168263 ⎘
Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light; Systems specially adapted for particular applications; Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined; Inspecting patterns on the surface of objects Masks, reticles, shadow masks
Optical defect inspection apparatus
#302Particle inspection and removal apparatus and particle inspection and removal program
#303Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle
#304Measurement apparatus, exposure apparatus, and device fabrication method
#305Method and apparatus for detecting pattern defects
#306TDI sensor modules with localized driving and signal processing circuitry for high speed inspection
#307EUV Mask Inspection
#308APPARATUS AND METHOD FOR MEASURING THE POSITIONS OF MARKS ON A MASK
#309Reticle inspection systems and method
#310EUV mask inspection system
#311Methods and systems for detecting defects on a reticle
#312Optical defect inspection apparatus
#313Mask inspection apparatus and mask inspection method
#314MASK INSPECTION APPARATUS, AND EXPOSURE METHOD AND MASK INSPECTION METHOD USING THE SAME
#315Apparatus and method for pattern inspection
#316Apparatus and method for pattern inspection
#317Particle detection on an object surface
#318Optical inspection of a specimen using multi-channel responses from the specimen
#319Inspection apparatus, exposure apparatus, and method of manufacturing device
#320Method for detecting particles and defects and inspection equipment thereof
#321Apparatus for examining pattern defects, a method thereof, and a computer-readable recording medium having recorded therein a program thereof
#322Aperture biosensor with trenches
#323Ultrafine pattern discrimination using transmitted/reflected workpiece images for use in lithography inspection system
#324Particle Detection on Patterning Devices with Arbitrary Patterns
#325Pattern inspection device and method of inspecting pattern
#326Reticle defect inspection apparatus and reticle defect inspection method
#327Method of detecting repeating defects in lithography masks on the basis of test substrates exposed under varying conditions
#328Foreign particle inspection apparatus, exposure apparatus, and method of manufacturing device
#329Optical exterior inspection apparatus and method
#330Test method for determining reticle transmission stability
#331Optical apparatus, photomask inspecting apparatus, and exposure apparatus
#332Mask inspection apparatus
#333Photomask image inspection
#334Photomask mounting/housing device and resist inspection method and resist inspection apparatus using same
#335Optical defect inspection apparatus
#336Apparatus and a method for inspection of a mask blank, a method for manufacturing a reflective exposure mask, a method for reflective exposure, and a method for manufacturing semiconductor integrated circuits
#337Method and equipment for detecting pattern defect
#338Inspection apparatus and inspection method
#339Method for detecting particles and defects and inspection equipment thereof
#340Plasmon tomography
#341Mask defect inspection data generating method, mask defect inspection method and mask production method
#342CIRCUIT-PATTERN INSPECTING APPARATUS AND METHOD
#343Method and system for measuring contamination of a lithographical element
#344Optical inspection of a specimen using multi-channel responses from the specimen
#345Mask inspection DNIR replacement based on location of tri-tone level database images—2P shapes
#346Reticle defect inspection apparatus and inspection method using thereof
#347Reticle defect inspection apparatus and reticle defect inspection method
#348Foreign substance inspection apparatus
#349Reticle defect inspection apparatus and reticle defect inspection method
#350Lighting optical apparatus and sample inspection apparatus
#351Method and Apparatus for Detecting Surface Characteristics on a Mask Blank
#352High speed laser scanning inspection system
#353Mask defect inspection apparatus
#354Device and method for automatic detection of incorrect measurements by means of quality factors
#355Method and apparatus for inspecting defects on mask
#356Defect inspection apparatus and method
#357Systems and methods for blocking specular reflection and suppressing modulation from periodic features on a specimen
#358Focus control method for an optical apparatus which inspects a photo-mask or the like
#359Inspection systems and methods
#360METHODS AND SYSTEMS FOR INSPECTION OF WAFERS AND RETICLES USING DESIGNER INTENT DATA
#361Method and system for aerial imaging of a reticle
#362Inspection apparatus having two sensors, method for inspecting an object, and a method for manufacturing a photolithography mask
#363Multiple beam inspection apparatus and method
#364Defect inspection method, defect inspection apparatus, and semiconductor device manufacturing method
#365Method for detecting particles and defects and inspection equipment thereof
#366Optical inspection of a specimen using multi-channel responses from the specimen
#367Method and apparatus for detecting defect on a surface of a specimen
#368Measuring and/or inspecting method, measuring and/or inspecting apparatus, exposure method, device manufacturing method, and device manufacturing apparatus
#369Method and device for optical determination of physical properties of features, not much larger than the optical wavelength used, on a test sample
#370Extracting ordinary and extraordinary optical characteristics for critical dimension measurement of anisotropic materials
#371Optical defect inspection apparatus
#372Circuit-pattern inspecting apparatus and method
#373Plasmon tomography
#374Plasmon tomography
#375Method and system of defect inspection for mask blank and method of manufacturing semiconductor device using the same
#376Detecting and characterizing mask blank defects using angular distribution of scattered light
#377Pattern inspection apparatus and method along with workpiece tested thereby and management method of workpiece under testing
#378Inspection apparatus, lithographic system provided with the inspection apparatus and a method for inspecting a sample
#379Lithographic apparatus and method
#380Excimer laser inspection system
#381Optical inspection of a specimen using multi-channel responses from the specimen
#382Defect inspection apparatus and defect inspection method
#383Method and device for examination of nonuniformity defects of patterns
#384Defect inspection apparatus
#385Workpiece inspection apparatus assisting device, workpiece inspection method and computer-readable recording media storing program therefor
#386Production of test patterns for test inspection
#387Method and equipment for detecting pattern defect
#388Mask inspection DNIR placement based on location of tri-tone level database images (2P shapes)
#389Computer-implemented methods for detecting and/or sorting defects in a design pattern of a reticle
#390Method for detecting, sampling, analyzing, and correcting marginal patterns in integrated circuit manufacturing
#391Method and apparatus for inspecting reticles implementing parallel processing
#392Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device
#393Particle inspection apparatus and method, exposure apparatus, and device manufacturing method
#394Method and apparatus for detecting pattern defects
#395Multiple beam inspection apparatus and method
#396Method and system of inspecting mura-defect and method of fabricating photomask
#397Apparatus and method of inspecting defects in photomask and method of fabricating photomask
#398Optical inspection of a specimen using multi-channel responses from the specimen
#399Mask blanks inspection tool
#400High speed laser scanning inspection system
#401Apparatus for Inspecting the front side and backside of a disk-shaped object
#402Optical inspection apparatus and optical inspection method
#403Mask blanks inspection method and mask blank inspection tool
#404Fiber amplifier based light source for semiconductor inspection
#405Reticle particle calibration standards
#406Large substrate flat panel inspection system
#407Ultraviolet light source, laser treatment apparatus comprising ultraviolet light source, and exposure apparatus comprising ultraviolet light source
#408Method and apparatus for detecting surface characteristics on a mask blank
#409Apparatus and method for measurement of critical dimensions of features and detection of defects in UV, VUV, and EUV lithography masks
#410Method and equipment for detecting pattern defect
#411High throughout image for processing inspection images
#412Extreme ultraviolet radiation imaging
#413Mask defect inspection apparatus
#414Image input apparatus and inspection apparatus
#415Multiple beam inspection apparatus and method
#416Reference data generating method, pattern defect checking apparatus, pattern defect checking method, reference data generating program, and semiconductor device manufacturing method
#417Optical inspection of a specimen using multi-channel responses from the specimen
#418Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device
#419Method for dynamically monitoring a reticle
#420Method and equipment for detecting pattern defect
#421Apparatus and method for high speed scan for detection and measurement of properties of sub-wavelength defects and artifacts in semiconductor and mask metrology
#422Methods and systems for inspection of wafers and reticles using designer intent data
#423Inspection apparatus having two sensors, method for inspecting an object, and a method for manufacturing a photolithography mask
#424EUV mask defect tool apparatus
#425Global dynamic detection method and system for protective film of photomask
#426Analyzer of technological surfaces
#427Systems, devices, and methods for combined wafer and photomask inspection
#428High-brightness LPP EUV light source
#429Pulsed laser induced plasma light source