ClassID:

167846

G01N2021/3568 - CPC Classification

Classification description:

Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light; Systems in which incident light is modified in accordance with the properties of the material investigated; Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands; Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infra-red light for analysing solids; Preparation of samples therefor applied to semiconductors, e.g. Silicon

Recent Application in this class:
#1
20260043751
2026-02-12

INSPECTION DEVICE AND MICROPROBE USED THEREIN

#2
20260002871
2026-01-01

MEASURING APPARATUS, MEASURING METHOD, AND MEASURING PROGRAM

#3
20250224329
2025-07-10

SUBSTRATE EVALUATION METHOD AND SUBSTRATE PROCESSING APPARATUS

#4
20250198941
2025-06-19

DEFECT INSPECTION SYSTEM AND DEFECT INSPECTION METHOD

#5
20250003874
2025-01-02

MEASUREMENT METHOD AND SUBSTRATE PROCESSING APPARATUS

#6
20240426746
2024-12-26

HEAT TREATMENT APPARATUS AND ACCURATE TEMPERATURE MEASUREMENT METHOD FOR SEMICONDUCTOR WORKPIECE

#7
20240328776
2024-10-03

METHOD FOR MEASURING ETCHING AMOUNT, AND MEASUREMENT SYSTEM THEREFOR

#8
20240321650
2024-09-26

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

#9
20240219235
2024-07-04

OPTICAL SENSING MODULE, SYSTEM AND METHOD FOR OPERATING OPTICAL SENSING SYSTEM

#10
20240210314
2024-06-27

Ultrafast laser imaging with box lock-in

#11
20240201077
2024-06-20

Phase-Resolved Optical Metrology for Substrates

#12
20230273123
2023-08-31

Structure of thermal stress release of photo-excited thermal infrared emitter

#13
20220412896
2022-12-29

Systems and methods of characterizing semiconductor materials

#14
20220236181
2022-07-28

Measurement of properties of patterned photoresist

#15
20220221705
2022-07-14

OPTICAL APPARATUS AND SOLID IMMERSION LENS

#16
20220187718
2022-06-16

System and method for determining post bonding overlay

#17
20220181179
2022-06-09

In-situ metrology and process control

#18
20220018761
2022-01-20

Method for measuring extremely low oxygen concentration in silicon wafer

#19
20220011225
2022-01-13

Hybrid probe, physical property analysis apparatus including the same, and method of measuring semiconductor device using the apparatus

#20
20210398863
2021-12-23

Film forming method and film forming apparatus

#21
20210215621
2021-07-15

Method for producing nitride semiconductor laminate, silicon semiconductor product, method for inspecting film quality and method for inspecting semiconductor growth device

#22
20210181102
2021-06-17

Calibration method and terminal equipment of terahertz frequency band on-wafer S parameter

#23
20210172863
2021-06-10

Apparatus and method for biomolecular analysis

#24
20210131977
2021-05-06

System and method to calibrate a plurality of wafer inspection system (WIS) modules

#25
20200335369
2020-10-22

In-situ metrology and process control

#26
20200225151
2020-07-16

Semiconductor metrology based on hyperspectral imaging

#27
20200096675
2020-03-26

OPTICAL FILTER INCLUDING A HIGH REFRACTIVE INDEX MATERIAL

#28
20190326184
2019-10-24

Method for manufacturing resistivity standard sample and method for measuring resistivity of epitaxial wafer

#29
20190198330
2019-06-27

Passivation of nonlinear optical crystals

#30
20190122942
2019-04-25

Detecting the cleanness of wafer after post-CMP cleaning

#31
20180339362
2018-11-29

Reflective detection method and reflectance detection apparatus

#32
20180224711
2018-08-09

Inspection and metrology using broadband infrared radiation

#33
20180088042
2018-03-29

Method and assembly for determining the carbon content in silicon

#34
20180088040
2018-03-29

Infrared spectroscopic reflectometer for measurement of high aspect ratio structures

#35
20180067042
2018-03-08

Silicon article inspection systems and methods

#36
20170370856
2017-12-28

Internal crack detecting method and internal crack detecting apparatus

#37
20170356841
2017-12-14

OPTICAL FILTER INCLUDING A HIGH REFRACTIVE INDEX MATERIAL

#38
20170248528
2017-08-31

System for measuring levels of radiation reflecting from semiconductor material for use in measuring the dopant content thereof

#39
20170248527
2017-08-31

Determining oxidation of photoconductor members based on obtained spectrum from optical spectroscopy

#40
20170205342
2017-07-20

Systems and methods for extended infrared spectroscopic ellipsometry

#41
20170194217
2017-07-06

Detecting the cleanness of wafer after post-CMP cleaning

#42
20170025281
2017-01-26

Passivation of nonlinear optical crystals

#43
20160377554
2016-12-29

Quality evaluation method for silicon wafer, and silicon wafer and method of producing silicon wafer using the method

#44
20160169815
2016-06-16

Passivation of nonlinear optical crystals

#45
20150377702
2015-12-31

Spectrometer insert for measuring temperature-dependent optical properties

#46
20150316475
2015-11-05

Thickness determination and layer characterization using terahertz scanning reflectometry

#47
20150300950
2015-10-22

Method for detecting an etching residue

#48
20150079702
2015-03-19

Measurement device for texture size, manufacturing system for solar cell, and manufacturing method for solar cell

#49
20140055783
2014-02-27

Method of analyzing nitride semiconductor layer and method of manufacturing nitride semiconductor substrate using the analysis method

#50
20130088706
2013-04-11

Passivation of nonlinear optical crystals

#51
20120203473
2012-08-09

Apparatus and method for measuring semiconductor carrier lifetime

#52
20120111263
2012-05-10

METHOD FOR THE DETERMINATION OF IMPURITIES IN SILICON

#53
20110089348
2011-04-21

METHOD AND APPARATUS FOR THIN FILM QUALITY CONTROL

#54
20100271618
2010-10-28

Carrier concentration measuring device and carrier concentration measuring method

#55
20100220316
2010-09-02

METHOD AND APPARATUS FOR THIN FILM QUALITY CONTROL

#56
20100006785
2010-01-14

METHOD AND APPARATUS FOR THIN FILM QUALITY CONTROL

#57
20090316981
2009-12-24

Method and device for inspecting a disk-shaped object

#58
20090173884
2009-07-09

Method and apparatus for measuring spectroscopic absorbance

#59
20050190369
2005-09-01

Ion implant monitoring through measurement of modulated optical response

#60
20050083528
2005-04-21

Ion implant monitoring through measurement of modulated optical response

#61
16723565
2022-01-25

Multi-environment polarized infrared reflectometer for semiconductor metrology