Patents-Review.com
ClassID:

120237 ⎘

C23C16/45561 - page 2 - CPC Classification

Classification description:

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber Gas plumbing upstream of the reaction chamber

Recent Application in this class:
#301
20210017646
2021-01-21

Substrate processing apparatus and substrate processing method

 #302
20210010137
2021-01-14

Control system for plasma chamber having controllable valve

 #303
20210002767
2021-01-07

Liquid vaporizer

 #304
20200399754
2020-12-24

Solid precursor feed system for thin film depositions

 #305
20200393086
2020-12-17

Method, system, and device for storage and delivery of process gas from a substrate

 #306
20200393051
2020-12-17

Valve device

 #307
20200385867
2020-12-10

Gas-phase reactor system including a gas detector

 #308
20200371439
2020-11-26

Organotin oxide hydroxide patterning compositions, precursors, and patterning

 #309
20200365744
2020-11-19

Article with Transparent Conductive Layer and Method of Making the Same

 #310
20200363826
2020-11-19

Abnormality diagnosis method of fluid supply line

 #311
20200354835
2020-11-12

Valve device, fluid control device and semiconductor manufacturing apparatus using the valve device

 #312
20200312680
2020-10-01

MULTIZONE FLOW DISTRIBUTION SYSTEM

 #313
20200299837
2020-09-24

Vapor delivery device, methods of manufacture and methods of use thereof

 #314
20200299836
2020-09-24

Reactor manifolds

 #315
20200295204
2020-09-17

Article with Transparent Conductive Oxide Coating

 #316
20200291520
2020-09-17

Method, system, and device for storage and delivery of process gas from a substrate

 #317
20200291517
2020-09-17

Method, system, and device for storage and delivery of process gas from a substrate

 #318
20200283899
2020-09-10

Gas supply unit and gas supply method

 #319
20200279758
2020-09-03

Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber

 #320
20200263292
2020-08-20

METHOD AND DEVICE FOR PLASMA TREATMENT OF CONTAINERS

 #321
20200251310
2020-08-06

Multi channel splitter spool

 #322
20200248310
2020-08-06

JOINT BLOCK AND MANUFACTURING METHOD THEREOF

 #323
20200248308
2020-08-06

Manifolds for uniform vapor deposition

 #324
20200208266
2020-07-02

Manufacturing processes to synthesize, functionalize, surface treat and/or encapsulate powders, and applications thereof

 #325
20200199748
2020-06-25

Method and apparatus for supplying improved gas flow to a processing volume of a processing chamber

 #326
20200190666
2020-06-18

ALD apparatus, method and valve

 #327
20200157681
2020-05-21

Substrate processing apparatus, substrate processing system, and substrate processing method

 #328
20200141002
2020-05-07

Monolithic gas distribution manifold and various construction techniques and use cases therefor

 #329
20200135513
2020-04-30

Diffuser and semiconductor processing system using same

 #330
20200126758
2020-04-23

Flow through line charge volume

 #331
20200119315
2020-04-16

High efficiency vapor transport sublimation source using baffles coated with source material

 #332
20200115797
2020-04-16

Substrate processing apparatus having a gas-mixing manifold

 #333
20200109470
2020-04-09

VACUUM EVACUATION SYSTEM

 #334
20200071827
2020-03-05

Precursor delivery system

 #335
20200063255
2020-02-27

Fixed and portable coating apparatuses and methods

 #336
20200056724
2020-02-20

Valve device, processing apparatus, and control method

 #337
20200056286
2020-02-20

Semiconductor processing reactor and components thereof

 #338
20200049294
2020-02-13

Mounting structures for flow substrates

 #339
20200040458
2020-02-06

Multi-port gas injection system and reactor system including same

 #340
20200024740
2020-01-23

Film forming apparatus, source supply apparatus, and film forming method

 #341
20200002810
2020-01-02

Combination CVD/ALD method, source and pulse profile modification

 #342
20190393045
2019-12-26

Substrate processing device, manufacturing method for semiconductor device, and reaction tube

 #343
20190385824
2019-12-19

Nozzle for multi-zone gas injection assembly

 #344
20190385823
2019-12-19

Chemical control features in wafer process equipment

 #345
20190382895
2019-12-19

Blocker plate for use in a substrate process chamber

 #346
20190382890
2019-12-19

Apparatus and method for controlling a flow process material to a deposition chamber

 #347
20190368041
2019-12-05

Gas distribution system and reactor system including same

 #348
20190362939
2019-11-28

Radical deactivation component, plasma processing apparatus using the same and radical deactivation method

 #349
20190323125
2019-10-24

Substrate processing systems including gas delivery system with reduced dead legs

 #350
20190316274
2019-10-17

Vapor phase growth apparatus and vapor phase growth method

 #351
20190316258
2019-10-17

CHEMICAL VAPOR DEPOSITION APPARATUS WITH MULTI-ZONE INJECTION BLOCK

 #352
20190301016
2019-10-03

Layer deposition method and layer deposition apparatus

 #353
20190301009
2019-10-03

Integrated cluster tool for selective area deposition

 #354
20190271072
2019-09-05

Vapor phase growth method

 #355
20190264326
2019-08-29

Fluid control system and product manufacturing method using fluid control system

 #356
20190249304
2019-08-15

RESIN CONTAINER COATING DEVICE

 #357
20190249299
2019-08-15

Apparatus and Method of Manufacturing Oxide Film and Display Apparatus Including the Oxide Film

 #358
20190211955
2019-07-11

Additively manufactured gas distribution manifold

 #359
20190186002
2019-06-20

Solid Precursor, Apparatus for Supplying Source Gas and Deposition Device Having the Same

 #360
20190177840
2019-06-13

Chemical delivery system and method of operating the chemical delivery system

 #361
20190164768
2019-05-30

Film forming method

 #362
20190161859
2019-05-30

Apparatus for making large-scale atomic layer deposition on powdered materials with plowing action

 #363
20190157089
2019-05-23

Method of manufacturing semiconductor device and substrate processing apparatus

 #364
20190122924
2019-04-25

Method and apparatus for depositing cobalt in a feature

 #365
20190122861
2019-04-25

Plasma reactor with highly symmetrical four-fold gas injection

 #366
20190119813
2019-04-25

Low vapor pressure chemical delivery

 #367
20190112707
2019-04-18

Systems and methods for atomic layer deposition

 #368
20190106788
2019-04-11

Gas distribution system, reactor including the system, and methods of using the same

 #369
20190096708
2019-03-28

Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber

 #370
20190096663
2019-03-28

Method for manufacturing semiconductor device, non-transitory computer-readable recording medium, and substrate processing apparatus

 #371
20190093221
2019-03-28

Apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods

 #372
20190085457
2019-03-21

Graphene structure forming method and graphene structure forming apparatus

 #373
20190085444
2019-03-21

Concentration control apparatus and material gas supply system

 #374
20190074100
2019-03-07

Electroplated Au for conformal coating of high aspect ratio silicon structures

 #375
20190071774
2019-03-07

Semiconductor manufacturing apparatus and method of manufacturing semiconductor device

 #376
20190071772
2019-03-07

Evaporator, deposition arrangement, deposition apparatus and methods of operation thereof

 #377
20190055649
2019-02-21

Precursor supply unit, substrate processing system, and method of fabricating semiconductor device using the same

 #378
20190040528
2019-02-07

Hardware and process for film uniformity improvement

 #379
20190032211
2019-01-31

MONOLITHIC CERAMIC GAS DISTRIBUTION PLATE

 #380
20190032207
2019-01-31

Vapor delivery device, methods of manufacture and methods of use thereof

 #381
20190032200
2019-01-31

Method and device for plasma treatment of containers

 #382
20190024234
2019-01-24

Gas processing apparatus

 #383
20190024233
2019-01-24

Dynamic precursor dosing for atomic layer deposition

 #384
20180351208
2018-12-06

Solid electrolyte containing oxynitride, and secondary battery including the solid electrolyte

 #385
20180350627
2018-12-06

Apparatus and method for gas delivery in semiconductor process chambers

 #386
20180350562
2018-12-06

Deposition radial and edge profile tunability through independent control of TEOS flow

 #387
20180347043
2018-12-06

Blocker plate for use in a substrate process chamber

 #388
20180311700
2018-11-01

Film forming method and film forming apparatus

 #389
20180294145
2018-10-11

Processing method

 #390
20180291502
2018-10-11

Storage device, vaporizer and substrate processing apparatus

 #391
20180269038
2018-09-20

Side gas injection kit for multi-zone gas injection assembly

 #392
20180265984
2018-09-20

Temperature-controlled gas supply line with dilution gas flows supplied at multiple locations

 #393
20180265983
2018-09-20

Systems and methods for flow monitoring in a precursor vapor supply system of a substrate processing system

 #394
20180258530
2018-09-13

Gas control system, deposition apparatus including gas control system, and program and gas control method used for gas control system

 #395
20180251898
2018-09-06

Gas supply device, gas supply method and film forming method

 #396
20180247819
2018-08-30

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS

 #397
20180240677
2018-08-23

Gas reaction trajectory control through tunable plasma dissociation for wafer by-product distribution and etch feature profile uniformity

 #398
20180223430
2018-08-09

Programmable deposition apparatus

 #399
20180204720
2018-07-19

Substrate processing apparatus

 #400
20180163307
2018-06-14

Temperature control system and process for gaseous precursor delivery

 #401
20180163304
2018-06-14

GAS INJECTOR DEVICE USED FOR SEMICONDUCTOR EQUIPMENT

 #402
20180155830
2018-06-07

GAS SUPPLY AND EXHAUST STRUCTURE

 #403
20180142357
2018-05-24

Substrate processing apparatus, injector, and substrate processing method

 #404
20180142352
2018-05-24

Two zone flow cooling plate design with concentric or spiral channel for efficient gas distribution assembly cooling

 #405
20180135203
2018-05-17

Film forming apparatus

 #406
20180135176
2018-05-17

Substrate processing apparatus, method for manufacturing semiconductor device and vaporizer

 #407
20180119280
2018-05-03

Film forming apparatus and film forming method

 #408
20180096866
2018-04-05

Substrate processing apparatus

 #409
20180073144
2018-03-15

Control system for plasma chamber having controllable valve and method of using the same

 #410
20180066360
2018-03-08

Combination CVD/ALD method, source and pulse profile modification

 #411
20180057937
2018-03-01

Exhaust apparatus and substrate processing apparatus having an exhaust line with a first ring having at least one hole on a lateral side thereof placed in the exhaust line

 #412
20180046206
2018-02-15

METHOD AND APPARATUS FOR CONTROLLING GAS FLOW TO A PROCESS CHAMBER

 #413
20180037991
2018-02-08

Gas supply apparatus and gas supply method

 #414
20180012735
2018-01-11

Gas supply system, substrate processing system and gas supply method

 #415
20170362705
2017-12-21

DYNAMIC PRECURSOR DOSING FOR ATOMIC LAYER DEPOSITION

 #416
20170362703
2017-12-21

Mixing dimers for moisture resistant materials

 #417
20170350011
2017-12-07

Manifolds for uniform vapor deposition

 #418
20170350004
2017-12-07

Integrated cluster tool for selective area deposition

 #419
20170335457
2017-11-23

Gas distribution showerhead for semiconductor processing

 #420
20170335455
2017-11-23

Apparatus and method for controlled application of reactive vapors to produce thin films and coatings

 #421
20170335450
2017-11-23

Vapor delivery method and apparatus for solid and liquid precursors

 #422
20170327949
2017-11-16

Liquid level indicator and liquid raw material vaporization feeder

 #423
20170306493
2017-10-26

Method and apparatus to prevent deposition rate/thickness drift, reduce particle defects and increase remote plasma system lifetime

 #424
20170306486
2017-10-26

High efficiency vapor transport sublimation source using baffles coated with source material

 #425
20170306484
2017-10-26

Method of coating metallic powder particles

 #426
20170306483
2017-10-26

Film forming method and film forming apparatus

 #427
20170294325
2017-10-12

Semiconductor processing chamber

 #428
20170294318
2017-10-12

Substrate processing device, manufacturing method for semiconductor device, and reaction tube

 #429
20170283949
2017-10-05

Substrate processing apparatus

 #430
20170275758
2017-09-28

Gas jetting apparatus for film formation apparatus

 #431
20170275757
2017-09-28

Substrate processing apparatus, gas supply method, substrate processing method, and film forming method

 #432
20170271144
2017-09-21

Method of manufacturing semiconductor device, substrate processing apparatus and recording medium

 #433
20170260649
2017-09-14

Gas distribution apparatus for improved film uniformity in an epitaxial system

 #434
20170260046
2017-09-14

Laminated ceramic chip component including nano thin film layer, manufacturing method therefor, and atomic layer vapor deposition apparatus therefor

 #435
20170253971
2017-09-07

Mixed gas multiple line supply system and substrate processing apparatus using same

 #436
20170253970
2017-09-07

ALD Coating System and Method for Operating an ALD Coating System

 #437
20170241020
2017-08-24

Lid assembly for a processing system to facilitate sequential deposition techniques

 #438
20170236691
2017-08-17

Chemical control features in wafer process equipment

 #439
20170233888
2017-08-17

REACTOR GAS PANEL COMMON EXHAUST

 #440
20170233867
2017-08-17

VAPOR PHASE GROWTH APPARATUS AND VAPOR PHASE GROWTH METHOD

 #441
20170211183
2017-07-27

Methods of forming material layer

 #442
20170204989
2017-07-20

Additively manufactured gas distribution manifold

 #443
20170204517
2017-07-20

Vapor deposition apparatus

 #444
20170183773
2017-06-29

Gas supply device and valve device

 #445
20170178956
2017-06-22

Method and apparatus for depositing cobalt in a feature

 #446
20170175269
2017-06-22

Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer deposition

 #447
20170167026
2017-06-15

Gas flow monitoring method and gas flow monitoring apparatus

 #448
20170167022
2017-06-15

APPARATUS FOR HIGH SPEED ATOMIC LAYER DEPOSITION AND DEPOSITION METHOD USING THE SAME

 #449
20170162426
2017-06-08

SPIN CHUCK WITH GAS LEAKAGE PREVENTION

 #450
20170159180
2017-06-08

Gas supply system, plasma processing apparatus, and operation method for plasma processing apparatus

 #451
20170137942
2017-05-18

Processing apparatus

 #452
20170121818
2017-05-04

Pulsed valve manifold for atomic layer deposition

 #453
20170114463
2017-04-27

Deposition apparatus and cleansing method using the same

 #454
20170110312
2017-04-20

Apparatus for manufacturing a thin film and a method therefor

 #455
20170107621
2017-04-20

Method for depositing dielectric film in trenches by PEALD

 #456
20170096735
2017-04-06

Dynamic precursor dosing for atomic layer deposition

 #457
20170062212
2017-03-02

Vapor phase growth apparatus and vapor phase growth method

 #458
20170058400
2017-03-02

Method and device for continuously supplying a precursor

 #459
20170032982
2017-02-02

Gas delivery system

 #460
20170029945
2017-02-02

Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium

 #461
20170009338
2017-01-12

Plasma processing apparatus and film formation method

 #462
20160379857
2016-12-29

Vacuum processing apparatus

 #463
20160372348
2016-12-22

Gas supply system, gas supply control method and gas replacement method

 #464
20160369396
2016-12-22

Protecting an interior of a gas container with an ALD coating

 #465
20160362813
2016-12-15

INJECTOR FOR SEMICONDUCTOR EPITAXY GROWTH

 #466
20160362785
2016-12-15

APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE HAVING A GAS MIXER

 #467
20160362784
2016-12-15

Method of manufacturing semiconductor device and recording medium

 #468
20160358762
2016-12-08

SEMICONDUCTOR MANUFACTURING SYSTEM AND SEMICONDUCTOR MANUFACTURING METHOD

 #469
20160319426
2016-11-03

Modular gas injection device

 #470
20160307766
2016-10-20

Cyclic doped aluminum nitride deposition

 #471
20160305019
2016-10-20

Vessel and method for delivery of precursor materials

 #472
20160298235
2016-10-13

Substrate processing apparatus and guide portion

 #473
20160293431
2016-10-06

Gas reaction trajectory control through tunable plasma dissociation for wafer by-product distribution and etch feature profile uniformity

 #474
20160290677
2016-10-06

Apparatus for thermal control of tubing assembly and associated methods

 #475
20160289830
2016-10-06

Substrate processing systems having multiple gas flow controllers

 #476
20160289828
2016-10-06

Semiconductor processing reactor and components thereof

 #477
20160284539
2016-09-29

Method of manufacturing semiconductor device

 #478
20160281234
2016-09-29

Apparatus including 4-way valve for fabricating semiconductor device, method of controlling valve, and method of fabricating semiconductor device using the apparatus

 #479
20160281232
2016-09-29

Vapor flow control apparatus for atomic layer deposition

 #480
20160281226
2016-09-29

Raw material supply method, raw material supply apparatus, and storage medium

 #481
20160273105
2016-09-22

Atomic layer deposition apparatus

 #482
20160273101
2016-09-22

Raw material gas supply apparatus and film forming apparatus

 #483
20160268457
2016-09-15

Article with transparent conductive oxide coating

 #484
20160268453
2016-09-15

Article with transparent conductive layer and method of making the same

 #485
20160268451
2016-09-15

Article with buffer layer

 #486
20160264458
2016-09-15

Article with buffer layer and method of making the same

 #487
20160240433
2016-08-18

Ruthenium film forming method, film forming apparatus, and semiconductor device manufacturing method

 #488
20160233124
2016-08-11

Reaction system for growing a thin film

 #489
20160230933
2016-08-11

Refillable ampoule with purge capability

 #490
20160217977
2016-07-28

Gas distribution system for ceramic showerhead of plasma etch reactor

 #491
20160215390
2016-07-28

Method of coating metallic powder particles

 #492
20160177443
2016-06-23

Hardware and process for film uniformity improvement

 #493
20160168710
2016-06-16

Gas Injection System For Chemical Vapor Deposition Using Sequenced Valves

 #494
20160168702
2016-06-16

SYSTEMS AND METHODS FOR PROCESSING VAPOR

 #495
20160122870
2016-05-05

Vapor delivery device, methods of manufacture and methods of use thereof

 #496
20160115594
2016-04-28

SOURCE GAS SUPPLY APPARATUS AND FILM FORMING APPARATUS

 #497
20160111304
2016-04-21

Substrate processing apparatus, substrate processing method and storage medium

 #498
20160111258
2016-04-21

Gas supply delivery arrangement including a gas splitter for tunable gas flow control

 #499
20160102401
2016-04-14

VAPOR PHASE GROWTH APPARATUS AND VAPOR PHASE GROWTH METHOD

 #500
20160097127
2016-04-07

Systems and methods for measuring entrained vapor

 #501
20160097121
2016-04-07

Methods of vapor deposition with multiple vapor sources

 #502
20160084400
2016-03-24

Method and system for supplying a cleaning gas into a process chamber

 #503
20160083844
2016-03-24

Substrate Processing Apparatus, Gas Introduction Shaft and Gas Supply Plate

 #504
20160068953
2016-03-10

Gas separation control in spatial atomic layer deposition

 #505
20160060760
2016-03-03

Deposition apparatus and cleansing method using the same

 #506
20160053375
2016-02-25

CHEMICAL VAPOR DEPOSITION SYSTEM ARRANGEMENT

 #507
20160053374
2016-02-25

GAS SPRAYER AND THIN FILM DEPOSITING APPARATUS HAVING THE SAME

 #508
20160047039
2016-02-18

Processing apparatus

 #509
20160042917
2016-02-11

Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wall

 #510
20160032488
2016-02-04

Vapor phase growth apparatus and vapor phase growth method

 #511
20160024651
2016-01-28

VAPOR DEPOSITION SYSTEM AND METHOD OF OPERATING

 #512
20160017493
2016-01-21

Systems and methods for improving deposition rate uniformity and reducing defects in substrate processing systems

 #513
20160010206
2016-01-14

H/Oside inject to improve process uniformity for low temperature oxidation process

 #514
20160005572
2016-01-07

Chemical control features in wafer process equipment

 #515
20150371831
2015-12-24

Multi-zone gas injection assembly with azimuthal and radial distribution control

 #516
20150371826
2015-12-24

Plasma reactor with highly symmetrical four-fold gas injection

 #517
20150368794
2015-12-24

Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus, recording medium, and cleaning completion determining method

 #518
20150361557
2015-12-17

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

 #519
20150361553
2015-12-17

Rotating semi-batch ALD device

 #520
20150348762
2015-12-03

Electrode plate for plasma etching and plasma etching apparatus

 #521
20150345645
2015-12-03

Valve with adjustable hard stop

 #522
20150332916
2015-11-19

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

 #523
20150325447
2015-11-12

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SUBSTRATE PROCESSING APPARATUS

 #524
20150325427
2015-11-12

Method of manufacturing semiconductor device, substrate processing method and substrate processing apparatus

 #525
20150318147
2015-11-05

Gas distribution showerhead for inductively coupled plasma etch reactor

 #526
20150315702
2015-11-05

Substrate Processing Apparatus

 #527
20150303035
2015-10-22

Systems and methods for providing gases to a process chamber

 #528
20150299853
2015-10-22

EVAPORATOR, DEPOSITION ARRANGEMENT, DEPOSITION APPARATUS AND METHODS OF OPERATION THEREOF

 #529
20150287572
2015-10-08

Monolithic ceramic component of gas delivery system and method of making and use thereof

 #530
20150284848
2015-10-08

Method for stabilizing reaction chamber pressure

 #531
20150275358
2015-10-01

Systems and methods for pressure-based liquid flow control

 #532
20150270119
2015-09-24

Substrate processing apparatus, method for manufacturing semiconductor device and computer-readable recording medium

 #533
20150267299
2015-09-24

Gas distribution system, reactor including the system, and methods of using the same

 #534
20150267297
2015-09-24

Method for performing uniform processing in gas system-sharing multiple reaction chambers

 #535
20150267296
2015-09-24

Substrate processing apparatus

 #536
20150259797
2015-09-17

Liquid-Metal Organic Compound Supply System

 #537
20150252475
2015-09-10

CVD apparatus with gas delivery ring

 #538
20150240359
2015-08-27

Gas supply manifold and method of supplying gases to chamber using same

 #539
20150225852
2015-08-13

Method of forming metal-containing film

 #540
20150221503
2015-08-06

Method of manufacturing semiconductor device

 #541
20150221497
2015-08-06

Apparatus including 4-way valve for fabricating semiconductor device, method of controlling valve, and method of fabricating semiconductor device using the apparatus

 #542
20150214044
2015-07-30

Substrate processing apparatus and method of manufacturing semiconductor device

 #543
20150203962
2015-07-23

Delivery device, methods of manufacture thereof and articles comprising the same

 #544
20150184287
2015-07-02

Systems and Methods for Parallel Combinatorial Vapor Deposition Processing

 #545
20150176153
2015-06-25

Gas-supply system and method

 #546
20150170908
2015-06-18

High productivity combinatorial processing using pressure-controlled one-way valves

 #547
20150167172
2015-06-18

Vapor delivery device, methods of manufacture and methods of use thereof

 #548
20150152969
2015-06-04

Purge line changing block joint and fluid control apparatus

 #549
20150152557
2015-06-04

Film forming method and film forming device

 #550
20150145154
2015-05-28

Multi-tray ballast vapor draw systems

 #551
20150140835
2015-05-21

Substrate processing apparatus, method for manufacturing semiconductor device, and recording medium

 #552
20150136735
2015-05-21

Plasma processing device and plasma processing method

 #553
20150114295
2015-04-30

DEPOSITION APPARATUS

 #554
20150110974
2015-04-23

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

 #555
20150110973
2015-04-23

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

 #556
20150104575
2015-04-16

Multi-metal films, alternating film multilayers, formation methods and deposition system

 #557
20150099372
2015-04-09

Sequential precursor dosing in an ALD multi-station/batch reactor

 #558
20150099066
2015-04-09

Combination CVD/ALD method, source and pulse profile modification

 #559
20150087160
2015-03-26

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM

 #560
20150078864
2015-03-19

Substrate processing apparatus and method for processing a substrate

 #561
20150072537
2015-03-12

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

 #562
20150064340
2015-03-05

Fixed and portable coating apparatuses and methods

 #563
20150056386
2015-02-26

DEVICE FOR DEPOSITING CARBON FILM AND METHOD FOR DEPOSITING CARBON FILM

 #564
20150041430
2015-02-12

Method for treating inner surface of chlorine trifluoride supply passage in apparatus using chlorine trifluoride

 #565
20150034011
2015-02-05

CHEMICAL VAPOR DEPOSITION APPARATUS

 #566
20150011076
2015-01-08

Reactor gas panel common exhaust

 #567
20150000773
2015-01-01

Fluid control apparatus joint, and fluid control apparatus

 #568
20140332100
2014-11-13

Gas supply method

 #569
20140299206
2014-10-09

Raw material vaporizing and supplying apparatus equipped with raw material concentration

 #570
20140295677
2014-10-02

Film forming method and film forming apparatus

 #571
20140291286
2014-10-02

Shower head, plasma processing apparatus and plasma processing method

 #572
20140287594
2014-09-25

Cleaning method, method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium

 #573
20140273410
2014-09-18

Inject insert liner assemblies for chemical vapor deposition systems and methods of using same

 #574
20140264780
2014-09-18

Adhesion layer to minimize dielectric constant increase with good adhesion strength in a PECVD process

 #575
20140262025
2014-09-18

Plasma processing apparatus and plasma etching apparatus

 #576
20140261733
2014-09-18

Processing chamber gas delivery system with hot-swappable ampoule

 #577
20140231550
2014-08-21

Gas distributor for a CVD reactor

 #578
20140217193
2014-08-07

Method and apparatus for purging and plasma suppression in a process chamber

 #579
20140213069
2014-07-31

Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium

 #580
20140209022
2014-07-31

Raw material gas supply method

 #581
20140190581
2014-07-10

Raw material gas supply apparatus for semiconductor manufacturing equipment

 #582
20140182689
2014-07-03

Gas supply systems for substrate processing chambers and methods therefor

 #583
20140141562
2014-05-22

Reaction apparatus and method for manufacturing a CIGS absorber of a thin film solar cell

 #584
20140102563
2014-04-17

Passive isolation assembly and gas transport system

 #585
20140097270
2014-04-10

Chemical control features in wafer process equipment

 #586
20140096834
2014-04-10

Method for supplying vaporized precursor

 #587
20140083512
2014-03-27

Refillable ampoule with purge capability

 #588
20140076236
2014-03-20

Method and system for supplying a cleaning gas into a process chamber

 #589
20140065827
2014-03-06

Gas distribution showerhead for inductively coupled plasma etch reactor

 #590
20140060430
2014-03-06

Semiconductor processing apparatus including a plurality of reactors, and method for providing the same with process gas

 #591
20140053912
2014-02-27

Methods and apparatus for enhanced gas flow rate control

 #592
20140053776
2014-02-27

Gas line weldment design and process for CVD aluminum

 #593
20140041804
2014-02-13

Plasma processing apparatus and diagnosis method thereof

 #594
20140038395
2014-02-06

Vapor deposition device and vapor deposition method

 #595
20140020764
2014-01-23

Vapor delivery device, methods of manufacture and methods of use thereof

 #596
20130333768
2013-12-19

Point of use valve manifold for semiconductor fabrication equipment

 #597
20130323935
2013-12-05

Film forming method and apparatus

 #598
20130319612
2013-12-05

Plasma chamber having an upper electrode having controllable valves and a method of using the same

 #599
20130312663
2013-11-28

Vapor Delivery Apparatus

 #600
20130295283
2013-11-07

CHEMICAL VAPOR DEPOSITION APPARATUS WITH MULTIPLE INLETS FOR CONTROLLING FILM THICKNESS AND UNIFORMITY