176896 ⎘
Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof; Phase shift masks [PSM]; PSM blanks; Preparation thereof Rim PSM or outrigger PSM; Preparation thereof
Half-tone phase shift mask blank and method for manufacturing half-tone phase shift mask
#2Chromeless phase-shifting photomask with undercut rim-shifting element
#3Boundary layer formation and resultant structures
#4Photomask and pattern formation method using the same
#5Chromeless phase-shifting photomask with undercut rim-shifting element
#6Phase-shift photomask and patterning method
#7Mask for EUV lithography and method for exposure using the same
#8Mask and method for fabricating the same
#9Reticle constructions
#10Multi-layer, attenuated phase-shifting mask
#11Differential alternating phase shift mask optimization
#12Method for fabricating patterns using a photomask
#13Phase shift mask for double patterning and method for exposing wafer using the same
#14Methods of forming reticles
#15RETICLES INCLUDING ASSISTANT STRUCTURES, METHODS OF FORMING SUCH RETICLES, AND METHODS OF UTILIZING SUCH RETICLES
#16Photomask, fabrication method for the same and pattern formation method using the same
#17Method for fabricating rim type photomask
#18Exposure mask, pattern formation method, and exposure mask fabrication method
#19Photomask and pattern formation method using the same
#20Lithography masks and methods of manufacture thereof
#21Methods of forming reticles
#22Photomask, photomask fabrication method, pattern formation method using the photomask and mask data creation method
#23Lithographic mask and methods for fabricating a semiconductor device
#24Photomask and pattern forming method employing the same
#25Photomask, method for producing the same, and method for forming pattern using the photomask
#26Patterning method using photomask
#27Multi-layer, attenuated phase-shifting mask
#28Pattern forming method and phase shift mask manufacturing method
#29Photomask, method for producing the same, and method for forming pattern using the photomask
#30Binary photomask having a compensation layer
#31Method of manufacturing rim type of photomask and photomask made by such method
#32PHASE SHIFT MASK FOR PATTERNING ULTRA-SMALL HOLE FEATURES
#33Method of producing phase shift masks
#34Methods of forming reticles
#35Lithography mask and methods for producing a lithography mask
#36Chromeless phase shifting mask for integrated circuits using interior region
#37Method for forming pattern using a photomask
#38Photomask
#39Method for forming pattern
#40Method for forming generating mask data
#41Differential alternating phase shift mask optimization
#42Mask and method for crystallizing amorphous silicon
#43Method for producing photomask and method for producing photomask pattern layout
#44Method for forming pattern using photomask
#45Method and apparatus for contact hole unit cell formation
#46Methods of forming reticles
#47Multi-layer, attenuated phase-shifting mask
#48Method of manufacturing a semiconductor device
#49Etching method for making a reticle
#50Phase shift mask and method of producing the same
#51Mask for manufacturing semiconductor device and method of manufacture thereof
#52Photomask and pattern forming method employing the same
#53Masks for fabricating semiconductor devices and methods of forming mask patterns
#54Photomask for enhancing contrast
#55Mask for off axis illumination and method for manufacturing the same
#56Photomask, photomask manufacturing method and semiconductor device manufacturing method using photomask
#57Method of manufacturing mask for correcting optical proximity effect
#58Radiation patterning tools, and methods of forming radiation patterning tools
#59Method for forming an opening on an alternating phase shift mask