176891 ⎘
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
DETERMINING POTENTIAL DEFECTS IN MASK PATTERNS
#2REFLECTIVE PHOTOMASK BLANK, AND METHOD FOR MANUFACTURING REFLECTIVE PHOTOMASK
#3Mirror image of geometrical patterns in stacked integrated circuit dies
#4CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION AND RESIST PATTERN FORMING PROCESS
#5METHOD FOR ELECTRON BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROLITHOGRAPHIC PHOTOMASK
#6METAL OXIDE FILM-FORMING COMPOSITION, METHOD FOR PRODUCING METAL OXIDE FILMS USING SAME, AND METHOD FOR REDUCING VOLUME SHRINKAGE RATIO OF METAL OXIDE FILMS
#7Structured Film and Method of Using Same to Form a Pattern on a Substrate
#8METHOD OF AND SYSTEM FOR MANUFACTURING SEMICONDUCTOR DEVICE
#9METHOD VERIFYING PROCESS PROXIMITY CORRECTION USING MACHINE LEARNING, AND SEMICONDUCTOR MANUFACTURING METHOD USING SAME
#10Mirror image of geometrical patterns in stacked integrated circuit dies
#11PROCESS FOR CREATING A THREE-DIMENSIONAL STRUCTURE IN A LITHOGRAPHY MATERIAL VIA A LASER LITHOGRAPHY DEVICE
#12Multi charged particle beam writing apparatus and method of adjusting same
#13Method of and system for manufacturing semiconductor device
#14METHOD AND SYSTEM FOR APPLYING A PATTERN ON A MASK LAYER
#15Mask blanks and methods for depositing layers on mask blank
#16Reticle processing system
#17Design-rule checking for curvilinear device features
#18Blankmask and photomask for extreme ultraviolet lithography
#19Using mask fabrication models in correction of lithographic masks
#20Charged particle beam lithography system
#21Memory system having write assist circuit including memory-adapted transistors
#22Photomask
#23Mask patterns and method of manufacture
#24Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process
#25Mask bias approximation
#26PHOTORESIST AND PREPARATION METHOD THEREOF
#27Hexagonal boron nitride structures
#28Resist composition and method of forming resist pattern
#29METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH VARIABLE PATTERN DOSAGE
#30Device having write assist circuit including memory-adapted transistors and method for making the same
#31Photomask and method of forming the same
#32Display panel and mask for manufacturing process of display panel
#33Method of applying vertex based corrections to a semiconductor design
#34Mask blank, phase shift mask and method for manufacturing semiconductor device
#35Assistant pattern for measuring critical dimension of main pattern in semiconductor manufacturing
#36Ebeam three beam aperture array
#37Division mask
#38Dual exposure patterning of a photomask to print a contact, a via or curvilinear shape on an integrated circuit
#39Systems and methods for rapidly fabricating nanopatterns in a parallel fashion over large areas
#40Polymer, negative resist composition, and pattern forming process
#41Polymer, positive resist composition, and pattern forming process
#42Method and system for forming a pattern on a reticle using charged particle beam lithography
#432H/1T phase contact engineering for high performance transition metal dichalcogenide chemical vapor sensors
#44LASER ABLATION TOOLING VIA SPARSE PATTERNED MASKS
#45Method and System for Forming Patterns Using Charged Particle Beam Lithography with Variable Pattern Dosage
#46Polymer compound, negative resist composition, laminate, patterning process, and compound
#47Mask blank with resist film and method for manufacturing the same and method for manufacturing transfer mask
#48Reticle and exposure apparatus including the same
#49Information processing apparatus, information processing method, and storage medium
#50Method of generating a pattern on a photomask using a plurality of beams and pattern generator for performing the same
#51Ebeam three beam aperture array
#52Photomask blank
#53Photomask blank
#54RADIATION-SENSITIVE OR ACTINIC RAY-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, MASK BLANK, RESIST PATTERN FORMING METHOD, ELECTRONIC DEVICE MANUFACTURING METHOD, AND ELECTRONIC DEVICE
#55Photomask blank and method for preparing photomask
#56Two-dimensional heterostructure materials
#57METHOD AND SYSTEM FOR FORMING PATTERNS WITH CHARGED PARTICLE BEAM LITHOGRAPHY
#58Method for preparing synthetic quartz glass substrate
#59Photosensitization chemical-amplification type resist material, method for forming pattern using same, semiconductor device, mask for lithography, and template for nanoimprinting
#60Chemically amplified negative resist composition using novel onium salt and resist pattern forming process
#61Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
#62Method and system for forming a pattern on a reticle using charged particle beam lithography
#63EXPOSURE APPARTUS AND RETICLE FORMING METHOD THEREOF
#64METHOD OF FORMING A DESIRED PATTERN ON A SUBSTRATE
#65PHOTOMASK BLANK, RESIST PATTERN FORMING PROCESS, AND METHOD FOR MAKING PHOTOMASK
#66Stencil mask, stencil mask manufacturing method, and imprinting method
#67Patterning method using electron beam and exposure system configured to perform the same
#68Photo acid generator, chemically amplified resist composition, and patterning process
#69Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
#70Method and system for forming patterns with charged particle beam lithography
#71Electron beam exposure method
#72Structure and method of photomask with reduction of electron-beam scatterring
#73Method and system for forming non-manhattan patterns using variable shaped beam lithography
#74Method for forming circular patterns on a surface
#75Chemical amplification resist composition, resist film using the same, resist-coated mask blank, method of forming photomask and pattern, and method of manufacturing electronic device and electronic device
#76Patterning method using electron beam and exposure system configured to perform the same
#77Method and system for design of a reticle to be manufactured using variable shaped beam lithography
#78Actinic ray-sensitive or radiation-sensitive composition, and resist film, resist-coated mask blanks, resist pattern forming method and photomask each using the composition
#79Electron beam data storage system and method for high volume manufacturing
#80Proximity mask for ion implantation with improved resistance to thermal deformation
#81Mask and method for forming the same
#82Photomask with three states for forming multiple layer patterns with a single exposure
#83Method and system for forming a diagonal pattern using charged particle beam lithography
#84Mask blank for scattering effect reduction
#85Method and system for forming patterns with charged particle beam lithography
#86Exposure apparatus for forming a reticle
#87Methods of measuring overlay errors in area-imaging e-beam lithography
#88Method and system for forming a pattern on a reticle using charged particle beam lithography
#89Method and system for forming a pattern on a reticle using charged particle beam lithography
#90Device for manufacturing a surface using character projection lithography with variable magnification
#91Mask assembly having frame with support stick
#92Method for forming circular patterns on a surface
#93Electron beam exposure method
#94Actinic-ray- or radiation sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern
#95Positive resist composition, and resist film, resist-coated mask blank, resist pattern forming method and photomask each using the composition
#96Pattern-dependent proximity matching/tuning including light manipulation by projection optics
#97Data process for E-beam lithography
#98Method and system for design of a reticle to be manufactured using variable shaped beam lithography
#99Devices and methods for improved reflective electron beam lithography
#100Electron beam data storage system and method for high volume manufacturing
#101Method and system for forming non-manhattan patterns using variable shaped beam lithography
#102Chemical amplification resist composition, resist film using the composition, resist-coated mask blanks, resist pattern forming method, photomask and polymer compound
#103Reduce mask overlay error by removing film deposited on blank of mask
#104EUV photoresist encapsulation
#105Method of manufacturing a mask
#106Roller mold manufacturing device and manufacturing method
#107Exposure apparatus for forming a reticle and method of forming a reticle using the same
#108Method and system for design of a reticle to be manufactured using variable shaped beam lithography
#109Method and system for stencil design for particle beam writing
#110Method and system for forming patterns with charged particle beam lithography
#111EXPOSURE DATA GENERATION METHOD
#112METHOD AND SYSTEM FOR FORMING NON-MANHATTAN PATTERNS USING VARIABLE SHAPED BEAM LITHOGRAPHY
#113Electron beam data storage system and method for high volume manufacturing
#114METHOD AND SYSTEM FOR DESIGN OF A SURFACE TO BE MANUFACTURED USING CHARGED PARTICLE BEAM LITHOGRAPHY
#115METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH VARIABLE PATTERN DOSAGE
#116Hybrid lithographic method for fabricating complex multidimensional structures
#117Pattern-dependent proximity matching/tuning including light manipulation by projection optics
#118Method and system for design of a reticle to be manufactured using variable shaped beam lithography
#119Pattern measurement apparatus
#120Method, device, and system for forming circular patterns on a surface
#121METHOD AND SYSTEM FOR STENCIL DESIGN FOR PARTICLE BEAM WRITING
#122Method for optical proximity correction of a reticle to be manufactured using variable shaped beam lithography
#123METHODS TO ACHIEVE 22 NANOMETER AND BEYOND WITH SINGLE EXPOSURE
#124ADJUSTABLE SHADOW MASK ASSEMBLY FOR USE IN SOLAR CELL FABRICATIONS
#125Method and system for design of a reticle to be manufactured using variable shaped beam lithography
#126Method for manufacturing a surface and integrated circuit using variable shaped beam lithography
#127Negative resist composition and patterning process
#128Mask assembly having a frame with support stick
#129Method for manufacturing a surface and integrated circuit using variable shaped beam lithography
#130Mask defect testing apparatus
#131Method and system for manufacturing a surface using character projection lithography with variable magnification
#132Evaporation mask, method of fabricating organic electroluminescent device using the same, and organic electroluminescent device
#133Self-powered lithography method and apparatus using radioactive thin films
#134Charged particle beam drawing method and apparatus
#135METHOD AND SYSTEM FOR STENCIL DESIGN FOR PARTICLE BEAM WRITING
#136LASER ABLATION TOOLING VIA SPARSE PATTERNED MASKS
#137HOLDING MECHANISM, PROCESSING APPARATUS INCLUDING HOLDING MECHANISM, DEPOSITION METHOD USING PROCESSING APPARATUS, AND METHOD OF MANUFACTURING IMAGE DISPLAY DEVICE
#138Implanting a solar cell substrate using a mask
#139Stencil, stencil design system and method for cell projection particle beam lithography
#140Method and system for design of a reticle to be manufactured using character projection lithography
#141Method and system for design of a reticle to be manufactured using variable shaped beam lithography
#142Method and system for forming circular patterns on a surface
#143Method for optical proximity correction of a reticle to be manufactured using variable shaped beam lithography
#144Compensation of dose inhomogeneity and image distortion
#145Writing apparatus and writing method
#146Cell projection charged particle beam lithography
#147Mask for multi-column electron beam exposure, and electron beam exposure apparatus and exposure method using the same
#148PRODUCTION OF MICRO- AND NANOPORE MASS ARRANGEMENTS BY SELF-ORGANIZATION OF NANOPARTICLES AND SUBLIMATION TECHNOLOGY
#149Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the same
#150Membrane Structure and Method for Manufacturing the Same
#151APERTURE MASK, MANUFACTURING METHOD THEREOF, CHARGE BEAM LITHOGRAPHY APPARATUS, AND CHARGE BEAM LITHOGRAPHY METHOD
#152Stencil mask having main and auxiliary strut and method of forming the same
#153Spinodally patterned nanostructures
#154Charged particle beam writing apparatus and charged particle beam writing method
#155Multi-beam deflector array device for maskless particle-beam processing
#156Method and system for logic design for cell projection particle beam lithography
#157Stencil design and method for cell projection particle beam lithography
#158Method for manufacturing semiconductor device
#159Standard component for calibration and calibration method using it and electro beam system
#160Organic electroluminescent device and manufacturing method thereof
#161Method for fabricating semiconductor device and equipment for fabricating the same
#162STENCIL MASK
#163Micro-pattern forming apparatus, micro-pattern structure, and method of manufacturing the same
#164Exposure pattern or mask and inspection method and manufacture method for the same
#165Charged particle beam exposure method of character projection system, charged particle beam exposure device of character projection system, program for use in charged particle beam exposure device, and manufacturing method of semiconductor device
#166MASK-MAKING MEMBER AND ITS PRODUCTION METHOD, MASK AND ITS MAKING METHOD, EXPOSURE PROCESS, AND FABRICATION METHOD OF SEMICONDUCTOR DEVICE
#167MASK, MASK BLANK, AND METHODS OF PRODUCING THESE
#168Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same
#169Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the same
#170MASK, MASK BLANK, AND METHODS OF PRODUCING THESE
#171MASK, MASK BLANK, AND METHODS OF PRODUCING THESE
#172MASK, MASK BLANK, AND METHODS OF PRODUCING THESE
#173Stencil masks, method of manufacturing stencil masks, and method of using stencil masks
#174Mask, method of producing mask, and method of producing semiconductor device
#175Mask, method of producing mask, and method of producing semiconductor device
#176Mask, method of producing the same, and method of producing semiconductor device
#177Selective area fusing of a slurry coating using a laser
#178Electron beam exposure device and exposure method
#179Exposure method, mask, semiconductor device manufacturing method, and semiconductor device
#180Reticle, method for manufacturing magnetic disk medium using reticle, and magnetic disk medium
#181Methods for forming a MRAM with non-orthogonal wiring
#182Complementary division mask having alignment mark, method for forming alignment mark of the complementary division mask, semiconductor device manufactured by using the complementary division mask, and its manufacturing method
#183Exposure device, exposure method, and semiconductor device manufacturing method
#184Device for fabricating a mask by plasma etching a semiconductor substrate
#185Mask processing device, mask processing method, program and mask
#186Method for patterning surface modification
#187Complementary masks and method of fabrication of same, exposure method, and semiconductor device and method of production of same
#188Energetic neutral particle lithographic apparatus and process
#189Mask blank for charged particle beam exposure, method of forming mask blank and mask for charged particle beam exposure
#190Mask-retaining device
#191Lithography systems and methods for operating the same
#192Electron beam exposure mask, electron beam exposure method, and electron beam exposure system
#193Alignment method, alignment substrate, production method for alignment substrate, exposure method, exposure system and mask producing method
#194Electron beam control method, electron beam drawing apparatus and method of fabricating a semiconductor device
#195Highly-corrected mask
#196Mask, method of producing the same, and method of producing semiconductor device
#197Transfer mask blank, transfer mask, and transfer method using the transfer mask
#198Aperture masks for circuit fabrication
#199Mask and production method therefor and production for semiconductor device
#200Method of manufacturing membrane mask, method of manufacturing semiconductor device, and membrane mask
#201Method of designing charged particle beam mask, charged particle beam mask, and charged particle beam transfer method
#202Mask and inspection method therefor and production method for semiconductor device
#203Strongly textured atomic ridge nanowindows
#204Photolithographic techniques for producing angled lines
#205Mask blank and mask for electron beam exposure
#206Nonlithographic method of defining geometries for plasma and/or ion implantation treatments on a semiconductor wafer
#207Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same
#208Method for manufacturing transfer mask substrate, transfer mask substrate, and transfer mask
#209Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device
#210Mask, exposure method and production method of semiconductor device
#211Method of forming exposure mask pattern, exposure mask pattern, and method of producing semiconductor device
#212Mask, semiconductor device manufacturing method, and semiconductor device
#213Mask, method of production of same, and method of production of semiconductor device
#214Mask, method for manufacturing a mask, method for manufacturing an organic electroluminescence device, organic electroluminescence device, and electronic apparatus
#215Mask pattern correction method, semiconductor device manufacturing method, mask manufacturing method and mask
#216Transfer mask for exposure and pattern exchanging method of the same
#217Stencil mask and method of producing the same
#218Stencil mask and method of producing the same
#219Method of dividing circuit pattern, method of manufacturing stencil mask, stencil mask and method of exposure
#220Stencil mask, production method thereof, exposure apparatus, exposure method and electronic device production method
#221Stencil mask, charged particle irradiation apparatus and the method
#222Mask and method of manufacturing the same, electro-luminescence device and method of manufacturing the same, and electronic instrument
#223Photolithographic techniques for producing angled lines
#224Photolithographic techniques for producing angled lines
#225Photolithographic techniques for producing angled lines
#226Method for producing diamond film
#227Method of generating mask distortion data, exposure method and method of producing semiconductor device
#228Complementary division mask, method of producing mask, and program
#229Mask for charged particle beam exposure, and method of forming the same
#230Stencil mask and method of producing the same, semiconductor device produced using the stencil mask and method of producing the semiconductor device