121090 ⎘
Constructional parts, or assemblies thereof, of cells for electrolytic coating Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
Lipseals and contact elements for semiconductor electroplating apparatuses
#302Substrate holder reception apparatus
#303Apparatus and methods for uniformly forming porous semiconductor on a substrate
#304Apparatus for holding a substrate
#305APPARATUS AND METHOD FOR MODULATING AZIMUTHAL UNIFORMITY IN ELECTROPLATING
#306Microelectronic substrate electro processing system
#307Semiconductor manufacturing apparatus, failure prediction method for semiconductor manufacturing apparatus, and failure prediction program for semiconductor manufacturing apparatus
#308Electroplating apparatus and cleaning method in electroplating apparatus
#309Electroplating apparatus for tailored uniformity profile
#310Substrate processing device, method for controlling substrate processing device, and storage medium storing programs
#311Method of controlling display of operation of semiconductor manufacturing apparatus and non-transitory computer readable storage medium therefor, and system for performing display concerning operation of semiconductor manufacturing apparatus
#312Apparatus and method for electrodeposition of metals with the use of an ionically resistive ionically permeable element having spatially tailored resistivity
#313Substrate transporting apparatus, control apparatus for substrate transporting apparatus, displacement compensation method for substrate transporting apparatus, program for implementing method and recording medium that records program
#314Plating method and plating apparatus
#315PLATING APPARATUS AND METHOD FOR DETERMINING PLATING BATH CONFIGURATION
#316Plating method and plating apparatus
#317Systems and methods for controlling substrate approach toward a target horizontal plane
#318Control of current density in an electroplating apparatus
#319Control of current density in an electroplating apparatus
#320Method for galvanic metal deposition
#321ELECTROPLATING APPARATUS AND METHODS UTILIZING INDEPENDENT CONTROL OF IMPINGING ELECTROLYTE
#322WIDE LIPSEAL FOR ELECTROPLATING
#323Electroplating apparatus and process for wafer level packaging
#324Substrate holder, plating apparatus, plating method, and electric contact
#325Semiconductor manufacturing apparatus and manufacturing method of semiconductor device
#326Paddle, plating apparatus equipped with the paddle, and plating method
#327Apparatus for electrochemically processing semiconductor substrates
#328Plating device, plating method, substrate holder, resistance measuring module, and substrate holder testing method
#329Uniform flow behavior in an electroplating cell
#330Substrate attachment/detachment device, plating device, control device for a substrate attachment/detachment device, and storage medium that stores a program for causing a computer to execute a method of controlling a substrate attachment/detachment device
#331Method and apparatus for processing a substrate
#332Electrochemical deposition chamber
#333Methods of electrochemical deposition for void-free gap fill
#334Conductive external connector structure and method of forming
#335Electrolytic plating apparatus
#336Method for manufacturing bump structure
#337Substrate holder, plating apparatus, and method for manufacturing substrate holder
#338Separation of alpha emitting species from plating baths
#339METHOD AND APPARATUS FOR DYNAMIC CURRENT DISTRIBUTION CONTROL DURING ELECTROPLATING
#340Wetting pretreatment for enhanced damascene metal filling
#341Leak checking method, leak checking apparatus, electroplating method, and electroplating apparatus
#342Selective solder plating
#343Process for optimizing cobalt electrofill using sacrificial oxidants
#344ELECTROPLATING APPARATUS AND ELECTROPLATING METHOD
#345Enhancement of electrolyte hydrodynamics for efficient mass transfer during electroplating
#346Electroplating apparatus
#347Gap fill process stability monitoring of an electroplating process using a potential-controlled exit step
#348High purity aluminum top coat on substrate
#349Dynamic current distribution control apparatus and method for wafer electroplating
#350Methods and apparatuses for electroplating and seed layer detection
#351Plating system, a plating system control method, and a storage medium containing a program for causing a computer to execute the plating system control method
#352Configuration and method of operation of an electrodeposition system for improved process stability and performance
#353METHOD AND APPARATUS FOR ELECTROPLATING SEMICONDUCTOR WAFER WHEN CONTROLLING CATIONS IN ELECTROLYTE
#354Methods and apparatus for wetting pretreatment for through resist metal plating
#355Substrate holder and plating apparatus using the same
#356Apparatus and method of contact electroplating of isolated structures
#357Photovoltaic cell with porous semiconductor regions for anchoring contact terminals, electrolitic and etching modules, and related production line
#358Workpiece loader for a wet processing system
#359Workpiece holder for a wet processing system
#360WET PROCESSING SYSTEM AND METHOD OF OPERATING
#361Cleaning apparatus, plating apparatus using the same, and cleaning method
#362CONTROL OF CURRENT DENSITY IN AN ELECTROPLATING APPARATUS
#363Feeder capable of feeding anode and plating apparatus
#364Plating apparatus, substrate holder, plating apparatus controlling method, and storage medium configured to store program for instructing computer to implement plating apparatus controlling method
#365MODULATION OF APPLIED CURRENT DURING SEALED ROTATIONAL ELECTROPLATING
#366Dynamic modulation of cross flow manifold during elecroplating
#367System and method for manufacturing photovoltaic structures with a metal seed layer
#368Electroplating apparatus with current crowding adapted contact ring seal and thief electrode
#369METHODS AND APPARATUS FOR UNIFORMLY METALLIZATION ON SUBSTRATES
#370Substrate holder for vertical galvanic metal deposition
#371Substrate holder and plating apparatus using the same
#372Apparatus for measuring condition of electroplating cell components and associated methods
#373Remote detection of plating on wafer holding apparatus
#374Methods and apparatuses for electroplating nickel using sulfur-free nickel anodes
#375Plating apparatus and plating method
#376Plating apparatus and plating method
#377Plating apparatus and plating method
#378Electroplating wafers having a pattern induced non-uniformity
#379Electroplating contact ring with radially offset contact fingers
#380Plating apparatus and plating method
#381Systems and methods for achieving uniformity across a redistribution layer
#382Anisotropic high resistance ionic current source (AHRICS)
#383APPARATUS AND METHOD FOR SUPPLYING PLATING SOLUTION TO PLATING TANK, PLATING SYSTEM, POWDER CONTAINER, AND PLATING METHOD
#384Non-Contact Sheet Resistance Measurement of Barrier and/or Seed Layers Prior to Electroplating
#385PHOTOVOLTAIC CELL WITH POROUS SEMICONDUCTOR REGIONS FOR ANCHORING CONTACT TERMINALS, ELECTROLITIC AND ETCHING MODULES, AND RELATED PRODUCTION LINE
#386Cross flow manifold for electroplating apparatus
#387Plating apparatus
#388ANODIZATION ARCHITECTURE FOR ELECTRO-PLATE ADHESION
#389Method and system for electroplating a MEMS device
#390Method of forming metal coating
#391Bubble and foam solutions using a completely immersed air-free feedback flow control valve
#392Systems, methods and apparatus for electroplating photovoltaic cells
#393Plating method and plating apparatus
#394FORMING COBALT INTERCONNECTIONS ON A SUBSTRATE
#395High resistance virtual anode for electroplating cell
#396Seal rings in electrochemical processors
#397Separation of alpha emitting species from plating baths
#398Separation of alpha emitting species from plating baths
#399Separation of alpha emitting species from plating baths
#400Protecting anodes from passivation in alloy plating systems
#401Inert anode electroplating processor and replenisher with anionic membranes
#402Wetting wave front control for reduced air entrapment during wafer entry into electroplating bath
#403APPARATUS FOR ELECTROCHEMICAL ETCHING AND APPARATUS FOR ELECTROPLATING
#404System and method for manufacturing photovoltaic structures with a metal seed layer
#405APPARATUS FOR ELECTROPLATING OF ELECTRODES ON PHOTOVOLTAIC STRUCTURES
#406PACKING FOR SUBSTRATE PLATING JIG AND SUBSTRATE PLATING JIG USING THE SAME
#407Electrochemical plating
#408Electro-plating and apparatus for performing the same
#409DURABLE LOW CURE TEMPERATURE HYDROPHOBIC COATING IN ELECTROPLATING CUP ASSEMBLY
#410Laminating magnetic cores for on-chip magnetic devices
#411Electroplating processor with current thief electrode
#412Plating apparatus, plating method, and substrate holder
#413Edge flow element for electroplating apparatus
#414Adaptive electric field shielding in an electroplating processor using agitator geometry and motion control
#415Enhancement of electrolyte hydrodynamics for efficient mass transfer during electroplating
#416Copper Electrodeposition in Microelectronics
#417Electroplating apparatus with electrolyte agitation
#418Inert anode electroplating processor and replenisher
#419Cleaning electroplating substrate holders using reverse current deplating
#420Integrated elastomeric lipseal and cup bottom for reducing wafer sticking
#421Electroplating apparatus with membrane tube shield
#422Wafer electroplating chuck assembly
#423CONTROL OF ELECTROLYTE HYDRODYNAMICS FOR EFFICIENT MASS TRANSFER DURING ELECTROPLATING
#424Method of adjusting plating apparatus, and measuring apparatus
#425Anode holder and plating apparatus
#426Apparatus and method for modulating azimuthal uniformity in electroplating
#427Substrate holder, plating apparatus, and plating method
#428Electroplating apparatus
#429Method and apparatus for monitoring edge bevel removal area in semiconductor apparatus and electroplating system
#430Apparatus and method for electrodeposition of metals with the use of an ionically resistive ionically permeable element having spatially tailored resistivity
#431Electrochemical deposition method
#432Electrochemical deposition method
#433Electrochemical deposition method
#434SEMICONDUCTOR ELECTROPLATING SYSTEM
#435Electroplating apparatus and process for wafer level packaging
#436Electroplating wafers having a notch
#437Monitoring electrolytes during electroplating
#438Microelectronic substrate electro processing system
#439ELECTROCHEMICAL REACTION APPARATUS
#440Methods and apparatus for wetting pretreatment for through resist metal plating
#441Plating apparatus
#442Control of current density in an electroplating apparatus
#443Electroplating method and electroplating device
#444Control of electrolyte flow dynamics for uniform electroplating
#445Chemistry additives and process for cobalt film electrodeposition
#446Method of cleaning substrate holder
#447Dynamic modulation of cross flow manifold during electroplating
#448Plating apparatus
#449Pretreatment of nickel and cobalt liners for electrodeposition of copper into through silicon vias
#450Copper electroplating method
#451Forming cobalt interconnections on a substrate
#452ELECTROPLATING WITH REDUCED AIR BUBBLE DEFECTS
#453Front referenced anode
#454Plating method and plating apparatus
#455Geometry and process optimization for ultra-high RPM plating
#456Electroplating apparatus with notch adapted contact ring seal and thief electrode
#457Apparatus and method for dynamic control of plated uniformity with the use of remote electric current
#458Multi-contact lipseals and associated electroplating methods
#459Substrate holder, a method for holding a substrate with a substrate holder, and a plating apparatus
#460Device for vertical galvanic metal deposition on a substrate
#461Lipseals and contact elements for semiconductor electroplating apparatuses
#462Methods and apparatuses for dynamically tunable wafer-edge electroplating
#463PRESSURE TRANSFER PROCESS FOR THIN FILM SOLAR CELL FABRICATION
#464Plating apparatus and plating method
#465METHOD AND APPARATUS FORMING COPPER (Cu) OR ANTIMONY (Sb) DOPED ZINC TELLURIDE AND CADMIUM ZINC TELLURIDE LAYERS IN A PHOTOVOLTAIC DEVICE
#466SUBSTRATE PLATING DEVICE
#467Method for copper plating through silicon vias using wet wafer back contact
#468Systems and methods for electrochemical deposition on a workpiece including removing contamination from seed layer surface prior to ECD
#469Plating cup with contoured cup bottom
#470Apparatus and method for plating and/or polishing wafer
#471Electroplating apparatus for tailored uniformity profile
#472Substrate holder and plating apparatus
#473Substrate processing method and template
#474Vacuum pre-wetting apparatus and methods
#475Paddle for materials processing
#476Method and apparatus for uniformly metallization on substrate
#477Method of forming a composite material and apparatus for forming a composite material
#478METAL PLATING SYSTEM INCLUDING GAS BUBBLE REMOVAL UNIT
#479High purity aluminum top coat on substrate
#480Apparatus for manufacturing semiconductor wafer
#481Device for vertical galvanic metal, preferably copper, deposition on a substrate and a container suitable for receiving such a device
#482Apparatus for and method of processing substrate
#483High-productivity porous semiconductor manufacturing equipment
#484Methods and apparatuses for electroplating nickel using sulfur-free nickel anodes
#485Substrate plating jig
#486Methods and apparatus for depositing a metal layer on a semiconductor device
#487Plating bath metrology
#488Plating apparatus and method of determining electric resistance of electric contact of substrate holder
#489Anode unit and plating apparatus having such anode unit
#490Wet etching methods for copper removal and planarization in semiconductor processing
#491Substrate holder, plating apparatus, and plating method
#492APPARATUS AND METHODS RELATED TO COPPER PLATING OF WAFERS
#493Holding device for a product and treatment method
#494Wetting wave front control for reduced air entrapment during wafer entry into electroplating bath
#495Lipseals and contact elements for semiconductor electroplating apparatuses
#496Front referenced anode
#497Methods and apparatuses for electroplating and seed layer detection
#498Method of manufacturing semiconductor device
#499Plating method and plating apparatus
#500Plating cup with contoured cup bottom
#501Wetting pretreatment for enhanced damascene metal filling
#502Substrate carrier device for double-sided electroplating of solar cell
#503Apparatus and methods for uniformly forming porous semiconductor on a substrate
#504Electrochemical deposition method
#505Sn alloy plating apparatus and Sn alloy plating method
#506Bonded stacked wafers and methods of electroplating bonded stacked wafers
#507Electrochemical deposition apparatus with remote catholyte fluid management
#508Method for uniform flow behavior in an electroplating cell
#509Semiconductor wafer holder and electroplating system for plating a semiconductor wafer
#510Apparatus for wetting pretreatment for enhanced damascene metal filling
#511Electrolytic copper process using anion permeable barrier
#512Electroplating apparatus for tailored uniformity profile
#513Magnetic structure for metal plating control
#514Insulator plate for metal plating control
#515Apparatuses and methods for maintaining pH in nickel electroplating baths
#516Plating method, plating system and storage medium
#517WAFER PROCESSING APPARATUS HAVING SCROLL PUMP
#518ELECTROPLATING APPARATUS HAVING SCROLL PUMP
#519Electrochemical deposition apparatus and methods for controlling the chemistry therein
#520Electrochemical deposition apparatus and methods for controlling the chemistry therein
#521Electroplating and post-electrofill systems with integrated process edge imaging and metrology systems
#522METHOD AND APPARATUS FOR FORMING A CADMIUM ZINC TELLURIDE LAYER IN A PHOTOVOLTAIC DEVICE
#523Electroplating tool with feedback of metal thickness distribution and correction
#524Fast and continuous eddy-current metrology of a conductive film
#525Non-contact sheet resistance measurement of barrier and/or seed layers prior to electroplating
#526AUTOMATIC IN-SITU CONTROL OF AN ELECTRO-PLATING PROCESSOR
#527Electroplating apparatus with improved throughput
#528Anisotropic high resistance ionic current source (AHRICS)
#529Polishing device for removing polishing byproducts
#530Microelectronic substrate electro processing system
#531Machine suitable for plating a cavity of a semi-conductive or conductive substrate such as a through via structure
#532Substrate plating apparatus and substrate plating method
#533Plating apparatus, plating method and storage medium having plating program stored thereon
#534Control of electrolyte hydrodynamics for efficient mass transfer during electroplating
#535Control of electrolyte hydrodynamics for efficient mass transfer during electroplating
#536Plating apparatus and plating method
#537Electroplating methods for fabricating integrated circuit devices and devices fabricated thereby
#538Electrochemical deposition chamber
#539Electro chemical plating process
#540Metal plating apparatus and method using solenoid coil
#541Method and apparatus for remote plasma treatment for reducing metal oxides on a metal seed layer
#542Electro-plating and apparatus for performing the same
#543Plating apparatus
#544Layer by layer electro chemical plating (ECP) process
#545ADJUSTABLE CURRENT SHIELD FOR ELECTROPLATING PROCESSES
#546Detection of plating on wafer holding apparatus
#547Current ramping and current pulsing entry of substrates for electroplating
#548Methods and apparatus for uniformly metallization on substrates
#549Low copper electroplating solutions for fill and defect control
#550Copper electroplating solution and copper electroplating apparatus
#551Enhancement of electrolyte hydrodynamics for efficient mass transfer during electroplating
#552Bubble and foam solutions using a completely immersed air-free feedback flow control valve
#553Plating equipment for solar cell wafer using electroplating and light-induced plating jointly and method of the same
#554Electroplating processor with thin membrane support
#555Method and apparatus for dynamic current distribution control during electroplating
#556Method and apparatus for filling interconnect structures
#557TUNGSTEN CARBIDE COATED METAL COMPONENT OF A PLASMA REACTOR CHAMBER AND METHOD OF COATING
#558Electrofill vacuum plating cell
#559Electroplating apparatus with contact ring deplating
#560Device for single-sided electrolytic treatment of a flat substrate
#561Electroplating systems and methods for high sheet resistance substrates
#562Electroplating method and electroplating apparatus for through-hole
#563Non-permeable substrate carrier for electroplating
#564Magnetically sealed wafer plating jig system and method
#565Plating apparatus and method of cleaning substrate holder
#566PLATING APPARATUS
#567Protecting anodes from passivation in alloy plating systems
#568Paddle for electroplating for selectively depositing greater thickness
#569Apparatus for fluid processing a workpiece
#570Method and apparatus for electroplating
#571Electro chemical deposition apparatus
#572Cross flow manifold for electroplating apparatus
#573Plating apparatus, plating method and storage medium
#574Electroplating processor with geometric electrolyte flow path
#575Methods and apparatuses for cleaning electroplating substrate holders
#576Method and apparatus for electroplating semiconductor wafer when controlling cations in electrolyte
#577Device and method for metalizing wafers
#578Cleaning electroplating substrate holders using reverse current deplating
#579Plating method and plating apparatus
#580Adjustable wafer plating shield and method
#581Electroplating systems
#582Incorporating High-Purity Copper Deposit As Smoothing Step After Direct On-Barrier Plating To Improve Quality Of Deposited Nucleation Metal In Microscale Features
#583Wet etching methods for copper removal and planarization in semiconductor processing
#584Substrate holder and plating apparatus
#585Device and method for producing targeted flow and current density patterns in a chemical and/or electrolytic surface treatment
#586Methods and apparatus for wetting pretreatment for through resist metal plating
#587ANODIZING APPARATUS, AN ANODIZING SYSTEM HAVING THE SAME, AND A SEMICONDUCTOR WAFER
#588Electro processor with shielded contact ring
#589Dynamic current distribution control apparatus and method for wafer electroplating
#590Contact ring for an electrochemical processor
#591Method for forming metal film with twins
#592Method and System for Metal Deposition in Semiconductor Processing
#593Electrochemical processor alignment system
#594Electrochemical deposition apparatus
#595Substrate plating apparatus with multi-channel field programmable gate array
#596Working electrode design for electrochemical processing of electronic components
#597PLATING CUP WITH CONTOURED CUP BOTTOM
#598PHOTOVOLTAIC CELL WITH POROUS SEMICONDUCTOR REGIONS FOR ANCHORING CONTACT TERMINALS, ELECTROLITIC AND ETCHING MODULES, AND RELATED PRODUCTION LINE
#599Component cleaning in a metal plating apparatus
#600Seek scan probe (SSP) cantilever to mover wafer bond stop