MASK BLANK, PHASE SHIFT MASK, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE

MASK BLANK, TRANSFER MASK, AND SEMICONDUCTOR-DEVICE MANUFACTURING METHOD

Mask blank, phase shift mask, and method of manufacturing semiconductor device

Phase-shift mask for extreme ultraviolet lithography

Chromeless phase shift mask structure and process

Patterning devices for use within a lithographic apparatus, methods of making and using such patterning devices

Chromeless phase shift mask structure and process

Reticle design for the reduction of lens heating phenomenon

Forming a bridging feature using chromeless phase-shift lithography

Forming a bridging feature using chromeless phase-shift lithography

Forming a bridging feature using chromeless phase-shift lithography

Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film

Methods and patterning devices for measuring phase aberration

Nanopatterning method and apparatus

Phase-shift mask with assist phase regions

Photomask blank, photomask, and methods of manufacturing the same

PHASE MODULATION DEVICE, PHASE MODULATION DEVICE FABRICATION METHOD, CRYSTALLIZATION APPARATUS, AND CRYSTALLIZATION METHOD

PHASE MODULATION DEVICE, PHASE MODULATION DEVICE FABRICATION METHOD, CRYSTALLIZATION APPARATUS, AND CRYSTALLIZATION METHOD

Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film

Chromeless phase-shifting photomask with undercut rim-shifting element

Method of manufacturing optical element, and optical element

PATTERN FORMING METHOD

Mask and method for fabricating the same

High contrast lithographic masks

Reticle constructions

Mask and method to pattern chromeless phase lithography contact hole

Extreme ultraviolet photolithography mask, with absorbent cavities

Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film

Method for etching glass or metal substrates using negative photoresist and method for fabricating cliche using the same

PATTERN FORMING METHOD AND PATTERN FORM

Photomask blank, photomask, and methods of manufacturing the same

Method for fabricating chromeless phase shift mask

Photomask blank, photomask, and methods of manufacturing the same

Photomask blank, photomask, and methods of manufacturing the same

Methods of forming reticles

Method for correcting critical dimension of mask pattern

Method for preparing photonic crystal slab waveguides

Phase-shift mask and method for forming a pattern

USING ION IMPLANTATION TO CONTROL TRENCH DEPTH AND ALTER OPTICAL PROPERTIES OF A SUBSTRATE

Adjustable mask blank structure for an EUV phase-shift mask

USE OF CHROMELESS PHASE SHIFT MASKS TO PATTERN CONTACTS

Lithography masks for improved line-end patterning

Methods of forming reticles

Method of forming supports bearing features, such as lithography masks

PHASE-SHIFTING MASK AND METHOD OF FABRICATING SAME

SUB-RESOLUTION ASSIST FEATURE OF A PHOTOMASK

Method for manufacturing phase shift mask using electron beam lithography

Method for manufacturing photomask

Patterning device, method of providing a patterning device, photolithographic apparatus and device manufacturing method

Dual layer workpiece masking and manufacturing process

Phase shift mask

METHOD FOR DESIGNING AN INDEX PROFILE SUITABLE FOR ENCODING INTO A PHASE MASK FOR MANUFACTURING A COMPLEX OPTICAL GRATING

Patterning masks, methods, and systems

CPL mask and a method and program product for generating the same

Hybrid photomask and method of fabricating the same

Method of mask making to prevent phase edge and overlay shift for chrome-less phase shifting mask

High Definition Mask and Manufacturing Method of the Same

Crystallization apparatus, crystallization method, and phase shifter

Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film

Hybrid phase-shift mask and manufacturing method thereof

Phase shifting mask capable of reducing the optical proximity effect and method for preparing semiconductor devices using the same

Reflective photomask and method of fabricating the same

Method of achieving CD linearity control for full-chip CPL manufacturing

Lithographic apparatus and device manufacturing method

Dual layer workpiece masking and manufacturing process

Method for preparing a phase-shifting mask and method for preparing a semiconductor device using the phase-shifting mask

Phase-shifting mask

Method for patterning photoresist pillars using a photomask having a plurality of chromeless nonprinting phase shifting windows

CPL mask and a method and program product for generating the same

Phase modulation device, phase modulation device fabrication method, crystallization apparatus, and crystallization method

PHASE SHIFTING MASK FOR EQUAL LINE/SPACE DENSE LINE PATTERNS

Method of making a semiconductor device using a dual-tone phase shift mask

Cr-capped chromeless phase lithography

Method for checking phase shift angle of phase shift mask, lithography process and phase shift mask

Chromeless phase-shifting mask for equal line/space dense line patterns

Methods of forming reticles

Phase shift photomask and method for improving printability of a structure on a wafer

Chromeless phase shifting mask for integrated circuits using interior region

Adjustable Transmission Phase Shift Mask

Method and apparatus for correcting 3D mask effects

Method of fabricating chrome-less phase shift mask

Multi-transmission phase mask and method for manufacturing the same

Mask and method to pattern chromeless phase lithography contact hole

Multi-transmission phase mask and exposure method using the same

Photomask for forming small contact hole array and methods of fabricating and using the same

Chromeless phase shift lithography (CPL) masks having features to pattern large area line/space geometries

Method and apparatus for removing radiation side lobes

Crystallization apparatus, crystallization method, and phase shifter

Polarizing reticle

Light irradiation apparatus, crystallization apparatus, crystallization method, semiconductor device and light modulation element

Methods of forming reticles

Light irradiation apparatus, crystallization apparatus, crystallization method and device

Chromeless phase shift mask and method of fabricating the same

Reflective mask useful for transferring a pattern using extreme ultra violet (EUV) radiation and method of making the same

Method of manufacturing a semiconductor device

Mask blank, phase shift mask manufacturing method and template manufacturing method

Optical proximity correction method utilizing phase-edges as sub-resolution assist features

Etching method for making a reticle

Masks for lithographic imagings and methods for fabricating the same

Photomask features with chromeless nonprinting phase shifting window

Method for etching a quartz layer in a photoresistless semiconductor mask

Process for creating phase edge structures in a phase shift mask

Photomask and method of controlling transmittance and phase of light using the photomask

Photomasks

Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography

Clear field annular type phase shifting mask

Adjustable transmission phase shift mask

Phase-shift mask and fabrication thereof

Lithography method

Printing irregularly-spaced contact holes using phase shift masks

Phase shift mask

Manufacturable chromeless alternating phase shift mask structure with phase grating

Method of manufacturing mask for correcting optical proximity effect

Phase edge darkening binary masks