ClassID:

176815

G03D13/006 - CPC Classification

Classification description:

Processing apparatus or accessories therefor, not covered by groups  -  Temperature control of the developer

Recent Application in this class:
#1
20120320361
2012-12-20

Cluster tool architecture for processing a substrate

#2
20120180983
2012-07-19

CLUSTER TOOL ARCHITECTURE FOR PROCESSING A SUBSTRATE

#3
20110206408
2011-08-25

System for cooling a developer roll inside an image forming device

#4
20090067956
2009-03-12

Cluster tool architecture for processing a substrate

#5
20090064929
2009-03-12

Cluster tool architecture for processing a substrate

#6
20090064928
2009-03-12

Cluster tool architecture for processing a substrate

#7
20080296316
2008-12-04

COAT/DEVELOP MODULE WITH SHARED DISPENSE

#8
20080223293
2008-09-18

CLUSTER TOOL ARCHITECTURE FOR PROCESSING A SUBSTRATE

#9
20080199282
2008-08-21

Cluster tool architecture for processing a substrate

#10
20060286300
2006-12-21

Cluster tool architecture for processing a substrate

#11
20060278165
2006-12-14

Cluster tool architecture for processing a substrate

#12
20060241813
2006-10-26

Optimized cluster tool transfer process and collision avoidance design

#13
20060158240
2006-07-20

Distributed temperature control system for point of dispense temperature control on track systems utilizing mixing of hot and cold streams

#14
20060134536
2006-06-22

Method and system for determining post exposure bake endpoint

#15
20060134340
2006-06-22

Coat/develop module with independent stations

#16
20060134330
2006-06-22

Cluster tool architecture for processing a substrate

#17
20060132730
2006-06-22

Developer endpoint detection in a track lithography system

#18
20060130767
2006-06-22

Purged vacuum chuck with proximity pins

#19
20060130751
2006-06-22

Cluster tool substrate throughput optimization

#20
20060130750
2006-06-22

Cluster tool architecture for processing a substrate

#21
20060130747
2006-06-22

Coat/develop module with shared dispense