PHOTOLITHOGRAPHY METHOD AND APPARATUS

SEMICONDUCTOR DEVICE

MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

PHASE SHIFT MASK FOR EUV LITHOGRAPHY AND MANUFACTURING METHOD FOR THE PHASE SHIFT MASK

SEMICONDUCTOR DEVICE

Phase shift mask for EUV lithography and manufacturing method for the phase shift mask

Method of making semiconductor device and semiconductor device

PHOTOLITHOGRAPHY METHOD AND APPARATUS

Phase shift mask and electronic component manufacturing method

Critical dimension (CD) uniformity of photoresist island patterns using alternating phase shifting mask

Semiconductor device

Memory system having write assist circuit including memory-adapted transistors

Critical dimension (CD) uniformity of photoresist island patterns using alternating phase shifting mask

Hybrid power rail structure

Photolithography method and apparatus

Photomask and methods for manufacturing and correcting photomask

MASK BLANK, PHASE SHIFT MASK, METHOD OF MANUFACTURING PHASE SHIFT MASK, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Photomask and methods for manufacturing and correcting photomask

Method for quickly establishing lithography process condition by a pre-compensation value

Device having write assist circuit including memory-adapted transistors and method for making the same

Photomask and fabrication method therefor

Mask blank, method for manufacturing mask blank and transfer mask

Phase shift mask and method of forming patterns using the same

Photomask and methods for manufacturing and correcting photomask

Mask blank, method of manufacturing phase shift mask, phase shift mask, and method of manufacturing semiconductor device

Extreme ultraviolet lithography process and mask with reduced shadow effect and enhanced intensity

Transmission balancing for phase shift mask with a trim mask

Transmission balancing for phase shift mask with a trim mask

Photomask blank, process for production of photomask, and chromium-containing material film

Mask and method for forming the same

Photomask blank

Photomasks, methods of forming a photomask, and methods of photolithographically patterning a substrate

Phase shift mask, method of forming asymmetric pattern, method of manufacturing diffraction grating, and method of manufacturing semiconductor device

Reducing edge die reflectivity in extreme ultraviolet lithography

Photomasks, methods of forming a photomask, and methods of photolithographically patterning a substrate

Photomask blank, method for manufacturing photomask, and method for manufacturing phase shift mask

Mask and method for forming the same

Semiconductor fabrication utilizing grating and trim masks

Photomask blank, process for production of photomask, and chromium-containing material film

Exposure system, method of forming pattern using the same and method of manufacturing display substrate using the same

Layout content analysis for source mask optimization acceleration

Patterning methods and masks

Photomask blank and method for manufacturing photomask

Determining manufacturability of lithographic mask based on manufacturing shape penalty of aspect ratio of edge that takes into account pair of connected edges of the edge

Mask layout formation

PHASE SHIFT MASK AND METHOD FOR MANUFACTURING THE SAME, AND METHOD FOR MANUFACTURING INTEGRATED CIRCUIT

Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask

Photomask and methods for manufacturing and correcting photomask

MASKS FOR MICROLITHOGRAPHY AND METHODS OF MAKING AND USING SUCH MASKS

Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask

ETCHING APPARATUS AND METHOD FOR FABRICATING ALTERNATING PHASE SHIFT MASK USING THE SAME

Method and system of fabricating alternating phase shift mask

Phase-shift photomask and patterning method

Layout Content Analysis for Source Mask Optimization Acceleration

Masks for microlithography and methods of making and using such masks

Method of fabricating integrated circuit using alternating phase-shift mask and phase-shift trim mask

Photomask making method

Etching method and photomask blank processing method

Lithographic mask and method of forming a lithographic mask

Photomask blank and photomask making method

Method for Manufacturing Photo Mask Using Fluorescence Layer

Phase shift mask with enhanced resolution and method for fabricating the same

Angled-wedge chrome-face wall for intensity balance of alternating phase shift mask

Method of generating reticle data, memory medium storing program for generating reticle data and method of producing reticle

Phase shift mask and method for manufacturing the same, and method for manufacturing integrated circuit

Method and apparatus for analyzing a group of photolithographic masks

Patterning methods and masks

Resolution enhancing technology using phase assignment bridges

Pattern formation method using levenson-type mask and method of manufacturing levenson-type mask

Differential alternating phase shift mask optimization

Phase shift mask for double patterning and method for exposing wafer using the same

PHOTOMASK DEFECT CORRECTION METHOD, PHOTOMASK MANUFACTURING METHOD, PHASE SHIFT MASK MANUFACTURING METHOD, PHOTOMASK, PHASE SHIFT MASK, PHOTOMASK SET, AND PATTERN TRANSFER METHOD

MULTI-PASS, CONSTRAINED PHASE ASSIGNMENT FOR ALTERNATING PHASE-SHIFT LITHOGRAPHY

Method and apparatus for identifying and correcting phase conflicts

Correcting 3D effects in phase shifting masks using sub-resolution features

System and method for making photomasks

System and method for making photomasks

Handling of flat data for phase processing including growing shapes within bins to identify clusters

Treatment of trim photomask data for alternating phase shift lithography

Methods and systems for layout and routing using alternating aperture phase shift masks

Process for fabrication of alternating phase shift masks

Mask and method for patterning a semiconductor wafer

Masks for microlithography and methods of making and using such masks

Pattern forming method and mask

ALTERNATING PHASE SHIFT MASK OPTIMIZATION FOR IMPROVED PROCESS WINDOW

MULTI-LAYER ALTERNATING PHASE SHIFT MASK STRUCTURE

SYSTEM AND METHOD FOR MAKING PHOTOMASKS

ALTERNATIVE PHASE-SHIFTING MASK AND MANUFACTURING METHOD THEREOF

Photomask correcting method and manufacturing method of semiconductor device

Full phase shifting mask in damascene process

PHOTOLITHOGRAPHY MASK WITH PROTECTIVE CAPPING LAYER

PHOTOLITHOGRAPHY MASK WITH PROTECTIVE SILICIDE CAPPING LAYER

PHOTOLITHOGRAPHY MASK WITH INTEGRALLY FORMED PROTECTIVE CAPPING LAYER

System for coloring a partially colored design in an alternating phase shift mask

Migration of integrated circuit layout for alternating phase shift masks

Photo mask, exposure method using the same, and method of generating data

Photo mask, exposure method using the same, and method of generating data

PHASE SHIFT MASK FOR AVOIDING PHASE CONFLICT

Mask blank, method of manufacturing an exposure mask, and method of manufacturing an imprint template

Method and apparatus for performing target-image-based optical proximity correction

Method for manufacturing phase shift mask using electron beam lithography

Lithographic mask and methods for fabricating a semiconductor device

Multi-step photomask etching with chlorine for uniformity control

Methods for adjusting shifter width of an alternating phase shifter having variable width

Method to etch chrome for photomask fabrication

Photo-mask having phase and non-phase shifter parts for patterning an insulated gate transistor

Phase shift mask

Method for producing a photomask, method for patterning a layer or layer stack and resist stack on a mask substrate

PHOTO MASK WITH IMPROVED CONTRAST AND METHOD OF FABRICATING THE SAME

Alternating phase shift mask inspection using biased inspection data

Structure and method for partitioned dummy fill shapes for reduced mask bias with alternating phase shift masks

Phase shift mask and method for manufacturing light-collecting device

Mask and method for patterning a semiconductor wafer

TRIM PHOTOMASK PROVIDING ENHANCED DIMENSIONAL TRIMMING AND METHODS FOR FABRICATION AND USE THEREOF

Phase shift mask including a substrate with recess

Photomask having self-masking layer and methods of etching same

Continuous sloped phase edge architecture fabrication technique using electron or optical beam blur for single phase shift mask ret

Transistor arrangement, sense-amplifier arrangement and methods of manufacturing the same via a phase shift mask

Two-print two-etch method for enhancement of CD control using ghost poly

INTEGRATED PHASE ANGLE AND OPTICAL CRITICAL DIMENSION MEASUREMENT METROLOGY FOR FEED FORWARD AND FEEDBACK PROCESS CONTROL

Mask pattern generating method

Dummy Phase Shapes To Reduce Sensitivity Of Critical Gates To Regions Of High Pattern Density

Phase-shift mask, manufacturing method thereof and manufacturing method of semiconductor element

Incrementally resolved phase-shift conflicts in layouts for phase-shifted features

Photomask making method and semiconductor device manufacturing method

Alternating phase shift masking

Patterning method using photomask

Photomask blank and photomask making method

Multiple resist layer phase shift mask (PSM) blank and PSM formation method

Exposure mask, method of forming resist pattern and method of forming thin film pattern

Dual trench alternating phase shift mask fabrication

Photomask, pattern formation method using the same and mask data creation method

Photomask features with interior nonprinting window using alternating phase shifting

Patterning methods and masks

Phase-Shift Mask Providing Balanced Light Intensity Through Different Phase-Shift Apertures And Method For Forming Such Phase-Shift Mask

Correcting 3D effects in phase shifting masks using sub-resolution features

Pattern formation method using Levenson-type mask and method of manufacturing Levenson-type mask

Method of manufacturing semiconductor integrated circuit devices

Mask blank and photomask having antireflective properties

Angled-wedge chrome-face wall for intensity balance of alternating phase shift mask

Method of manufacturing semiconductor device

Method of forming pattern

Method of making alternating phase shift masks

Notched trim mask for phase shifting mask

Attenuated phase shift mask blank and photomask

Photomask

Phase shifting test mask patterns for characterizing illumination and mask quality in image forming optical systems

Levenson type phase shift mask and manufacturing method thereof

Method of manufacturing rim type of photomask and photomask made by such method

Cluster tool with integrated metrology chamber for transparent substrates

Levenson phase shifting mask and method for preparing the same and method for preparing a semiconductor device using the same

Resolution enhancing technology using phase assignment bridges

Mask, manufacturing method for mask, and manufacturing method for semiconductor device

Method of manufacturing EUVL alternating phase-shift mask

Method of resolving phase conflicts in an alternating phase shift mask and the alternating phase shift mask

Dual phase shift photolithography masks for logic patterning

Photomask to which phase shift is applied and exposure apparatus

Method and apparatus for identifying and correcting phase conflicts

Performing OPC on structures with virtual edges

Printing of design features using alternating PSM technology with double mask exposure strategy

Photomask

Method for forming pattern

Method for forming generating mask data

Apparatus for projecting a pattern into an image plane

Photomask, method for forming the same, and method for forming pattern using the photomask

Phase shift masks

Phase-shifting mask and semiconductor device

Method for plasma etching a chromium layer suitable for photomask fabrication

Differential alternating phase shift mask optimization

Integrated metrology chamber for transparent substrates

Method for quartz photomask plasma etching

Dry etching apparatus having particle removing device and method of fabricating phase shift mask using the same

Methods for repairing an alternating phase-shift mask

Mask pattern and method for forming resist pattern using mask pattern thereof

Designing method and device for phase shift mask

Method for producing photomask and method for producing photomask pattern layout

Pattern formation method

Method and apparatus for performing target-image-based optical proximity correction

Tri-tone trim mask for an alternating phase-shift exposure system

Photomask for forming small contact hole array and methods of fabricating and using the same

Generating mask patterns for alternating phase-shift mask lithography

Structure and method to fabricate a protective sidewall liner for an optical mask

Method of creating a layout of a set of masks

Method to resolve line end distortion for alternating phase shift mask

Phase shift mask fabrication method thereof and fabrication method of semiconductor apparatus

Anti-reflective sidewall coated alternating phase shift mask and fabrication method

System and method for phase shift assignment

Mask for exposure and method of manufacturing the same

Combining image imbalance compensation and optical proximity correction in designing phase shift masks

Method for designing alternating phase shift masks

Exposure method and apparatus

Method for the photolithographic projection of a pattern onto a semiconductor wafer with an alternating phase mask

System for coloring a partially colored design in an alternating phase shift mask

Methods and systems for layout and routing using alternating aperture phase shift masks

Designing method and device for phase shift mask

Phase shift mask including a substrate with recess

Mask blank having a protection layer

Graph based phase shift lithography mapping method and apparatus

Single exposure of mask levels having a lines and spaces array using alternating phase-shift mask

Continuous sloped phase edge architecture fabrication technique using electron or optical beam blur for single phase shift mask ret

Alternating phase-shift mask rule compliant IC design

Semiconductor device manufacturing method

Phase shift mask and method of manufacturing phase shift mask

Methods of forming alternating phase shift masks having improved phase-shift tolerance

Method for transferring a layout of an integrated circuit level to a semiconductor substrate

Method and apparatus for etching photomasks

Correcting 3D effects in phase shifting masks using sub-resolution features

Method of conflict avoidance in fabrication of gate-shrink alternating phase shifting masks

Alternating aperture phase shift photomask having light absorption layer

Alternating phase shift mask design for high performance circuitry

Handling of flat data for phase processing including growing shapes within bins to identify clusters

Photomask and manufacturing method of semiconductor device

Mask for manufacturing semiconductor device and method of manufacture thereof

Process for creating phase edge structures in a phase shift mask

Integrated phase angle and optical critical dimension measurement metrology for feed forward and feedback process control

Resolution enhancing technology using phase assignment bridges

Method for printability enhancement of complementary masks

Full phase shifting mask in damascene process

Photomask features with interior nonprinting window using alternating phase shifting

Phase-shift mask and fabrication thereof

Alternating phase mask built by additive film deposition

Lithography mask for imaging of convex structures

Manufacturing method of semiconductor integrated circuit device

Multi-step phase shift mask and methods for fabrication thereof

Semiconductor device with loop line pattern structure, method and alternating phase shift mask for fabricating the same

Phase shifting lithographic process

Method of improving a resolution of contact hole patterns by utilizing alternate phase shift principle

Resolving phase-shift conflicts in layouts using weighted links between phase shifters

Semiconductor device with loop line pattern structure, method and alternating phase shift mask for fabricating the same

Photomask having an internal substantially transparent etch stop layer

Phase shift assignments for alternate PSM

Phase shift mask including sub-resolution assist features for isolated spaces

Method for creating alternating phase masks

Radiation patterning tools, and methods of forming radiation patterning tools

Method for forming an opening on an alternating phase shift mask

Phase-shifting mask and method of forming pattern using the same

Generating mask patterns for alternating phase-shift mask lithography

Photo mask, exposure method using the same, and method of generating data

Alternating phase shift mask

Critical dimension (CD) uniformity of photoresist island patterns using alternating phase shifting mask

Alternating phase shift mask