120620 ⎘
Processes for removing metallic material from surfaces, not provided for in group or
USE OF HIGH ENERGY HEAVY ION BEAM FOR DIRECT SPUTTERING
#302Slide part and surface processing methods of the same
#303Method for modifying an etch rate of a material layer using energetic charged particles
#304Localized plasma processing
#305Plasma etching method and plasma etching apparatus
#306Plasma etch for chromium alloys
#307LOWER CHAMBER HEATERS FOR IMPROVED ETCH PROCESSES
#308Stamping tool and treatment method for stamping tool surface
#309FIB Process for Selective and Clean Etching of Copper
#310FIB Process for Selective and Clean Etching of Copper
#311Multi-film stack etching with polymer passivation of an overlying etched layer
#312ETCH METHOD IN THE MANUFACTURE OF AN INTEGRATED CIRCUIT
#313Method of manufacturing magnetic recording medium
#314METHOD OF ETCHING A MULTI-LAYER
#315Method for eliminating metallic lithium
#316DRY ETCHING METHOD, MAGNETO-RESISTIVE ELEMENT, AND METHOD AND APPARATUS FOR MANUFACTURING THE SAME
#317PROCESS AND APPARATUS FOR FABRICATING MAGNETIC DEVICE
#318PROCESS AND APPARATUS FOR FABRICATING MAGNETIC DEVICE
#319FABRICATION OF METALLIC STAMPS FOR REPLICATION TECHNOLOGY
#320Blade member, and edge working apparatus for the blade member
#321Methods and systems for removing a material from a sample
#322Method and apparatus for manufacturing magnetic recording media
#323DEVICE FOR PROCESSING WELDING WIRE
#324Photomask blank and photomask making method
#325Power storage device
#326Formation method of water repellent layer and injector having water repellent layer
#327Method of manufacturing magnetic recording medium
#328ETCHING METHOD AND ETCHING APPARATUS
#329Method of Smoothing Solid Surface with Gas Cluster Ion Beam and Solid Surface Smoothing Apparatus
#330Beam-induced etching
#331Substrate processing methods for reflectors
#332Process for etching a metal layer suitable for use in photomask fabrication
#333Electromagnet array in a sputter reactor
#334Critical dimension reduction and roughness control
#335Monocyclic high aspect ratio titanium inductively coupled plasma deep etching processes and products so produced
#336Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
#337Solid surface smoothing apparatus
#338MULTI-STEP ETCH PROCESS FOR GRANULAR MEDIA
#339Plasma processing apparatus and methods for removing extraneous material from selected areas on a substrate
#340Etching method, method for producing dielectric film of low dielectric constant, method for producing porous member, etching system and thin film forming equipment
#341COPPER LAYER PROCESSING
#342Method and installation for the vacuum colouring of a metal strip by means of magnetron sputtering
#343Flex-rigid printed wiring board and manufacturing method thereof
#344BARRIER METAL FILM PRODUCTION APPARATUS, BARRIER METAL FILM PRODUCTION METHOD, METAL FILM PRODUCTION METHOD, AND METAL FILM PRODUCTION APPARATUS
#345METHOD OF FABRICATING MAGNETIC DEVICE
#346Metal material and its manufacturing method, thin-film device and its manufacturing method, element-side substrate and its manufacturing method, and liquid crystal display and its manufacturing method
#347Removing reflective layers from EUV mirrors
#348Selective etching and formation of xenon difluoride
#349METHOD AND SYSTEM FOR PATTERNING OF MAGNETIC THIN FLIMS USING GASEOUS TRANSFORMATION
#350Low-temperature wafer bonding of semiconductors to metals
#351Nanopin manufacturing method and nanometer sized tip array by utilizing the method
#352METHOD AND APPARATUS FOR PRODUCING A FEATURE HAVING A SURFACE ROUGHNESS IN A SUBSTRATE
#353SURFACE TREATMENT METHOD
#354DRY-ETCHING METHOD AND APPARATUS
#355Photon induced cleaning of a reaction chamber
#356Interconnect structure and method of making same
#357Systems for detecting unconfined-plasma events
#358PRODUCTION METHOD FOR SEMICONDUCTOR DEVICE
#359Method of manufacturing metal wiring and method of manufacturing semiconductor device
#360METHOD AND INSTALLATION FOR THE VACUUM COLOURING OF A METAL STRIP BY MEANS OF MAGNETRON SPUTTERING
#361Method of fabricating filtered printhead ejection nozzle
#362FIB milling of copper over organic dielectrics
#363Method for dry etching AlOfilm
#364Reactive Ion Etching Process for Etching Metals
#365Etching Process
#366BONDING WIRE CLEANING UNIT AND METHOD OF WIRE BONDING USING THE SAME
#367Endpoint detection for photomask etching
#368Dry etching method, fine structure formation method, mold and mold fabrication method
#369Vacuum prcessing apparatus and vacuum processing method of sample
#370Method and apparatus for flattening solid surface
#371Method for the formation of surfaces on the inside of medical devices
#372Wiring and manufacturing method thereof, semiconductor device comprising said wiring, and dry etching method
#373METHOD FOR PHOTOMASK FABRICATION UTILIZING A CARBON HARD MASK
#374Masking material for dry etching
#375Endpoint detection for photomask etching
#376Plasma processing apparatus and method for controlling the same
#377Inkjet printhead nozzle with a patterned surface
#378Plasma processing apparatus and plasma processing method
#379Pulsed-plasma system with pulsed sample bias for etching semiconductor substrates
#380Plasma processing method and plasma processing apparatus
#381GAS DISTRIBUTION UNIFORMITY IMPROVEMENT BY BAFFLE PLATE WITH MULTI-SIZE HOLES FOR LARGE SIZE PECVD SYSTEMS
#382ENDPOINT DETECTION FOR PHOTOMASK ETCHING
#383Confinement ring drive
#384Gas for plasma reaction, process for producing the same, and use thereof
#385Etching method and etching apparatus
#386Method for photomask fabrication utilizing a carbon hard mask
#387Etching of nano-imprint templates using an etch reactor
#388Electrode Array Device Having An Adsorbed Porous Reaction Layer
#389Nanometer-scale sharpening of conductor tips
#390Method and apparatus for photomask plasma etching
#391Film formation apparatus and film formation method and cleaning method
#392PHOTOMASK FABRICATION UTILIZING A CARBON HARD MASK
#393Method to minimize CD etch bias
#394Photomask blank, photomask and method for producing those
#395Photomask blank and photomask making method
#396Plasma processing apparatus and method for controlling the same
#397Etch methods to form anisotropic features for high aspect ratio applications
#398Dry etching method, fine structure formation method, mold and mold fabrication method
#399Dry etching method, fine structure formation method, mold and mold fabrication method
#400Process for etching photomasks
#401Formation of nanoscale surfaces for the atttachment of biological materials
#402Plasma processing apparatus and plasma processing method
#403Method of manufacturing an electrical component
#404Vacuum processing apparatus and vacuum processing method of sample
#405Planarization with reduced dishing
#406Method of forming a metal line and method of manufacturing display substrate having the same
#407Etch selectivity enhancement in electron beam activated chemical etch
#408Structural modification using electron beam activated chemical etch
#409Method for setting plasma chamber having an adaptive plasma source, plasma etching method using the same and manufacturing method for adaptive plasma source
#410Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
#411Masking material for dry etching
#412Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
#413Metal MEMS devices and methods of making same
#414Radio frequency grounding rod
#415Radio frequency grounding apparatus
#416Process for etching a metal layer suitable for use in photomask fabrication
#417Method and device for removing layers in some areas of glass plates
#418Method of forming patterns and method of manufacturing magnetic recording media
#419Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
#420Method of fabricating inkjet nozzle chambers having filter structures
#421Method of fabricating inkjet nozzles having associated ink priming features
#422Method of fabricating inkjet nozzle chambers having sidewall entrance
#423Plasma ethching apparatus and plasma etching process
#424Method for plasma etching a chromium layer through a carbon hard mask suitable for photomask fabrication
#425Methods for protecting metal surfaces
#426Vacuum plasma processor having a chamber with electrodes and a coil for plasma excitation and method of operating same
#427METHOD FOR PREVENTING CHARGE-UP IN PLASMA PROCESS AND SEMICONDUCTOR WAFER MANUFACTURED USING SAME
#428Three-dimensional metal microfabrication process and devices produced thereby
#429Surface treating method and surface-treating apparatus
#430Gas for removing deposit and removal method using same
#431Method for advanced time-multiplexed etching
#432Cluster tool and method for process integration in manufacturing of a photomask
#433Cluster tool and method for process integration in manufacturing of a photomask
#434Method for manufacturing semiconductor device
#435Method of plasma etching transition metals and their compounds
#436Plasma etching apparatus and plasma etching method
#437Method and apparatus for manufacturing magnetic recording media
#438Method for fabricating semiconductor device
#439Rolled product, method and device for the production thereof, and use of the same
#440Electrode assembly and plasma processing apparatus
#441Method for smoothing a solid surface
#442Method for manufacturing a magnetic sensor having an ultra-narrow track width
#443Vacuum reaction chamber with x-lamp heater
#444Method and apparatus for cleaning and surface conditioning objects using plasma
#445Critical dimension reduction and roughness control
#446Method to address carbon incorporation in an interpoly oxide
#447Plasma processing apparatus
#448Semiconductor device fabrication method
#449Vacuum processing apparatus and vacuum processing method of sample
#450Beam-induced etching
#451Gas distribution uniformity improvement by baffle plate with multi-size holes for large size PECVD systems
#452Selective isotropic etch for titanium-based materials
#453FIB MILLING OF COPPER OVER ORGANIC DIELECTRICS
#454Bonding wire cleaning unit and method of wire bonding using same
#455Capacitive coupling plasma processing apparatus and method for using the same
#456Method and apparatus for cleaning and surface conditioning objects using plasma
#457Plasma processing method and apparatus
#458Plasma processing method and apparatus, and method for measuring a density of fluorine in plasma
#459Gas supply member and plasma processing apparatus
#460Reflectors, substrate processing apparatuses and methods for the same
#461Chuck pedestal shield
#462Control of process gases in specimen surface treatment system
#463Photo resist stripping and de-charge method for metal post etching to prevent metal corrosion
#464Specimen surface treatment system
#465Specimen surface treatment system
#466Purge process conducted in the presence of a purge plasma
#467Plasma processing method and apparatus
#468Mask material for reactive ion etching, mask and dry etching method
#469Method for plasma etching a chromium layer suitable for photomask fabrication
#470Methods and apparatus for etching metal layers on substrates
#471Method for making a contact magnetic transfer template
#472Confinement ring drive
#473Pattern reversal process for self aligned imprint lithography and device
#474Method and apparatus for forming surface shape, method and apparatus for forming flying surface shape of magnetic head
#475Low temperature, atmospheric pressure plasma generation and applications
#476Focus rings, apparatus in chamber, contact hole and method of forming contact hole
#477Process for manufacturing a reference leak
#478Window protector for sputter etching of metal layers
#479Method for controlling corrosion of a substrate
#480Magnetic head and method of making the same using an etch-stop layer for removing portions of the capping layer
#481Method for fabricating semiconductor device using ArF photolithography capable of protecting tapered profile of hard mask
#482Method for manufacturing magnetic recording medium
#483Planarization with reduced dishing
#484Plasma etching method
#485Atmospheric pressure plasma system
#486Plasma processing apparatus and methods for removing extraneous material from selected areas on a substrate
#487Plasma processing apparatus and method for controlling the same
#488Method for removing at least one partial area of a component made of metal or a metallic compound
#489Method for etching chromium thin film and method for producing photomask
#490Electrode array device having an adsorbed porous reaction layer
#491Post-etch treatment to remove residues
#492Selective etching processes of SiO, Ti and InOthin films for FeRAM device applications
#493Gas-introducing system and plasma CVD apparatus
#494Plasma etching method
#495Method to address carbon incorporation in an interpoly oxide
#496Method of etching metals with high selectivity to hafnium-based dielectric materials
#497Thin film forming method and system
#498Plasma treatment method
#499Method for making chrome photo mask
#500Barrier metal film production apparatus, barrier metal film production method, metal film production method, and metal film production apparatus
#501Multi-step process for etching photomasks
#502Localized plasma processing
#503Electrically floating diagnostic plasma probe with ion property sensors
#504Mirror process using tungsten passivation layer for preventing metal-spiking induced mirror bridging and improving mirror curvature
#505Transition radiation apparatus and method therefor
#506Method for the recovery of ash rate following metal etching
#507Imprint stamp
#508Process for low temperature, dry etching, and dry planarization of copper
#509Method and apparatus for stable plasma processing
#510Method of dry etching, method of manufacturing magnetic recording medium, and magnetic recording medium
#511Dry-etching method and apparatus
#512Diagnostic plasma measurement device having patterned sensors and features
#513Two-axis device and manufacturing method therefor
#514Plasma processing apparatus and method, and plasma control unit
#515Seasoning method for etch chamber
#516Wiring and manufacturing method thereof, semiconductor device comprising said wiring, and dry etching method
#517Multi-step process for forming a metal barrier in a sputter reactor
#518Magnetic memory device and method of manufacturing the same
#519Selective dry etching of tantalum and tantalum nitride
#520Device for processing welding wire
#521Metal wiring and method of manufacturing the same, and metal wiring substrate and method of manufacturing the same
#522Anisotropic dry etching of Cu-containing layers
#523Plasma etching of Ni-containing materials
#524Plasma etching apparatus and plasma etching process
#525Method of forming a catalytic surface comprising at least one of Pt, Pd, Co and Au in at least one of elemental and alloy forms
#526Method of cleaning reaction chamber using substrate having catalyst layer thereon
#527Method for etching upper metal of capacitator
#528Plasma processing apparatus and plasma processing method
#529Master for concavo-convex pattern transfer and method for manufacturing stamp for manufacturing information recording medium
#530Surface treatment process for enhancing a release rate of metal ions from a sacrificial electrode and a related sacrificial electrode
#531Film formation apparatus and film formation method and cleaning method
#532Process for the locally restricted etching of a chromium layer
#533Method of manufacturing semiconductor device
#534Gas for plasma reaction, process for producing the same, and use
#535Method and system for patterning of magnetic thin films using gaseous transformation to transform a magnetic portion to a non-magnetic portion
#536FIB milling of copper over organic dielectrics
#537Selective isotropic etch for titanium-based materials
#538Wiring and manufacturing method thereof, semiconductor device comprising said wiring, and dry etching method
#539Process for defining a chalcogenide material layer, in particular in a process for manufacturing phase change memory cells
#540Magnetic memory device and method of manufacturing the same
#541Dry etching method for magnetic material
#542Method and apparatus for dry-etching half-tone phase-shift films, half-tone phase-shift photomasks and method for the preparation thereof, and semiconductor circuits and method for the fabrication thereof
#543Multi-step process for etching photomasks
#544Thin film resistor etch
#545Method and apparatus for smoothing surfaces on an atomic scale
#546Protective leaching mask assemblies and methods of use
#547Method of fabricating single Rh layer optical field enhancer with pre-focusing structures
#548Method and apparatus for removing paint on metallic components
#549Process for repairing a worn carburized steel surface of a sprag clutch
#550Etching technique for microfabrication substrates
#551Protective leaching mask assemblies and methods of use