176003 ⎘
Photographic printing apparatus; Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
Sub-classes:Reticle Thermal Expansion Calibration Method Capable of Improving Sub-Recipe
#2Lithographic apparatus and device manufacturing method
#3Reticle thermal expansion calibration method capable of improving sub-recipe
#4Lithographic apparatus and device manufacturing method
#5Biological analysis systems, devices, and methods
#6EXPOSURE METHOD AND APPARATUS, AND METHOD FOR FABRICATING DEVICE WITH LIGHT AMOUNT DISTRIBUTION HAVING LIGHT LARGER IN FOUR AREAS
#7EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
#8Exposure apparatus, surface position control method, exposure method, and semiconductor device manufacturing method
#9EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD
#10EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD FOR PRODUCING DEVICE
#11Support apparatus, lithographic apparatus and device manufacturing method
#12Exposure apparatus and device fabrication method
#13Exposure method, exposure apparatus, and method for producing device
#14Exposure method, exposure apparatus, and method for producing device
#15Systems and methods for fabricating three-dimensional objects
#16Biological analysis systems, devices, and methods
#17Optical projection array exposure system
#18Exposure apparatus and device manufacturing method
#19Enhanced stitching by overlap dose and feature reduction
#20Exposure apparatus and device manufacturing method
#21Exposure apparatus and device fabrication method
#22Sub-resolution assist devices and methods
#23Method for manufacturing reflective mask and apparatus for manufacturing reflective mask
#24Systems and methods for fabricating three-dimensional objects
#25Exposure apparatus, exposure method, and method of manufacturing device
#26Lithographic apparatus, and patterning device for use in a lithographic process
#27Immersion exposure apparatus and device manufacturing method with measuring device to measure specific resistance of liquid
#28Optical projection array exposure system
#29Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
#30Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
#31Immersion exposure apparatus and method that detects liquid adhered to rear surface of substrate
#32Exposure apparatus
#33Exposure method, exposure apparatus, and method for producing device
#34Large area nanopatterning method and apparatus
#35Exposure apparatus and device fabrication method
#36Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method
#37Method of aligning an exposure apparatus, method of exposing a photoresist film using the same and exposure apparatus for performing the method of exposing a photoresist film
#38LARGE AREA NANOPATTERNING METHOD AND APPARATUS
#39EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
#40ILLUMINATION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND EXPOSURE METHOD
#41Method for a lithographic apparatus
#42Exposure apparatus and method of manufacturing device
#43Large area nanopatterning method and apparatus
#44FIELD EXTENSION TO REDUCE NON-YIELDING EXPOSURES OF WAFER
#45Method for manufacturing reflective mask and apparatus for manufacturing reflective mask
#46SHOWERHEAD CONFIGURATIONS FOR PLASMA REACTORS
#47Optical compensation devices, systems, and methods
#48TRANSFER METHOD, TRANSFER APPARATUS, AND METHOD OF MANUFACTURING ORGANIC LIGHT EMITTING ELEMENT
#49System and method for manufacturing three dimensional integrated circuits
#50Lithographic apparatus and device manufacturing method
#51Exposure apparatus, exposure method, and method of manufacturing device
#52PRODUCTION OF AN ALIGNMENT MARK
#53Lithographic apparatus and device manufacturing method
#54Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table after exposure
#55Immersion exposure apparatus and method that detects residual liquid on substrate held by substrate table on way from exposure position to unload position
#56Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method
#57Lithographic apparatus and device manufacturing method
#58Sub-resolution assist devices and methods
#59Stage apparatus and exposure apparatus
#60Exposure apparatus, measurement method, stabilization method, and device fabrication method
#61Lithographic apparatus and device manufacturing method with double exposure overlay control
#62Apparatus and method for recovering liquid droplets in immersion lithography
#63METHOD OF MANUFACTURING SEMICONDUCTOR DEVICES AND EXPOSURE APPARATUS
#64Exposure apparatus and device manufacturing method
#65INTEGRATED LITHOGRAPHY EQUIPMENT AND LITHOGRAPHY PROCESS THEREOF
#66Management apparatus, exposure method, and method of manufacturing device
#67Molecular transfer lithography apparatus and method for transferring patterned materials to a substrate
#68Exposure device, exposure method, and method for manufacturing semiconductor device
#69Detection apparatus, exposure apparatus, and device fabrication method
#70Generating method, creating method, exposure method, and storage medium
#71Exposure apparatus, exposure method, and method for producing device
#72Offset printing process using light controlled wettability
#73SYSTEM FOR ENGRAVING FLEXOGRAPHIC PLATES
#74Lithographic apparatus configured to compensate for variations in a critical dimension of projected features due to heating of optical elements
#75Optical element, exposure apparatus based on the use of the same, exposure method, and method for producing microdevice
#76Optical compensation devices, systems, and methods
#77EXPOSURE SYSTEM, CONTROL APPARATUS OF EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE
#78Methods for fabricating semiconductor devices
#79Wavefront aberration measurement apparatus, exposure apparatus, and method of manufacturing device
#80EXPOSURE APPARATUS, DEVICE MANUFACTURING SYSTEM, AND METHOD OF MANUFACTURING DEVICE
#81METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND EXPOSURE DEVICE
#82Intensity selective exposure method and apparatus
#83HDD pattern apparatus using laser, E-beam, or focused ion beam
#84Alignment Measurement Arrangement, Alignment Measurement Method, Device Manufacturing Method and Lithographic Apparatus
#85Illumination optical system, exposure apparatus, and exposure method
#86Alignment system and alignment marks for use therewith
#87Creating metal gate structures using Lithography-Etch-Lithography-Etch (LELE) processing sequences
#88Exposure apparatus and method to measure beam position and assign address using the same
#89LOW k1 HOLE PRINTING USING TWO INTERSECTING FEATURES
#90Image transformation device
#91MEMS device with controlled gas space chemistry
#92Method of determining a characteristic
#93EUV Mask Inspection
#94Optimization method and a lithographic cell
#95Lithographic apparatus with gas pressure means for controlling a planar position of a patterning device contactless
#96Lithographic apparatus, and patterning device for use in a lithographic process
#97Method of measuring numerical aperture of exposure machine, control wafer, photomask, and method of monitoring numerical aperture of exposure machine
#98Illumination optical system, exposure apparatus, and exposure method
#99Method of detecting reticle errors
#100Device and method for manufacturing a particulate filter with regularly spaced micropores
#101Lithographic apparatus and device manufacturing method with double exposure overlay control
#102Method for a lithographic apparatus
#103Large area nanopatterning method and apparatus
#104EXPOSURE APPARATUS, SUBSTRATE PROCESSING APPARATUS, LITHOGRAPHY SYSTEM, AND DEVICE MANUFACTURING METHOD
#105SCANNING EXPOSURE APPARATUS, CONTROL METHOD THEREFOR, AND DEVICE MANUFACTURING METHOD
#106Reverse flow gas gauge proximity sensor
#107PATTERNING METHOD, EXPOSURE SYSTEM, COMPUTER READABLE STORAGE MEDIUM, AND METHOD OF MANUFACTURING DEVICE
#108Exposure apparatus
#109LITHOGRAPHIC APPARATUS COMPRISING AN ASSEMBLY OF A LINE CARRIER WITH LOW-FRICTION CABLES, HOSES OR THE LIKE AND SUCH AN ASSEMBLY IN GENERAL
#110Guiding device and guiding assembly for guiding cables and/or hoses, and a lithographic apparatus
#111Exposure apparatus and device fabrication method
#112Method and apparatus for using a synchrotron as a source in extreme ultraviolet lithography
#113PROJECTION ASSEMBLY AND LITHOGRAPHIC APPARATUS
#114Spectral purity filters and methods therefor
#115LITHOGRAPHIC APPARATUS AND ALIGNMENT METHOD
#116Method and system for manufacturing a reticle using character projection lithography
#117Device manufacturing method, control system, computer program and computer-readable medium
#118Method and system for manufacturing a reticle using character projection particle beam lithography
#119Biological Analysis Systems, Devices, and Methods
#120Lithography apparatus with an optical fiber module
#121Photoimaging method and apparatus
#122SCANNING EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE
#123Systems and methods for fabricating three-dimensional objects
#124EXPOSURE APPARATUS AND METHOD FOR MANUFACTURING DEVICE
#125SCANNING EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD
#126Method and system for step-and-align interference lithography
#127Exposure apparatus, cleaning method, and device fabricating method
#128Exposure apparatus and device manufacturing method
#129Exposure apparatus and method of manufacturing device
#130EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE
#131Deforming mechanism, exposure apparatus, and device manufacturing method
#132WAFER EXPOSING METHOD, EUV EXPOSING APPARATUS, AND EB EXPOSING APPARATUS
#133EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
#134CONDUCTIVE PATTERN FORMING APPARATUS
#135Method of measuring a lithographic projection apparatus
#136Method of aligning an exposure apparatus, method of exposing a photoresist film using the same and exposure apparatus for performing the method of exposing a photoresist film
#137Foreign particle inspection apparatus, exposure apparatus, and method of manufacturing device
#138EXPOSURE APPARATUS
#139ILLUMINATION SYSTEM AND LITHOGRAPHIC METHOD
#140Exposure apparatus, measurement method, stabilization method, and device fabrication method
#141Lithographic apparatus and device manufacturing method using overlay measurement
#142Projection exposure method
#143Digital camera with card reader for reading program script
#144EXPOSURE METHOD, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE
#145Exposure apparatus and method of decreasing fluctuations in optical characteristics of projection system
#146Exposure apparatus and device manufacturing method
#147Exposure apparatus
#148Exposure apparatus and device manufacturing method
#149Semiconductor Devices and Methods of Manufacture Thereof
#150Lithographic apparatus with actuator to compensate acoustic vibration
#151Method of manufacturing a miniaturized device
#152METHOD AND SYSTEM FOR LEVELING TOPOGRAPHY OF SEMICONDUCTOR CHIP SURFACE
#153Optical scanning element, optical scanning device, optical scanning display device, and retinal scanning display
#154Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger and different linear polarization states in an on-axis area and a plurality of off-axis areas
#155Exposure apparatus and device fabrication method
#156Alignment system and alignment marks for use therewith
#157MULTIPLE CHUCK SCANNING STAGE
#158Method and apparatus for extracting dose and focus from critical dimension data
#159Biological Analysis Systems, Devices, and Methods
#160Compact projection exposure device and associated exposure process performed by the device for exposing film-shaped tape to form circuit patterns
#161Exposure apparatus and device manufacturing method
#162Radiometric Kirk test
#163Device and method for manufacturing a particulate filter with regularly spaced micropores
#164Mark for alignment and overlay, mask having the same, and method of using the same
#165Multiple exposure technique using OPC to correct distortion
#166Developing apparatus, developing method and storage medium
#167DOUBLE EXPOSURE OF A PHOTORESIST LAYER USING A SINGLE RETICLE
#168Exposure apparatus
#169Illumination optical system and exposure apparatus including the same
#170METHOD OF INSPECTING EXPOSURE SYSTEM AND EXPOSURE SYSTEM
#171Exposure Method and Apparatus, and Electronic Device Manufacturing Method
#172Exposure method, exposure apparatus, and method for producing device
#173Exposure apparatus and method for manufacturing device
#174STAGE APPARATUS, EXPOSURE APPARATUS, AND METHOD OF MANUFACTURING DEVICE
#175Exposure apparatus and method
#176Exposure apparatus and device manufacturing method
#177Exposure apparatus and method of manufacturing device
#178In-line particle detection for immersion lithography
#179Exposure method, exposure apparatus, and method for producing device
#180Exposure apparatus and device manufacturing method
#181TRANSFER METHOD, TRANSFER APPARATUS, AND METHOD OF MANUFACTURING ORGANIC LIGHT EMITTING ELEMENT
#182Exposure apparatus and device manufacturing method
#183Exposure apparatus and method for manufacturing device
#184Assembly comprising a radiation source, a reflector and a contaminant barrier
#185Optical compensation devices, systems, and methods
#186Defocus determination method using sub-resolution feature (SRF) printing
#187Sub-resolution assist devices and methods
#188Apparatus, system, and method for simulating outputs of a resolver to test motor-resolver systems
#189Exposure apparatus and device manufacturing method
#190EXPOSURE APPARATUS AND METHOD OF MANUFACTURING DEVICE
#191Exposure system with a plurality of laser sources located at dispersed sites
#192Illumination optical system, exposure apparatus, and exposure method
#193Immersion lithographic apparatus and method for rinsing immersion space before exposure
#194Device manufacturing method, computer program and lithographic apparatus
#195Exposure apparatus
#196Movable stage apparatus
#197Device manufacturing method, computer program product and lithographic apparatus
#198Exposure apparatus, exposure method, and method for producing device
#199Exposure apparatus
#200Stage apparatus and exposure apparatus
#201Method and apparatus to prevent contamination of optical element by resist processing
#202Illumination optical system, exposure apparatus, and exposure method with polarized state fluctuation correcting device
#203Methods and systems to compensate for a stitching disturbance of a printed pattern
#204Methods and systems to compensate for a stitching disturbance of a printed pattern
#205Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
#206Immersion lithography method
#207Methods and apparatus for changing the optical properties of resists
#208Illumination optical system, exposure apparatus, and exposure method with polarized state detection result and adjustment
#209Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in four areas
#210Optical power modulation at high frequency
#211Roll printer with decomposed raster scan and X-Y distortion correction
#212Apparatus and methods for recovering fluid in immersion lithography
#213Manufacturing method of display device and exposure system for that
#214Systems and methods for fluid flow control in an immersion lithography system
#215Method and apparatus for angular-resolved spectroscopic lithography characterization
#216Exposure apparatus
#217Exposure apparatus and device fabrication method
#218Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas
#219Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method
#220ILLUMINATION LIGHT IN IMMERSION LITHOGRAPHY STEPPER FOR PARTICLE OR BUBBLE DETECTION
#221Apparatus for exposing an edge portion of a wafer
#222Scanning exposure apparatus and device manufacturing method
#223Exposure apparatus
#224Immersion exposure apparatus
#225Altering pattern data based on measured optical element characteristics
#226Immersion exposure apparatus and device manufacturing method with measuring device
#227EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
#228Exposure apparatus, and device manufacturing method
#229Exposure scan and step direction optimization
#230EUVL reticle stage and reticle protection system and method
#231Exposure apparatus and method, and device manufacturing method
#232Apparatus and method for particle monitoring in immersion lithography
#233METHOD OF EXPOSING A WAFER TO A LIGHT, AND RETICLE, RETICLE ASSEMBLY AND EXPOSING APPARATUS FOR PERFORMING THE SAME
#234Exposure apparatus and device fabrication method
#235Exposure apparatus and method for producing device
#236Lithographic apparatus, method of exposing a substrate, method of measurement, device manufacturing method, and device manufactured thereby
#237Assembly of a reticle holder and a reticle
#238Tessellated patterns in imprint lithography
#239Lithographic apparatus with cleaning of substrate table
#240Lithographic apparatus and patterning device
#241Lithographic processing cell and device manufacturing method
#242Filtered device container assembly with shield for a reticle
#243Lithographic processing cell and device manufacturing method
#244Exposure apparatus
#245Lithographic apparatus and device manufacturing method
#246Lithographic apparatus and device manufacturing method using overlay measurement
#247Heat treatment apparatus of light emission type
#248Lithographic apparatus and device manufacturing method with double exposure overlay control
#249Exposure apparatus, exposure method, and method for producing device
#250Exposure apparatus, exposure method, and method for producing device
#251Stage apparatus
#252Exposure apparatus and device manufacturing method
#253Lithographic apparatus and device manufacturing method
#254System for determining conducted radio frequency (RF) receiver sensitivity and related methods
#255Exposure apparatus and making method thereof
#256Optical element, exposure apparatus based on the use of the same, exposure method, and method for producing microdevice
#257Photo-mask stage
#258Manufacturing method of semiconductor device
#259Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium
#260Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium
#261Lithographic apparatus and device manufacturing method
#262SEMICONDUCTOR EXPOSURE METHOD AND METHOD OF CONTROLLING SEMICONDUCTOR EXPOSURE APPARATUS
#263Lithographic apparatus and device manufacturing method
#264Lithographic projection apparatus and a device manufacturing method
#265Exposure apparatus and device manufacturing method
#266Immersion exposure apparatus and device manufacturing method with liquid detection apparatus
#267Methods and systems to compensate for a stitching disturbance of a printed pattern in a maskless lithography system utilizing overlap of exposure zones with attenuation of the aerial image in the overlap region
#268Exposure method, exposure apparatus, and method for producing device
#269Load-lock apparatus, device manufacturing apparatus, and device manufacturing method
#270Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method
#271Immersion exposure apparatus and device manufacturing method with residual liquid detector
#272Exposure apparatus and device fabrication method
#273Apparatus and method for recovering liquid droplets in immersion lithography
#274Exposure apparatus and exposure method, maintenance method, and device manufacturing method
#275Exposure apparatus and device fabrication method
#276Exposure apparatus
#277Exposure apparatus and method for manufacturing device
#278Analysis method, exposure method, and device manufacturing method
#279Exposure apparatus
#280Exposure method, exposure system, and substrate processing apparatus
#281Containment system for immersion fluid in an immersion lithography apparatus
#282Exposure apparatus and device fabrication method
#283Exposure apparatus and device fabrication method
#284Substrate conveyance device and substrate conveyance method, exposure apparatus and exposure method, device manufacturing method
#285Exposure apparatus
#286Exposure apparatus, exposure method, and device manufacturing method
#287Roll printer with decomposed raster scan and X-Y distortion correction
#288Exposure method
#289Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby
#290Method of manufacturing a miniaturized device
#291Stage design for reflective optics
#292Holding mechanism in exposure apparatus, and device manufacturing method
#293Exposure apparatus
#294Exposure method, exposure apparatus, and method for producing device
#295Self-adapting feedforward control tuning for motion system, and lithographic apparatus provided with such a motion system
#296Exposure device for immersion lithography and method for monitoring parameters of an exposure device for immersion lithography
#297Exposure method, exposure tool and method of manufacturing a semiconductor device
#298System and method to block unwanted light reflecting from a pattern generating portion from reaching an object
#299Exposure apparatus and device manufacturing method
#300Exposure method and apparatus, and method for fabricating device