120714 ⎘
Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions using inhibitors Organic inhibitors
COMPOSITION, METHOD OF TREATING METAL-CONTAINING LAYER BY USING THE SAME, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE BY USING THE SAME
#2SYSTEMS AND METHODS FOR TREATING A METAL SUBSTRATE
#3CLEANING COMPOSITION WITH MOLYBDENUM ETCHING INHIBITOR
#4COMPOSITION, ITS USE AND A PROCESS FOR CLEANING SUBSTRATES COMPRISING COBALT AND COPPER
#5CLEANING COMPOSITION WITH MOLYBDENUM ETCHING INHIBITOR
#6Composition useful in metal sulfide scale removal
#7Method for nickel-free phosphating metal surfaces
#8Post-etch residue removal for advanced node beol processing
#9Selective etching of reactor surfaces
#10Method for removing substrates provided with organic coatings
#11Alkaline cleaning compositions for metal substrates
#12Oxidizing aqueous cleaner for the removal of post-etch residues
#13Process for the demulsifying cleaning of metallic surfaces
#14Cleaning liquid composition for electronic device
#15Methods for cleaning a semiconductor substrate
#16Process for the demulsifying cleaning of metallic surfaces
#17Cleaning Compound and Method and System for Using the Cleaning Compound
#18Metal loss inhibitor formulations and processes
#19Metal cleaner polisher and anti-tarnish solution
#20Cleaning and corrosion inhibition system and composition for surfaces of aluminum or colored metals and alloys thereof under alkaline conditions
#21CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES
#22Composition for stripping and cleaning and use thereof
#23Oxidizing aqueous cleaner for the removal of post-etch residues
#24Two-phase substrate cleaning material
#25Apparatus for cleaning contaminants from substrate
#26Selective etching of reactor surfaces
#27Method for removing contamination from a substrate and for making a cleaning solution
#28Cleaning compound and method and system for using the cleaning compound
#29PROCESS FOR THE DEMULSIFYING CLEANING OF METALLIC SURFACES
#30Method and apparatus for removing contamination from substrate
#31CLEANING COMPOSITIONS WITH VERY LOW DIELECTRIC ETCH RATES
#32Oxidizing aqueous cleaner for the removal of post-etch residues
#33Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
#34AQUEOUS CLEANER WITH LOW METAL ETCH RATE
#35Cleaning and corrosion inhibition system and composition for surfaces of aluminum or colored metals and alloys thereof under alkaline conditions
#36METAL CLEANER CONTAINING POLYETHYLENE IMINE
#37Cleaning compositions and methods of use thereof
#38Apparatus and methods for deoxidizing metal surfaces
#39SUBSTRATE SURFACE CLEANING LIQUID MEDIUM AND CLEANING METHOD
#40Method and system for using a two-phases substrate cleaning compound
#41Aqueous cleaning composition for removing residues and method using same
#42Method and apparatus for cleaning a semiconductor substrate
#43Method and apparatus for cleaning a semiconductor substrate
#44Method and apparatus for removing contamination from substrate
#45Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
#46Aqueous cleaner with low metal etch rate comprising alkanolamine and tetraalkylammonium hydroxide
#47Cleaning compound and method and system for using the cleaning compound
#48Method for removing contamination from a substrate and for making a cleaning solution
#49Composition for stripping and cleaning and use thereof
#50Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
#51Method and composition to decrease iron sulfide deposits in pipe lines
#52Microelectronic cleaning compositions containing oxidizers and organic solvents