120219 ⎘
Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber Mixing in close vicinity to the substrate
SEMICONDUCTOR PROCESSING SYSTEMS AND ASSOCIATED METHODS FOR FORMING SUPER-LATTICE STRUCTURES USING SEMICONDUCTOR PROCESSING SYSTEMS
#2METHODS AND SYSTEMS FOR FILLING A GAP
#3HIGH PRESSURE SPATIAL CHEMICAL VAPOR DEPOSITION SYSTEM AND RELATED PROCESS
#4METHOD OF DEPOSITING A TRANSITION METAL DICHALCOGENIDE
#5APPARATUS AND METHODS FOR COMBINATORIAL MATERIAL SCREENING AND DISCOVERY
#6Metal chalcogenide film and method and device for manufacturing the same
#7GAS INJECTION APPARATUS FOR LAYER DEPOSITION
#8HYBRID CHEMICAL AND PHYSICAL VAPOR DEPOSITION OF TRANSITION-METAL-ALLOYED PIEZOELECTRIC SEMICONDUCTOR FILMS
#9GAS INJECTOR FOR A VERTICAL FURNACE
#10SURFACE ENGINEERED METAL SUBSTRATES AND RELATED METHODS
#11Heteroalkylcyclopentadienyl indium-containing precursors and processes of using the same for deposition of indium-containing layers
#12High pressure spatial chemical vapor deposition system and related process
#13METHOD AND SYSTEM FOR THE LOCALIZED DEPOSIT OF METAL ON A SURFACE
#14Fluid distributing device for a thin-film deposition apparatus, related apparatus and methods
#15Metal chalcogenide film and method and device for manufacturing the same
#16FILM FORMING APPARATUS AND FILM FORMING METHOD
#17CORROSION RESISTANT METAL AND METAL ALLOY COATINGS CONTAINING SUPERSATURATED CONCENTRATIONS OF CORROSION INHIBITING ELEMENTS AND METHODS AND SYSTEMS FOR MAKING THE SAME
#18Apparatus including metallized-ceramic tubes for radio-frequency and gas delivery
#19CHEMICAL VAPOR DEPOSITION APPARATUS WITH MULTI-ZONE INJECTION BLOCK
#20Module including metallized ceramic tubes for RF and gas delivery
#21METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
#22Fabrication of thermally stable nanocavities and particle-in-cavity nanostructures
#23Substrate pedestal module including metallized ceramic tubes for RF and gas delivery
#24Hard titanium aluminum nitride coating, hard-coated tool, and their production methods
#25EPITAXIAL CHAMBER WITH CUSTOMIZABLE FLOW INJECTION
#26Metal oxide film formation method
#27Process for forming a film on a substrate using multi-port injection assemblies
#28VORTICAL ATOMIZING NOZZLE ASSEMBLY, VAPORIZER, AND RELATED METHODS FOR SUBSTRATE PROCESSING SYSTEMS
#29Gas mixing device and substrate processing apparatus
#30Gas distribution showerhead for semiconductor processing
#31Film forming apparatus
#32Method and system for the localized deposit of metal on a surface
#33Plasma source and surface treatment method
#34Method of manufacturing semiconductor device
#35METHOD AND APPARATUS FOR MANUFACTURING SILICON CARBIDE SUBSTRATE
#36GAS DISTRIBUTION SYSTEM FOR A REACTION CHAMBER
#37CORROSION RESISTANT METAL AND METAL ALLOY COATINGS CONTAINING SUPERSATURATED CONCENTRATIONS OF CORROSION INHIBITING ELEMENTS AND METHODS AND SYSTEMS FOR MAKING THE SAME
#38Method of manufacturing semiconductor device including forming a film containing a first element, a second element and carbon, substrate processing apparatus, and recording medium
#39Semiconductor reaction chamber with plasma capabilities
#40METHODS OF LOW TEMPERATURE DEPOSITION OF CERAMIC THIN FILMS
#41Film forming method using reversible decomposition reaction
#42Apparatus of chemical vapor deposition with a showerhead regulating injection velocity of reactive gases positively and method thereof
#43Apparatus of chemical vapor deposition with a showerhead regulating injection velocity of reactive gases positively and method thereof
#44Shower head, plasma processing apparatus and plasma processing method
#45Multi-gas straight channel showerhead
#46Semiconductor manufacturing apparatus and method for cleaning same
#47Gas showerhead, method for making the same and thin film growth reactor
#48Film formation device
#49Substrate processing apparatus, method of manufacturing semiconductor device and program
#50Surface treatment and deposition for reduced outgassing
#51Advanced Mixing System for Integrated Tool Having Site-Isolated Reactors
#52Multi-gas centrally cooled showerhead design
#53METHOD AND APPARATUS FOR REMOTE PLASMA SOURCE ASSISTED SILICON-CONTAINING FILM DEPOSITION
#54Apparatus and method for combinatorial gas distribution through a multi-zoned showerhead
#55Apparatus for depositing thin film coatings and method of deposition utilizing such apparatus
#56Advanced mixing system for integrated tool having site-isolated reactors
#57PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION APPARATUS
#58Deposition of hydrogenated thin film
#59PROCESS CHAMBER FOR DIELECTRIC GAPFILL
#60DIRECTED REAGENTS TO IMPROVE MATERIAL UNIFORMITY
#61Multi-gas straight channel showerhead
#62Advanced mixing method for integrated tool having site-isolated reactors
#63Multi-channel gas-delivery system
#64PLACING TABLE STRUCTURE
#65Method for producing photocatalytically active titanium dioxide layers
#66Method and Apparatus for Silicon Film Deposition
#67GAS DISTRIBUTION MODULE AND GAS DISTRIBUTION SCANNING APPARATUS USING THE SAME
#68SYSTEM FOR THE DELIVERY OF GERMANIUM-BASED PRECURSOR
#69FILM DEPOSITION APPARATUS AND METHOD
#70Substrate processing apparatus , method of manufacturing semiconductor device, and method of manufacturing substrate
#71FILM DEPOSITION APPARATUS, FILM DEPOSITION METHOD, STORAGE MEDIUM, AND GAS SUPPLY APPARATUS
#72Separate injection of reactive species in selective formation of films
#73SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR CLEANING SAME
#74Vapor deposition reactor using plasma and method for forming thin film using the same
#75Method and apparatus for producing group III nitride
#76VAPOR GROWTH APPARATUS, VAPOR GROWTH METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#77Process And Apparatus For Depositing Semiconductor Layers Using Two Process Gases, One Of Which is Preconditioned
#78Flowable dielectric equipment and processes
#79Showerhead for chemical vapor deposition and chemical vapor deposition apparatus having the same
#80Gas head and thin-film manufacturing apparatus
#81Method for preparing electrically conducting materials
#82HIGH VOLUME DELIVERY SYSTEM FOR GALLIUM TRICHLORIDE
#83Apparatus of chemical vapor deposition with a showerhead regulating injection velocity of reactive gases positively and method thereof
#84Separate injection of reactive species in selective formation of films
#85Film-forming method for forming metal oxide on substrate surface
#86Multi-gas straight channel showerhead
#87Method of creating super-hydrophobic and-or super-hydrophilic surfaces on substrates, and articles created thereby
#88APPARATUS AND METHODS FOR ISOLATING CHEMICAL VAPOR REACTIONS AT A SUBSTRATE SURFACE
#89Advanced mixing system for integrated tool having site-isolated reactors
#90System and method for depositing a gaseous mixture onto a substrate surface using a showerhead apparatus
#91Film formation apparatus and film formation method and cleaning method
#92Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film
#93Processing apparatus with a chamber having therein a high-corrosion-resistant sprayed film
#94PROCESS CHAMBER FOR DIELECTRIC GAPFILL
#95Systems and methods for roll-to-roll atomic layer deposition on continuously fed objects
#96Film forming apparatus
#97Directed reagents to improve material uniformity
#98Method for depositing compounds on a substrate by means of metalorganic chemical vapor deposition
#99Apparatus and methods for isolating chemical vapor reactions at a substrate surface
#100High temperature chemical vapor deposition apparatus
#101Process and apparatus for depositing semiconductor layers using two process gases, one of which is preconditioned
#102Plasma film forming system
#103Plasma treatment processing apparatus
#104Showerhead with branched gas receiving channel and apparatus including the same for use in manufacturing semiconductor substrates
#105Film-forming method
#106Film forming apparatus and method
#107Chemical vapor deposition method
#108Oxide film forming method and oxide film forming apparatus
#109Modular injector and exhaust assembly
#110Deposition chamber and method for depositing low dielectric constant films
#111Reactors having gas distributors and methods for depositing materials onto micro-device workpieces
#112Film formation apparatus and film formation method and cleaning method
#113Atomic layer deposition reactor
#114Processing apparatus and method
#115Methods for forming a ferroelectric layer and capacitor and FRAM using the same
#116Method and apparatus for forming a ferroelectric layer
#117Plasma film forming system