120218 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber Premixing before introduction in the reaction chamber
SHOWERHEAD GAS INLET MIXER
#2MANIFOLD STRUCTURE AND SUBSTRATE PROCESSING SYSTEMS USING THE SAME
#3APPARATUS FOR PROVIDING A GAS MIXTURE TO A REACTION CHAMBER AND METHOD OF USING SAME
#4METHOD OF VALVE CONTROL FOR CVD SYSTEM
#5Substrate Processing Method and Substrate Processing Apparatus
#6MULTI-PATH HELICAL MIXER FOR ASYMMETRIC WAFER BOW COMPENSATION
#7MULTI-ZONE GAS DISTRIBUTION FOR ASYMMETRIC WAFER BOW COMPENSATION
#83D PRINTED INTEGRATED GAS MIXER
#9MIXING BLOCKS FOR FLUID SYSTEMS, FIXTURES AND FIXTURE ARRANGEMENTS INCLUDING MIXING BLOCKS, AND METHODS OF MAKING MIXING BLOCKS FOR FLUID SYSTEMS
#10PLASMA-ENHANCED ATOMIC LAYER DEPOSITION APPARATUS AND METHOD THEREOF
#11SYSTEMS AND METHODS FOR REMOVING COLLATERAL DEPOSITIONS FROM WITHIN CHAMBER ARRANGEMENTS IN SEMICONDUCTOR PROCESSING SYSTEMS
#12METHODS AND APPARATUS FOR A VALVE ASSEMBLY
#13SUBSTRATE-PROCESSING APPARATUS AND FILM-FORMING METHOD
#14DRY PROCESS TOOL WITH ADJUSTABLE FLOW VALVE
#15SHOWERHEAD ASSEMBLY FOR CYCLIC VAPOR DEPOSITION WITH ENHANCED GAS MIXING
#16FILM FORMING APPARATUS AND FILM FORMING METHOD
#17METHODS FOR SILICON GERMANIUM UNIFORMITY CONTROL USING MULTIPLE PRECURSORS
#18METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE AND SEMICONDUCTOR GROWTH DEVICE
#19UPSTREAM PROCESS MONITORING FOR DEPOSITION AND ETCH CHAMBERS
#20FILM FORMING APPARATUS AND METHOD OF FORMING CRYSTALLINE SEMICONDUCTOR FILM USING THE SAME
#21Semiconductor processing apparatus and mixing inlet device
#22METHOD FOR PRODUCING LAMINATE, PRODUCING APPARATUS FOR LAMINATE, LAMINATE, AND SEMICONDUCTOR DEVICE
#23IN-SITU FILM ANNEALING IN SUBSTRATE PROCESSING
#24APPARATUS FOR PROVIDING A GAS MIXTURE TO A REACTION CHAMBER AND METHOD OF USING SAME
#25GAS INLET ASSEMBLY OF PROCESS CHAMBER, GAS INLET DEVICE, AND SEMICONDUCTOR PROCESSING APPARATUS
#26Precursor container
#27GAS DISTRIBUTION APPARATUSES FOR IMPROVING MIXING UNIFORMITY
#28SINGLE PROCESS GAS FEED LINE ARCHITECTURE
#29Method and Device for Producing a SiC Solid Material
#30HIGH SELECTIVITY, LOW STRESS, AND LOW HYDROGEN CARBON HARDMASKS IN LOW-PRESSURE CONDITIONS WITH WIDE GAP ELECTRODE SPACING
#31PECVD APPARATUS FOR IN-SITU DEPOSITION OF FILM STACKS
#32DEPOSITION METHOD AND DEPOSITION APPARATUS
#33CHEMICAL VAPOR INFILTRATION APPARATUS AND ASSEMBLY FOR GAS INFLOW IN REACTION CHAMBER
#34SUBSTRATE TREATMENT APPARATUS
#35Apparatus and Methods for Self-Assembled Monolayer (SAM) Deposition in Semiconductor Equipment
#36DEVICE FOR SUPPLYING A MIXED GAS, DEVICE FOR PRODUCING METAL NITRIDE FILM, AND METHOD FOR PRODUCING METAL NITRIDE FILM
#37LIQUID PRECURSOR INJECTION FOR THIN FILM DEPOSITION
#38CONTROLLED DELIVERY OF LOW-VAPOR-PRESSURE PRECURSOR INTO A CHAMBER
#39HIGH MODULUS BORON-BASED CERAMICS FOR SEMICONDUCTOR APPLICATIONS
#40Precursor container
#41APPARATUS FOR PROVIDING A GAS MIXTURE TO A REACTION CHAMBER AND METHOD OF USING SAME
#42Apparatus for performing film forming process on substrate and method of using vacuum chuck mechanism provided in the apparatus
#43RAW MATERIAL SUPPLY APPARATUS AND RAW MATERIAL SUPPLY METHOD
#44Method for controlling a processing system
#45METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
#46Chemical delivery system and method of operating the chemical delivery system
#47Vapor delivery device, methods of manufacture and methods of use thereof
#48Apparatus and method for manufacturing hexagonal silicon crystal
#49Liquid precursor injection for thin film deposition
#50Gas distribution unit in connection with ALD reactor
#51Method of Manufacturing Semiconductor Device, Substrate Processing Method, Non-transitory Computer-readable Recording Medium and Substrate Processing Apparatus
#52MULTI-LOCATION GAS INJECTION TO IMPROVE UNIFORMITY IN RAPID ALTERNATING PROCESSES
#53Methods for silicon germanium uniformity control using multiple precursors
#54Coated cutting tool, and method and system for manufacturing the same by chemical vapor deposition
#55Increased deposition efficiency via dual reactor system
#56SEQUENTIAL PULSE AND PURGE FOR ALD PROCESSES
#57Deposition radial and edge profile tunability through independent control of TEOS flow
#58Chemical vapor deposition process for depositing a coating and the coating formed thereby
#59Vapor delivery device, methods of manufacture and methods of use thereof
#60Processing chamber mixing systems
#61CVI/CVD matrix densification process and apparatus
#62THERMAL METAL CHEMICAL VAPOR DEPOSITION APPARATUS AND PROCESS
#63Methods and apparatus comprising a first conduit circumscribed by a second conduit
#64Shower head, vapor phase growth apparatus, and vapor phase growth method
#65Substrate processing apparatus having a gas-mixing manifold
#66PECVD apparatus for in-situ deposition of film stacks
#67Microwave plasma and ultraviolet assisted deposition apparatus and method for material deposition using the same
#68Microwave plasma and ultraviolet assisted deposition apparatus and method for material deposition using the same
#69Method for controlling a processing system
#70In situ generation of gaseous precursors for chemical vapor deposition of a chalcogenide
#71Shower head, vapor phase growth apparatus, and vapor phase growth method
#72MULTIZONE GAS DISTRIBUTION APPARATUS
#73Chemical delivery system and method of operating the chemical delivery system
#74GAS MIXING DEVICE AND METHOD, AND CVD APPARATUS INCLUDING THE SAME
#75Method and apparatus for depositing cobalt in a feature
#76Vapor delivery device, methods of manufacture and methods of use thereof
#77MIXER STRUCTURE, FLUID PASSAGE DEVICE, AND PROCESSING DEVICE
#78Fabrication of thermally stable nanocavities and particle-in-cavity nanostructures
#79Deposition radial and edge profile tunability through independent control of TEOS flow
#80Titanium silicide region forming method
#81Apparatus and method of manufacturing display apparatus
#82Formulation for deposition of silicon doped hafnium oxide as ferroelectric materials
#83Gas control system, deposition apparatus including gas control system, and program and gas control method used for gas control system
#84APPARATUS FOR PERFORMING SELENIZATION AND SULFURIZATION PROCESS ON GLASS SUBSTRATE
#85Film forming method
#86Gas mixing device and substrate processing apparatus
#87Mixing dimers for moisture resistant materials
#88Gas distribution showerhead for semiconductor processing
#89Gas distribution showerhead for semiconductor processing
#90Vapor delivery method and apparatus for solid and liquid precursors
#91COATINGS FORMED FROM THE DEPOSITION OF PLASMA-ACTIVATED ADDUCTS
#92Gas feedthrough assembly
#93Method of manufacturing semiconductor device by forming a film on a substrate, substrate processing apparatus, and recording medium
#94ULTRA-HIGH DENSITY SINGLE-WALLED CARBON NANOTUBE HORIZONTAL ARRAY AND ITS CONTROLLABLE PREPARATION METHOD
#95Lid assembly for a processing system to facilitate sequential deposition techniques
#96Method and apparatus for depositing cobalt in a feature
#97Shower head, vapor phase growth apparatus, and vapor phase growth method
#98Counter flow mixer for process chamber
#99Pulsed valve manifold for atomic layer deposition
#100Device and method for generating a vapor for a CVD or PVD device from multiple liquid or solid source materials
#101Device for Processing Plasma with a Circulation of Process Gas in Multiple Plasmas
#102Dichlorosilane compensating control strategy for improved polycrystalline silicon growth
#103PHOTO-ASSISTED ATOMIC LAYER DEPOSITION METHOD
#104Gas delivery system
#105Microwave plasma and ultraviolet assisted deposition apparatus and method for material deposition using the same
#106APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE HAVING A GAS MIXER
#107Process gas preheating systems and methods for double-sided multi-substrate batch processing
#108Method for manufacturing compound semiconductor epitaxial substrates including heating of carrier gas
#109Metal organic chemical vapor deposition apparatus for solar cell
#110SEMICONDUCTOR PROCESSING APPARATUS HAVING GAS SPRAY UNIT
#111Inlet for effective mixing and purging
#112Vapor delivery device, methods of manufacture and methods of use thereof
#113VAPOR PHASE GROWTH APPARATUS AND VAPOR PHASE GROWTH METHOD
#114Azimuthal mixer
#115DIFFUSER HEAD APPARATUS AND METHOD OF GAS DISTRIBUTION
#116Gas supply manifold and method of supplying gases to chamber using same
#117Substrate processing apparatus
#118Microwave plasma and ultraviolet assisted deposition apparatus and method for material deposition using the same
#119Vapor delivery device, methods of manufacture and methods of use thereof
#120Film forming method and film forming device
#121Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
#122Treatment for flowable dielectric deposition on substrate surfaces
#123Source container and vapour-deposition reactor
#124Substrate processing apparatus including auxiliary gas supply port
#125PECVD apparatus for in-situ deposition of film stacks
#126Substrate processing apparatus
#127Adhesion layer to minimize dielectric constant increase with good adhesion strength in a PECVD process
#128Lid assembly for a processing system to facilitate sequential deposition techniques
#129RAW MATERIAL VAPORIZING AND SUPPLYING APPARATUS
#130Device to Generate a Gas Mixture
#131Low temperature GST process
#132Device for introducing, injecting or spraying a mixture of a carrier gas and liquid compounds and method for implementing said device
#133Vapor delivery device, methods of manufacture and methods of use thereof
#134Film forming method and apparatus
#135CO-EVAPORATION SYSTEM COMPRISING VAPOR PRE-MIXER
#136COMPENSATING CONCENTRATION UNCERTAINITY
#137Deposition valve assembly and method of heating the same
#138Gas supply unit, substrate processing apparatus and supply gas setting method
#139Systems and methods for measuring, monitoring and controlling ozone concentration
#140Process for forming a silica coating on a glass substrate
#141Method of manufacturing semiconductor device and substrate processing apparatus
#142Vapor delivery device, methods of manufacture and methods of use thereof
#143Method and apparatus for gas delivery
#144Lateral flow atomic layer deposition device
#145Method and apparatus for gas delivery
#146Large Area Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition Apparatus
#147Process for depositing ceramic or organoceramic material on a substrate
#148Low temperature GST process
#149GAS INJECTION UNIT AND A THIN-FILM VAPOUR-DEPOSITION DEVICE AND METHOD USING THE SAME
#150Gas mixer and manifold assembly for ALD reactor
#151PRECISE TEMPERATURE CONTROL FOR TEOS APPLICATION BY HEAT TRANSFER FLUID
#152Apparatus for manufacturing thin film photovoltaic devices
#153Multi-channel gas-delivery system
#154In-situ deposition of film stacks
#155Large scale MOCVD system for thin film photovoltaic devices
#156Plasma film forming apparatus
#157LID ASSEMBLY FOR A PROCESSING SYSTEM TO FACILITATE SEQUENTIAL DEPOSITION TECHNIQUES
#158Atmospheric pressure chemical vapor deposition method for producing an-N-semiconductive metal sulfide thin layer
#159Gas mixing method realized by back diffusion in a PECVD system with showerhead
#160Multi-station deposition apparatus and method
#161VAPOR PHASE EPITAXY APPARATUS OF GROUP III NITRIDE SEMICONDUCTOR
#162Film forming method and substrate processing apparatus
#163CVD apparatus for improved film thickness non-uniformity and particle performance
#164Gas delivery apparatus and method for atomic layer deposition
#165HVPE SHOWERHEAD DESIGN
#166High accuracy vapor generation and delivery for thin film deposition
#167FILM MANUFACTURING DEVICE
#168Gas supply unit, substrate processing apparatus and supply gas setting method
#169Structure comprises an As-deposited doped single crystalline Si-containing film
#170Method of forming an insulation film having low impurity concentrations
#171Integration of ALD tantalum nitride for copper metallization
#172Method and apparatus for producing group III nitride
#173Rapid thermal processing chamber with shower head
#174CHAMBER COMPONENTS FOR CVD APPLICATIONS
#175Apparatus and method for hybrid chemical processing
#176Chemical vapor deposition apparatus
#177FILM-FORMING APPARATUS, FILM-FORMING METHOD AND RECORDING MEDIUM
#178Multi-station deposition apparatus and method
#179Gas mixer and manifold assembly for ALD reactor
#180PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR ELEMENT MANUFACTURED BY SUCH APPARATUS
#181Method for forming silazane-based dielectric film
#182SHOWERHEAD DESIGN WITH PRECURSOR SOURCE
#183GAS MIXING SWIRL INSERT ASSEMBLY
#184Inhibitors for selective deposition of silicon containing films
#185Device for introducing, injecting or spraying a mixture of a carrier gas and liquid compounds and method for implementing said device
#186DEPOSITION APPARATUS
#187Method of manufacturing thin film semiconductor device
#188Methods of making substitutionally carbon-doped crystalline Si-containing materials by chemical vapor deposition
#189Gas inlet element for a CVD reactor
#190SHOWERHEAD DESIGN WITH PRECURSOR PRE-MIXING
#191HVPE SHOWERHEAD DESIGN
#192Gas feed installation for machines depositing a barrier layer on containers
#193Film formation method and apparatus for semiconductor process
#194Apparatus for hybrid chemical processing
#195METHOD OF FORMING AMORPHOUS CARBON LAYER USING CROSS TYPE HYDROCARBON COMPOUND AND METHOD OF FORMING LOW-K DIELECTRIC LAYER USING THE SAME
#196Method for pre-conditioning a precursor vaporization system for a vapor deposition process
#197Method for heating a substrate prior to a vapor deposition process
#198PROCESS FOR TUNGSTEN NITRIDE DEPOSITION BY A TEMPERATURE CONTROLLED LID ASSEMBLY
#199Temperature controlled lid assembly for tungsten nitride deposition
#200Apparatus For Forming Thin Film
#201Coating system and method for coating, as well as coated articles
#202Vortex chamber lids for atomic layer deposition
#203VORTEX CHAMBER LIDS FOR ATOMIC LAYER DEPOSITION
#204Gas delivery apparatus for atomic layer deposition
#205ATOMIC LAYER DEPOSITION PROCESS
#206Method for reducing carbon monoxide poisoning in a thin film deposition system
#207Method and apparatus for reducing particle formation in a vapor distribution system
#208Apparatus and method for hybrid chemical processing
#209INTEGRATION PROCESS OF TUNGSTEN ATOMIC LAYER DEPOSITION FOR METALLIZATION APPLICATION
#210CVD apparatus of improved in-plane uniformity
#211Nitrous oxide anneal of TEOS/ozone CVD for improved gapfill
#212Enhanced copper growth with ultrathin barrier layer for high performance interconnects
#213Enhanced copper growth with ultrathin barrier layer for high performance interconnects
#214Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill
#215Fluid mixing and delivery system
#216Methods of making substitutionally carbon-doped crystalline Si-containing materials by chemical vapor deposition
#217Selective deposition of silicon-containing films
#218Film formation method and apparatus for semiconductor process
#219Methods of depositing electrically active doped crystalline Si-containing films
#220Method and apparatus for low temperature dielectric deposition using monomolecular precursors
#221Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill
#222Integration of ALD tantalum nitride for copper metallization
#223High accuracy vapor generation and delivery for thin film deposition
#224Atomic layer deposition apparatus
#225Gas supply unit, substrate processing apparatus, and supply gas setting method
#226Direct liquid injection system and method for forming multi-component dielectric films
#227Precursor gas delivery with carrier gas mixing
#228Apparatus for fabricating semiconductor device
#229Multi-station deposition apparatus and method
#230Chemical processing system and method
#231Mixing box, and apparatus and method for producing films
#232Apparatus for the preparation of film
#233Gas delivery apparatus for atomic layer deposition
#234Deposition chamber and method for depositing low dielectric constant films
#235Method and apparatus for low temperature silicon nitride deposition
#236Gap-fill depositions in the formation of silicon containing dielectric materials
#237Lid assembly for a processing system to facilitate sequential deposition techniques
#238Integration of ALD tantalum nitride for copper metallization
#239Gas mixer and manifold assembly for ALD reactor
#240Plasma chemical vapor deposition apparatus having an improved nozzle configuration
#241Method using TEOS ramp-up during TEOS/ozone CVD for improved gap-fill
#242Pulsed valve manifold for atomic layer deposition