164179 ⎘
Instruments as specified in the subgroups and characterised by the use of optical measuring means; Interferometers characterised by the beam path configuration with multiple interactions between the target object and light beams, e.g. beam reflections occurring from different locations Multipass interferometers, e.g. double-pass
NANOMETROLOGY DEVICE
#2OPTICAL FIBER SENSOR AND MEASURING SYSTEM USING THE SAME
#3Compact dual pass interferometer for a plane mirror interferometer
#4OPTICAL INTERFERENCE RANGE SENSOR
#5Measuring assembly for the frequency-based determination of the position of a component
#6Methods and apparatus for high resolution imaging with reflectors at staggered depths beneath sample
#7PHOTODETECTOR
#8Inspecting a multilayer sample
#9Displacement detecting device with controlled heat generation
#10Position measurement system and lithographic apparatus
#11Balanced detection systems
#12Method for defect inspection of transparent substrate by integrating interference and wavefront recording to reconstruct defect complex images information
#13Methods and apparatus for high resolution imaging with reflectors at staggered depths beneath sample
#14Three-dimensional measurement device
#15Mirror plate for a fabry-perot interferometer and a fabry-perot interferometer
#16Measurement apparatus, lithography apparatus, and method of manufacturing article
#17Optical imaging device with image defect determination
#18Multiple beam path laser optical system using multiple beam reflector
#19Device for interferential distance measurement
#20Interferometer having two transparent plates in parallel for making reference and measurement beams parallel
#21Integrated reciprocal space mapping for simultaneous lattice parameter refinement using a two-dimensional X-ray detector
#22Measuring device for high-precision optical determination of distance or position
#23Interferometer
#24Interferometer
#25Method for the absolute measurement of the flatness of the surfaces of optical elements, using an interferometer and a three-flat method
#26Optical imaging device with image defect determination
#27Device for distance measurement
#28Displacement detecting device
#29Interferometer devices for determining initial position of a stage or the like
#30Device for determining distance interferometrically
#31Double pass interferometer with tilted mirrors
#32Optical imaging device with image defect determination
#33Multi-beam interferometer displacement measuring system utilized in a large measuring range
#34Rotary Interferometer
#35Interferometer
#36Laser gauge interferometer
#37Interferometer
#38Laser interferometer system for measuring roll angle
#39Optical member, interferometer system, stage apparatus, exposure apparatus, and device manufacturing method
#40Phase-conjugate optical coherence tomography methods and apparatus
#41Double pass interferometer with tilted mirrors
#42Spectral domain phase microscopy (SDPM) dual mode imaging systems and related methods and computer program products
#43Interferometer with Double Polarizing Beam Splitter
#44Polarizing different phases of interfered light used in a method and apparatus for measuring displacement of a specimen
#45Displacement measurement sensor head and system having measurement sub-beams comprising zeroth order and first order diffraction components
#46Vibration detection device
#47Multi-axis interferometers and methods and systems using multi-axis interferometers
#48Compensation of effects of atmospheric perturbations in optical metrology
#49Spectral domain phase microscopy (SDPM) dual mode imaging systems and related methods and computer program products
#50Optics system for an interferometer that uses a measuring mirror, a reference mirror and a beam deflector
#51Interferometer using integrated retarders to reduce physical volume
#52Beam shear reduction in interferometry systems
#53Absolute position measurement apparatus
#54Time-delayed source and interferometric measurement of windows and domes
#55Interferometer for measurement of dome-like objects
#56Apparatus and methods for reducing non-cyclic non-linear errors in interferometry
#57Measuring device and method for determining relative positions of a positioning stage configured to be moveable in at least one direction
#58Compensation of turbulent effects of gas in measurement paths of multi-axis interferometers
#59Discrete quarter wave plates for displacement measuring interferometers
#60Multi-axis interferometer with procedure and data processing for mirror mapping
#61Interferometry systems and methods of using interferometry systems
#62Temperature/thickness measuring apparatus, temperature/thickness measuring method, temperature/thickness measuring system, control system and control method
#63Low walk-off interferometer
#64Position detection apparatus and method
#65Compensation for effects of beam misalignments in interferometer metrology systems
#66Differential interferometers creating desired beam patterns
#67Heterodyne laser interferometer for measuring wafer stage translation
#68Interferometry systems and methods of using interferometry systems
#69Lithographic interferometer system with an absolute measurement subsystem and differential measurement subsystem and method thereof
#70Interferometry systems and methods of using interferometry systems
#71Interferometer assemblies having reduced cyclic errors and system using the interferometer assemblies
#72Aspheric diffractive reference for interferometric lens metrology
#73Spatial filtering in interferometry
#74Cyclic error reduction in average interferometric position measurements
#75MEASUREMENT SYSTEM FOR DETERMINING THE THICKNESS OF A LAYER DURING A PLATING PROCESS
#76Multi-axis interferometers and methods and systems using multi-axis interferometers
#77Integrated plane mirror and differential plane mirror interferometer system
#78Spatial filtering in interferometry
#79Compensation for geometric effects of beam misalignments in plane mirror interferometer metrology systems
#80Lithographic apparatus, device manufacturing method, and computer program