ClassID:

176442

G03C1/85 - CPC Classification

Classification description:

Photosensitive materials; Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings

Sub-classes:
Recent Application in this class:
#1
20120285726
2012-11-15

ELECTRICALLY CONDUCTIVE ELEMENT, PHOTOSENSITIVE MATERIAL FOR FORMATION OF ELECTRICALLY CONDUCTIVE ELEMENT, AND ELECTRODE

#2
20100243923
2010-09-30

Transparent electromagnetic wave-shielding filter and method of producing thereof, and conductive film

#3
20080290084
2008-11-27

Method of Forming a Flexible Heating Element

#4
20080230393
2008-09-25

Method and apparatus for producing conductive material

#5
20070248906
2007-10-25

Silver halide color photographic light-sensitive material

#6
20070244004
2007-10-18

Thermally developable materials with buried conductive backside coatings

#7
20070111145
2007-05-17

THERMALLY DEVELOPABLE MATERIALS WITH BACKSIDE CONDUCTIVE LAYER

#8
20070087295
2007-04-19

Radiographic materials with antifoggant precursors

#9
20070082301
2007-04-12

Image forming method using photothermographic material

#10
20070077527
2007-04-05

Silver halide color photosensitive material

#11
20070072772
2007-03-29

Thermally developable materials with backside antistatic layer

#12
20070015660
2007-01-18

Direct thermographic materials with catechol borate reducing agents

#13
20060293184
2006-12-28

Thermographic materials with highly polymerized binder polymer

#14
20060210931
2006-09-21

Thermally developable materials with narrow disperse amorphous silica

#15
20060194158
2006-08-31

Antistatic properties for thermally developable materials

#16
20060046932
2006-03-02

Thermally developable materials with backside conductive layer

#17
20060046215
2006-03-02

Antistatic properties for thermally developable materials

#18
20050260529
2005-11-24

Image forming method using photothermographic material

#19
20050118540
2005-06-02

Image forming method

#20
20050084810
2005-04-21

Highly lubricated imaging element with elastomeric matte

#21
20050084809
2005-04-21

Thermally development imaging materials having backside stabilizers

#22
20050084808
2005-04-21

Thermally developable imaging materials having backside stabilizers

#23
20050069683
2005-03-31

Antistatic conductive grid pattern with integral logo

#24
20050053872
2005-03-10

Image forming method

#25
20050006629
2005-01-13

Composition for antistat layer