174756 ⎘
Optical systems or apparatus not provided for by any of the groups - for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
METHOD FOR HEATING AN OPTICAL ELEMENT, AND OPTICAL SYSTEM
#2OPTICAL ELEMENT, AND ASSEMBLY AND OPTICAL SYSTEM THEREWITH
#3Eye Glow Suppression in Waveguide Based Displays
#4Imaging optical system, exposure apparatus, and article manufacturing method
#5Exposure method, exposure apparatus, article manufacturing method, and method of manufacturing semiconductor device
#6Folded projection system
#7Method for correcting an image, storage medium and projection device
#8EUV exposure apparatus with reflective elements having reduced influence of temperature variation
#9Measuring device with measurement beam homogenization
#10Lithography apparatus, a method of manufacturing a device and a control program
#11Projection system, projection method, and projection program
#12Structured-light projector
#13Optical device, projection optical system, exposure apparatus using the same, and method for manufacturing article
#14EUV exposure apparatus with reflective elements having reduced influence of temperature variation
#15Optical system for field mapping and/or pupil mapping
#16Image display device and light guiding device with diffraction elements
#17EUV exposure apparatus with reflective elements having reduced influence of temperature variation
#18Lithography apparatus and method of manufacturing a device
#19EUV exposure apparatus with reflective elements having reduced influence of temperature variation
#20System correction from long timescales
#21Method and apparatus for compensating at least one defect of an optical system
#22EUV exposure apparatus with reflective elements having reduced influence of temperature variation
#23Methods and devices for driving micromirrors
#24Optical writing head and image forming apparatus
#25Projection objective with diaphragms
#26Methods and devices for driving micromirrors
#27Illumination system for EUV microlithography
#28Magnification control for lithographic imaging system
#29Pattern generator
#30Telecentricity corrector for microlithographic projection system
#31Pattern generator
#32Pattern generator
#33OPTICAL ELEMENT, AND LIGHT SOURCE UNIT AND EXPOSURE APPARATUS HAVING THE SAME
#34Efficient EUV collector designs
#35Mask Structure for Manufacturing an Integrated Circuit by Photolithographic Patterning
#36Illumination system for a microlithgraphic exposure apparatus
#37Pattern generator
#38Diffractive-optical element, scanning optical system, optical scanner, and image forming apparatus
#39CATADIOPTRIC PROJECTION OBJECTIVE WITH ADAPTIVE MIRROR AND PROJECTION EXPOSURE METHOD
#40Focal point detection apparatus
#41Objective with crystal lenses
#42Reflection-type projection-optical systems, and exposure apparatus comprising same
#43Groupwise corrected objective
#44Method of Forming a Diffractive Optical Element
#45OPTICAL ELEMENT, AND LIGHT SOURCE UNIT AND EXPOSURE APPARATUS HAVING THE SAME
#46No-contact alignment apparatus and no-contact alignment method
#47Microlithography projection objective including deformable mirror with adjusting elements and systems and methods using the same
#48Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method
#49Pattern generator diffractive mirror methods and systems
#50Lithographic objective having a first lens group including only lenses having a positive refractive power
#51Efficient EUV collector designs
#52System for measuring aberration, method for measuring aberration and method for manufacturing a semiconductor device
#53Pattern generator
#54Optical element, optical system, laser device, exposure device, mask testing device and high polymer crystal processing device
#55Lithographic apparatus, device manufacturing method
#56Lithographic apparatus, device manufacturing method
#57Correction of birefringence in cubic crystalline optical systems
#58Aberration correction element, optical pickup, and information equipment
#59Pattern generator mirror configurations
#60Lithographic optical system
#61Diffractive optical element
#62Grating element for filtering wavelengths < 100 nm
#63Objective with crystal lenses
#64Diffractive optical element
#65Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method
#66Correction of birefringence in cubic crystalline optical systems
#67Diffractive optical element and method of making same
#68Method for evaluating image formation performance
#69Method for evaluating image formation performance
#70Folded projection system