POLARIZATION-MODULATING OPTICAL ELEMENT

Printer, printer-equipped imaging apparatus, and printing control method

Instant film pack and image recording device

IMAGING DEVICE, TEMPERATURE ESTIMATION METHOD OF IMAGING DEVICE, AND NON-TRANSITORY STORAGE MEDIUM STORING TEMPERATURE ESTIMATION PROGRAM OF IMAGING DEVICE

Lighting apparatus and image reading apparatus

Lithography apparatus, an apparatus for providing setpoint data, a device manufacturing method, a method for providing setpoint data and a computer program

Prism film and method and apparatus for manufacturing the same

Polarization-modulating optical element

Mask and optical filter manufacturing apparatus including the same

Methods and devices for driving micromirrors

Print color predicting apparatus, print color predicting method, and recording medium

Method for determining exposure condition and computer-readable storage media storing program for determining exposure condition

EXPOSURE SYSTEM AND ADJUSTMENT METHOD THEREOF

System and Method Configured to Provide Predetermined Depth Of Focus and to Control Irradiance Distribution

Systems and methods for thermally-induced aberration correction in immersion lithography

Optical device and device manufacturing method

APPARATUS, METHOD, AND LITHOGRAPHY SYSTEM

POLARIZATION-MODULATING OPTICAL ELEMENT

Methods and devices for driving micromirrors

Methods of optical proximity correction in manufacturing semiconductor devices

Maskless exposure apparatus having measurement optical unit to measure depths of focus of a plurality of beams and control method thereof

Anti-reflective coating for optical elements

SPECTRAL PURITY FILTERS FOR USE IN A LITHOGRAPHIC APPARATUS

SPECTRAL PURITY FILTERS FOR USE IN A LITHOGRAPHIC APPARATUS

Method and system for photolithographic fabrication with resolution far below the diffraction limit

POLARIZATION EVALUATION MASK, EXPOSURE DEVICE, AND POLARIZATION EVALUATION METHOD

Resist exposure and contamination testing apparatus for EUV lithography

POLARIZATION STATE MEASUREMENT APPARATUS AND EXPOSURE APPARATUS

SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A SPECTRAL PURITY FILTER

Method of exposing substrate, apparatus for performing the same, and method of manufacturing display substrate using the same

Photolithography systems and associated methods of selective die exposure

Light source device and projector

Shutter pixel, shutter structure including the shutter pixel, and exposure apparatus including the shutter structure

Optical scanning device and image forming apparatus provided with the same

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

Illumination aperture for optical lithography

ILLUMINATION OPTICAL SYSTEM AND EXPOSURE APPARATUS

Fluid Assisted Gas Gauge Proximity Sensor

Image forming device provided with sensor and movable shutter

Exposure apparatus and image forming apparatus

Illumination optical system and exposure apparatus

Mixed polarization state monitoring

Exposure apparatus and device manufacturing method

Device, method, and system for measuring image profiles produced by an optical lithography system

Dichroic mirror, method for manufacturing a dichroic mirror, lithographic apparatus, semiconductor device and method of manufacturing therefor

Measurement apparatus, measurement method, exposure apparatus, and device manufacturing method

EXPOSURE SYSTEM

Exposure apparatus and device manufacturing method using original with phase-modulation diffraction grating to form interference pattern

Exposure apparatus and a method of manufacturing a device that conduct exposure using a set light source shape

Projection exposure method

Optical element, projection optical system, exposure apparatus, and device fabrication method

Exposure apparatus and method of manufacturing device

Methods for enhancing photolithography patterning

Illumination optical system, exposure apparatus using the same and device manufacturing method

Light intensity distribution measurement apparatus and measurement method, and exposure apparatus

Evaluation method, control method, exposure apparatus, and memory medium

Projection apparatus

POLARIZER, PROJECTION LENS SYSTEM, EXPOSURE APPARATUS AND EXPOSING METHOD

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

EXPOSURE METHOD AND APPARATUS, AND ELECTRONIC DEVICE MANUFACTURING METHOD

Method and apparatus for forming image

Measurement apparatus, exposure apparatus, and device fabrication method

METHODS AND APPARATUSES FOR CONFIGURING RADIATION IN MICROLITHOGRAPHIC PROCESSING OF WORKPIECES

EXPOSURE APPARATUS AND DEVICE FABRICATION METHOD

Exposure apparatus and device fabrication method

Optical device, exposure apparatus, and device manufacturing method

Polarization-modulating optical element

Light attenuating filter for correcting field dependent ellipticity and uniformity

Projection exposure apparatus

Polarization rotator and a crystalline-quartz plate for use in an optical imaging system

Method for determining exposure condition and computer-readable storage media storing program for determining exposure condition

Method and arrangement for stabilizing the average emitted radiation output of a pulsed radiation source

Systems and methods for thermally-induced aberration correction in immersion lithography

Shutter blade apparatus, shutter unit, image pickup apparatus, exposure apparatus, and method of manufacturing device

Exposure apparatus

Increasing pulse-to-pulse radiation beam uniformity

Exposure apparatus and device manufacturing method

Exposure apparatus

APERTURE UNIT AND EXPOSURE SYSTEM INCLUDING THE SAME, AND METHOD FOR REPLACING APERTURES OF THE APERTURE UNIT

PROJECTION ALIGNER INCLUDING CORRECTION FILTERS

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

Exposure apparatus and image plane detecting method

Method of reducing a wave front aberration, and computer program product

Optical system of an illumination device of a projection exposure apparatus

Light application apparatus, crystallization apparatus and optical modulation element assembly

LIGHT IRRADIATION APPARATUS, LIGHT IRRADIATION METHOD, CRYSTALLIZATION APPARATUS, CRYSTALLIZATION METHOD, SEMICONDUCTOR DEVICE, AND LIGHT MODULATION ELEMENT

METHOD AND APPARATUS FOR CONTROLLING LIGHT INTENSITY AND FOR EXPOSING A SEMICONDUCTOR SUBSTRATE

Lithographic projection apparatus and a device manufacturing method

Color timing processes

Polarization rotator and a crystalline-quartz plate for use in an optical imaging system

Multi-function image device

Printing apparatus

Exposure apparatus and method for manufacturing device using the exposure apparatus

Polarization-modulating optical element

Methods and apparatuses for configuring radiation in microlithographic processing of workpieces using an adjustment structure

Surface light source control apparatus and surface light source control method

Image forming apparatus

Simulator of optical intensity distribution, computer implemented method for simulating the optical intensity distribution, method for collecting mask pattern, and computer program product for the simulator

Method for exposing a semiconductor wafer by applying periodic movement to a component

Printing apparatus and correction data generating method

Gradation conversion calibration by comparing grayscale and color chart measurements to target values and repeated correction amount calculations to tolerance values

Exposure device with spatial light modulator and neutral density filters

Image forming apparatus

Light amount adjusting device and projector using the same

Image projection apparatus for adjusting white balance in consideration of temperature of LED and method thereof

Scanner optical module

LCD photographic printer

Polarization rotator and a crystalline-quartz plate for use in an optical imaging system

Method and system for reducing the impact of across-wafer variations on critical dimension measurements

Method for characterization of the illuminator in a lithographic system

Method of monitoring the light integrator of a photolithography system

Projection exposure system for microlithography and method for generating microlithographic images

Layered structure for a tile wave plate assembly

Exposure apparatus and device manufacturing method

Method for evaluating a local flare, correction method for a mask pattern, manufacturing method for a semiconductor device and a computer program product

Image recording apparatus

Compact pulse stretcher

Illumination optical system and exposure apparatus having the same

Multi beam exposing device and exposing method using the same

Exposure apparatus

Light application apparatus, crystallization apparatus and optical modulation element assembly

Method and system for detecting sensitivity of photosensitive materials and exposure correcting method

Digital exposure apparatus for a color enlarging photoprinter

Wireless signaling in a lithographic apparatus

Exposure apparatus

Projection exposure system for microlithography and method for generating microlithographic images

Projection exposure system for microlithography and method for generating microlithographic images

White light emitting diode with first and second LED elements

Exposure system

Polarizer, projection lens system, exposure apparatus and exposing method

Exposure apparatus

Method and apparatus for amplitude filtering in the frequency plane of a lithographic projection system