ClassID:

175986

G03B27/16 - CPC Classification

Classification description:

Photographic printing apparatus; Exposure apparatus for contact printing; Details Illumination arrangements, e.g. positioning of lamps, positioning of reflectors

Recent Application in this class:
#1
20240377717
2024-11-14

IMAGING APPARATUS, CONTROL METHOD, AND PROGRAM

#2
20150205192
2015-07-23

Multi-prism mechanism for laser exposure system of 3D images and method thereof

#3
20150029483
2015-01-29

Display device comprising dual transistor with LDD regions overlapping the gate electrodes and one of a source electrode and a drain electrode of first transistor is electrically connected to the second gate electrode

#4
20140111835
2014-04-24

Image scanning unit

#5
20130286372
2013-10-31

Display device comprising at least dual transistor electrically connected to dual parallel wiring

#6
20130148200
2013-06-13

Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination

#7
20130043480
2013-02-21

Display device

#8
20110304838
2011-12-15

EXPOSURE SYSTEM AND ADJUSTMENT METHOD THEREOF

#9
20090231707
2009-09-17

Optical arrangement, in particular projection exposure apparatus for EUV lithography, as well as reflective optical element with reduced contamination

#10
20080316449
2008-12-25

Exposure device, exposure method and method of manufacturing semiconductor device

#11
20080049205
2008-02-28

IMAGING SYSTEM FOR THERMAL TRANSFER

#12
20060274296
2006-12-07

Imaging system for thermal transfer

#13
20050275819
2005-12-15

Imaging system for thermal transfer

#14
20050140775
2005-06-30

Film exposure method and apparatus using liquid crystal display

#15
20050100832
2005-05-12

Exposure device, exposure method and method of manufacturing semiconductor device

#16
20050078168
2005-04-14

Exposure system