Patents-Review.com
ClassID:

120217 ⎘

C23C16/4551 - CPC Classification

Classification description:

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber; Flow conditions in reaction chamber Jet streams

Recent Application in this class:
#1
20260059995
2026-02-26

ORGANIC VAPOR JET PRINTING SYSTEM

 #2
20250003066
2025-01-02

SUBSTRATE PROCESSING APPARATUS, GAS NOZZLE, METHOD OF PROCESSING SUBSTRATE, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

 #3
20230189626
2023-06-15

ORGANIC VAPOR JET PRINTING SYSTEM

 #4
20230160067
2023-05-25

ATMOSPHERIC COLD PLASMA JET COATING AND SURFACE TREATMENT

 #5
20220204904
2022-06-30

PRO-BIOFILM COATING, METHOD FOR THE PRODUCTION THEREOF AND SUBSTRATE COATED WITH THE SAME

 #6
20190221783
2019-07-18

Organic vapor jet print head for depositing thin film features with high thickness uniformity

 #7
20180342379
2018-11-29

Atmospheric cold plasma jet coating and surface treatment

 #8
20180297853
2018-10-18

Ultra-high temperature precipitation process for manufacturing polysilicon

 #9
20180291506
2018-10-11

COATING APPARATUS AND METHOD OF USING

 #10
20180215625
2018-08-02

Method and apparatus for preparing boron nitride nanotubes by heat treating boron precursor prepared by using air-jet

 #11
20170275758
2017-09-28

Gas jetting apparatus for film formation apparatus

 #12
20160319429
2016-11-03

COATING APPARATUS

 #13
20160237564
2016-08-18

Atomic-layer deposition method using compound gas jet

 #14
20160056448
2016-02-25

Single-step synthesis of nanostructured thin films by a chemical vapor and aerosol deposition process

 #15
20150368796
2015-12-24

APPARATUS FOR GAS INJECTION TO EPITAXIAL CHAMBER

 #16
20150024540
2015-01-22

Apparatus and process for producing thin layers

 #17
20140367359
2014-12-18

Method for controlling in-plane uniformity of substrate processed by plasma-assisted process

 #18
20140179120
2014-06-26

Film deposition apparatus having a turntable and film deposition method

 #19
20120180725
2012-07-19

CVD APPARATUS

 #20
20120167962
2012-07-05

SYSTEM AND METHOD FOR GENERATING A BEAM OF PARTICLES

 #21
20120031336
2012-02-09

CHEMICAL VAPOR DEPOSITION DEVICE

 #22
20110162581
2011-07-07

ATOMIC LAYER DEPOSITION APPARATUS USING NEUTRAL BEAM AND METHOD OF DEPOSITING ATOMIC LAYER USING THE SAME

 #23
20110088621
2011-04-21

Organic vapor jet deposition using an exhaust

 #24
20100132614
2010-06-03

Film deposition apparatus

 #25
20100055352
2010-03-04

Method of fabrication of fibers, textiles and composite materials

 #26
20080152806
2008-06-26

Organic vapor jet deposition using an exhaust

 #27
20070020389
2007-01-25

Method of forming film, patterning and method of manufacturing electronic device using thereof

 #28
20070012249
2007-01-18

FILM FORMING APPARATUS

 #29
20060213443
2006-09-28

Atomic layer deposition apparatus using neutral beam and method of depositing atomic layer using the same