120708 ⎘
Cleaning or pickling metallic material with solutions or molten salts with acid solutions; Other heavy metals copper or alloys of copper
PASSIVATION COATING ON COPPER METAL SURFACE FOR COPPER WIRE BONDING APPLICATION
#2METHOD FOR SMOOTHING SURFACE OF COPPER FOIL AND COPPER FOIL OBTAINED
#3Methods for wet atomic layer etching of copper
#4Silver-plated product and method for producing same
#5Method for increasing adhesion strength between a surface of copper or copper alloy and an organic layer
#6WATER-SOLUBLE FLUX AND COPPER MATERIAL PICKLING METHOD
#7Metallic material surface treatment agent, metallic material having surface treatment coating, and manufacturing method therefor
#8Method for manufacturing circuit board
#9Method and system for cleaning copper-exposed substrate
#10Method for manufacturing circuit board
#11Methods, systems and apparatuses for copper removal from aluminum desmutting solutions
#12Compositions and methods that promote charge complexing copper protection during low pKa driven polymer stripping
#13COMPOSITION AND METHOD FOR MICRO ETCHING OF COPPER AND COPPER ALLOYS
#14COPPER ALLOY PLATE STRIP FOR USE IN LED LEAD FRAME
#15Method for surface treatment of metals using bacteria
#16High-precision zinc-based alloy electrode wire and manufacture method thereof
#17Method and system for cleaning copper-exposed substrate
#18Oxidizing aqueous cleaner for the removal of post-etch residues
#19Method for manufacturing brass-plated steel wire and brass-plated steel wire
#20Method of treating wiring substrate and wiring substrate manufactured by the same
#21Low Etch Process for Direct Metallization
#22Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
#23Plating method of circuit substrate, production method of plated circuit substrate, and silver etching liquid
#24Process for inhibiting oxide formation on copper surfaces
#25CLEANING SOLUTION FOR SIDEWALL POLYMER OF DAMASCENE PROCESSES
#26Oxidizing aqueous cleaner for the removal of post-etch residues
#27PROCESS FOR SURFACE TREATMENT OF METALS
#28Method for manufacturing semiconductor device
#29Acidic cleaner for metal surfaces
#30PROCESS FOR INHIBITING OXIDE FORMATION ON COPPER SURFACES
#31Bevel plasma treatment to enhance wet edge clean
#32Composition for cleaning and rust prevention and process for producing semiconductor element or display element
#33Method of surface treatment for metal glass part, and metal glass part with its surface treated by the method
#34Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
#35Composition and method for improved adhesion of polymeric materials to copper alloy surfaces
#36Low-temperature wafer bonding of semiconductors to metals
#37Oxidizing aqueous cleaner for the removal of post-etch residues
#38Sarcosine compound used as corrosion inhibitor
#39PROCESS FOR SURFACE TREATMENT OF METALS
#40COMPOSITIONS AND METHOD FOR TREATING A COPPER SURFACE
#41Oxidant and passivant composition and method for use in treating a microelectronic structure
#42COBALT CAPPING SURFACE PREPARATION IN MICROELECTRONICS MANUFACTURE
#43CONSUMER PRODUCTS HAVING VARYING ODOR PATTERNS
#44PROCESS FOR SURFACE TREATMENT OF METALS
#45Surface treatment process for metal articles
#46Process for removing contaminant from a surface and composition useful therefor description
#47IMPROVED ACIDIC CHEMISTRY FOR POST-CMP CLEANING
#48METHOD OF REACTIVATING ELECTRODE FOR ELECTROLYSIS
#49Method for Fabricating A Semiconductor Device Comprising Surface Cleaning
#50Cleaning formulation for removing residues on surfaces
#51Semiconductor process residue removal composition and process
#52METHOD OF CLEANING POST-CMP WAFER
#53Cleaning compositions and methods of use thereof
#54CLEANING COMPOSITION FOR SEMICONDUCTOR DEVICE-MANUFACTURING APPARATUS AND CLEANING METHOD
#55Selective removal chemistries for semiconductor applications, methods of production and uses thereof
#56Acidic chemistry for Post-CMP cleaning using a composition comprising mercaptopropionic acid
#57Method of cleaning a semiconductor wafer
#58Method for isotropic etching of copper
#59Stable acid inhibitor formulations with improved performance, lower toxicity and minimal environmental issues
#60Wafer cleaning solution for cobalt electroless application
#61Textured decorative plating on plastic components
#62Cleaning composition
#63Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
#64Wet processing method and processing apparatus of substrate
#65Composition and a method for defect reduction
#66Acidic chemistry for post-CMP cleaning
#67Chemical mechanical polishing slurries and cleaners containing salicylic acid as a corrosion inhibitor
#68Methods of cleaning copper surfaces in the manufacture of printed circuit boards
#69Method for isotropic etching of copper
#70Cleaning tantalum-containing deposits from process chamber components
#71System and method for cleaning stator cooling coils