Patents-Review.com
ClassID:

176902 ⎘

G03F1/40 - CPC Classification

Classification description:

Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof; Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof Electrostatic discharge [ESD] related features, e.g. antistatic coatings or a conductive metal layer around the periphery of the mask substrate

Recent Application in this class:
#1
20260044066
2026-02-12

REFLECTIVE MASK AND FABRICATING METHOD THEREOF

 #2
20250199395
2025-06-19

TRANSPORT COMPLEX AND TRANSPORT MODULE INCLUDING THE SAME

 #3
20250147407
2025-05-08

REFLECTION-TYPE MASK BLANK, METHOD FOR PRODUCING REFLECTION-TYPE MASK BLANK, REFLECTION-TYPE MASK, AND METHOD FOR PRODUCING REFLECTION-TYPE MASK

 #4
20240347552
2024-10-17

METHOD FOR MANUFACTURING DRIVE CIRCUIT, DRIVE CIRCUIT AND PHOTOMASK

 #5
20230305404
2023-09-28

Method of lithography process and transferring a reticle

 #6
20230229072
2023-07-20

Reflective mask and fabricating method thereof

 #7
20230138079
2023-05-04

LITHOGRAPHY SYSTEM

 #8
20230104571
2023-04-06

Substrate with film for reflective mask blank, reflective mask blank, and method for manufacturing reflective mask

 #9
20220397820
2022-12-15

PHOTOMASK, METHOD OF MANUFACTURING ARRAY SUBSTRATE, AND DISPLAY PANEL

 #10
20220260901
2022-08-18

Method of lithography process using reticle container with discharging device

 #11
20220146924
2022-05-12

Reflective mask and fabricating method thereof

 #12
20210373434
2021-12-02

TRANSPORT COMPLEX AND TRANSPORT MODULE INCLUDING THE SAME

 #13
20210208495
2021-07-08

Reflective type blankmask and photomask for EUV

 #14
20210026236
2021-01-28

Reticle with conductive material structure

 #15
20200371426
2020-11-26

ANTI-STATIC PHOTOMASK

 #16
20200233298
2020-07-23

Photomask with electrostatic discharge protection

 #17
20200201169
2020-06-25

Induced stress for EUV pellicle tensioning

 #18
20200201168
2020-06-25

Alignment mark, substrate and manufacturing method therefor, and exposure alignment method

 #19
20200192213
2020-06-18

Substrate with an electrically conductive film, substrate with a multilayer reflective film, reflective mask blank, reflective mask and method of manufacturing semiconductor device

 #20
20200133114
2020-04-30

Extreme ultraviolet mask with backside coating

 #21
20200133113
2020-04-30

Reflective mask and fabricating method thereof

 #22
20200004134
2020-01-02

Lithography mask and method

 #23
20190155139
2019-05-23

Method for discharging static charges on reticle

 #24
20190148156
2019-05-16

Photo mask and method of manufacturing semiconductor element using photo mask

 #25
20190094681
2019-03-28

Photoetching mask plate, manufacture method thereof, and photoetching method

 #26
20190056653
2019-02-21

Reflective mask blank and reflective mask

 #27
20190004416
2019-01-03

Lithography mask and method

 #28
20180335693
2018-11-22

Mask blank having a resist layer, method for manufacturing mask blank having resist layer, and method for manufacturing transfer mask

 #29
20180164676
2018-06-14

Anti-ESD photomask and method of forming the same

 #30
20180149962
2018-05-31

Substrate with electrically conductive film, substrate with multilayer reflective film, reflective mask blank, reflective mask, and method of manufacturing semiconductor device

 #31
20170261854
2017-09-14

Conductive composition, antistatic film, laminate and production therefor, and production method for photomask

 #32
20170255102
2017-09-07

Pattern trimming compositions and methods

 #33
20150301440
2015-10-22

Mask for performing pattern exposure using reflected light

 #34
20140205936
2014-07-24

Mask blank for reflection-type exposure, and mask for reflection-type exposure

 #35
20140106266
2014-04-17

Mask blank and photomask

 #36
20140001380
2014-01-02

Method and apparatus of mask drawing using a grounding body at lowest resistance value position of the mask

 #37
20130323928
2013-12-05

Method of manufacturing semiconductor device, and mask

 #38
20130075605
2013-03-28

Conductive element for electrically coupling an EUVL mask to a supporting chuck

 #39
20120244714
2012-09-27

Exposure mask and method for manufacturing same and method for manufacturing semiconductor device

 #40
20120070768
2012-03-22

Methods of fabricating reticles with subdivided blocking regions

 #41
20110169495
2011-07-14

MONITORING MODULE INCLUDING E-FIELD-INDUCED ESD-SENSITIVE PATTERN AND PHOTOMASK INCLUDING THE MODULE

 #42
20100266939
2010-10-21

Lithographic mask and method of forming a lithographic mask

 #43
20100203432
2010-08-12

Exposure mask and method for manufacturing same and method for manufacturing semiconductor device

 #44
20100167187
2010-07-01

Reflective-type mask blank for EUV lithography

 #45
20100124710
2010-05-20

Photomask

 #46
20100112462
2010-05-06

Reticles with subdivided blocking regions

 #47
20100112461
2010-05-06

Photolithographic reticles with electrostatic discharge protection structures

 #48
20100081066
2010-04-01

Mask blank and method of manufacturing a transfer mask

 #49
20080308900
2008-12-18

ELECTRICAL FUSE WITH SUBLITHOGRAPHIC DIMENSION

 #50
20080268352
2008-10-30

LIGHT REFLECTION MASK, METHOD OF MANUFACTURING THE SAME AND SEMICONDUCTOR DEVICE

 #51
20080261126
2008-10-23

Secure photomask with blocking aperture

 #52
20080187843
2008-08-07

Photomask and method for manufacturing a semiconductor device using the photomask

 #53
20070281221
2007-12-06

STENCIL MASK

 #54
20070228525
2007-10-04

Substrate earthing mechanism for use in charged-particle beam writing apparatus

 #55
20070218667
2007-09-20

Reticle containing structures for sensing electric field exposure and a method for its use

 #56
20070166626
2007-07-19

Scattering bar OPC application method for mask ESD prevention

 #57
20070160916
2007-07-12

Reflective-type mask blank for EUV lithography

 #58
20070066006
2007-03-22

Method and structure for electrostatic discharge protection of photomasks

 #59
20060292457
2006-12-28

System for electrically connecting a mask to earth, a mask

 #60
20060216614
2006-09-28

Method of mask making and structure thereof for improving mask ESD immunity

 #61
20060154153
2006-07-13

Anti-ESD photomask blank

 #62
20060130969
2006-06-22

Partial edge bead removal to allow improved grounding during e-beam mask writing

 #63
20060115744
2006-06-01

Method of producing a mask blank for photolithographic applications, and mask blank

 #64
20060113280
2006-06-01

Partial edge bead removal to allow improved grounding during e-beam mask writing

 #65
20050238964
2005-10-27

PHOTOMASK

 #66
20050214654
2005-09-29

ESD-resistant photomask and method of preventing mask ESD damage

 #67
20050186488
2005-08-25

Reticle with antistatic coating

 #68
20050142699
2005-06-30

Method and structure for electrostatic discharge protection of photomasks

 #69
20050008943
2005-01-13

Partial edge bead removal to allow improved grounding during e-beam mask writing