Patents-Review.com
ClassID:

167785 ⎘

G01N2021/214 - CPC Classification

Classification description:

Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light; Systems in which incident light is modified in accordance with the properties of the material investigated; Polarisation-affecting properties; Ellipsometry Variangle incidence arrangement

Recent Application in this class:
#1
20260110625
2026-04-23

RAPID ELLIPSOMETRY USING ENCODED ANGULAR DISTRIBUTION OF LIGHT

 #2
20240369352
2024-11-07

DETERMINING AND RECONSTRUCTING A SHAPE AND A MATERIAL PROPERTY OF AN OBJECT

 #3
20240240986
2024-07-18

DEVICES AND METHODS FOR DETERMINING POLARIZATION CHARACTERISTICS FROM PARTIAL POLARIMETRY

 #4
20240011894
2024-01-11

MUELLER MATRIX ELLIPSOMETER

 #5
20230204493
2023-06-29

Pupil ellipsometry measurement apparatus and method and method of fabricating semiconductor device using the pupil ellipsometry measurement method

 #6
20220074848
2022-03-10

Pupil ellipsometry measurement apparatus and method and method of fabricating semiconductor device using the pupil ellipsometry measurement method

 #7
20220065774
2022-03-03

Method for determining properties of a sample by ellipsometry

 #8
20210364420
2021-11-25

Measurement system capable of adjusting AOI, AOI spread and azimuth of incident light

 #9
20200025678
2020-01-23

System and method for use in high spatial resolution ellipsometry

 #10
20190212255
2019-07-11

Variable resolution spectrometer

 #11
20160187248
2016-06-30

Method and device for measuring large-area and massive scattered field in nanoscale

 #12
20160146596
2016-05-26

Apparatus and method for measuring pretilt angle of liquid crystal

 #13
20150285735
2015-10-08

Multiple angles of incidence semiconductor metrology systems and methods

 #14
20150077750
2015-03-19

Ellipsometer for detecting surface

 #15
20140358476
2014-12-04

Automatic determination of fourier harmonic order for computation of spectral information for diffraction structures

 #16
20130010296
2013-01-10

Multi-analyzer angle spectroscopic ellipsometry

 #17
20130003068
2013-01-03

Measurement of critical dimension

 #18
20120033216
2012-02-09

Spatially precise optical treatment for measurement of targets through intervening birefringent layers

 #19
20110109906
2011-05-12

Fast sample height, AOI and POI alignment in mapping ellipsometer or the like

 #20
20110080585
2011-04-07

Scatterometry measurement of asymmetric structures

 #21
20100277729
2010-11-04

Light focusing unit and spectrum measuring apparatus having the same

 #22
20100045983
2010-02-25

Spatially precise optical treatment or measurement of targets through intervening birefringent layers

 #23
20090279090
2009-11-12

Multiple measurement techniques including focused beam scatterometry for characterization of samples

 #24
20090103093
2009-04-23

Fast sample height, AOI and POI alignment in mapping ellipsometer or the like

 #25
20080036998
2008-02-14

Probe beam profile modulated optical reflectance system and methods

 #26
20070153285
2007-07-05

Measuring a surface characteristic

 #27
20070097356
2007-05-03

Method and device for three-dimensionally determining the refractive index of transparent or partially transparent layers

 #28
20060164642
2006-07-27

Achromatic spectroscopic ellipsometer with high spatial resolution

 #29
20050111006
2005-05-26

Apparatus and method for ellipsometric measurements with high spatial resolution

 #30
16501681
2019-11-05

Method of determining refractive indices and surface properties of prism shaped material