ClassID:

167786

G01N2021/215 - CPC Classification

Classification description:

Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light; Systems in which incident light is modified in accordance with the properties of the material investigated; Polarisation-affecting properties; Ellipsometry Brewster incidence arrangement

Recent Application in this class:
#1
20240011894
2024-01-11

MUELLER MATRIX ELLIPSOMETER

#2
20230213436
2023-07-06

Concentration measuring method of optically active substance and concentration measuring device of optically active substance

#3
20230152213
2023-05-18

ELLIPSOMETER AND APPARATUS FOR INSPECTING SEMICONDUCTOR DEVICE INCLUDING THE ELLIPSOMETER

#4
20220187218
2022-06-16

Angle independent optical surface inspector

#5
20210072149
2021-03-11

High-sensitive biosensor chip using high extinction coefficient marker and dielectric substrate, measurement system, and measurement method

#6
20190250100
2019-08-15

Biomarker detection apparatus

#7
20180100799
2018-04-12

SAMPLE ANALYSIS TOOL EMPLOYING A BROADBAND ANGLE-SELECTIVE FILTER

#8
20150219497
2015-08-06

Multiple wavelength ellipsometer system and related method

#9
20130085351
2013-04-04

Apparatus and method for measuring a tissue analyte such as bilirubin using the Brewster's angle

#10
20130055818
2013-03-07

PRESSURE CONTROL IN CONTINUOUS PLASMA DEPOSITION PROCESSES

#11
20120199287
2012-08-09

Transforming metrology data from a semiconductor treatment system using multivariate analysis

#12
20120009849
2012-01-12

Polishing end point detection method, polishing end point detection apparatus, and polishing apparatus

#13
20100012031
2010-01-21

Method and apparatus for optically characterizing the doping of a substrate

#14
20090153859
2009-06-18

Polishing end point detection method, polishing end point detection apparatus and polishing apparatus

#15
20090094001
2009-04-09

Transforming metrology data from a semiconductor treatment system using multivariate analysis

#16
20080094616
2008-04-24

Surface defect inspection apparatus

#17
20080030738
2008-02-07

Analytical method and apparatus

#18
20070185684
2007-08-09

Transforming metrology data from a semiconductor treatment system using multivariate analysis

#19
20070013912
2007-01-18

Analytical method and apparatus

#20
20060072115
2006-04-06

Analytical method and apparatus

#21
20050195395
2005-09-08

High-sensitivity reflection measurement apparatus

#22
20050007605
2005-01-13

Analytical method and apparatus

#23
16873259
2024-01-30

Reflectometer, spectrophotometer, ellipsometer or polarimeter system including sample imaging system that simultaneously meet the scheimpflug condition and overcomes keystone error