYTIC CHEMICAL VAPOR DEPOSITION APPARATUS
#122Substrates for silicon solar cells and methods of producing the same
#123Method and apparatus for production of metal film or the like
#124COATINGS AND COATING PROCESSES FOR MOLYBDENUM SUBSTRATES
#125SOURCE CONTAINER OF A VPE REACTOR
#126DIVIDED ELECTROCHEMICAL CELL AND LOW COST HIGH PURITY HYDRIDE GAS PRODUCTION PROCESS
#127METHOD FOR DEPOSITING GROUP III/V COMPOUNDS
#128SHOWERHEAD DESIGN WITH PRECURSOR SOURCE
#129METAL FILM PRODUCTION APPARATUS AND METAL FILM PRODUCTION METHOD
#130APPARATUS FOR THE FORMATION OF A METAL FILM
#131Process for the vapor phase aluminization of a turbomachine metal part and donor liner and turbomachine vane comprising such a liner
#132Method of aluminization in the vapor phase on hollow metal parts of a turbomachine
#133Process for producing silicon compound
#134Metal film vapor phase deposition method and vapor phase deposition apparatus
#135Synthesis and characterization of a highly stable amorphous silicon hydride as the product of a catalytic hydrogen plasma reaction
#136APPARATUS FOR MANUFACTURING SEMICONDUCTOR LAYER
#137Apparatus and method for coating internal surfaces of a turbine engine component
#138SHOWERHEAD DESIGN WITH PRECURSOR PRE-MIXING
#139HVPE SHOWERHEAD DESIGN
#140METHODS AND APPARATUS FOR DEPOSITING A GROUP III-V FILM USING A HYDRIDE VAPOR PHASE EPITAXY PROCESS
#141CROSS FLOW APPARATUS AND METHOD FOR HYDRIDE VAPOR PHASE DEPOSITION
#142Simple chemical vapor deposition systems for depositing multiple-metal aluminide coatings
#143Plasma tool for forming porous diamond films for semiconductor applications
#144Metal halide reactor for CVD and method
#145Method and an apparatus for the coating of a base body
#146Methods for atomic layer deposition of hafnium-containing high-K dielectric materials
#147Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system
#148Radical Assisted Batch Film Deposition
#149Film formation method and apparatus
#150METHOD OF FORMING A RELIABLE ELECTROCHEMICAL CAPACITOR
#151ALD apparatus and method
#152Method and apparatus for achieving maximum yield in the electrolytic preparation of group IV and V hydrides
#153Plasma processing apparatus
#154Thin film preparation apparatus
#155Fabrication method and fabrication apparatus of group III nitride crystal substance
#156Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
#157PRODUCTION APPARATUS FOR PRODUCING GALLIUM NITRIDE FILM SEMICONDUCTOR AND CLEANING APPARATUS FOR EXHAUST GAS
#158Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
#159Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
#160Method of making nitride-based compound semiconductor crystal and substrate
#161Apparatus for the formation of a metal film
#162Apparatus for the formation of a metal film
#163Method for the formation of a metal film
#164Nitride-based compound semiconductor substrate and method for fabricating the same
#165Ruthenium containing layer deposition method
#166Ruthenium layer deposition apparatus and method
#167Method and device for the cvd coating of workpieces
#168Metal film vapor phase deposition method and vapor phase deposition apparatus
#169Metal film production apparatus
#170Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
#171Metal film production apparatus and metal film production method
#172Integrated electroless deposition system
#173Plasma treatment of hafnium-containing materials
#174CVD process to deposit aluminum oxide coatings
#175Gas distributor for vapor coating method and container
#176Apparatuses and methods for atomic layer deposition of hafnium-containing high-k dielectric materials
#177Apparatuses for atomic layer deposition
#178Control of gas flow and delivery to suppress the formation of particles in an MOCVD/ALD system
#179Interconnection structure
#180Method and apparatus for production of metal film or the like
#181Method for modifying a metallic surface
#182Production apparatus for producing gallium nitride semiconductor film and cleaning apparatus for exhaust gas
#183Method for manufacturing diamond coatings
#184Method and apparatus for providing and integrating a general metal delivery source (GMDS) with atomic layer deposition (ALD)
#185Method and apparatus for cleaning and method and apparatus for etching
#186Chemical vapor deposition apparatus and method
#187Method of modifying source chemicals in an ALD process
#188Simple chemical vapor deposition system and methods for depositing multiple-metal aluminide coatings