Patents-Review.com
ClassID:

120266 ⎘

C23C16/466 - CPC Classification

Classification description:

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate; Cooling of the substrate using thermal contact gas

Recent Application in this class:
#1
20250374375
2025-12-04

ULTRA-FAST TEMPERATURE SWITCHING PEDESTAL

 #2
20240379400
2024-11-14

WAFER CHUCK STRUCTURE WITH HOLES IN UPPER SURFACE TO IMPROVE TEMPERATURE UNIFORMITY

 #3
20240309509
2024-09-19

METHOD OF COOLING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE COOLING SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM

 #4
20240287678
2024-08-29

METHODS FOR FORMING IMPURITY FREE METAL ALLOY FILMS

 #5
20240229240
2024-07-11

SYSTEMS AND METHODS FOR SUBSTRATE SUPPORT TEMPERATURE CONTROL

 #6
20240200192
2024-06-20

STAGE FOR HEATING AND COOLING OBJECT

 #7
20240191356
2024-06-13

GAS SUPPLY SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND OPERATION METHOD FOR GAS SUPPLY SYSTEM

 #8
20240133035
2024-04-25

Substrate retaining apparatus, system including the apparatus, and method of using same

 #9
20240110282
2024-04-04

LOADLOCK ASSEMBLY INCLUDING CHILLER UNIT

 #10
20230416920
2023-12-28

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

 #11
20230383411
2023-11-30

SUBSTRATE PROCESSING APPARATUS AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM

 #12
20230374659
2023-11-23

Atomic Layer Deposition (ALD) for Multi-Layer Ceramic Capacitors (MLCCs)

 #13
20230323538
2023-10-12

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

 #14
20230295804
2023-09-21

METHOD OF FORMING INTERCONNECT STRUCTURE

 #15
20230197421
2023-06-22

Method for manufacturing semiconductor wafer with wafer chuck having fluid guiding structure

 #16
20230133798
2023-05-04

COOLED EDGE RING WITH INTEGRATED SEALS

 #17
20230104924
2023-04-06

Atomic Layer Deposition (ALD) for Multi-Layer Ceramic Capacitors (MLCCs)

 #18
20230072594
2023-03-09

High power electrostatic chuck design with radio frequency coupling

 #19
20220344193
2022-10-27

Wafer chuck structure with holes in upper surface to improve temperature uniformity

 #20
20220332585
2022-10-20

Method for manufacturing graphene

 #21
20220267904
2022-08-25

METHODS FOR FORMING IMPURITY FREE METAL ALLOY FILMS

 #22
20220259727
2022-08-18

SUBSTRATE HEATING DEVICE, SUBSTRATE HEATING METHOD, AND METHOD OF MANUFACTURING SUBSTRATE HEATER

 #23
20220235463
2022-07-28

SixNy AS A NUCLEATION LAYER FOR SiCxOy

 #24
20220186375
2022-06-16

METHOD FOR RECORDING A STATE OF A CVD REACTOR UNDER PRODUCTION CONDITIONS

 #25
20220122858
2022-04-21

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE

 #26
20220068616
2022-03-03

Plasma processing apparatus and method for dechucking wafer in the plasma processing apparatus

 #27
20220049353
2022-02-17

Methods for forming impurity free metal alloy films

 #28
20210287886
2021-09-16

Temperature control method and plasma processing apparatus

 #29
20210280391
2021-09-09

System and method for managing substrate outgassing

 #30
20210265142
2021-08-26

Method for manufacturing semiconductor wafer with wafer chuck having fluid guiding structure

 #31
20210166958
2021-06-03

Piping assembly and substrate processing apparatus

 #32
20210130960
2021-05-06

Systems and methods for substrate support temperature control

 #33
20210087676
2021-03-25

Modular reactor for microwave plasma-assisted deposition

 #34
20200411359
2020-12-31

Dual-function wafer backside pressure control and edge purge

 #35
20200395197
2020-12-17

Adjustable thermal break in a substrate support

 #36
20200312624
2020-10-01

RF capacitive coupled dual frequency etch reactor

 #37
20200294838
2020-09-17

Substrate fixing device

 #38
20200248306
2020-08-06

Method of controlling substrate processing apparatus, and substrate processing apparatus

 #39
20200173014
2020-06-04

Sample stage/holder for improved thermal and gas flow control at elevated growth temperatures

 #40
20200102653
2020-04-02

Substrate retaining apparatus, system including the apparatus, and method of using same

 #41
20200020556
2020-01-16

Upper cone for epitaxy chamber

 #42
20200010956
2020-01-09

Film-forming apparatus

 #43
20190341234
2019-11-07

Vacuum plasma workpiece treatment apparatus

 #44
20190341231
2019-11-07

RF capacitive coupled etch reactor

 #45
20190301018
2019-10-03

Wafer boat cooldown device

 #46
20190276938
2019-09-12

Substrate processing apparatus and non-transitory computer-readable recording medium

 #47
20190276936
2019-09-12

Condensation suppressing method and processing system

 #48
20190249294
2019-08-15

CARRIER FOR HOLDING A SUBSTRATE, USE OF THE CARRIER IN A PROCESSING SYSTEM, PROCESSING SYSTEM EMPLOYING THE CARRIER, AND METHOD FOR CONTROLLING A TEMPERATURE OF A SUBSTRATE

 #49
20190088521
2019-03-21

System for coupling a voltage to portions of a substrate

 #50
20180286642
2018-10-04

ELECTROSTATIC CHUCK WITH FLEXIBLE WAFER TEMPERATURE CONTROL

 #51
20180265968
2018-09-20

COATING CHAMBER FOR IMPLEMENTING OF A VACUUM-ASSISTED COATING PROCESS, HEAT SHIELD, AND COATING PROCESS

 #52
20180223432
2018-08-09

POLYSILICON PREPARATION APPARATUS

 #53
20180179626
2018-06-28

Large area optical quality synthetic polycrystalline diamond window

 #54
20180163306
2018-06-14

UHV in-situ cryo-cool chamber

 #55
20180053670
2018-02-22

Upper cone for epitaxy chamber

 #56
20180040488
2018-02-08

Substrate processing apparatus, recording medium, and fluid circulation mechanism

 #57
20170352567
2017-12-07

High power electrostatic chuck design with radio frequency coupling

 #58
20170352565
2017-12-07

WORKPIECE CARRIER WITH GAS PRESSURE IN INNER CAVITIES

 #59
20170011951
2017-01-12

Apparatus for depositing a layer on a substrate in a processing gas

 #60
20160376701
2016-12-29

Substrate processing apparatus including heating and cooling device, and ceiling part included in the same

 #61
20160300713
2016-10-13

Eliminating first wafer metal contamination effect in high density plasma chemical vapor deposition systems

 #62
20160296973
2016-10-13

Methods for coating articles

 #63
20160240352
2016-08-18

Plasma processing apparatus and method for manufacturing electronic component

 #64
20160168708
2016-06-16

COMBINED HEAT TREAT AND THIN FILM COATING PROCESS

 #65
20160068397
2016-03-10

Apparatus and method for continuous synthesis of carbon film or inorganic material film

 #66
20150270109
2015-09-24

Methods for plasma processing

 #67
20150090693
2015-04-02

Film formation apparatus and film formation method

 #68
20150090692
2015-04-02

Plasma processing apparatus and plasma processing method

 #69
20150056787
2015-02-26

Device for depositing a layer on a semiconductor wafer by means of vapour deposition

 #70
20150053553
2015-02-26

PLASMA PROCESSING APPARATUS

 #71
20150024540
2015-01-22

Apparatus and process for producing thin layers

 #72
20140342122
2014-11-20

Large area optical quality synthetic polycrystalline diamond window

 #73
20140220262
2014-08-07

Methods for plasma processing

 #74
20140212601
2014-07-31

Methods for plasma processing

 #75
20130288477
2013-10-31

Apparatus and method for depositing a layer onto a substrate

 #76
20120301615
2012-11-29

Thin film-manufacturing apparatus,thin film-manufacturing method,and substrate-conveying roller

 #77
20120168144
2012-07-05

Thermal diffusion chamber control device and method

 #78
20120094483
2012-04-19

Method for forming a film including Zr, Hf or the like, and method for manufacturing a semiconductor device using the same

 #79
20120003497
2012-01-05

Methods for coating articles

 #80
20110262315
2011-10-27

Substrate support having dynamic temperature control

 #81
20110117279
2011-05-19

THIN FILM FORMING METHOD AND FILM FORMING APPARATUS

 #82
20110020545
2011-01-27

Lateral-flow deposition apparatus and method of depositing film by using the apparatus

 #83
20110017139
2011-01-27

System for Depositing a Film by Modulated Ion-Induced Atomic Layer Deposition (MII-ALD)

 #84
20110006040
2011-01-13

Methods for plasma processing

 #85
20110005682
2011-01-13

Apparatus for Plasma Processing

 #86
20110005681
2011-01-13

Plasma generating units for processing a substrate

 #87
20100272887
2010-10-28

THIN FILM FORMING APPARATUS AND THIN FILM FORMING METHOD

 #88
20100190331
2010-07-29

System for Depositing a Film Onto a Substrate Using a Low Vapor Pressure Gas Precursor

 #89
20100014208
2010-01-21

SUBSTRATE HOLDER

 #90
20090110805
2009-04-30

Apparatus and Method for Controlling the Surface Temperature of a Substrate in a Process Chamber

 #91
20090004887
2009-01-01

APPARATUS AND METHOD FOR DEPOSITION OF PROTECTIVE FILM FOR ORGANIC ELECTROLUMINESCENCE

 #92
20080257494
2008-10-23

SUBSTRATE PROCESSING APPARATUS

 #93
20080145556
2008-06-19

METHOD FOR MANUFACTURING SUBSTRATE MOUNTING TABLE

 #94
20070224777
2007-09-27

Substrate holder having a fluid gap and method of fabricating the substrate holder

 #95
20070184189
2007-08-09

Controlling the temperature of a substrate in a film deposition apparatus

 #96
20070065594
2007-03-22

System for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD)

 #97
20070040265
2007-02-22

Substrate support having brazed plates and resistance heater

 #98
20060260747
2006-11-23

Gas introduction system for temperature adjustment of object to be processed

 #99
20060243060
2006-11-02

Method and apparatus for pressure control and flow measurement

 #100
20050120805
2005-06-09

Method and apparatus for substrate temperature control

 #101
20050022741
2005-02-03

Chemical vapor deposition apparatus and method of forming thin layer using same

 #102
20050011457
2005-01-20

Controlling the temperature of a substrate in a film deposition apparatus

 #103
20050000937
2005-01-06

Temperature control system in an ALD chamber