120709 ⎘
Cleaning or pickling metallic material with solutions or molten salts with acid solutions; Other heavy metals refractory metals
HIGH-PURITY TANTALUM POWDER AND PREPARATION METHOD THEREFOR
#2Preparation method of large-scale die blank for vacuum isothermal forging
#3PROCESS FOR REGENERATING A BATH FOR CHEMICAL ETCHING OF TITANIUM PARTS
#4Method of manufacturing sputtering target and sputtering target
#5Method of manufacturing sputtering target and sputtering target
#6Compositions and Methods for Activating Titanium Substrates
#7MOLYBDENUM CONTAINING TARGETS
#8Titanium nano-scale etching on an implant surface
#9Chemical decontamination method using chelate free chemical decontamination reagent for removal of the dense radioactive oxide layer on the metal surface
#10Decontamination method reducing radioactive waste
#11DEPOSITION OF DISCRETE NANOPARTICLES ON AN IMPLANT SURFACE
#12Molybdenum containing targets
#13Titanium nano-scale etching on an implant surface
#14Method of manufacturing sputtering target and sputtering target
#15Titanium material or titanium alloy material having surface electrical conductivity and method for producing the same, and fuel cell separator and fuel cell using the same
#16Titanium material or titanium alloy material having surface electrical conductivity, and fuel cell separator and fuel cell using the same
#17Liquid composition for removing titanium nitride, semiconductor-element cleaning method using same, and semiconductor-element manufacturing method
#18Titanium nano-scale etching on an implant surface
#19Molybdenum containing targets for touch screen device
#20Titanium nano-scale etching on an implant surface
#21Oxidizing aqueous cleaner for the removal of post-etch residues
#22Titanium material for polymer electrolyte fuel cell separator, method for producing the same, and polymer electrolyte fuel cell using the same
#23Titanium nano-scale etching on an implant surface
#24Deposition of discrete nanoparticles on an implant surface
#25Method of removing work-affected layer
#26Method of making molybdenum containing targets comprising molybdenum, titanium, and tantalum or chromium
#27Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
#28Nanosurface
#29Method of descaling metallic devices
#30Titanium nano-scale etching on an implant surface
#31Oxidizing aqueous cleaner for the removal of post-etch residues
#32Molybdenum containing targets
#33Nanosurface
#34Method of surface treatment for metal glass part, and metal glass part with its surface treated by the method
#35Method Of Surface Finishing A Bone Implant
#36Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
#37Method for removing the coating from a gas turbine component
#38Method for the pre-treatment of titanium components for the subsequent coating thereof
#39Oxidizing aqueous cleaner for the removal of post-etch residues
#40Method Of Surface Finishing A Bone Implant
#41Method For Removing A Coating From A Component
#42METHODS OF USING CORROSION-INHIBITING CLEANING COMPOSITIONS FOR METAL LAYERS AND PATTERNS ON SEMICONDUCTOR SUBSTRATES
#43Method of removing a case layer from a metal alloy
#44Implant surface preparation
#45Implant surface preparation
#46METHOD OF REACTIVATING ELECTRODE FOR ELECTROLYSIS
#47Surface treatment for a thin titanium foil
#48Removal of niobium second phase particle deposits from pickled zirconium-niobium alloys
#49Method for Fabricating A Semiconductor Device Comprising Surface Cleaning
#50Method of descaling metallic devices
#51CLEANING COMPOSITION FOR SEMICONDUCTOR DEVICE-MANUFACTURING APPARATUS AND CLEANING METHOD
#52COMPOSITION FOR DISSOLVING TITANIUM OXIDE AND DISSOLUTION METHOD USING IT
#53Deposition of discrete nanoparticles on an implant surface
#54Deposition of discrete nanoparticles on an implant surface
#55Implant surface preparation
#56Preparation of getter surfaces using caustic chemicals
#57Methods of Forming Corrosion-Inhibiting Cleaning Compositions for Metal Layers and Patterns on Semiconductor Substrates
#58Method of cleaning a semiconductor wafer
#59Beta type titanium alloy and manufacturing method thereof
#60Composition for dissolving titanium oxide and dissolution method using it
#61Method of manufacturing a semiconductor device using a cleaning composition
#62Corrosion-inhibiting cleaning compositions for metal layers and patterns on semiconductor substrates
#63Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate
#64Corrosion-inhibiting cleaning compositions for metal layers and patterns on semiconductor substrates
#65Magnesium-zirconium alloying
#66Discoloration removal cleaning agent for titanium and titanium alloy building materials, and discoloration removal cleaning method
#67Chemical mechanical polishing slurries and cleaners containing salicylic acid as a corrosion inhibitor
#68Method of removing iron oxide deposits from the surface of titanium components
#69Clean chemistry for tungsten/tungsten nitride gates
#70Method of forming barrier layer
#71Cleaning tantalum-containing deposits from process chamber components