ClassID:

120287 āŽ˜

C23C16/52 - page 6 - CPC Classification

Classification description:

Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating Controlling or regulating the coating process

Recent Application in this class:
#1501
20200411294
2020-12-31

PLASMA IN A SUBSTRATE PROCESSING APPARATUS

#1502
20200407851
2020-12-31

Substrate processing apparatus and method of manufacturing semiconductor device

#1503
20200407850
2020-12-31

FILM FORMING METHOD AND FILM FORMING APPARATUS

#1504
20200407849
2020-12-31

Systems and methods for flow monitoring in a precursor vapor supply system of a substrate processing system

#1505
20200402788
2020-12-24

Method of manufacturing semiconductor device, substrate processing apparatus, recording medium, and method of processing substrate

#1506
20200399759
2020-12-24

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM

#1507
20200399758
2020-12-24

Techniques for controlling precursors in chemical deposition processes

#1508
20200399757
2020-12-24

Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-transitory Computer-readable Recording Medium

#1509
20200399756
2020-12-24

PECVD process

#1510
20200399755
2020-12-24

Processing apparatus

#1511
20200392625
2020-12-17

Substrate processing apparatus, gas nozzle and method of manufacturing semiconductor device

#1512
20200392624
2020-12-17

METHODS AND APPARATUS FOR DEPOSITING YTTRIUM-CONTAINING FILMS

#1513
20200392622
2020-12-17

Substrate processing method and substrate processing apparatus

#1514
20200385868
2020-12-10

Method of using a gas-phase reactor system including analyzing exhausted gas

#1515
20200385867
2020-12-10

Gas-phase reactor system including a gas detector

#1516
20200378000
2020-12-03

Methods for forming films on substrates

#1517
20200377998
2020-12-03

APPARATUS FOR IMPROVED FLOW CONTROL IN PROCESS CHAMBERS

#1518
20200377407
2020-12-03

Coating apparatus for containers

#1519
20200370179
2020-11-26

Systems and methods for controlling vapor phase processing

#1520
20200365388
2020-11-19

Method of processing substate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#1521
20200357669
2020-11-12

Processing tool having a monitoring device

#1522
20200357612
2020-11-12

WAFER PROCESSING METHOD

#1523
20200354836
2020-11-12

Chemical source vessel with dip tube

#1524
20200347498
2020-11-05

Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium

#1525
20200347495
2020-11-05

Wire grid polarizer with multi-layer silane conformal coating

#1526
20200340116
2020-10-29

Heat treatment apparatus, heat treatment method, and film forming method

#1527
20200340115
2020-10-29

Atomic layer deposition apparatus and methods of fabricating semiconductor devices using the same

#1528
20200340104
2020-10-29

System and method for enhancing a diffusion limited CVI/CVD process

#1529
20200339422
2020-10-29

Apparatus for monitoring carbon nanotube growth

#1530
20200335328
2020-10-22

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#1531
20200333766
2020-10-22

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND CONTROL PROGRAM

#1532
20200333189
2020-10-22

System and method for thermally calibrating semiconductor process chambers

#1533
20200332417
2020-10-22

Method and apparatus for fabricating fibers and microstructures from disparate molar mass precursors

#1534
20200325580
2020-10-15

Monitoring thin film deposition

#1535
20200325578
2020-10-15

Substrate pedestal including backside gas-delivery tube

#1536
20200312685
2020-10-01

Method for controlling temperature of furnace in semiconductor fabrication process

#1537
20200312631
2020-10-01

REACTION TUBE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

#1538
20200308696
2020-10-01

Film Forming Method and Film Forming Apparatus

#1539
20200299841
2020-09-24

Abnormality detection system and control board

#1540
20200299838
2020-09-24

Thickness compensation by modulation of number of deposition cycles as a function of chamber accumulation for wafer to wafer film thickness matching

#1541
20200299837
2020-09-24

Vapor delivery device, methods of manufacture and methods of use thereof

#1542
20200294798
2020-09-17

Film forming method and film forming apparatus

#1543
20200294790
2020-09-17

Method for manufacturing semiconductor device, non-transitory computer-readable recording medium, and substrate processing apparatus

#1544
20200291524
2020-09-17

Nano-coating protection method for electrical connectors

#1545
20200291516
2020-09-17

Substrate processing apparatus

#1546
20200286716
2020-09-10

Chucking process and system for substrate processing chambers

#1547
20200283904
2020-09-10

Nano-coating protection method for electrical connectors

#1548
20200283903
2020-09-10

Nano-coating protection method for electrical connectors

#1549
20200283891
2020-09-10

Method for coating temperature-sensitive substrates with polycrystalline diamond

#1550
20200273712
2020-08-27

DEPOSITION PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

#1551
20200263295
2020-08-20

FILM FORMING METHOD, METHOD FOR CLEANING PROCESSING CHAMBER FOR FILM FORMATION, AND FILM FORMING APPARATUS

#1552
20200263294
2020-08-20

METHOD AND DEVICE FOR MONITORING A MICROWAVE PLASMA ASSISTED DEPOSITION

#1553
20200263292
2020-08-20

METHOD AND DEVICE FOR PLASMA TREATMENT OF CONTAINERS

#1554
20200258736
2020-08-13

Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium

#1555
20200255945
2020-08-13

Use of voltage and current measurements to control dual zone ceramic pedestals

#1556
20200255944
2020-08-13

Vaporization device, film formation device, program for a concentration control mechanism, and concentration control method

#1557
20200251656
2020-08-06

Method for manufacturing display device using a mask frame

#1558
20200251384
2020-08-06

Deposition of aluminum oxide etch stop layers

#1559
20200249263
2020-08-06

METHOD AND TOOL FOR ELECTROSTATIC CHUCKING

#1560
20200248305
2020-08-06

Exhaust device, processing system, and processing method

#1561
20200241580
2020-07-30

Multi-channel flow ratio controller and processing chamber

#1562
20200240014
2020-07-30

Asymmetric injection for better wafer uniformity

#1563
20200234981
2020-07-23

Movable and removable process kit

#1564
20200232097
2020-07-23

Substrate processing apparatus and method of manufacturing semiconductor device

#1565
20200227326
2020-07-16

Processing method and plasma processing apparatus

#1566
20200227260
2020-07-16

Selective growth of metal-containing hardmask thin films

#1567
20200227243
2020-07-16

Methods for thermally calibrating reaction chambers

#1568
20200217657
2020-07-09

Distance measurement between gas distribution device and substrate support at high temperatures

#1569
20200216961
2020-07-09

SUBSTRATE PROCESSING APPARATUS, A NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM

#1570
20200216960
2020-07-09

Methods and apparatus for microwave plasma assisted chemical vapor deposition reactors

#1571
20200216959
2020-07-09

HIGH ASPECT RATIO DEPOSITION

#1572
20200216953
2020-07-09

Apparatus for atomic layer deposition and method of forming thin film using the apparatus

#1573
20200209606
2020-07-02

Real-time monitoring microscopic imaging system for nitride MOCVD epitaxial growth mode

#1574
20200208268
2020-07-02

Plasma atomic layer deposition

#1575
20200208266
2020-07-02

Manufacturing processes to synthesize, functionalize, surface treat and/or encapsulate powders, and applications thereof

#1576
20200208264
2020-07-02

SEMICONDUCTOR PROCESSING APPARATUS AND CONTROL METHOD THEREOF

#1577
20200208260
2020-07-02

Method of Forming RuSi Film and Film and Film-Forming Apparatus

#1578
20200203196
2020-06-25

Method for decreasing cool down time with heated system for semiconductor manufacturing equipment

#1579
20200199753
2020-06-25

Fluid control device

#1580
20200199746
2020-06-25

COATING DEVICE AND COATING METHOD FOR TUBE-TYPE PERC SOLAR CELL

#1581
20200198967
2020-06-25

Vanadium nitride film, and member coated with vanadium nitride film and method for manufacturing the same

#1582
20200195216
2020-06-18

Combiner and distributor for adjusting impedances or power across multiple plasma processing stations

#1583
20200194291
2020-06-18

Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium

#1584
20200194269
2020-06-18

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#1585
20200194250
2020-06-18

Method of manufacturing semiconductor device, surface treatment method, substrate processing apparatus, and recording medium

#1586
20200194233
2020-06-18

Film stress control for plasma enhanced chemical vapor deposition

#1587
20200193290
2020-06-18

Thickness prediction network learning method, semiconductor device manufacturing method, and semiconductor material deposition equipment

#1588
20200190661
2020-06-18

Deposition Process Based on Stencil Mask and Application to the Fabrication of Tags Supporting Multi-Functional Traceable Codes

#1589
20200189054
2020-06-18

DEPOSITION APPARATUS, ELECTRONIC DEVICE MANUFACTURING APPARATUS, AND DEPOSITION METHOD

#1590
20200185259
2020-06-11

SEMICONDUCTOR REACTION DEVICE AND METHOD

#1591
20200181763
2020-06-11

Broadband optical monitoring

#1592
20200176291
2020-06-04

Unconsumed precursor monitoring

#1593
20200176261
2020-06-04

Method of determining plasma abnormality, method of manufacturing semiconductor device, and substrate processing apparatus

#1594
20200168439
2020-05-28

Impedance matching network and method

#1595
20200165728
2020-05-28

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#1596
20200161130
2020-05-21

Method of forming polysilicon film and film forming apparatus

#1597
20200157679
2020-05-21

CVI/CVD matrix densification process and apparatus

#1598
20200152433
2020-05-14

Methods and apparatus for microwave plasma assisted chemical vapor deposition reactors

#1599
20200149187
2020-05-14

Vapor phase growth apparatus comprising n reactors, a primary gas supply path, a main secondary gas supply path, (nāˆ’1) auxiliary secondary gas supply paths, a first control circuit, and a second control circuit

#1600
20200149168
2020-05-14

FILM FORMING APPARATUS AND FILM FORMING METHOD

#1601
20200149167
2020-05-14

Method and apparatus for fabricating fibers and microstructures from disparate molar mass precursors

#1602
20200140993
2020-05-07

Apparatus, method, and recording medium storing command for controlling thin-film deposition process

#1603
20200131639
2020-04-30

Shower head, vapor phase growth apparatus, and vapor phase growth method

#1604
20200123659
2020-04-23

Substrate processing apparatus and method of manufacturing semiconductor device

#1605
20200118850
2020-04-16

INTEGRATED SUBSTRATE TEMPERATURE MEASUREMENT ON HIGH TEMPERATURE CERAMIC HEATER

#1606
20200118809
2020-04-16

Selective deposition with atomic layer etch reset

#1607
20200115801
2020-04-16

Source gas supply apparatus, film forming apparatus, and source gas supply method

#1608
20200105523
2020-04-02

Asymmetric wafer bow compensation by chemical vapor deposition

#1609
20200102650
2020-04-02

Method for selective deposition using a base-catalyzed inhibitor

#1610
20200102649
2020-04-02

Pressure transmitter for a semiconductor processing environment

#1611
20200098653
2020-03-26

Substrate processing apparatus and recording medium

#1612
20200098651
2020-03-26

Systems and methods for controlling plasma instability in semiconductor fabrication

#1613
20200098650
2020-03-26

Method for calibrating temperature in chemical vapor deposition

#1614
20200095683
2020-03-26

FILM FORMING METHOD AND FILM FORMING APPARATUS

#1615
20200095681
2020-03-26

Liquid delivery and vaporization apparatus and method

#1616
20200095678
2020-03-26

Method of cleaning, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#1617
20200095676
2020-03-26

Method of manufacturing semiconductor device, non-transitory computer-readable recording medium and substrate processing apparatus

#1618
20200091019
2020-03-19

Stack of multiple deposited semiconductor layers

#1619
20200090968
2020-03-19

Auto-calibrated process independent feedforward control for processing substrates

#1620
20200090931
2020-03-19

Substrate processing apparatus and method of producing semiconductor device

#1621
20200087785
2020-03-19

Substrate processing apparatus

#1622
20200083028
2020-03-12

Multi-functional protective coating

#1623
20200083024
2020-03-12

Multi-layer protective coating

#1624
20200080895
2020-03-12

Heat treatment apparatus and temperature control method

#1625
20200080894
2020-03-12

System and method for thermally calibrating semiconductor process chambers

#1626
20200080202
2020-03-12

Substrate state determining apparatus, substrate processing apparatus, model generating apparatus, and substrate state determining method

#1627
20200071828
2020-03-05

TEMPERATURE-INDEXED THIN FILM DEPOSITION REACTORS

#1628
20200071821
2020-03-05

Substrate processing apparatus, and method of manufacturing semiconductor device

#1629
20200066607
2020-02-27

Suppressing interfacial reactions by varying the wafer temperature throughout deposition

#1630
20200066552
2020-02-27

Sensor array, apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods

#1631
20200066497
2020-02-27

Controlling multiple plasma processes

#1632
20200063257
2020-02-27

Apparatus and method of depositing a layer at atmospheric pressure

#1633
20200063255
2020-02-27

Fixed and portable coating apparatuses and methods

#1634
20200061709
2020-02-27

Porous tools and methods of making the same

#1635
20200058516
2020-02-20

Systems and methods for internal surface conditioning assessment in plasma processing equipment

#1636
20200058499
2020-02-20

Film forming method and film forming apparatus

#1637
20200058498
2020-02-20

Method of depositing silicon nitride

#1638
20200058476
2020-02-20

Plasma treatment method

#1639
20200056285
2020-02-20

Film forming apparatus

#1640
20200056282
2020-02-20

Gas distribution device for a wafer processing apparatus

#1641
20200051838
2020-02-13

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

#1642
20200048770
2020-02-13

CHEMICAL VAPOR DEPOSITION TOOL FOR PREVENTING OR SUPPRESSING ARCING

#1643
20200048764
2020-02-13

Film Forming Apparatus and Film Forming Method

#1644
20200045776
2020-02-06

MULTIZONE LAMP CONTROL AND INDIVIDUAL LAMP CONTROL IN A LAMPHEAD

#1645
20200041407
2020-02-06

Precursor delivery system and methods related thereto

#1646
20200040458
2020-02-06

Multi-port gas injection system and reactor system including same

#1647
20200040456
2020-02-06

Film deposition apparatus and film deposition method

#1648
20200040455
2020-02-06

Methods and apparatus for ALD processes

#1649
20200040450
2020-02-06

System and method for supplying a precursor for an atomic layer deposition (ALD) process

#1650
20200032395
2020-01-30

Plasma processing method and plasma processing apparatus

#1651
20200032392
2020-01-30

HYRODGEN PARTIAL PRESSURE CONTROL IN A VACUUM PROCESS CHAMBER

#1652
20200030887
2020-01-30

HARD COATING, CUTTING TOOL, AND METHOD FOR PRODUCING HARD COATING

#1653
20200024740
2020-01-23

Film forming apparatus, source supply apparatus, and film forming method

#1654
20200024739
2020-01-23

Dual gas feed showerhead for deposition

#1655
20200024731
2020-01-23

Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium

#1656
20200020556
2020-01-16

Upper cone for epitaxy chamber

#1657
20200020509
2020-01-16

Apparatus for depositing metal films with plasma treatment

#1658
20200017973
2020-01-16

CVD apparatus with multi-zone thickness control

#1659
20200017969
2020-01-16

Semiconductor device, method, and tool of manufacture

#1660
20200017967
2020-01-16

Dielectric gapfill using atomic layer deposition (ALD), inhibitor plasma and etching

#1661
20200017963
2020-01-16

Film forming method and film forming apparatus

#1662
20200017962
2020-01-16

Methods for Increasing Hydrogen Trapping Vacancies in Materials

#1663
20200013615
2020-01-09

Selective growth of SIO2 on dielectric surfaces in the presence of copper

#1664
20200006073
2020-01-02

Selective growth of metal-containing hardmask thin films

#1665
20200002815
2020-01-02

Azimuthal critical dimension non-uniformity for double patterning process

#1666
20200002810
2020-01-02

Combination CVD/ALD method, source and pulse profile modification

#1667
20190393057
2019-12-26

SUBSTRATE PROCESSING APPARATUS

#1668
20190391602
2019-12-26

METHODS AND APPARATUS FOR ENHANCED FLOW DETECTION REPEATABILITY OF THERMAL-BASED MASS FLOW CONTROLLERS (MFCS)

#1669
20190390949
2019-12-26

METHODS, APPARATUSES AND SYSTEMS FOR CONDUCTIVE FILM LAYER THICKNESS MEASUREMENTS

#1670
20190390347
2019-12-26

CONTROL DEVICE, FILM FORMING APPARATUS, CONTROL METHOD, FILM FORMING METHOD, AND RECORDING MEDIUM

#1671
20190390346
2019-12-26

Deposition method and deposition apparatus

#1672
20190390345
2019-12-26

Substrate processing apparatus, storage medium and substrate processing method

#1673
20190390343
2019-12-26

Substrate processing system

#1674
20190390335
2019-12-26

Substrate processing apparatus and substrate processing method

#1675
20190390333
2019-12-26

Method of manufacturing semiconductor device, method of managing parts, and recording medium

#1676
20190386287
2019-12-19

Separator for secondary cell having excellent heat resistance and shutdown properties

#1677
20190385850
2019-12-19

Capped ALD films for doping fin-shaped channel regions of 3-D IC transistors

#1678
20190385835
2019-12-19

Substrate treatment method and substrate treatment apparatus

#1679
20190382897
2019-12-19

Method and apparatus for processing substrate

#1680
20190382885
2019-12-19

METHOD TO OBTAIN SiC CLASS OF FILMS OF DESIRED COMPOSITION AND FILM PROPERTIES

#1681
20190382882
2019-12-19

VACUUM DEPOSITION PROCESSING OF MULTIPLE SUBSTRATES

#1682
20190378730
2019-12-12

Processing method and plasma processing apparatus

#1683
20190376187
2019-12-12

METHOD FOR FORMING Si-CONTAINING FILM

#1684
20190376186
2019-12-12

PECVD apparatus for in-situ deposition of film stacks

#1685
20190376184
2019-12-12

CHEMICAL VAPOR DEPOSITION SHOWER HEAD FOR UNIFORM GAS DISTRIBUTION

#1686
20190376183
2019-12-12

Substrate processing chamber with showerhead having cooled faceplate

#1687
20190376180
2019-12-12

Gas-phase chemical reactor and method of using same

#1688
20190371573
2019-12-05

Active showerhead

#1689
20190371572
2019-12-05

FILM-FORMING METHOD AND FILM-FORMING APPARATUS

#1690
20190368045
2019-12-05

Microwave plasma and ultraviolet assisted deposition apparatus and method for material deposition using the same

#1691
20190368044
2019-12-05

Microwave plasma and ultraviolet assisted deposition apparatus and method for material deposition using the same

#1692
20190368038
2019-12-05

Systems and methods for controlling vapor phase processing

#1693
20190368037
2019-12-05

Method for controlling a processing system

#1694
20190368033
2019-12-05

SELECTIVE VAPOR DEPOSITION PROCESS FOR ADDITIVE MANUFACTURING

#1695
20190368032
2019-12-05

Method for continuous coating of metal foils and wires by high-quality graphene

#1696
20190360103
2019-11-28

CVD apparatus with multi-zone thickness control

#1697
20190360101
2019-11-28

Systems and methods for determining film thickness using DC self-bias voltage

#1698
20190360098
2019-11-28

Substrate processing apparatus and method of manufacturing semiconductor device

#1699
20190360095
2019-11-28

Multiple zone gas injection for control of gas phase radicals

#1700
20190355597
2019-11-21

Method of processing substrate and substrate processing apparatus

#1701
20190352778
2019-11-21

Syringe with PECVD lubrication

#1702
20190348278
2019-11-14

Semiconductor film forming method and film forming apparatus

#1703
20190348274
2019-11-14

Method for forming thin film

#1704
20190346838
2019-11-14

Common Terminal Heater for Ceramic Pedestals Used in Semiconductor for Fabrication

#1705
20190345608
2019-11-14

METHOD OF PROVIDING A PLASMA ATOMIC LAYER DEPOSITION

#1706
20190345605
2019-11-14

Substrate processing apparatus and method of manufacturing semiconductor device

#1707
20190345604
2019-11-14

Film forming apparatus, film forming method, and method for manufacturing a semiconductor device using the film forming apparatus

#1708
20190345602
2019-11-14

Method and apparatus for decreasing the radial temperature gradient in CVI/CVD furnaces

#1709
20190338422
2019-11-07

Use of voltage and current measurements to control dual zone ceramic pedestals

#1710
20190338421
2019-11-07

Nano-coating protection method for electrical devices

#1711
20190338420
2019-11-07

PRESSURE SKEW SYSTEM FOR CONTROLLING CENTER-TO-EDGE PRESSURE CHANGE

#1712
20190337012
2019-11-07

Nano-coating protection method for electrical connectors

#1713
20190333764
2019-10-31

Plasma enhanced CVD with periodic high voltage bias

#1714
20190330741
2019-10-31

Gas injectors and wafer processing apparatuses having the same

#1715
20190330740
2019-10-31

SUBSTRATE PROCESSING APPARATUS AND METHOD

#1716
20190330739
2019-10-31

Shower head, vapor phase growth apparatus, and vapor phase growth method

#1717
20190328299
2019-10-31

Syringe with PECVD lubricity layer

#1718
20190326124
2019-10-24

Method for processing workpiece

#1719
20190326030
2019-10-24

Highly twinned, oriented polycrystalline diamond film and method of manufacture thereof

#1720
20190323123
2019-10-24

Treatment chamber for a chemical vapour deposition (CVD) reactor and thermalization process carried out in this chamber

#1721
20190316274
2019-10-17

Vapor phase growth apparatus and vapor phase growth method

#1722
20190316257
2019-10-17

Film-forming apparatus and film-forming method

#1723
20190316254
2019-10-17

SUBSTRATE TREATMENT APPARATUS AND SUBSTRATE TREATMENT METHOD

#1724
20190311884
2019-10-10

RF TAILORED VOLTAGE ON BIAS OPERATION

#1725
20190309420
2019-10-10

Substrate Processing Apparatus and Substrate Processing Method

#1726
20190304771
2019-10-03

Method of manufacturing semiconductor device having higher exhaust pipe temperature and non-transitory computer-readable recording medium

#1727
20190301020
2019-10-03

Substrate processing apparatus and control system

#1728
20190301019
2019-10-03

BORON-BASED FILM FORMING METHOD AND APPARATUS

#1729
20190301011
2019-10-03

LOW TEMPERATURE IN-SITU CLEANING METHOD FOR EPI-CHAMBERS

#1730
20190294151
2019-09-26

Method of manufacturing semiconductor device

#1731
20190292656
2019-09-26

Method of forming tungsten film and controller

#1732
20190287831
2019-09-19

Substrate processing apparatus, substrate processing system and method of manufacturing semiconductor device

#1733
20190287830
2019-09-19

Substrate processing apparatus and method of manufacturing semiconductor device

#1734
20190287829
2019-09-19

Substrate processing apparatus and method of manufacturing semiconductor device

#1735
20190287787
2019-09-19

Film forming method and film forming apparatus

#1736
20190284716
2019-09-19

APPARATUS AND METHOD OF PRODUCING DIAMOND AND PERFORMING REAL TIME IN SITU ANALYSIS

#1737
20190284698
2019-09-19

Flow rate control method, flow rate control device, and film forming apparatus

#1738
20190284696
2019-09-19

Substrate processing apparatus and ceiling heater

#1739
20190284691
2019-09-19

FILM FORMING METHOD AND FILM FORMING APPARATUS

#1740
20190284690
2019-09-19

Method and apparatus for making a vapor of precise concentration by sublimation

#1741
20190284689
2019-09-19

Plasma Enhanced ALD System

#1742
20190279877
2019-09-12

Method of manufacturing semiconductor device, substrate processing apparatus and recording medium

#1743
20190277783
2019-09-12

XPS metrology for process control in selective deposition

#1744
20190276938
2019-09-12

Substrate processing apparatus and non-transitory computer-readable recording medium

#1745
20190276937
2019-09-12

METHOD FOR CONTROLLING THE DEPOSITION RATE OF THIN FILMS IN A VACUUM MULTI-NOZZLE PLASMA SYSTEM AND A DEVICE FOR PERFORMING OF THE METHOD

#1746
20190276936
2019-09-12

Condensation suppressing method and processing system

#1747
20190276935
2019-09-12

Film forming apparatus

#1748
20190276934
2019-09-12

Semiconductor processing apparatus comprising one or more pyrometers for measuring a temperature of a substrate during transfer of the substrate

#1749
20190273128
2019-09-05

Methods of manufacturing driving substrates, driving substrates and display apparatuses

#1750
20190272993
2019-09-05

Method for depositing a metal chalcogenide on a substrate by cyclical deposition

#1751
20190271077
2019-09-05

Film deposition method and film deposition apparatus

#1752
20190267262
2019-08-29

Light irradiation type heat treatment apparatus including oxygen analyzer and heat treatment method thereof

#1753
20190267236
2019-08-29

METHOD AND APPARATUS FOR FORMING SILICON FILM, GERMANIUM FILM, OR SILICON GERMANIUM FILM

#1754
20190264326
2019-08-29

Fluid control system and product manufacturing method using fluid control system

#1755
20190259860
2019-08-22

Processing method

#1756
20190256999
2019-08-22

HEATING METHOD FOR A REACTOR FOR EPITAXIAL DEPOSITION AND REACTOR FOR EPITAXIAL DEPOSITION

#1757
20190256978
2019-08-22

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

#1758
20190256972
2019-08-22

Tungsten film-forming method, film-forming system and storage medium

#1759
20190252185
2019-08-15

Apparatus and Method of Forming a Semiconductor Layer

#1760
20190252182
2019-08-15

Manufacturing method for forming a thin film between two terminals

#1761
20190249304
2019-08-15

RESIN CONTAINER COATING DEVICE

#1762
20190249295
2019-08-15

AMMONIA PRE-TREATMENT TO PROMOTE AMORPHOUS SILICON ADHESION TO ALUMINUM NITRIDE

#1763
20190244842
2019-08-08

Position and temperature monitoring of ALD platen susceptor

#1764
20190244841
2019-08-08

Semiconductor manufacturing apparatus

#1765
20190243392
2019-08-08

Method and apparatus for pulse gas delivery with isolation valves

#1766
20190242818
2019-08-08

ABSORBANCE METER AND SEMICONDUCTOR MANUFACTURING DEVICE USING ABSORBANCE METER

#1767
20190233941
2019-08-01

APPARATUS FOR COATING PARTICLES, AND PROCESS

#1768
20190229267
2019-07-25

Coating device and coating method

#1769
20190229128
2019-07-25

VNAND tensile thick TEOS oxide

#1770
20190229004
2019-07-25

Dynamic leveling process heater lift

#1771
20190226092
2019-07-25

Method, non-volatile memory and control device

#1772
20190221460
2019-07-18

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

#1773
20190221458
2019-07-18

Advanced temperature monitoring system and methods for semiconductor manufacture productivity

#1774
20190221434
2019-07-18

Tungsten film forming method, film forming system and film forming apparatus

#1775
20190221425
2019-07-18

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#1776
20190218666
2019-07-18

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#1777
20190214281
2019-07-11

HEAT TREATING APPARATUS, COOLING METHOD FOR HEAT PLATE AND RECORDING MEDIUM

#1778
20190212128
2019-07-11

In-situ metrology method for thickness measurement during PECVD processes

#1779
20190211453
2019-07-11

Method based on multi-source deposition for fabricating perovskite film

#1780
20190211449
2019-07-11

Substrate processing apparatus, liquid precursor replenishment system, and method of manufacturing semiconductor device

#1781
20190211446
2019-07-11

A Non-Contact Substrate Carrier for Simultaneous Rotation and Levitation of a Substrate

#1782
20190206697
2019-07-04

Plasma apparatus for high aspect ratio selective lateral etch using cyclic passivation and etching

#1783
20190203358
2019-07-04

Techniques for controlling precursors in chemical deposition processes

#1784
20190203354
2019-07-04

Conformality modulation of metal oxide films using chemical inhibition

#1785
20190203337
2019-07-04

Apparatus and method for adsorbing a mask, evaporation device, and evaporation method

#1786
20190198367
2019-06-27

High pressure wafer processing systems and related methods

#1787
20190194809
2019-06-27

APPARATUS AND METHODS FOR ATOMIC LAYER DEPOSITION

#1788
20190194807
2019-06-27

Film forming method

#1789
20190194803
2019-06-27

SUSCEPTOR CLEANING METHOD

#1790
20190194802
2019-06-27

Plasma process apparatus with low particle contamination and method of operating the same

#1791
20190193247
2019-06-27

Grinding disk and method of manufacturing the same

#1792
20190189440
2019-06-20

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#1793
20190189422
2019-06-20

Method for manufacturing semiconductor device, substrate-processing apparatus, and recording medium

#1794
20190186009
2019-06-20

SYSTEM FOR FORMING COMPOSITIONALLY-GRADED THIN FILMS

#1795
20190185995
2019-06-20

Method of manufacturing tantalum carbide coating layer using chemical vapor deposition and tantalum carbide manufactured using the same

#1796
20190180981
2019-06-13

Gas splitting by time average injection into different zones by fast gas valves

#1797
20190177851
2019-06-13

SYSTEM AND METHOD FOR GAS PHASE DEPOSITION

#1798
20190177850
2019-06-13

Concentration controller, gas control system, deposition apparatus, concentration control method, and program recording medium for concentration controller

#1799
20190177849
2019-06-13

Method of processing substrate

#1800
20190177841
2019-06-13

FILM FORMING APPARATUS