G02B17/0828 - CPC Classification Index

ClassID:

174569 ⎘

G02B17/0828 - CPC Classification

Classification description:

Systems with reflecting surfaces, with or without refracting elements; Catadioptric systems using three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry

Recent Application in this class:

20230176465

2023-06-08

OPTICAL SYSTEM AND PROJECTOR

20180357758

2018-12-13

Method for three-dimensionally measuring a 3D aerial image of a lithography mask

20180246302

2018-08-30

Projection optical system and projector

20170219807

2017-08-03

Wafer defect inspection and review systems

20130314679

2013-11-28

Projection optical system, exposure apparatus, and exposure method

20100309279

2010-12-09

Optical system for direct imaging of light markable material

20080192216

2008-08-14

Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus

20070273965

2007-11-29

Catadioptric projection system for 157 nm lithography

20070216885

2007-09-20

Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus

#10

20070153398

2007-07-05

Microlithographic reduction projection catadioptric objective

#11

20060238729

2006-10-26

Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus

#12

20060077567

2006-04-13

Imaging optical system

#13

20060050407

2006-03-09

Zoom optical system

#14

20050185162

2005-08-25

Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus

#15

20050012917

2005-01-20

Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus