ClassID:

121071

C25D11/32 - CPC Classification

Classification description:

Electrolytic coating by surface reaction, i.e. forming conversion layers; Anodisation of semiconducting materials

Recent Application in this class:
#1
20250382724
2025-12-18

SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE PROCESSING METHOD, AND SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE PROCESSING SYSTEM

#2
20250369155
2025-12-04

PROCESSING METHOD FOR SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE, SILICON CARBIDE SINGLE CRYSTAL SUBSTRATE PROCESSING SYSTEM, AND REPLENISHING LIQUID

#3
20240371629
2024-11-07

SURFACE PROCESSING METHOD OF SEMICONDUCTOR WAFER

#4
20240055487
2024-02-15

SILICON CARBIDE SUBSTRATE OR SUBSTRATE PROCESSING METHOD

#5
20230197440
2023-06-22

DEVICE COMPRISING AN ANODIC POROUS REGION SURROUNDED BY A TRENCH HAVING AN ELECTRICAL ISOLATION BARRIER, AND CORRESPONDING METHOD

#6
20220403531
2022-12-22

CONFORMAL YTTRIUM OXIDE COATING

#7
20220380927
2022-12-01

SURFACE PROCESSING METHOD FOR SiC SUBSTRATE

#8
20220178043
2022-06-09

Methods for fabricating and etching porous silicon carbide structures

#9
20210238762
2021-08-05

Anodic-oxidation equipment, anodic-oxidation method, and method for producing cathode of anodic-oxidation equipment

#10
20200161420
2020-05-21

Systems and methods for forming nanowires using anodic oxidation

#11
20200006074
2020-01-02

Methods for fabricating and etching porous silicon carbide structures

#12
20190361001
2019-11-28

MOLYBDENUM TRIOXIDE AND NANO SILICON CHIPS FOR ACETONE DETECTION

#13
20190323139
2019-10-24

SUBSTRATE WITH MATRIX-FREE NANOSTRUCTURED HYDROPHILIC ANALYTE SPOTS FOR USE IN MASS SPECTROMETRY

#14
20190100851
2019-04-04

Thermochemical Gas Sensor Using Thermoelectric Thin Film And Method Of Manufacturing The Same

#15
20180347063
2018-12-06

Apparatus and methods for uniformly forming porous semiconductor on a substrate

#16
20180323087
2018-11-08

High-throughput batch porous silicon manufacturing equipment design and processing methods

#17
20180005853
2018-01-04

MULTIPLE WAFER SINGLE BATH ETCHER

#18
20170283975
2017-10-05

PATTERN TRANSFER DEVICE AND PATTERN TRANSFER METHOD

#19
20170243774
2017-08-24

METHOD AND APPARATUS FOR FORMING POROUS SILICON LAYERS

#20
20170186890
2017-06-29

PHOTOVOLTAIC CELL WITH POROUS SEMICONDUCTOR REGIONS FOR ANCHORING CONTACT TERMINALS, ELECTROLITIC AND ETCHING MODULES, AND RELATED PRODUCTION LINE

#21
20170179518
2017-06-22

Production and use of flexible conductive films and inorganic layers in electronic devices

#22
20170092720
2017-03-30

Systems and methods for forming nanowires using anodic oxidation

#23
20160293284
2016-10-06

Metal grating structure for X-ray

#24
20160186358
2016-06-30

High-throughput batch porous silicon manufacturing equipment design and processing methods

#25
20160186352
2016-06-30

Non-metallic coating and method of its production

#26
20160064592
2016-03-03

Method of anodising a surface of a semiconductor device

#27
20150315719
2015-11-05

High-productivity porous semiconductor manufacturing equipment

#28
20150275383
2015-10-01

Systems and methods for forming nanowires using anodic oxidation

#29
20150167176
2015-06-18

Cutting tool with wear-recognition layer

#30
20150159292
2015-06-11

Apparatus and methods for uniformly forming porous semiconductor on a substrate

#31
20150021191
2015-01-22

Pattern transfer mold and pattern formation method

#32
20140367248
2014-12-18

Extreme ultraviolet radiation (EUV) pellicle formation apparatus

#33
20140293554
2014-10-02

Insulated metal substrate

#34
20140072876
2014-03-13

Porous amorphous silicon—carbon nanotube composite based electrodes for battery applications

#35
20130288476
2013-10-31

Electrochemical etching of semiconductors

#36
20130180847
2013-07-18

High-Throughput batch porous silicon manufacturing equipment design and processing methods

#37
20130061920
2013-03-14

PHOTOVOLTAIC CELL WITH POROUS SEMICONDUCTOR REGIONS FOR ANCHORING CONTACT TERMINALS, ELECTROLITIC AND ETCHING MODULES, AND RELATED PRODUCTION LINE

#38
20120305402
2012-12-06

Process for continuous coating deposition and an apparatus for carrying out the process

#39
20120184098
2012-07-19

Electrochemical etching of semiconductors

#40
20120145553
2012-06-14

Apparatus and methods for uniformly forming porous semiconductor on a substrate

#41
20110120882
2011-05-26

Porous silicon electro-etching system and method

#42
20110051322
2011-03-03

Porous amorphous silicon-carbon nanotube composite based electrodes for battery applications

#43
20110030610
2011-02-10

High-productivity porous semiconductor manufacturing equipment

#44
20100221606
2010-09-02

ENERGY STORAGE DEVICE WITH POROUS ELECTRODE

#45
20100187973
2010-07-29

Carbon fiber including carbon fiber core coated with dielectric film, and fiber-based light emitting device including the carbon fiber

#46
20100163421
2010-07-01

Process for continuous coating deposition and an apparatus for carrying out the process

#47
20100147762
2010-06-17

Membrane assemblies and methods of making and using the same

#48
20090188553
2009-07-30

Methods of fabricating solar-cell structures and resulting solar-cell structures

#49
20090181278
2009-07-16

MICRO FUEL CELL, FABRICATION METHOD THEREOF, AND MICRO FUEL CELL STACK USING THE SAME

#50
20080166538
2008-07-10

Porous silicon and method of preparing the same

#51
20070275545
2007-11-29

Higher selectivity, method for passivating short circuit current paths in semiconductor devices

#52
20070117413
2007-05-24

Process for the production of a nitrogenous layer a semiconductor or metal surface

#53
20070065992
2007-03-22

Higher selectivity, method for passivating short circuit current paths in semiconductor devices

#54
20070012574
2007-01-18

Fabrication of macroporous silicon

#55
20060141751
2006-06-29

Method for making a silicon dioxide layer on a silicon substrate by anodic oxidation

#56
20050085001
2005-04-21

Luminescence stabilization of anodically oxidized porous silicon layers

#57
20050077183
2005-04-14

Anodic oxidation apparatus

#58
15900762
2019-12-31

Covalent chemical surface modification of surfaces with available silicon or nitrogen

#59
14576054
2017-10-24

Multiple wafer single bath etcher