ClassID:

120640

C23F11/146 - CPC Classification

Classification description:

Inhibiting corrosion of metallic material by applying inhibitors to the surface in danger of corrosion or adding them to the corrosive agent in other liquids using organic inhibitors; Nitrogen-containing compounds containing a multiple nitrogen-to-carbon bond

Recent Application in this class:
#1
20260125604
2026-05-07

REFINERY CRUDE DISTILLATION UNIT CORROSION INHIBITOR

#2
20250257471
2025-08-14

ETHOXYLATED FATTY DIAMINE AS A CORROSION INHIBITOR FOR PIPELINES AND STORAGE TANKS

#3
20250236958
2025-07-24

SURFACE ENHANCEMENT OF TRIVALENT CHROMIUM CONVERSION COATINGS AND METHODS THEREOF

#4
20250179373
2025-06-05

REFINERY CRUDE DISTILLATION UNIT CORROSION INHIBITOR

#5
20250109503
2025-04-03

MALEATED FATTY IMIDAZOLINE DERIVATIVES FOR CORROSION INHIBITORS

#6
20240368468
2024-11-07

AQUEOUS FORMULATION OF OIL-SOLUBLE CORROSION INHIBITOR, AND PREPARATION METHOD AND REGENERATION METHOD THEREOF

#7
20240301275
2024-09-12

CORROSION INHIBITOR COMPOSITION FOR WET SOUR CRUDE

#8
20240295030
2024-09-05

ETCHANT COMPOSITION

#9
20240183038
2024-06-06

Ethoxylated fatty diamine as a corrosion inhibitor for pipelines and storage tanks

#10
20220403224
2022-12-22

Inhibiting corrosion in gas wells

#11
20170356093
2017-12-14

Corrosion inhibition for aqueous systems using a halogenated triazole

#12
20170190952
2017-07-06

Multiple hydrophilic head corrosion inhibitors

#13
20150125704
2015-05-07

Polyisocyanate-based anti-corrosion coating

#14
20140255250
2014-09-11

Inhibition of corrosion in boiler systems with etheramines

#15
20130115467
2013-05-09

Polyisocyanate-based anti-corrosion coating

#16
20130072411
2013-03-21

Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate

#17
20110155959
2011-06-30

Methods and compositions for inhibiting corrosion

#18
20100035785
2010-02-11

Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate

#19
20070157846
2007-07-12

Antirust composition

#20
20050215446
2005-09-29

Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate